• Title/Summary/Keyword: Silicon nanophotonics

Search Result 4, Processing Time 0.02 seconds

Visible Wavelength Photonic Insulator for Enhancing LED Light Emission

  • Ryoo, Kwangki;Lee, Jeong Bong
    • Journal of information and communication convergence engineering
    • /
    • v.13 no.1
    • /
    • pp.50-55
    • /
    • 2015
  • We report design and simulation of a two-dimensional (2D) silicon-based nanophotonic crystal as an optical insulator to enhance the light emission efficiency of light-emitting diodes (LEDs). The device was designed in a manner that a triangular array silicon photonic crystal light insulator has a square trench in the middle where LED can be placed. By varying the normalized radius in the range of 0.3-0.5 using plane wave expansion method (PWEM), we found that the normalized radius of 0.45 creates a large band gap for transverse electric (TE) polarization. Subsequently a series of light propagation simulation were carried out using 2D and three-dimensional (3D) finite-difference time-domain (FDTD). The designed silicon-based light insulator device shows optical characteristics of a region in which light propagation was forbidden in the horizontal plane for TE light with most of the visible light spectrum in the wavelength range of 450 nm to 600 nm.

Capillary Assembly of Silicon Nanowires Using the Removable Topographical Patterns

  • Hong, Juree;Lee, Seulah;Lee, Sanggeun;Seo, Jungmok;Lee, Taeyoon
    • Korean Journal of Materials Research
    • /
    • v.24 no.10
    • /
    • pp.509-514
    • /
    • 2014
  • We demonstrate a simple and effective method to accurately position silicon nanowires (Si NWs) at desirable locations using drop-casting of Si NW inks; this process is suitable for applications in nanoelectronics or nanophotonics. Si NWs were assembled into a lithographically patterned sacrificial photoresist (PR) template by means of capillary interactions at the solution interface. In this process, we varied the type of solvent of the SiNW-containing solution to investigate different assembly behaviors of Si NWs in different solvents. It was found that the assembly of Si NWs was strongly dependent on the surface energy of the solvents, which leads to different evaporation modes of the Si NW solution. After Si NW assembly, the PR template was cleanly removed by thermal decomposition or chemical dissolution and the Si NWs were transferred onto the underlying substrate, preserving its position without any damage. This method enables the precise control necessary to produce highly integrated NW assemblies on all length scales since assembly template is easily fabricated with top-down lithography and removed in a simple process after bottom-up drop-casting of NWs.

Design of a High-efficiency Fiber-to-chip Coupler with Reflectors

  • Yoo, Keon;Lee, Jong-Ho
    • IEIE Transactions on Smart Processing and Computing
    • /
    • v.5 no.2
    • /
    • pp.123-128
    • /
    • 2016
  • In this paper, an inversely tapered coupler with Bragg reflectors is reported for the first time. With appropriately positioned reflecting structures, our fiber-to-chip coupler can more efficiently transmit the light from fiber to a waveguide in a photonic integrated circuit (PIC). A numerical simulation evaluated the coupler's efficiency with the reflector. Optimized parameters that maximize the efficiency of the coupler are also investigated. Simulation results show that the reflector with appropriate parameters enhances efficiency by up to 7 dB. Likewise, Bragg metal reflectors implemented by the conventional metallization process can also improve efficiency. It is also shown that the proposed reflector enhances the coupling efficiency in a double-tip taper coupler.

Periodically Aligned Metal Nanoparticle Array for a Plasmonic Absorber and Its Fabrication Technique (플라즈모닉 흡수체를 위한 금속 나노입자 주기구조 제작 기술)

  • Choi, Minjung;Ryu, Yunha;Bae, Kyuyoung;Kang, Gumin;Kim, Kyoungsik
    • Korean Journal of Optics and Photonics
    • /
    • v.28 no.6
    • /
    • pp.361-365
    • /
    • 2017
  • In this paper, we demonstrate a facile fabrication technique for a periodically aligned metal nanoparticle array, for a narrow-band plasmonic absorber. The metal nanoparticles are fabricated by e-beam evaporation and heat treatment processes on top of a periodic aluminum groove template. The plasmonic absorber is constructed with the transferred metal nanoparticle array, sputtered 33-nm-thick $Al_2O_3$, and 200-nm-thick metal reflector layers on silicon substrate. 46-nm-diameter and 76-nm-lattice metal-nanoparticle-array-based plasmonic absorber has performed as a narrow-band absorber with a central wavelength of 572 nm and full width at half maximum (FWHM) of 109.9 nm.