• Journal of the Korean institute of surface engineering
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• v.35 no.6
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• pp.377-382
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• 2002

We investigated the appropriate wet cleaning process for Co-Ti-Si compounds formed on top of cobalt disilicide made from Co/Ti deposition and two rapid thermal annealing (RTA). We employed three wet cleaning processes, WP1 ($H_2$SO$_4$ etchant), WP2 ($NH_4$OH etchant), and WP3 which execute sequentially WP1 and WP2 after the first RTA. All samples were cleaned with BOE etchant after the second RTA. We characterized the sheet resistance with process steps by a four-point probe, the microstructure evolution by a cross detail sectional transmission electron microscope, a Auger depth profiler, and a X-ray diffractometer (XRD). We confirmed WP3 wet cleaning process were the most suitable to remove CoTiSi layer selectively.

• Tribology and Lubricants
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• v.20 no.6
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• pp.343-349
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• 2004

The adsorption of soot particles onto a sensor surface of the engine soot detector posses a critical problem in the measurement. In order to prevent the optical rod surface from soot contamination, various functional coatings and flow-induced cleaning were applied to the surface in this work. For surface coatings, various materials of self-assembled monolayers (SAM) such as OTS (octadecyltrichlorosilane), PFDTES (perfluorodecyl-triethoxysilane) and PFDTMS (perfluorodecyltrimethoxysilane) were coated on the optical rod surface ,which have different characteristics in both hydrophobicity and oleophobicity. These coatings were tested with soot content varying from $0\%\;to\;3wt\%$ and oil temperature from 20 to $70^{\circ}C$. Test results showed that surface coatings were not effective for preventing the adsorption of soot panicles on the surface of optical rod. It was thought that these coatings provided the surface with additional attractive surface forces. However, it was found that adsorption of soot particles onto a sensor surface was minimized by flow-induced cleaning. This effect was tested with varying the flow velocity.

• Korean Journal of Materials Research
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• v.25 no.9
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• pp.462-467
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• 2015

Pellicle is defined as a thin transparent film stretched over an aluminum (Al) frame that is glued on one side of a photomask. As semiconductor devices are pursuing higher levels of integration and higher resolution patterns, the cleaning of the Al flame surface is becoming a critical step because the contaminants on the Al flame can cause lithography exposure defects on the wafers. In order to remove these contaminants from the Al frame, a highly concentrated nitric acid ($HNO_3$) solution is used. However, it is difficult to fully remove them, which results in an increase in the Al surface roughness. In this paper, the pellicle frame cleaning is investigated using various cleaning solutions. When the mixture of sulfuric acid ($H_2SO_4$), hydrofluoric acid (HF), hydrogen peroxide ($H_2O_2$), and deionized water with ultrasonic is used, a high cleaning efficiency is achieved without $HNO_3$. Thus, this cleaning process is suitable for Al frame cleaning and it can also reduce the use of chemicals.

• Membrane Journal
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• v.27 no.6
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• pp.519-527
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• 2017

Membrane fouling is the main issue hindering the expansion of low pressure membrane processes for surface water treatment. Therefore, applying periodic hydraulic cleaning for fouling control should be well optimized. Better understanding of membrane fouling associated with periodic hydraulic cleaning would be useful to optimize membrane cleaning strategies. By comparing experimental permeability data with the classical Hermia blocking laws, this study aims at analyzing membrane fouling and understanding dominant fouling mechanisms occurring when filtering a synthetic surface water solution with a pressurized membrane process during six filtration cycles of 30 min each, separated with cyclic cleaning of 1 min by backwashing and forward flushing separately and combined. When applying single cleaning technique, membrane fouling during the first cycles was controlled by complete blocking mechanism while the last cycles were dominated by cake formation. Nevertheless, when combining cleaning technique better membrane regeneration was obtained and fouling was mainly due to cake formation.

