• Title/Summary/Keyword: Silica Precursor (HMDS)

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HMDS Treatment of Ordered Mesoporous Silica Film for Low Dielectric Application (저유전물질로의 응용을 휘한 규칙성 메조포러스 실리카 박막에의 HMDS 처리)

  • Ha, Tae-Jung;Choi, Sun-Gyu;Yu, Byoung-Gon;Park, Hyung-Ho
    • Journal of the Korean Ceramic Society
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    • v.45 no.1
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    • pp.48-53
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    • 2008
  • In order to reduce signal delay in ULSI, an intermetal material of low dielectric constant is required. Ordered mesoporous silica film is proper to intermetal dielectric due to its low dielectric constant and superior mechanical properties. The ordered mesoporous silica film prepared by TEOS (tetraethoxysilane) / MTES (methyltriethoxysilane) mixed silica precursor and Brij-76 surfactant was surface-modified by HMDS (hexamethyldisilazane) treatment to reduce its dielectric constant. HMDS can substitute $-Si(CH_3)_3$ groups for -OH groups on the surface of silica wall. In order to modify interior silica wall, HMDS was treated by two different processes except the conventional spin coating. One process is that film is dipped and stirred in HMDS/n-hexane solution, and the other process is that film is exposed to evaporated HMDS. Through the investigation with different HMDS treatment, it was concluded that surface modification in evaporated HMDS was more effective to modify interior silica wall of nano-sized pores.

Electrical and Mechanical Properties of Ordered Mesoporous Silica Film with HMDS Treatment

  • Ha, Tae-Jung;Choi, Sun-Gyu;Reddy, A. Sivasankar;Yu, Byoung-Gon;Park, Hyung-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.159-159
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    • 2007
  • In order to reduce a signal delay in ULSI, low resistive metal and intermetal dielectric material of low dielectric constant are required. Ordered mesoporous silica film is proper to intermetal dielectric due to its low dielectric constant and superior mechanical properties. In this study, ordered mesoporous silica films was synthesized using TEOS (tetraethoxysilane) / MTES (methyltriethoxysilane) mixed silica precursor and Brij-$76^{(R)}$ surfactant. These films had the porosity of 40% and dielectric constant of 2.5. To lower dielectric constant, the ordered mesoporous silica films were surface-modified by HMDS (hexamethyldisilazane) treatment. HMDS substituted -OH groups on the surface of silica wall for -Si$(CH_3)_3$ groups. After the HMDS treatment, ordered mesoporous silica films were calcined at various calcination temperatures. Through the investigation, it was concluded that the proper calcination temperature is necessary as aspects of structural, electrical, and mechanical properties.

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Behaviour of Condensing Gaseous Species by Injection of Liquid Adsorbents (HMDS) in Combustion Facility (액체상흡착제(HMDS) 주입조건에 따른 응축성 가스상 물질의 거동특성 비교)

  • Kim, Yong-Gu;Lee, Sang-Yul;Bong, Choon-Keun;Kim, Hyun-sang
    • Journal of Korean Society of Environmental Engineers
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    • v.37 no.5
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    • pp.285-292
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    • 2015
  • In this study, we were clearly identify the behaviour characteristics on particle size distribution of a condensing species by injection condition of HMDS (Hexa Methyl Di-Silazane, silica precursor that is one of liquid adsorbents) to remove condensing gaseous species as using pyroligneous liquor generated during carbonization process of biomass as precursor of condensing gaseous species. When using HMDS to remove the condensing gaseous species by growth machanism of particles, we could be controlled properly particles size such as amount of adsorbent injection, residence time, heating temperature and MFC flux. Especially, in case of using the silica precursor, in consideration of the physical and chemical properties of the boiling point, the specific gravity and the molecular weight, we found that the condensing species could be effectively controlled by particles granulation.