• 제목/요약/키워드: Surface layer quality

검색결과 545건 처리시간 0.028초

Surface Analysis of Plasma Pretreated Sapphire Substrate for Aluminum Nitride Buffer Layer

  • Jeong, Woo Seop;Kim, Dae-Sik;Cho, Seung Hee;Kim, Chul;Jhin, Junggeun;Byun, Dongjin
    • 한국재료학회지
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    • 제27권12호
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    • pp.699-704
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    • 2017
  • Recently, the use of an aluminum nitride(AlN) buffer layer has been actively studied for fabricating a high quality gallium nitride(GaN) template for high efficiency Light Emitting Diode(LED) production. We confirmed that AlN deposition after $N_2$ plasma treatment of the substrate has a positive influence on GaN epitaxial growth. In this study, $N_2$ plasma treatment was performed on a commercial patterned sapphire substrate by RF magnetron sputtering equipment. GaN was grown by metal organic chemical vapor deposition(MOCVD). The surface treated with $N_2$ plasma was analyzed by x-ray photoelectron spectroscopy(XPS) to determine the binding energy. The XPS results indicated the surface was changed from $Al_2O_3$ to AlN and AlON, and we confirmed that the thickness of the pretreated layer was about 1 nm using high resolution transmission electron microscopy(HR-TEM). The AlN buffer layer deposited on the grown pretreated layer had lower crystallinity than the as-treated PSS. Therefore, the surface $N_2$ plasma treatment on PSS resulted in a reduction in the crystallinity of the AlN buffer layer, which can improve the epitaxial growth quality of the GaN template.

단속하드터닝에서 잔류응력과 가공변질층의 고찰 (Residual sterss and damaged layer in an intermittent hard turning)

  • 전준용
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2000년도 춘계학술대회논문집 - 한국공작기계학회
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    • pp.270-276
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    • 2000
  • Hard turning has the potential to replace grinding process and to achieve significant reduction in production time and cost. The main applications for hard turning is finishing process, namely grinding process. Therefore, it must be able to satisfy high surface integrity of the workpiece. This paper discusses surface quality in terms of residual stress and damaged layer with respect to cutting parameters in an intermittent hard turning. Damaged layer experiment is carried out orthogonal array. From that is based on the orthogonal array. From the response table, cutting parameters are analyzed from the view point of the damaged layer and residual stress. From this experimental results, even though in the intermittent hard turning, surface integrity turns out be good enough for replacing grinding process.

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UV-enhanced Atomic Layer Deposition of Al2O3 Thin Film

  • 윤관혁;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.256-256
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    • 2011
  • We have deposited Al2O3 thin films on Si substrates at room temperature by UV-enhanced atomic layer deposition using trimethylaluminum (TMA) and H2O as precursors with UV light. The atomic layer deposition relies on alternate pulsing of the precursor gases onto the substrate surface and subsequent chemisorption of the precursors. In many cases, the surface reactions of the atomic layer deposition are not completed at low temperature. In this experiment, the surface reactions were found to be self-limiting and complementary enough to yield uniform Al2O3 thin films by using UV irradiation at room temperature. The UV light was very effective to obtain the high quality Al2O3 thin films with defectless.

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Selective Catalytic Etching of Graphene by SiOx Layer Depletion

  • 이경재;임규욱;양미현;강태희;정석민
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.163.2-163.2
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    • 2014
  • We report catalytic decomposition of few-layer graphene on an $Au/SiO_x/Si$ surface wherein oxygen is supplied by dissociation of the native $SiO_x$ layer at a relatively low temperature of $400^{\circ}C$. The detailed chemical evolution of the graphene covered $SiO_x/Si$ surface with and without gold during the catalytic process is investigated using a spatially resolved photoelectron emission method. The oxygen atoms from the native $SiO_x$ layer activate the gold-mediated catalytic decomposition of the entire graphene layer, resulting in the formation of direct contact between the Au and the Si substrate. The notably low contact resistivity found in this system suggests that the catalytic depletion of a $SiO_x$ layer could realize a new way to micromanufacture high-quality electrical contact.

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Optimum thickness of GaAs top layer in AlGaAs-based 850 nm VCSELs for 56 Gb/s PAM-4 applications

  • Yu, Shin-Wook;Kim, Sang-Bae
    • ETRI Journal
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    • 제43권5호
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    • pp.923-931
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    • 2021
  • We studied the influence of GaAs top-layer thickness on the small-signal modulation response and 56 Gb/s four-level pulse-amplitude modulation eye quality of 850 nm vertical-cavity surface-emitting lasers (VCSELs). We considered the proportionality of the gain-saturation coefficient to the photon lifetime. The simulation results that employed the transfer-matrix method and laser rate equations led to the conclusion that the proportionality should be considered for proper explanation of the experimental results. From the obtained optical eyes, we could determine an optimum thickness of the GaAs top layer that rendered the best eye quality of VCSEL. We also compared two results: one result with a fixed gain-saturation coefficient and the other that considered the proportionality. The former result with the constant gain-saturation coefficient demonstrated a better eye quality and a wider optimum range of the GaAs top-layer thickness because the resultant higher damping reduced the relaxation oscillation.

