• 제목/요약/키워드: Spin device

검색결과 321건 처리시간 0.033초

실리콘 스핀트로닉스 (Silicon Spintronics)

  • 민병철
    • 한국자기학회지
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    • 제21권2호
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    • pp.67-76
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    • 2011
  • 반도체 스핀트로닉스는 자성체와 반도체를 결합하여 반도체 내에서의 전자 스핀을 이용하는 새로운 형태의 자성체-반도체 융합기술이며, 스핀 트랜지스터는 반도체 스핀트로닉스의 대표적인 소자이다. 이 소자를 실현하면, 반도체 내에 전자 스핀을 주입, 제어, 검출함으로써, 한 소자 내에서 정보처리와 정보저장을 동시에 수행할 수 있을 것으로 기대된다. 특히, 반도체 산업의 주축 물질인 실리콘을 이용하여 스핀 트랜지스터를 실현한다면, 이는 정보 산업에 중대한 영향을 미칠 것으로 예상된다. 이 글에서는 최근 실리콘 스핀트로닉스 분야에서의 주요한 진전을 소개하고, 앞으로의 기술적 과제에 대하여 간단히 기술하고자 한다.

Electromagnetic Resonant Tunneling System: Double-Magnetic Barriers

  • Kim, Nammee
    • Applied Science and Convergence Technology
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    • 제23권3호
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    • pp.128-133
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    • 2014
  • We study the ballistic spin transport properties in a two-dimensional electron gas system in the presence of magnetic barriers using a transfer matrix method. We concentrate on the size-effect of the magnetic barriers parallel to a two-dimensional electron gas plane. We calculate the transmission probability of the ballistic spin transport in the magnetic barrier structure while varying the width of the magnetic barriers. It is shown that resonant tunneling oscillation is affected by the width and height of the magnetic barriers sensitively as well as by the inter-spacing of the barriers. We also consider the effect of additional electrostatic modulation on the top of the magnetic barriers, which could enhance the current spin polarization. Because all-semiconductor-based devices are free from the resistance mismatch problem, a resonant tunneling structure using the two-dimensional electron gas system with electric-magnetic modulation would play an important role in future spintronics applications. From the results here, we provide information on the physical parameters of a device to produce well-defined spin-polarized current.

Uniaxial Magnetic Anistotropy of a NiO-Spin Valve Device

  • Lee, Won-Hyung;Hwang, Do-Guwn;Lee, Sang-Suk
    • Journal of Magnetics
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    • 제14권1호
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    • pp.18-22
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    • 2009
  • The shape anisotropy effect of a giant magnetoresistance-spin valves (GMR-SV) device with a glass/NiO/NiFe/CoFe/Cu/CoFe/NiFe layered structure for use in the detection of magnetic property of molecules within a cell was investigated. The patterned device was given uniaxial anisotropy during the sputtering deposition and vacuum post-annealing, which was performed at $200^{\circ}C$ under a 300 Oe magnetic field. The pattern size of the device, which was prepared through the photolithography process, was $2{\times}15\;{\mu}m^2$. The experimental results confirmed that the best design for a GMR-SV device to be used as a biosensor is to have both the axis sensing current and the easy axis of the pinned NiO/NiFe/CoFe triple layer oriented in the direction of the device's width, while the easy axis of the free CoFe/NiFe bilayer should be pointed along the long axis of the device.

Spin orbit torque detected by spin torque FMR in W/CoFeB bilayer

  • Kim, Changsoo;Moon, Kyoung-Woong;Chun, Byong Sun;Kim, Dongseok;Hwang, Chanyong
    • 한국자기공명학회논문지
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    • 제23권2호
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    • pp.46-50
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    • 2019
  • Spin orbit torque would be applied as the next generation of MRAM, so many researchers are interested in related field. To make a more efficient device, electric current should convert into spin current with high efficiency. Moreover, it becomes important to measure efficiency of spin orbit torque accurately. We measured spin torque FMR of W/CoFeB hetero structure system with direct current. The efficiencies of the damping like torque and field like torque were measured by using the linewidth and on-resonance field proportional to direct current. In addition, we analyzed that a quadratic shift of the on-response field was caused by the Joule heating.

수직전류 인가형 나노 스핀소자의 제조 및 자기저항 특성 (The Fabrication and Magnetoresistance of Nanometer-sized Spin Device Driven by Current Perpendicular to the Plane)

  • 전명길;이현정;정원용;김광윤;김철기
    • 한국자기학회지
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    • 제15권2호
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    • pp.61-66
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    • 2005
  • 서브 마이크론 크기의 셀을 제조하기 위하여 종래의 방식인 전체시료구조를 증착한 후 이온밀링 방식으로 제조하는 대신에 Pt 스텐실 마스크 공정과 e-beam 리소 및 습식 식각 공정을 이용하여 배치형 submicron 셀을 lift-off 방식으로 제조하였다. $500nm{\times}500 nm,\;200nm{\times}300 nm$ 크기에 $CoFe(30 {\AA})/Cu(100{\AA})/CoFe(120{\AA}$) 3층 구조를 셀내에 증착하고 수직전류를 인가하여 자기저항 특성을 조사하였다. 자기저항 특성은 두 자성층의 보자력 차이를 이용하여 스핀의 반평형 구조를 유도하여 슈도 스핀밸브이며 각 셀의 크기에서 1.1, $0.8{\%}$의 자기저항비가 얻어졌다. 또한 전류인가에 따른 저항변화로부터 스핀전달 효과에 따른 스위칭 변화가 일어남을 확인하였으며, 이 구조에서 저항의 변화로부터 측정된 임계전류밀도는 약 $7.65{\times}10^{7}A/cm^2$였다.

A Novel Calibration Method Research of the Scale Factor for the All-optical Atomic Spin Inertial Measurement Device

  • Zou, Sheng;Zhang, Hong;Chen, Xi-yuan;Chen, Yao;Fang, Jian-cheng
    • Journal of the Optical Society of Korea
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    • 제19권4호
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    • pp.415-420
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    • 2015
  • A novel method to measure the scale factor for the all-optical atomic spin inertial measurement device (ASIMD) is demonstrated in this paper. The method can realize the calibration of the scale factor by a self-consistent method with small errors in the quiescent state. At first, the matured IMU (inertial measurement unit) device was fixed on an optical platform together with the ASIMD, and it has been used to calibrate the scale factor for the ASIMD. The results show that there were some errors causing the inaccuracy of the experiment. By the comparative analysis of theory and experiment, the ASIMD was unable to keep pace with the IMU. Considering the characteristics of the ASIMD, the mismatch between the driven frequency of the optical platform and the bandwidth of the ASIMD was the major reason. An all-optical atomic spin magnetometer was set up at first. The sensitivity of the magnetometer is ultra-high, and it can be used to detect the magnetization of spin-polarized noble gas. The gyromagnetic ratio of the noble gas is a physical constant, and it has already been measured accurately. So a novel calibration method for scale factor based on the gyromagnetic ratio has been presented. The relevant theoretical analysis and experiments have been implemented. The results showed that the scale factor of the device was $7.272V/^{\circ}/s$ by multi-group experiments with the maximum error value 0.49%.