• 한국세라믹학회지
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• 제45권1호
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• pp.48-53
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• 2008

In order to reduce signal delay in ULSI, an intermetal material of low dielectric constant is required. Ordered mesoporous silica film is proper to intermetal dielectric due to its low dielectric constant and superior mechanical properties. The ordered mesoporous silica film prepared by TEOS (tetraethoxysilane) / MTES (methyltriethoxysilane) mixed silica precursor and Brij-76 surfactant was surface-modified by HMDS (hexamethyldisilazane) treatment to reduce its dielectric constant. HMDS can substitute $-Si(CH_3)_3$ groups for -OH groups on the surface of silica wall. In order to modify interior silica wall, HMDS was treated by two different processes except the conventional spin coating. One process is that film is dipped and stirred in HMDS/n-hexane solution, and the other process is that film is exposed to evaporated HMDS. Through the investigation with different HMDS treatment, it was concluded that surface modification in evaporated HMDS was more effective to modify interior silica wall of nano-sized pores.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.159-159
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• 2007

In order to reduce a signal delay in ULSI, low resistive metal and intermetal dielectric material of low dielectric constant are required. Ordered mesoporous silica film is proper to intermetal dielectric due to its low dielectric constant and superior mechanical properties. In this study, ordered mesoporous silica films was synthesized using TEOS (tetraethoxysilane) / MTES (methyltriethoxysilane) mixed silica precursor and Brij-$76^{(R)}$ surfactant. These films had the porosity of 40% and dielectric constant of 2.5. To lower dielectric constant, the ordered mesoporous silica films were surface-modified by HMDS (hexamethyldisilazane) treatment. HMDS substituted -OH groups on the surface of silica wall for -Si$(CH_3)_3$ groups. After the HMDS treatment, ordered mesoporous silica films were calcined at various calcination temperatures. Through the investigation, it was concluded that the proper calcination temperature is necessary as aspects of structural, electrical, and mechanical properties.

• 대한환경공학회지
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• 제37권5호
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• pp.285-292
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• 2015

본 연구에서는 바이오매스의 탄화공정 시 발생되는 목초액을 응축성 가스물질의 전구물질로 이용하여 발생되는 응축성 가스상 오염물질을 제거하기 위하여 액체상 흡착제중 실리카 전구물질인 HMDS의 주입조건에 따른 응축성물질의 입경분포 변화특성을 명확히 파악하고자 하였다. 응축성 가스상 물질을 입자화시켜 제거하기 위하여 액체상 흡착제인 HMDS를 이용할 경우, 흡착제의 주입량, 체류시간 및 가열온도, MFC 유량 등의 적절한 조절로써 입자화 크기를 조절할 수 있었다. 특히 실리카 전구물질을 도입시 끓는점, 밀도(비중), 분자량 등의 물리화학적 특성을 고려하면, 발생되는 응축성 물질을 효과적으로 입자화시켜 제어 가능할 것으로 판단된다.