• The Transactions of the Korean Institute of Electrical Engineers
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• v.43 no.3
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• pp.478-484
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• 1994

Facing target dc sputtering system developed by Hoshi et al. has simple configuration and high deposition rate under moderate substrate temperature in the range of pressure 5x10S0-4T - 1x10S0-2T torr. In this system, magnetic field should be applied perpendicular to the target surface in order to confine high energy secondary electrons between two targets. Because of this magnetic field, the glow discharge characteristics are very different from dc planar diode system showing some unstable discharge region. In this paper, the glow discharge characteristics of this system have been studied under the condition of Ti targets with Ar-NS12T(10%) as working gas. It is found that this system has stable discharge region under the discharge current density of 15-30(mA/cmS02T). The plasma density and electron temperature are in the range of 10S010Y - 10S011T(CMS0-3T) and 2.5-5(eV), respectively.

• Proceedings of the Materials Research Society of Korea Conference
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• 2010.05a
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• pp.49.2-49.2
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• 2010

Copper oxide films have been deposited on silicon substrates by direct current magnetron sputtering of Cu in O2 / Ar gas mixtures. The target oxidation occurring as a result of either adsorption or ion-plating of reactive gases to the target has a direct effect on the discharge current and the resulting composition of the deposited films. The kinetic model which relates the target oxidation to the discharge current was proposed, showing the one-to-one relationship between discharge current characteristics and film stoichiometry of the deposited films.

• Journal of Korean Society on Water Environment
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• v.32 no.2
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• pp.163-172
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• 2016

This study aimed to develop a plan for effective performance of a watershed through correct identification of a river watershed by using the flowrate of the river and water quality data, which is the basis for the establishment of the water environment policy. The target river for water quality improvement was selected based on the monitoring result for 4 water systems in Chungcheongnamdo province in the recent 3 years. The result of analysis for the distribution of discharge capacity by a pollution source group for the water quality improvement target river showed that most of the target river has a high discharge capacity in the water system for living and livestock. Analysis for the density of the total discharge capacity of the whole watershed of Chungcheongnamdo indicated that the river that needs water quality improvement has high BOD concentration and high discharge load density at the point that this river is located. Thus, for efficient watershed management through selection and concentration, Chungcheongnamdo needs to improve the target river in priority. Stepwise planning is also required to establish and execute the water quality improvement in order to satisfy said target water quality, and establish the index for the water improvement rate for its evaluation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.620-623
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• 2004

In this study, the discharge characteristic of FTS (Facing Targets Sputtering) apparatus was investigated using metal target paramagnetic and ceramic targets such as Zn, Al, $ZnO:Al(Al_2O_3)$, ITO. Threshold voltage and stable stage of discharge show different with target species. Compare with commercial sputtering apparatus, the FTS apparatus is a high-speed sputter method that promotes ionization of sputter gas by screw and reciprocate moving high-speed ${\gamma}$electrons which arrays two targets facing each other, inserts plasma arresting magnetic field to the parallel direction of the center axis of both targets, discharged from targets and accelerated at the cathode falling area. Especially, we notice that the FTS method using ceramic target has stable discharge characteristic even by DC power source.

• Korean Journal of Materials Research
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• v.21 no.9
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• pp.509-514
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• 2011

In this study, optical emission spectroscopy was used to monitor the plasma produced during the RF magnetron sputtering of a $BaTiO_3$ target. The intensities of chemical species were measured by real time monitoring with various discharge parameters such as RF power, pressure, and discharge gas. The emission lines of elemental and ionized species from $BaTiO_3$ and Ti targets were analyzed to evaluate the film composition and the optimized growth conditions for $BaTiO_3$ films. The emissions from Ar(I, II), Ba(I, II) and Ti(I) were found during sputtering of the $BaTiO_3$ target in Ar atmosphere. With increasing RF power, all the line intensities increased because the electron density increased with increasing RF power. When the Ar pressure increased, the Ba(II) and Ti(I) line intensity increased, but the $Ar^+$ line intensity decreased with increasing pressure. This result shows that high pressure is of greater benefit for the ionization of Ba than for that of Ar. Oxygen depressed the intensity of the plasma more than Ar did. When the Ar/$O_2$ ratio decreased, the intensity of Ba decreased more sharply than that of Ti. This result indicates that the plasma composition strongly depends on the discharge gas atmosphere. When the oxygen increased, the Ba/Ti ratio and the thickness of the films decreased. The emission spectra showed consistent variation with applied power to the Ti target during co-sputtering of the $BaTiO_3$ and Ti targets. The co-sputtered films showed a Ba/Ti ratio of 1.05 to 0.73 with applied power to the Ti target. The films with different Ba/Ti ratios showed changes in grain size. Ti excess films annealed at $600^{\circ}C$ did not show the second phase such as $BaTi_2O_5$ and $TiO_2$.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.526-526
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• 2012

