• Title/Summary/Keyword: Silica Waveguide

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AWG device characteristic dependence on the fabrication error limit (도파폭 공정오차에 따른 광도파 특성변화와 소자성능 저하)

  • 박순룡;오범환
    • Korean Journal of Optics and Photonics
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    • v.10 no.4
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    • pp.342-347
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    • 1999
  • As the waveguide width and the radius of curvature get smaller for the effort of monolithic fabrication of integrated photonic devices, the waveguide characteristics change significantly according to the change of the waveguide width or the radius of curvature. Especially, variation of the waveguide width due to fabrication process errors induces a phase error for each waveguide from the change of the propagation constant. Therefore, it is important to quantify these variation effects on the device characteristics for the design and fabrication of highly integrated photonic devices. Here, we analyze four different types of waveguides to get general characteristics in propagation constant change by utilizing the effective index method and the analytic solution method. Futhermore, the output characteristics of two AWG(Arrayed Waveguide Grating) devices are simulated by a highly-functional computer code. The simulated results have been found to be similar to the realistic device characteristics. The required fabrication error limit for the ridge-type InP-AWG device should be smaller than 0.02 ${\mu}{\textrm}{m}$ to get better channel crosstalk than-25 dB, while the required fabrication error limit for rib-type silica-AWG devices may be allowed up to 0.1 ${\mu}{\textrm}{m}$ to obtain better crosstalk than -30 dB.

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Planar Optical Waveguide Temperature Sensor Based on Etched Bragg Gratings Considering Nonlinear Thermo-optic Effect

  • Ahn, Kook-Chan;Lee, Sang-Mae;Jim S. Sirkis
    • Journal of Mechanical Science and Technology
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    • v.15 no.3
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    • pp.309-319
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    • 2001
  • This paper demonstrates the development of optical temperature sensor based on the etched silica-based planar waveguide Bragg grating. Topics include design and fabrication of the etched planar waveguide Bragg grating optical temperature sensor. The typical bandwidth and reflectivity of the surface etched grating has been ∼0.2nm and ∼9%, respectively, at a wavelength of ∼1552nm. The temperature-induced wavelength change is found to be slightly non-linear over ∼200$^{\circ}C$ temperature range. Typically, the temperature-induced fractional Bragg wavelength shift measured in this experiment is 0.0132nm/$^{\circ}C$ with linear curve fit. Theoretical models with nonlinear temperature effect for the grating response based on waveguide and plate deformation theories agree with experiments to within acceptable tolerance.

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Spectroscopic Analysis of Silica Soot for Planar Waveguide by FHD(Flame Hydrolysis Deposition) Method (FHD(Flame Hydrolysis Deposition)법으로 제작된 광도파막용 실리카 soot의 분광학적 분석)

  • 류형래;김재선;신동욱
    • Journal of the Korean Ceramic Society
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    • v.38 no.1
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    • pp.74-83
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    • 2001
  • FHD(Flame Hydrolysis Deposition) 공정은 광통신에서 사용되는 수동형 집적광학소자를 제작하는 공정으로서, SiCl$_4$를 형성하는 방법이다. 이 FHD 공정은 화염 형성에 관여하는 장비의 조건에 따른 매우 다양한 공정인자에 의하여 박막의 조성이 결정되므로, 박막의 조성을 예측하는 것이 용이하지 않았다. 본 연구에서는 FHD 공정에서 첨가가스의 유량을 제어하여 박막의 조성 및 광학적 특성을 예측할 수 있는 공정 분석의 기초자료를 제공하기 위하여 FTIR과 ICP-AES를 이용하여 실리카 soot의 조성분석에 대한 연구를 수행하였다. FTIR 흡수스펙트럼을 통해 실리카 soot에 존재하는 Si-O, B-O, OH($H_2O$) 농도의 변화를 관찰할 수 있었으며, ICP-AES를 통해 B-O의 흡수스펙트럼의 변화를 B의 농도와 정량적으로 연관지을 수 있었다.

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Propagation loss measurement of silica slab waveguide using index matching fluid (굴절률 정합액을 이용한 실리카 슬랩도파로의 전송손실 측정)

  • 성희경;박상호;신장욱;심재기
    • Korean Journal of Optics and Photonics
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    • v.10 no.2
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    • pp.174-177
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    • 1999
  • The propagation loss of silica slab waveguides were measured by immersing slab waveguides into a index matching liqiud. Index matching liqiud was used for out-coupling the light from arbitrary points of slab waveguide. The measured value of propagation loss are 0.04 dB/cm and 0.09 dB at 1300 nm and 633 nm respectively.

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The wavelength shift of waveguide Bragg grating with its polymer overclad irradiated by UV-laser (UV-laser 조사에 따른 폴리머 상부 클래드 광도파로 브래그 격자의 파장 변화)

  • Park, Dong-Yeong;Choe, Gi-Seon;Yun, Jae-Sun;Baek, Se-Jong;Mun, Hyeong-Myeong;Kim, Jin-Bong;Kim, Gwang-Taek;Im, Gi-Geon
    • Proceedings of the Optical Society of Korea Conference
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    • 2007.02a
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    • pp.221-222
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    • 2007
  • The UV laser trimming can be useful to have an accurate performance specification of the passive waveguide devices. In order to measure the change of the refractive index of polymer overclad layer under the irradiation of uv light in a high precision Bragg grating is fabricated on the silica core of planar waveguide and the corresponding transmittance spectrum was analyzed. An effective refractive index change of $4.7x10^{-5}$ was obtained for a straight waveguide when its $60{\mu}m$-thick overclad was irradiated by UV laser pulses of its total fluence 24 $J/cm^2$.