수평식 연속주조법에 제조된 무산소동의 방향성 응고에 관한 연구 (A Study on the Unidirectional Solidification of Oxygen Free Copper by the Horizontal Continuous Casting Process)

  • 김명한;이유재;조형호
    • 한국주조공학회지
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    • 제14권6호
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    • pp.558-565
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    • 1994
  • The horizontal continuous casting process with the heated mold was applied to obtain the unidirectionally solidified rods($4{\sim}8mm$ dia.) of pure copper with good surface quality. The results could be summarized as follows. 1. The unidirectional solidification of pure copper rods with good surface(mirror surface) quality could be obtained by placing the S/L interface inside the heated mold cavity even though the cast copper rods were covered with thin copper oxide layer. 2. The casting speed for 4mm dia. rods with mirror surfaces was affected significantly by the mold-cooler distance rather than the cooling flow rate when other casting conditions were fixed. 3. The casting speed was the main factor affecting the oxidation of copper during the continuous casting and the thickness of copper oxide layer decreased almost linearly as the casting speed increased.

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Cr-Mo-V강의 친환경 염욕질화처리에 의한 표면특성 연구 (A Study on Surface properties of Cr-Mo-V Steel by Eco-friendly Salt Bath Nitriding Treatment)

  • 정길봉
    • 한국군사과학기술학회지
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    • 제13권2호
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    • pp.275-282
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    • 2010
  • The improved properties of surface layer can be achieved by so-called "new salt bath nitriding(NSBN)", which has been developed by a domestic company. This process based upon modified traditional salt bath nitriding process, increased hardenability with minimum toughness deterioration. This process also offers not only less white layer surfaces but also more eco-friendly one. That is, NSBN is the new eco-friendly surface treatment technology removing harmful $CN^-$ and toxic gas. According to the research of applying NSBN to Cr-Mo-V steel which has been used in defense industry, showed the improved result of wear resistance and surface hardening than non-coated condition. In further, we expect NSBN to curtail expenses and productivity improvement applied to the various defense industry parts.

rf 마그네트런 스퍼터링법으로 Si 기판위에 증착한 ZnO 박막의 결정성과 photoluminescence 특성에 대한 Zn 완충층 두께의 영향 (Effects of ZnO Buffer Layer Thickness on the Crystallinity and Photoluminescence Properties of Rf Magnetron Sputter-deposited ZnO Thin Films)

  • 조용준;박안나;이종무
    • 한국재료학회지
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    • 제16권7호
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    • pp.445-448
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    • 2006
  • Highly c-axis oriented ZnO thin films were grown on Si(100)substrates with Zn buffer layers. Effects of the Zn buffer layer thickness on the structural and optical qualities of ZnO thin films were investigated using X-ray diffraction (XRD), photoluminescence (PL) and Atomic force microscopy (AFM) analysis techniques. It was confirmed that the quality of a ZnO thin film deposited by rf magnetron sputtering was substantially improved by using a Zn buffer layer. The highest ZnO film quality was obtained with a Zn buffer layer 110 nm thick. The surface roughness of the ZnO thin film increases as the Zn buffer layer thickness increases.

후방 복사된 초음파를 이용한 표면 지역의 평가 기술 (The Evaluation Technique of Surface Region using Backward-Radiated Ultrasound)

  • 권성덕
    • 비파괴검사학회지
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    • 제16권4호
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    • pp.241-250
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    • 1997
  • 액체/고체 경계면에서 후방 복사된 초음파의 주파수 분석에 의해 Si layer/mesh Au/Si substrate 시편에 존재하는 표면 탄성파의 주파수 의존성이 측정되었다. 사용된 광역 탐촉자(2, 5, 10MHz)의 주파수에 따라 다르게 나타난 후방 복사의 입사각 의존성은 이 현상이 표면 지역에 발생된 표면파로부터의 에너지 복사에 의한 것임을 보여주었다. 후방 산란된 초음파의 입사각 의존성을 연속적으로 측정하기 위한 초음파 각도계가 제작되었고 다른 비율의 구리 분말이 섞인 에폭시에 의해 접착된 Ni layer/Al substrate 시편에 대해 후방복사 세기의 입사각 의존성이 측정되었다. (5MHz) 후방 복사의 폭과 패턴은 표면파 속도의 주파수 의존성, layer 접합의 질 그리고 표면 지역의 구조 등 여러 정보를 가지고 있음이 밝혀졌다.

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3%Cr-Mo-V강의 2단 가스질화처리를 통한 표면경화 및 내마모성 연구 (A Study on Wear Resistance and Surface Hardening of 3%Cr-Mo-V Steel by Two-step Gas Nitriding)

  • 정길봉
    • 열처리공학회지
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    • 제22권6호
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    • pp.361-367
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    • 2009
  • The two-step gas nitriding was adopted to increase the depth of surface hardening in 3%Cr-Mo-V steel. The two-step gas nitriding consisted of Step I; $520^{\circ}C{\times}20\;hrs$ and Step II; $550^{\circ}{\times}70\;hrs$. The layer of two-step gas nitriding showed better uniformity and deeper nitriding layer than one-step gas-nitriding layer. The maximum surface hardness showed the value of 850 Hv. The maximum depth of nitrogen permeation showed $750\;{\mu}m$ (350 Hv). X-ray diffraction analysis showed that compound layer was mainly consisted of CrN and $\varepsilon-Fe_3N$ phases. These phases were presumed contributing to surface hardening and wear resistance. However, the corrosion resistance of gas-nitrided Cr-Mo-V steel were not improved in the solution of 1 N HCl and NaOH. Therefore, it is necessary that the continuous study for improvement of corrosion resistance hereafter.