• Laser Solutions
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• v.6 no.2
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• pp.27-33
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• 2003

A laser shock cleaning technology is a new dry cleaning methodology for the effective removal of small particles from the surface. This technique uses a plasma shock wave produced by a breakdown of air due to an intense laser pulse. In order to optimize the laser shock cleaning process, it needs to evaluate the cleaning performance quantitatively by using a monitoring technique. In this paper, an acoustic monitoring technique was attempted to investigate the laser shock cleaning process with an aim to optimize the cleaning process. A wide-band microphone with high sensitivity was utilized to detect acoustic signals during the cleaning process. It was found that the intensity of the shock wave was strongly dependent on the power density of laser beam and the gas species at the laser beam focus. As a power density was larger, the shock wave became stronger. It was also seen that the shock wave became stronger in the case of Ar gas compared with air and N$_2$ gas.

• Journal of Conservation Science
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• v.28 no.3
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• pp.217-228
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• 2012

Damage of cultural properties happens variously. Particularly, the surface damage of metal cultural properties exposed outdoors lowers historical and art historical value of artifact by artificial damage such as paint, scribbling containing oily material and so on. Therefore, this study compared dry-ice pellet cleaning with poultice when clearing paint and oily material environment-friendly, harmlessly to humans and without damage of artifact. As the result of experiment, when clearing those (paint and oily material) by poultice, oily paint was cleared, but there were spots of metal surface. Also, Lacquer spray wasn't well cleared, and resin came off the surface of artifact. When clearing those by dry-ice pellet cleaning, oil paint was cleanly cleared without surface damage of artifact according to Stereoscopic microscope observation, color-measurement, FT-IR, SEM analysis. Also, lacquer spray seemed to be cleared with the naked eye, but there were minute particles on surface according to the result of SEM observation. Consequently, we could confirm possibility of dry-ice pellet cleaning substitution.

• Air Cleaning Technology
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• v.3 no.2 s.10
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• pp.73-78
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• 1990

• Clean Technology
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• v.18 no.1
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• pp.43-50
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• 2012

Cleaning procedure of solar silicon wafer, following ingot sawing process in solar cell production is studied. Types of solar silicon wafer can be divided into monocrystalline or multicrystalline, and slurry sawn wafer or diamond sawn wafer according to the ingot growing methods and the sawing methods, respectively. Wafer surface and contaminants can vary with these methods. The characterisitics of contaminants and wafer surface are investigated for each cleaning substrate, and appropriate cleaning agents are developed. Physical properties and cleaning ability of the cleaning agents are evaluated in order to verify the application in the industry. The wafers cleaned with the cleaning agents do not show any residual contaminants when analyzed by XPS and regular patterns are formed after texturization. Furthermore, the cleaning agents are applied in the production industry, which shows superior cleaning results compared to the existing cleaning agents.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2006.04a
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• pp.85-85
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• 2006

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.34.2-34.2
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• 2011

The demand for Ru has been increasing in the electronic, chemical and semiconductor industry. Chemical mechanical planarization (CMP) is one of the fabrication processes for electrode formation and barrier layer removal. The abrasive particles can be easily contaminated on the top surface during the CMP process. This can induce adverse effects on subsequent patterning and film deposition processes. In this study, a post Ru CMP cleaning solution was formulated by using sodium periodate as an etchant and citric acid to modify the zeta potential of alumina particles and Ru surfaces. Ru film (150 nm thickness) was deposited on tetraethylorthosilicate (TEOS) films by the atomic layer deposition method. Ru wafers were cut into $2.0{\times}2.0$ cm pieces for the surface analysis and used for estimating PRE. A laser zeta potential analyzer (LEZA-600, Otsuka Electronics Co., Japan) was used to obtain the zeta potentials of alumina particles and the Ru surface. A contact angle analyzer (Phoenix 300, SEO, Korea) was used to measure the contact angle of the Ru surface. The adhesion force between an alumina particle and Ru wafer surface was measured by an atomic force microscope (AFM, XE-100, Park Systems, Korea). In a solution with citric acid, the zeta potential of the alumina surface was changed to a negative value due to the adsorption of negative citrate ions. However, the hydrous Ru oxide, which has positive surface charge, could be formed on Ru surface in citric acid solution at pH 6 and 8. At pH 6 and 8, relatively low particle removal efficiency was observed in citric acid solution due to the attractive force between the Ru surface and particles. At pH 10, the lowest adhesion force and highest cleaning efficiency were measured due to the repulsive force between the contaminated alumina particle and the Ru surface. The highest PRE was achieved in citric acid solution with NaIO4 below 0.01 M at pH 10.