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Control of Free Spectral Range of tong Period Fiber Grating by Cladding Mode Waveguide Dispersion

  • Jeong, H.;Oh, K.
    • Journal of the Optical Society of Korea
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    • v.7 no.2
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    • pp.89-96
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    • 2003
  • A new method to control the free spectral range of a long period fiber grating is proposed and theoretically analyzed. As the refractive index decreases radially outward in the silica cladding due to graded doping of fluorine, waveguide dispersion in the cladding modes was modified to result in the effective indices change and subsequently the phase matching conditions for coupling with the core mode in a long period fiber grating. Enlargement of the free spectral range in a long period fiber grating was theoretically confirmed.

The study of oxide etching characteristics using inductively coupled plasma for silica waveguide fabircation (실리카 도파로(Silica Waveguide) 제작을 위한 Inductively Coupled Plasma에 의한 산화막 식각특성 연구)

  • 박상호;권광호;정명영;최태구
    • Journal of the Korean Vacuum Society
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    • v.6 no.3
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    • pp.287-292
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    • 1997
  • This study was tried to form the silica waveguide using high density plasma. Plasma characteristics have been investigated as a function of etch parameters using a single Langmuir probe and optical emission spectroscopy(OES). As etch parameters, $CF_4/CHF_3$ ratio, bias power, and source power were chosen as main variables. The oxide etch characteristics of inductively coupled plasma(ICP) dry etcher such as the etch rate, etch profile, and surface roughness were investigated s a function of etch parameters. On the basis of these results, the core pattern of the wave guide composed of $SiO_2-P_2O_5$ was formed. It was confirmed that the etch rate of $SiO_2-P_2O_5$ core layer was 380 nm/min and the aluminum selectivity to oxide, that is, mask layer was approximately 30:1. The SEM images showed vertical etched profiles and minimal loss of pattern width.

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The Effect of RF Power and $SiH_4$/($N_2$O+$N_2$) Ratio in Properties of SiON Thick Film for Silica Optical Waveguide (실리카 광도파로용 SiON 후막 특성에서 RF Power와 $SiH_4$/($N_2$O+$N_2$) Ratio가 미치는 영향)

  • 김용탁;조성민;서용곤;임영민;윤대호
    • Journal of the Korean Ceramic Society
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    • v.38 no.12
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    • pp.1150-1154
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    • 2001
  • Silicon oxynitride (SiON) thick films using the core layer of silica optical waveguide have been deposited on Si wafer by PECVD at low temperature (32$0^{\circ}C$) were obtained by decomposition of appropriate mixture of (SiH$_4$+$N_2$O+$N_2$) gaseous mixtures under RF power and SiH$_4$/($N_2$O+$N_2$) ratio deposition condition. Prism coupler measurements show that the refractive indices of SiON layers range from 1.4663 to 1.5496. A high SiH$_4$/($N_2$O+$N_2$) of 0.33 and deposition power of 150 W leads to deposition rates of up to 8.67 ${\mu}{\textrm}{m}$/h. With decreasing SiH$_4$/($N_2$O+$N_2$) ratio, the SiON layer become smooth from 41$\AA$ to 6$\AA$.

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Design and fabrication of temperature-independent AWG-WDM devices using polymer overcladding (폴리머 상부클래드를 이용한 온도무의존 AWG 파장분할 다중화 소자의 설계 및 제작)

  • Han, Young-Tak;Kim, Duk-Jun;Shin, Jang-Uk;Park, Sang-Ho;Park, Yoon-Jung;Sung, Hee-Kyeng
    • Korean Journal of Optics and Photonics
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    • v.14 no.2
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    • pp.135-141
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    • 2003
  • In arrayed waveguide grating (AWG) devices whose waveguides were composed of polymer with negative thermo-optic coefficient as overcladding, and silica with positive thermo-optic coefficient as both core and undercladding, we investigated the temperature dependence of the central wavelength using two-dimensional SFDM. From these results, it was confirmed that the temperature dependence can be nearly eliminated by adjusting the refractive index of the cladding and the thickness of the silica thin film upper-loaded on the core. Based on the numerical calculations, the AWG device with polymer overcladding was fabricated. and its optical characteristics were compared with those of the orginal silica AWG device. The introduction of polymer overcladding decreased the temperature dependence of the central wavelength from 0.0130 nm/$^{\circ}C$ to 0.0028 nm/$^{\circ}C$ without deteriorating the insertion loss and crosstalk characteristics.

Design and analysis of a mode size converter composed of periodically segmented taper waveguide surrounded by trenches (좌우 트렌치를 구비한 분리 주기 테이퍼 도파로 모드 크기 변환기의 설계 및 성능 분석)

  • Park Bo Gen;Chung Young Chul
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.12
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    • pp.43-49
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    • 2004
  • In this paper, we have designed a mode size converter to reduce coupling loss between super-high delta silica optical waveguides and single mode fibers. The new mode size converter has three design aspects; periodically segmented taper waveguide for minimal size, lateral taper waveguide for simple fabrication, and surrounding trenches to improve coupling loss. In the optimal mode size converter design, coupling loss is 0.33dB/point without trenches and 0.2dB/point with trenches.