• Title/Summary/Keyword: Sub-Chamber

Search Result 426, Processing Time 0.025 seconds

Surface and Structural Features of a-Si Thin Films Prepared by Various H2/H2+SiH4 Dilution (수소 가스 분율(H2/H2+SiH4)에 따른 비정질 실리콘 박막의 표면 및 구조 분석)

  • Kwon, Jin-Up
    • Journal of the Korean institute of surface engineering
    • /
    • v.44 no.2
    • /
    • pp.39-43
    • /
    • 2011
  • Amorphous silicon thin film was deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD). Each films were prepared in different dilution in the chamber gas. As a result, silicon crystallites and crystal volume fraction was increased with raising the hydrogen dilution in the gas and optical band gap was decreased. Increasement of the hydrogen contents in the chamber affected on surface roughness. In this study, thickness and surface roughness of the a-Si thin film by different hydrogen dilution was investigated by various techniques.

Effects on Combustion Characteristics Induced by Ignition Timing and Shape of Passagehole in a IDI Type Constant Volume Combustion Chamber (IDI형 정적 연소기에서 점화시기 및 연락공의 형상이 연소특성에 미치는 영향)

  • 윤수한;이중순;김현지;박춘근;하종률
    • Transactions of the Korean Society of Automotive Engineers
    • /
    • v.4 no.3
    • /
    • pp.220-231
    • /
    • 1996
  • In this research, we use IDI type constant volume combustion chamber which may make up stratified combustion to construct the design back data of lean-burn engine. Some experiments are conducted by the passagehole angle in the adapter of main chamber and sub-chamber. The effects on the combustion characteristics according to the ignition timing are investigated. The used fuel is methanol prospective for alternative fuel. Fuel is injected under 10.78MPa using solenoid and accumulator. As the results of the experiment, combustion characteristics reveals that ignition timing, passagehole angle and shape greatly effects on. Lean inflammability limit is extended to 0.45 in equivalence ratio.

  • PDF

Test & Evaluation for the Configuration Optimization of Thrust Chamber in 70 N-class N2H4 Thruster (Part I: Pulse-mode Performance According to the Chamber Diameter Variation) (70 N급 하이드라진 추력기의 추력실 최적설계와 시험평가 (Part I: 추력실 직경변화에 따른 펄스모드 성능특성))

  • Kim, Jong Hyun;Jung, Hun;Kim, Jeong Soo
    • Journal of the Korean Society of Propulsion Engineers
    • /
    • v.18 no.1
    • /
    • pp.42-49
    • /
    • 2014
  • Performance evaluation was carried out for the 70 N-class hydrazine thruster whose design performance had been already verified. The pulse-mode firing test was conducted for the development model thrusters with various thrust chamber diameters. Evaluation was made by the performance parameters such as specific impulse, impulse bit, and characteristic velocity, etc: specific impulse and characteristic velocity were deteriorated as the thrust chamber diameter deviates from a standard model. Consequently, it is revealed that the performance characteristics of standard model is most superior among the test models.

Research Progress on NF3 Substitute Gas of PECVD Chamber Cleaning Process for Carbon Neutrality (반도체·디스플레이 탄소중립을 위한 PECVD 챔버세정용 NF3대체가스 개발연구)

  • Seyun Jo;Sang Jeen Hong
    • Journal of the Semiconductor & Display Technology
    • /
    • v.22 no.4
    • /
    • pp.72-75
    • /
    • 2023
  • Carbon neutrality has been emerged as important mission for all the manufacturing industry to reduce energy usage and carbon emission equivalent. Korean semiconductor and display manufacturing industries are also in huge interest by minimize the energy usage as well as to find a less global warming product gases in both etch and cleaning. In addition, Korean government is also investing long term research and development plan for the safe environment in various ways. In this paper, we revisit previous research activities on carbon emission equivalent and current research activities performed in semiconductor process diagnosis research center at Myongji University with respect to the reduction of NF3 usage for the PECVD chamber cleaning, and we present the analytical result of the exhaust gas with residual gas analysis in both 6 inches and 12 inches PECVD equipment. The presented result can be a reference study of the development of new substitution gas in near future to compare the cleaning rate of the silicon oxide deposition chamber.

