• 대한치과교정학회지
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• 제14권2호
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• pp.203-215
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• 1984

This experiment was performed to explore the effect of electric currents and orthodontic forces on bone $PGE_2$ content and orthodontic tooth movement on cats. Stainless steel electrodes were connected a power pack consisting of five miniature batteries, a transistor, and a resistor. The current $(10{\pm}2{\mu}A)$ was provided by a constant source encased in a palatal acrylic plate. In first experiment, the cathode was placed mesial to the right maxillary canine tooth and the anode was positioned distal to the tooth, Sham electrodes were placed new the left cuspid, to serve as control. Nine cats were divided into three groups evenly. Groups of three animals were treated with electric currents only-for 1, 3 and 7 days, respectively. In second experiment, electric currents and the orthodontic forces of about 80 gm were applied to the right maxillary canine, and the orthodontic forces only were applied to the left maxillary canine. 3 groups of three cats each were treated in this experiment-for 1, 3 and 7 days, respectively. Alveolar bone samples were obtained from sites of tension and compression as well as from contralateral sites. Bone samples were extracted by homogenization in $40\%$ ethanal. The supernatant partitioned twice with 2 volumes of petroleum ether to remove neutral lipids and the aqueous supernatant partitioned in ethyl acetate. After drying the solvent, $PGE_2$ was measured by radioimmunoassay technique. The obtained results were as follows. 1. Teeth treated with combined force and electricity moved faster than those treated with force alone. 2. Alveolar bone $PGE_2$ content of electric stimulation was increased at both electrodes. 3. Alveolar bone $PGE_2$ content of mechanical stimulation at compression sites was gradually increased at all time period. At tension site, $PGE_2$ content increased after 1 day of mechanical stimulation remained elevated at all time period. 4. Alveolar bone $PGE_2$ content of compression sites was increased more than that of tension sites from mechanical stimulation as well as electrical stimulation.

• 한국식품과학회지
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• 제31권5호
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• pp.1196-1202
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• 1999

마이크로파를 이용한 두유의 HTST저온살균시 미생물의 사멸효과와 이화학적 성분 변화를 상법과 비교하고자 하였다. 이때 HTST($90^{\circ}C$, 21초)법으로 살균하되 열수만을 이용한 경우(MP0)와 마이크로파로 온도를 올린 후 열수에서 holding한 경우(MP1)와 마이크로파만을 활용한 경우(MP2)의 세가지 경우로 구분하여 살균전후 변화를 비교해 보았다. 총균수의 경우 세가지 HTST살균법 모두 살균후 초기수의 4 log정도 감소하는 살균효과를 보여주었고 살균효과는 MP0>MP1>MP2의 순서를 보였다. 대장균과 저온성세균 및 phosphatase activity의 경우 세가지 HTST살균법 모두 살균후 우유의 배양실험에서 집락이 확인되지 않거나 살균후 음성(negative)인 것으로 나타났다. 세가지 살균방법 모두 80%이상의 trypsin 잔존율을 보여 trypsin inhibitor가 효과적으로 불활성화되었음을 알 수 있었으며 불활성화 효과는 MP0>MP1>MP2의 순서를 보였다. 두유의 pH와 적정산도, 점도 및 비타민 $B_2$의 경우 살균전후 큰 차이가 관찰되지 않았으며 살균방법별로도 차이가 없었다. 이로부터 마이크로파로 승온시킨 후 holding하는 병용법(MP1)이나 마이크로파 단독처리(MP2)를 활용할 경우 통상적 HTST방법(MP0)보다 우수하거나 대등한 살균효과 및 이화학적 품질보존효과가 있을 것으로 생각되었다. 이러한 연구결과는 다른 액상식품의 살균연구에도 확대 적용할 수 있으리라 기대된다.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2010년도 춘계학술발표대회 초록집
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• pp.24-24
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• 2010

마찰교반접합법은 특정한 회전수로 회전하는 용접 툴을 이용하여 접합하고자 하는 피접합재의 맞댄면에 삽입시킨 후 툴을 이동시키거나 혹은 시편을 견고하게 고정시킨 장치(backing plate)가 움직여 고상 상태에서 접합이 이루어진다. 알루미늄, 마그네슘 등 비교적 융점이 낮은 저융점 재료의 재료에 처음 적용이 되어 많은 연구가 활발히 진행되었고 타 용접방법에 비해 우수한 접합특성을 나타내었다. 최근 이러한 마찰교반접합은 이러한 저융점 재료를 넘어서 스틸, 타이타늄, 니켈 등과 같은 고융점 재료 등에 대한 적용이 늘어나고 있다. 마찰교반접합을 이용하여 이러한 고융점 재료의 접합 경우 내마모성 및 내열성 등의 내구성이 갖추어진 툴과 이러한 툴을 냉각시킬 수 있는 냉각 장치 등이 필요로 하나 경제적 측면이나 접합부의 우수한 특성 등을 고려 할 때 그 적용 및 발전 가능성이 매우 높다고 볼 수 있다. 2상 스테인레스 강은 금속 조직적으로 페라이트와 오스테나이트 상이 거의 1:1의 동등한 비율로 매우 미세하게 결합된 구조를 가지고 있다. 또한 이상 스테인레스 강은 각상의 개개의 특성에 기인하여 염소 분위기에서 응력부식 저항성이 우수하고, 공식과 틈부식에 대한 저항성이 매우 뛰어나다. 그리고 이상 스테인레스 강은 비교적 고가인 Ni이 일반 오스테나이트 스테인리스 강의 약 1/2의 수준으로 적게 포함이 되어 경제적인 이점을 지니고 있으며 또한 용접성이 좋아 산업계의 수요는 현재 점차 증가하고 있는 상황이다. 하지만 이러한 이상 스테인리스 강은 용접 후 페라이트 상의 조대화, 그리고 페라이트 상의 분율이 오스테나이트 상의 분율보다 높아지게 되어 용접부에서의 저온 인성 감소 및 내식성 저하 등의 문제가 발생하게 된다. 그리하여 용접 시 이러한 문제점을 해결하기 위해서는 입열량의 조절이 가장 필요로 하는 것으로 알려져 있다. 본 연구에서는 마찰교반용접을 이용하여 두께 3mm의 대표적인 이상 스테인리스 강인 SAF2205 스테인리스 강에 대해 맞대기 마찰교반접합을 실시하였다. 툴 회전속도를 변수로 하여 접합을 실시하였으며 접합 시 툴은 $Si_3N_4$ 툴을 사용하였다. 접합 후 외관상태 점검, 미세조직 관찰, 경도 및 인장강도 측정 등의 실험을 실시하였고, 이러한 결과를 이용하여 미세조직과 기계적 특성과의 관련성을 조사하였다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.81.2-81.2
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• 2012

