• Journal of the Korea Society of Computer and Information
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• v.21 no.12
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• pp.35-41
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• 2016

In this paper, we propose a new real-time dead pixel detection method based on spatial compare filtering, which are usually used in the small target detection. Actually, the soft dead and the small target are cast in the same mold. Our proposed method detect and remove the dead pixels as applying the spatial compare filtering, into the pixel outputs of a detector after the non-uniformity correction. Therefore, we proposed method can effectively detect and replace the dead pixels regardless of the non-uniformity correction performance. In infrared camera, there are usually many dead detector pixels which produce abnormal output caused by manufactural process or operational environment. There are two kind of dead pixel. one is hard dead pixel which electronically generate abnormal outputs and other is soft dead pixel which changed and generated abnormal outputs by the planning process. Infrared camera have to perform non-uniformity correction because of structural and material properties of infrared detector. The hard dead pixels whose offset values obtained by non-uniformity correction are much larger or smaller than the average can be detected easily as dead pixels. However, some dead pixels(soft dead pixel) can remain, because of the difficulty of uncleared decision whether normal pixel or abnormal pixel.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.73-73
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• 2008

In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.58-58
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• 2009

Uniformity related issues in chemical mechanical polishing (CMP) are within wafer non-uniformity (WIWNU), wafer to wafer non-uniformity (WTWNU), planarity and dishing/erosion. Here, the WIWNU that originates from spatial distribution of independent variables such as temperature, sliding distance, down force and material removal rate (MRR) during CMP, relies to spatial dependency. Among various sources of spatial irregularity, hardness and modulus of pad and surface roughness in sources for pad uniformity are great, especially. So, we investigated the spatial variation of pad surface characteristics using pad measuring system (PMS) and roughness measuring system. Reduced peak height ($R_{pk}$) of roughness parameter shows a strong correlation with the removal rate, and the distribution of relative sliding distance onwafer during polishing has an effect on the variation of $R_{pk}$ and WIWNU. Also, the results of pad wear profile thorough developed pad profiler well coincides with the kinematical simulation of conditioning, and it can contribute for the enhancement of WIWNU in CMP process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.2
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• pp.89-94
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• 2011

The cause of the thickness non-uniformity in the large area deposition of $SiO_2$ films by PECVD(Plasma Enhanced Chemical Vapor Deposition) was investigated by the plasma diagnostics. The spatial distribution of the plasma species in the chamber was obtained with DLP(Double Langmuir Probe) and the new-designed probe-type QMS(Quadrupole Mass Spectrometer). From the relationship between the spatial distribution of the plasma species and the depositing rate of the $SiO_2$ films, it was conformed that the non-uniform deposition of $SiO_2$ films was related with the spatial distribution of the oxygen radical density and electron temperature.

• Journal of the Institute of Electronics Engineers of Korea SC
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• v.44 no.3
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• pp.29-33
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• 2007

All pixels of image sensor do not react uniformly even if the light of same radiance enters into the camera. This non-uniformity comes from the sensor pixel non-uniformity and non-uniformity induced by the changing transmission of the telescope over the field. The first contribution to the non-uniformity has high spatial frequency nature and has an influence on the result and quality of the data compression. The second source of non-uniformity has low frequency nature and has no influence of the compression result. As the contribution resulting from the sensor PRNU(Photo Response Non-Uniformity) is corrected inside the camera electronics, the effect of the remaining non-uniformity to the compression result will be negligible. The non-uniformity correction result shall have big difference according to the sensor modeling and the calculation method to get correction coefficient. Usually, the sensor can be modeled with one dimensional coefficients which are a gain and a offset for each pixel. Only two measurements are necessary theoretically to get coefficients. However, these are not the optimized value over the whole illumination level. This paper proposes the algorithm to calculate the optimized non-uniformity correction coefficients over whole illumination radiance. The proposed algorithm uses several measurements and the least square method to get the optimum coefficients. The proposed algorithm is verified using the own camera electronics including sensor, electrical test equipment and optical test equipment such as the integrating sphere.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.176-177
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• 2016

In the last few decades, attention toward atmospheric pressure plasma (APP) has been greatly increased due to the numerous advantages of those applications, such as non-necessity of high vacuum facility, easy setup and operation, and low temperature operation. The practical applications of APP can be found in a wide spectrum of fields from the functionalization of material surfaces to sterilization of medical devices. In the secondary battery industry, separator film has been typically treated by APP to enhance adhesion strength between adjacent films. In this process, the plasma is required to have high stability and uniformity for better performance of the battery. Dielectric barrier discharge (DBD) was usually adopted to limit overcurrent in the plasma, and we developed the pre-discharge technology to overcome the drawbacks of streamer discharge in the conventional DBD source which makes it possible to produce a super-stable plasma at atmospheric pressure. Simulations for the fluid flow and electric field were parametrically performed to find the optimized design for the linear jet plasma source. The developed plasma source (Plasmapp LJPS-200) exhibits spatial non-uniformity of less than 3%, and the adhesion strength between the separator and electrode films was observed to increase 17% by the plasma treatment.