  • PDF

Characteristics of Liquid Fuel Jet Injected into Supercritical Environment (초임계 환경으로 분사되는 액체 연료 제트의 분사 거동 특성)

  • An, Jeongwoo;Choi, Myeung Hwan;Lee, Jun;Koo, Jaye
    • Journal of the Korean Society for Aeronautical & Space Sciences
    • /
    • v.50 no.5
    • /
    • pp.333-338
    • /
    • 2022
  • The single jet of decane/methylcyclohexane mixed fuel that is surrogate for kerosene was injected into supercritical environment and visualized using shadowgraph technique. The injection pressure drop of the fuel jet of Tr = 0.484 was kept constant at 0.5 MPa and the experiment was conducted above the critical point of the mixed fuel, and the reduced temperatures of the chamber was changed from 1.00 to 1.23, and the reduced pressures was 1.00 and 1.38. As an index for reducing the density of jets sprayed into the supercritical environment, the brightness intensity of the post-processed jet image was observed with the internal temperature and pressure of the chamber. It was confirmed that the decrease in the brightness intensity of the jet when the temperature inside the chamber increased, and when the pressure inside the chamber was higher at the same temperature, the decrease in the brightness intensity of the jet was delayed. When the pressure inside the chamber is high, it is thought that the change in brightness intensity is delayed due to the increase in the pseudo-critical temperature of the fuel and the increase in the temperature required to reduce the density of the fuel jet.

Characterizations of a Cold Trap System for the Process Stabilization of Al2O3 by ALD Equipment (ALD 장비의 Al2O3 공정 안정화를 위한 저온 트랩 장치의 특성 평가)

  • Yong Hyeok Seo;Won Woo Lee;In Hwan Kim;Ji Eun Han;Yeon Ju Lee;Che Hoo Cho;Yongmin Jeon;Eou-Sik Cho;Sang Jik Kwon
    • Journal of the Semiconductor & Display Technology
    • /
    • v.23 no.1
    • /
    • pp.92-96
    • /
    • 2024
  • The application of the technology for forming Al2O3 thin films using ALD(atomic layer deposition) method is rapidly increasing in the semiconductor and display fields. In order to increase the efficiency of the ALD process in a mass production line, metallic by-products generated from the ALD process chamber must be effectively collected. By collecting by-products flowing out of the chamber with a cold trap device before they go to the vacuum pump, damage to the vacuum pump can be prevented and the work room can be maintained stably, resulting in increased process flow rate. In this study, a cold trap was installed between the ALD process chamber and the dry pump to measure and analyze by-products generated during the Al2O3 thin film deposition process. As a result, it was confirmed that Al and O elements were discharged, and the collection forms were two types: bulk and powder. And the binding energy peaked at 73.7 ~ 74.3 eV, the binding energy of Al 2p, and 530.7 eV, the binding energy of O 1s, indicating that the binding structure was Al-O.

  • PDF

The Differences of Nitrous Oxide (N2O) Emissions as Crop Presence and Location of Gas Sampling Chambers in Upland (밭토양에서 챔버 위치와 작물체 유·무에 따른 아산화질소 배출량 차이 분석)

  • Jeong, Hyun Cheol;Choi, Eun Jung;Lee, Jong Sik;Kim, Gun Yeob;So, Kyu Ho
    • Journal of Climate Change Research
    • /
    • v.7 no.4
    • /
    • pp.427-432
    • /
    • 2016
  • Nitrous oxide is one of the main sources of greenhouse gases and its concentration has increased from 273 ppb in 1,750 to 315 ppb in 2005. Specially, nitrogen fertilizer used in agricultural soils is considered as an important source of atmospheric $N_2O$ emission. This study was conducted to estimate the difference of nitrous oxide emission as chamber position on furrow and ridge and crop existence in gas sampling chamber on upland. Four treatments used in this experiment were (1) no-fertilizer without crop in chamber on ridge, (2) fertilizer application without crop in chamber on ridge, (3) fertilizer application with crop in chamber on ridge, (4) fertilizer application without crop in chamber on ridge and furrow. Nitrous oxide emission at fertilizer application with crop in chamber on ridge were the highest while were the lowest at no-fertilizer without crop in chamber on ridge. There was no significant difference of nitrous oxide emission by chamber position, but total emission by crop existence in chamber was significant difference. Therefore, in order to estimate greenhouse gases emission using chamber method in upland, it should be considered in correlation with crop existence in chamber and characteristic changes like as the soil moisture, microbial flora by crop growth stage.