To fabricate a metal mold for injection molding, hot-embossing and imprinting process, mechanical machining, electro discharge machining (EDM), electrochemical machining (ECM), laser process and wet etching ($FeCl_3$ process) have been widely used. However it is hard to get precise structure with these processes. Electrochemical etching has been also employed to fabricate a micro structure in metal mold. A through mask electrochemical micro machining (TMEMM) is one of the electrochemical etching processes which can obtain finely precise structure. In this process, many parameters such as current density, process time, temperature of electrolyte and distance between electrodes should be controlled. Therefore, it is difficult to predict the result because it has low reliability and reproducibility. To improve it, we investigated this process numerically and experimentally. To search the relation between processing parameters and the results, we used finite element simulation and the commercial finite element method (FEM) software ANSYS was used to analyze the electric field. In this study, it was supposed that the anodic dissolution process is predicted depending on the current density which is one of major parameters with finite element method. In experiment, we used stainless steel (SS304) substrate with various sized square and circular array patterns as an anode and copper (Cu) plate as a cathode. A mixture of $H_2SO_4$, $H_3PO_4$ and DIW was used as an electrolyte. After electrochemical etching process, we compared the results of experiment and simulation. As a result, we got the current distribution in the electrolyte and line profile of current density of the patterns from simulation. And etching profile and surface morphologies were characterized by 3D-profiler(${\mu}$-surf, Nanofocus, Germany) and FE-SEM(S-4800, Hitachi, Japan) measurement. From comparison of these data, it was confirmed that current distribution and line profile of the patterns from simulation are similar to surface morphology and etching profile of the sample from the process, respectively. Then we concluded that current density is more concentrated at the edge of pattern and the depth of etched area is proportional to current density.

• 대한화학회지
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• 제27권4호
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• pp.279-286
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• 1983

몇가지의 알파입자를 방출하는 핵종, 즉 악티늄족 원소들, $^{207}Bi$ and $^{210}Po$을 전해석출하는 장치를 만들었다. 스텐레스 원판으로된 환원전극에 이 동위원소들을 석출했으며(석출부분 직경=18mm), 산화전극으로는 백금선을 썼다. 전해질로 염화암모늄을 쓰고, 초기 pH=4, 염소이온농도=0.6M이하, 용액부피=15ml로 하여 1.5암페어(전류밀도=0.59A/$cm^2$)의 전류를 100분간 흘려주어 98.3%의 석출 회수율과 ${\pm}$0.7%의 재현도를 얻었다. 석출된 시료의 알파스펙트럼을 측정한 결과 에너지 분리도로서 $^{210}Po=18.3keV, ^{234}U=21.8keV$ 및 $^{239}Pu=36.0keV$인 반치전폭(full width at half maximum)을 얻었다. 국산 천연우라늄(충북·괴산) 시료를 전해석출하여 그의 알파스펙트럼을 구한 결과 $^{238}U\;:\;^{234}U\;=\;:\;6.1{\times}10^{-5}$을 얻었으며 $1.8{\sim}10^{13} neutrons/cm^2{\cdot}sec$인 중성자속으로 144일 동안 쪼여준 238U 시료를 전해석출하여 그의 알파스펙트럼을 구한 결과 $^{238}U\;:\;^{239}Pu\;:\;241Am\;=\;100\;:\;0.0263\;:\;5.20{\times}10^{-5}$을 얻었다. 조사시료중의 $^{238}U$에 대한 본실험의 정량결과는 고체형광측정법 및 질량 스펙트럼법에 의한 결과들과 상대오차 1.6% 이내에서 일치하였으며, $^{239}Pu$의 경우는 음이온교환분리-알파스펙트럼 측정 및 삼불화테노일아세톤(thenoyltrifluoroacetone)을 쓴 용매추출-알파스펙트럼 측정에 의한 정량결과들과 상대오차 ${\pm}$4.0%이내에서 일치하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 추계학술발표회 초록집
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• pp.3-4
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• 2000

Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.