• International Journal of Fuzzy Logic and Intelligent Systems
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• v.10 no.2
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• pp.95-100
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• 2010

This paper proposes a new spatial regularization of Fisher linear discriminant analysis (LDA) to reduce the overfitting due to small size sample (SSS) problem in face recognition. Many regularized LDAs have been proposed to alleviate the overfitting by regularizing an estimate of the within-class scatter matrix. Spatial regularization methods have been suggested that make the discriminant vectors spatially smooth, leading to mitigation of the overfitting. As a generalized version of the spatially regularized LDA, the proposed regularized LDA utilizes the non-uniformity of spatial correlation structures in face images in adding a spatial smoothness constraint into an LDA framework. The region-dependent spatial regularization is advantageous for capturing the non-flat spatial correlation structure within face image as well as obtaining a spatially smooth projection of LDA. Experimental results on public face databases such as ORL and CMU PIE show that the proposed regularized LDA performs well especially when the number of training images per individual is quite small, compared with other regularized LDAs.

• 한국전산유체공학회:학술대회논문집
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• 1998.11a
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• pp.121-126
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• 1998

A numerical optimization procedure is developed to find the inlet velocity profile that yields the most uniform epitaxial layer in a vertical MOCVD reactor. It involves the solution of fully elliptic equations of motion, temperature, and concentration; the finite volume method based on SIMPLE algorithm has been adopted to solve the Navier-Stokes equations. The overall optimization process is highly nonlinear and has been efficiently treated by the sequential linear programming technique that breaks the non-linear problem into a series of linear ones. The optimal profile approximated by a 6th-degree Chebyshev polynomial is very successful in reducing the spatial non-uniformity of the growth rate. The optimization is particularly effective to the high Reynolds number flow. It is also found that a properly constructed inlet velocity profile can suppress the buoyancy driven secondary flow and improve the growth-rate uniformity.

• Journal of Magnetics
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• v.20 no.4
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• pp.360-365
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• 2015

Spatial distributions of magnetic flux density in a newly designed magnetized inductively coupled plasma (M-ICP) etcher were investigated. Radial and axial magnetic flux densities as well as the magnetic flux density on the center of the substrate holder were controllable by placing multiple circular coils around the etcher properly. The plasma density non-uniformity in M-ICP (25 Gauss) can be reduced (1.4%) compared to that in ICP (16.7%) when the neutral gas pressure was 0.67 Pa and a right-hand circularly polarized wave (R-wave) can be propagated in to the etcher by making magnetic flux density increases both radially and axially from the center of the substrate holder.

• Journal of the Korean Society of Costume
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• v.56 no.7 s.107
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• pp.115-125
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• 2006

The study on plane composition in clothing was focused mainly on woven wear earlier but its application has been reaching the knit wear. This study is confined to the utilization with geometrical linear pattern in the modern apparel. The work here intends to grasp the plane structure found in both woven wear and knit wear and, in particular, to understand the aesthetics of fashion. The modern flat patterned clothing has been affected by the oriental style or postmodernism in view of social and cultural aspect while its fabric material and expression method shows the diversity in terms of industrial and technical aspect. It can be characterized as several outstanding patterns: the geometrical pattern in structure, the linear pattern with seam line and 2-dimensional plane pattern without seam line, and the flexible silhouette integrated into one single shape with human body unlike the traditional apparel The aesthetics of fashion in modern flat patterned clothing can be divided into such category as the organically spatial change, the re-creation of tradition and the non-format framework. The organically spatial change shows the geometrical formation in clothes due to change in dimension, where the organically changing uniformity and generosity appears as the dimension progresses. The timeless without any difference of up and down, left and right, and inside and outside and the discontinuity due to limitless spatial change are also imbedded. The re-creation of tradition tells the reshaped spirits of old tradition by integrating and modifying the hereditary features in the old customed clothing into modern clothing. The modern flat patterned clothing implies the contemporaneousness or the frame through which the old and modern cultures may be shared and indicates the re-creation of the past and uniformity. The non-format framework contains the uncertainty in meaning and it doesn't have any certain standards. As both the apparel and the human body with this style aim at the open space, the numerous contingencies are realized.