Combustion Characteristics of Land Fill Gas according to the Diameter of the Flame outlet of the Pre-chamber Spark Plug (예연소실 점화 플러그의 화염 분출구 직경에 따른 매립지가스의 연소 특성)

  • Kim, Kwonse;Jeon, Yeong-Cheol;Choi, Doo-Seuk
    • Journal of Convergence for Information Technology
    • /
    • v.11 no.7
    • /
    • pp.111-117
    • /
    • 2021
  • This research work is to suggest the experimental results capable of solving an initial unsuitability of combustion and environment in a constant volume combustion chamber by using LFG(Land Fill Gas) which consists of 40% CO2 and 60% CH4. The experimental condition is set as 0.9~1.6 of air-fuel ratio, 3bar of combustion pressure, 25℃ of room temperature, methane for using gas, and 2.5~4.5 of Pre-chamber hole sizes. As a result, it can be seen that diffusion of initial flame is significantly increased by M3.0 model comparing with other one. The reason for the characteristics is that orifice effect is extremely improved by 0.9, 1.0, and 1.2 of air-fuel ratio comparing with other one. Consequently, this experiment is shown that M3.0 model is partially capable of improving combustion performance than a conventional ignition plug in case of applying to LFG with Pre-chamber design.

Closed Static Chamber Methods for Measurement of Methane Fluxes from a Rice Paddy: A Review (벼논 메탄 플럭스 측정용 폐쇄형 정적 챔버법: 고찰)

  • Ju, Okjung;Kang, Namgoo;Lim, Gapjune
    • Korean Journal of Agricultural and Forest Meteorology
    • /
    • v.22 no.2
    • /
    • pp.79-91
    • /
    • 2020
  • Accurate assessment of greenhouse gas emissions is a cornerstone of every climate change response study, and reliable assessment of greenhouse gas emission data is being used as a practical basis for the entire climate change prediction and modeling studies. Essential, fundamental technologies for estimating greenhouse gas emissions include an on-site monitoring technology, an evaluation methodology of uncertainty in emission factors, and a verification technology for reductions. The closed chamber method is being commonly used to measure gas fluxes between soil-vegetation and atmosphere. This method has the advantages of being simple, easily available and economical. This study presented the technical bases of the closed chamber method for measuring methane fluxes from a rice paddy. The methane fluxes from rice paddies occupy the largest portion of a single source of greenhouse gas in the agricultural field. We reviewed the international and the domestic studies on automated chamber monitoring systems that have been developed from manually operated chambers. Based on this review, we discussed scientific concerns on chamber methods with a particular focus on quality control for improving measurement reliability of field data.

Deposition and Electrical Properties of Al2O3와 HfO2 Films Deposited by a New Technique of Proximity-Scan ALD (PS-ALD) (Proximity-Scan ALD (PS-ALD) 에 의한 Al2O3와 HfO2 박막증착 기술 및 박막의 전기적 특성)

  • Kwon, Yong-Soo;Lee, Mi-Young;Oh, Jae-Eung
    • Korean Journal of Materials Research
    • /
    • v.18 no.3
    • /
    • pp.148-152
    • /
    • 2008
  • A new cost-effective atomic layer deposition (ALD) technique, known as Proximity-Scan ALD (PS-ALD) was developed and its benefits were demonstrated by depositing $Al_2O_3$ and $HfO_2$ thin films using TMA and TEMAHf, respectively, as precursors. The system is consisted of two separate injectors for precursors and reactants that are placed near a heated substrate at a proximity of less than 1 cm. The bell-shaped injector chamber separated but close to the substrate forms a local chamber, maintaining higher pressure compared to the rest of chamber. Therefore, a system configuration with a rotating substrate gives the typical sequential deposition process of ALD under a continuous source flow without the need for gas switching. As the pressure required for the deposition is achieved in a small local volume, the need for an expensive metal organic (MO) source is reduced by a factor of approximately 100 concerning the volume ratio of local to total chambers. Under an optimized deposition condition, the deposition rates of $Al_2O_3$ and $HfO_2$ were $1.3\;{\AA}/cycle$ and $0.75\;{\AA}/cycle$, respectively, with dielectric constants of 9.4 and 23. A relatively short cycle time ($5{\sim}10\;sec$) due to the lack of the time-consuming "purging and pumping" process and the capability of multi-wafer processing of the proposed technology offer a very high through-put in addition to a lower cost.