• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.621-622
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• 2010

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.1147-1150
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• 2003

When a braun tube becomes wider, one of the major problems to be experienced is the non-uniform coating along the four diagonal directions on its surface. This non-uniformity in the coating thickness has a deep relation with the fluid flow on the surface of a braun tube. In order to control the fluid flow properly, we install the plate to block fluid flow at the corner of a braun tube. In the present study, we investigate the effects of the geometry of plate to control the fluid flow and coating uniformity and determine the optimal shape of plate to improve the quality of coating uniformity.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2001년도 춘계학술대회 논문집
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• pp.1068-1071
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• 2001

Recently, the minimum line width shows a tendancy to decrease and the multi-level to increase in semiconductor. Therefore, a planarization technique is needed, which chemical polishing(CMP) is considered as one of the most important process. CMP accomplishes a high polishing performance and a global planarization of high quality. But there are several defects in CMP such as microscratches, abrasive contaminations, and non-uniformity of polished wafer edges. Spin Etching can improve the defects of CMP. It uses abrasive-free chemical solution instead of slurry. Wafer rotates and chemical solution is simultaneously dispensed on a whole surface of the wafer. Thereby chemical reaction is occurred on the surface of wafer, material is removed. On this study, TEOS film is removed by CMP and Spin Etching, the results are estimated at a viewpoint of material removal rate(MRR) and within wafer non-uniformity(WIWNU).

• 대한설비공학회:학술대회논문집
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• 대한설비공학회 2009년도 하계학술발표대회 논문집
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• pp.415-420
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• 2009

Selective Catalytic Reduction(SCR) has been used for the reduction of $NO_x$ in a steam supply boiler. Recently, the reduction of $NO_x$ becomes an important research field because of its negative effect on an environment. Shape optimization of circular poles installed in the chamber, which is located in upstream of a SCR, has been performed using response surface method and three-dimensional Navier-Stokes analysis to enhance gas flow uniformity. Three design parameters, diameter, arranging angle and stretching ratio of circular poles, are considered in the present study. Throughout the shape optimization of a circular pole, gas flow uniformity is successfully increased by decreasing local recirculation flow in a square duct chamber. Recirculation flow observed in the corner of the square duct can be reduced by proper installation of a guide vane or a blunt body. Detailed flow characteristics are also analyzed and discussed.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.180-181
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• 2015

본 논문에서는 ICP Poly Etcher를 이용한 Dry Etch에서 몇가지 공정조건의 변화에 따른 Etching 특성 변화를 연구하였다. 주요 가스유량들이 증가 할 때, Poly-Si 의 Etch rate는 증가 하였으며 Uniformity는 나빠진 것을 확인 할 수 있었고 다른 특성들은 특별한 변화를 보이지 않았다. 주요 Gas인 HBr의 증가는 PR(Photo Resist)와 Uniformity에 영향을 주었다. 이 논문을 통해 HBr의 유량이 Poly-Si Etching에 영향을 주는 결과를 알아 볼 수 있었고 HBr 가스의 유량 증가가 Polymer의 생성에 영향을 줘 Selectivity와 Uniformity를 증가 시킨다는 것도 확인 해 볼 수 있었다.

• 한국표면공학회지
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• 제23권3호
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• pp.160-166
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• 1990

The effects of the variation of proedd varibles on the flow patterns and effects of the flow patterns on the deposition rate and uniformity in the Si-epitaxy CVD with SiH4 as the source of Si were studied through the calculation by use of control volume method. The reslts showed that the natural convection was undesirable to the uniformity of deposition rate, whose effects were decreased with the dercrese with the decrese of the pressure in the reactoor and with the increase of the flow rate. However. the excessive increase of flow rate caused the movement of the unreacted gas to the substrate. Therefore it resulted in the non-uniform depositions. The rotation of substrate was apperared to improve the uniformity. The resulte of this study could used in CVD process to design the reator and to find the optimum conditions of the process variables.

• 한국분무공학회지
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• 제25권4호
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• pp.154-161
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• 2020

A single spray plume is the basic unit of the entire spray plume and is an important factor in understanding the spray characteristics. However, since the multi-hole GDI injector has a narrow spray angle, the superposition of the spray plumes occurs severely. Therefore, the spray uniformity and the spray atomization characteristics of a single spray plume were analyzed in this study using a single-hole GDI injector. Five single-hole GDI injectors with different nozzle hole diameters were used in the experiment. The uniformity of the spray was evaluated through the analysis of the spray pattern images. In addition, the atomization characteristics were compared using the diameter distribution of the spray droplets obtained using PDPA. As a result, the larger diameter of the nozzle hole, the less uniformity of the spray, and the injection pressure did not have a significant effect on the spray uniformity. It is judged that the surface roughness of the injector has a greater effect on spray uniformity than the diameter of the nozzle hole. Also, the size of the spray droplets increased sharply when the diameter of the nozzle hole was 230 ㎛.

• 한국해양공학회지
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• 제25권4호
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• pp.23-27
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• 2011

This experimental study was performed to find rpms of the impeller and the surface flow accelerator to make a uniform velocity vertical distribution in the circular water channel. PIV technique was employed to measure the water velocity profiles into the water depth from the free surface. The number of instantaneous velocity profiles was decomposed into mean and turbulence velocity components, and the distribution of velocity fluctuation and turbulence intensity were computed for each experimental condition. From these results, the velocity uniformity was quantitatively determined to present the flow quality in the measuring section of the circular water channel. It has been shown that the proper operation of the surface flow accelerator would make the uniform velocity profiles and reduce the velocity fluctuation near the free surface.

• 한국조명전기설비학회지:조명전기설비
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• 제13권2호
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• pp.133-133
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• 1999

Average illuminance and luminance can be calculated by graphical methods to a certain extent but to calculate for a wide place a suitable software is needed. Softwares suitable for this purpose have been already developed in foreign nations, but the appropriate softwares for domestic use have not been developed. Therefore a program is developed which is executable in Hangul Windows. The softwares LAPRoad, is developed to calculate luminance and illuminance distribution of road surface, as well as average luminance and illuminance, overall uniformity, longitudinal uniformity, threshold increment veilling luminance and glare. And an apparatus that measures road surface reflection properties is developed. Because the road surface reflection properties is very important in luminance calculation, then concrete road surface reflection properties were measured.

• 한국정밀공학회지
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• 제31권3호
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• pp.261-268
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• 2014

Precision screws have a wide range of industrial applications such as electrical and automotive products. To produce screw threads with high precision, not only high precision manufacturing technology but also reliable measurement technology is required. Machine vision systems have been used in the automatic inspection of screw threads based on backlight illumination, which cannot detect defects on the thread surface. Recently, an omnidirectional inspection system for screw threads was developed to obtain $360^{\circ}$ images of screws, based on front light illumination. In this study, the illumination design for the omnidirectional inspection system was modified by adding a light shield to improve the image uniformity. Optical simulation for various shield designs was performed to analyze image uniformity of the obtained images. The simulation results were analyzed statistically using response surface method, from which optical performance of the omnidirectional inspection system could be optimized in terms of image quality and uniformity.