DC magnetron discharges were studied using three-dimensional self-consistent particle-in-cell and Monte Carlo collisional (PIC-MCC) simulation codes. Two rectangular sputter sources (120 mm * 250 mm and 380 mm * 200 mm target sizes) were used in the simulation modeling. The number of incident ions to the Cu target as a function of position and simulation time was obtained. The target erosion profile was calculated by using the incident ions and the sputtering yields of the Cu target calculated with SRIM codes. The maximum ion density of the ion density distribution in the discharge was about $10^{10}cm^{-3}$ due to the calculation speed limit. The result may be less than one or two order of magnitude smaller than the real maximum ion density. However, the target erosion profiles of the two sputter sources were in good agreement with the measured target erosion profiles except for the erosion profile near the target surface, in which which the measured erosion width was broader than the simulation erosion width.

• Journal of Korean Society on Water Environment
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• v.29 no.4
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• pp.523-530
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• 2013

This study has been carried out to clarify the characteristics of discharge and pollutant loading according to flow conditions at jiseok stream watershed (JSW). A flow rate and pollutant load in the study watershed were estimated by equation of stage-discharge and discharge-loads rating curve. By using the methods above, I've evaluated the water quality (WQ) of the JSW if it is satisfied with the standard target. I've collected the data of BOD and T-P from the JSW every 8 days for the duration of 12 months. And then, I've schematized the data upon the load duration curve and the results showed me that the WQ of JSW was satisfied with the standard target. I've also collected the same data every each day for the duration of 12 months from JSW and have schematized the data again. And the results showed that it also was satisfied with the standard target. To be concluded, I've determined that point pollution sources of JSW gives more significant impacts to the WQ than non-point pollution sources of JSW and hence, as time goes, point pollution sources will keep depriciating the WQ of JSW. Therefore, further efforts will be required to JSW to maintain the WQ.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.7
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• pp.641-646
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• 2003

The dielectric carbon nitride thin films were deposited onto Si(100) substrate using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in the presence of a N$_2$ reactive gas. We calculated dielectric constant, $\varepsilon$$\_$s/, with a capacitance Schering bridge method. We investigated the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were increased drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and C=N bonds. The carbon nitride thin films were observed crystalline phase confirmed by x-ray diffraction data.

• Proceedings of the Korea Water Resources Association Conference
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• 2006.05a
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• pp.1191-1195
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• 2006

Now days, heavy storm occur to be continue. It is hard to use before frequency based on flood discharge for decision that design water pocket structure. We need to estimation of frequency based on flood discharge on the important basin likely city or basin that damage caused by flood recurrence. In this paper flood discharge calculated by Clark watershed method and SCS synthetic unit hydrograph method about upside during each minute of among time distribution method of rainfall, Huff method choosing Bocheong Stream basin that is representative basin of International Hydrologic Project (IHP) about time distribution of rainfall that exert big effect at flood discharge estimate to research target basin because of and the result is as following. Relation between probability flood discharge that is calculated through frequency analysis about flood discharge data and rainfall - runoff that is calculated through outward flow model was assumed about $48.1{\sim}95.9%$ in the case of $55.8{\sim}104.0%$, SCS synthetic unit hydrograph method in case of Clark watershed method, and Clark watershed method has big value overly in case of than SCS synthetic unit hydrograph method in case of basin that see, but branch of except appeared little more similarly with frequency flood discharge that calculate using survey data. In the case of Critical duration, could know that change is big area of basin is decrescent. When decide time distribution type of rainfall, apply upside during most Huff 1-ST because heavy rain phenomenon of upsides appears by the most things during result 1-ST about observation recording of target area about Huff method to be method to use most in business, but maximum value of peak flood discharge appeared on Huff 3-RD too in the case of upside, SCS synthetic unit hydrograph method during Huff 3-RD incidental of this research and case of Clark watershed method. That is, in the case of Huff method, latitude is decide that it is decision method of reasonable design floods that calculate applying during all $1-ST{\sim}4-TH$.

• Proceedings of the KIEE Conference
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• 1993.11a
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• pp.272-274
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• 1993

In this paper, We were studied the discharge occurrence voltage characteristics. discharge current-discharge voltage characteristics, electron temperature and electron density characteristics on the Facing Tarcket Sputtering System(FTSS) and fabrication of TiN thin films. The discharge occurrence voltage characteristics and discharge current are significantly affected by magnetic flux density. The minimum value of discharge occurrence voltage are obtained about 100[Gauss]. The electron temperature are about 4-8 [eV], and electron density are about $10^{10}cm^{-3}$.