• Journal of the Korean Applied Science and Technology
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• v.32 no.2
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• pp.215-225
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• 2015

Recently, the importance of energy saving and alternative energy is significantly increasing due to energy depletion and the phase change material (PCM) research for saving energy is also actively investigating. In this research, the membrane emulsification using SPG membrane was used to make various microencapsulated phase change material (MPCM) particles which were comprised of $Rubitherms^{(R)}$ (RT-21 and RT-24) core and silica coating. We investigated the pressure of the dispersion phase, the concentration of surfactant, and the ratio of $Rubitherm^{(R)}$ and silica to prepare various MPCM particles. The DSC and TGA were used to examine the heat stability and latent heat properties. Also, PSA, SEM, and optical microscopy were used to confirm the size of $Rubitherm^{(R)}$ particles and the thickness of silica shell. The average of particle size was $7-8{\mu}m$. And, FT-IR was also used to enforce the qualitative analysis. Finally, the MPCM particles obtained from membrane emulsification showed monodispersed size distribution and the heat stability and latent heat were kept up to 80% compared to pure $Rubitherm^{(R)}$. So, it can be effectively used for wallpaper, buildings and interior products for energy saving as PCMs.

• Proceedings of the KIEE Conference
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• 2006.07a
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• pp.605-606
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• 2006

CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$,$CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

• Proceedings of the KIEE Conference
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• 2006.07d
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• pp.2237-2238
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• 2006

CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

• Rubber Technology
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• v.12 no.1
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• pp.1-7
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• 2011

Nanotechnology is the fast becoming key technology of the $21^{st}$ century. Due to its fascinating size-dependent properties, it has gained significant important in various sectors. Myths are being formed on the proverbal nanotechnology market, but the reality is the nanotechnology is not a market but a value chain. The chain comprises of - nanomaterials (nanoparticles) and nanointermediates (coatings, compounds, smart fabrics). Elastomer based nanocomposites reinforced with low volume fraction of nanofillers is the first generation nanotechnology products and it has attracted great interest due to their fascinating properties. The incorporation of nanofillers such as nanolayered silicates, carbon nanotubes, nanofibers, metal oxides or silica nanoparticles into elastomers improves significantly their mechanical, thermal, barrier properties, flame retardency etc., Extremely small particle size, high aspect ratio and large interface area yield an excellent improvement of the properties in a wide variety of the materials. Uniform dispersion of the nanofillers is a general prerequisite for achieving desired properties. In this paper, current developments in the area of elastomer based nanocomposites reinforced with layered silicate and carbon nanotube fillers are highlighted.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.316-316
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• 2006

The preparation of an organic/inorganic polymer hybrid from a novolac derivatives is described. The hybrid was prepared by the acid-catalyzed solgel reaction of phenyl-trimethoxysilane (PhTMOS) in the presence of anisole novolac. The resulting film was transparent and showed a high heat stability. The dispersion of two components might be due to the utilization of the p-p interaction between the phenyl ring of the silica matrix and that of novolac. This makes it possible to prepare a hybrid glass having a highly content of novolac derivatives.

• Journal of Hydrogen and New Energy
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• v.18 no.3
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• pp.317-324
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• 2007

The conversion reaction of ortho to para hydrogen was studied. The percentage of ortho and para hydrogen is mainly dependent on the equilibrium temperature. Because this reaction is known to be accelerated by the catalyst such as nickel-silicate and ruthenium on silica, we focused in the test and development of the catalysts. We studied metal-silicates because they provide high metal dispersion on support. Nickel-silicate, ruthenium-silicate and mixed-silicate were prepared by the coprecipitation method and used in the reaction at the temperature of liquid nitrogen. The conversion was measured by the difference of thermal conductivity between reference gas and sample gas. The activation condition was important and it affected the activities of the catalysts. Nickel-silicate showed high activities. Ruthenium-silicate also showed relative high activities but mixed-silicate showed poor activities.

• Proceedings of the KIEE Conference
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• 2006.07b
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• pp.1271-1272
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• 2006

CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40%. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.87-88
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• 2006

To investigate the possibility of ceria abrasive-added slurry for the oxide-chemical mechanical polishing (oxide-CMP) application, two kinds of retreated methods were introduced as follows: First, the characteristics of mixed abrasive slurry (MAS) using $CeO_2$ powder as an abrasive added within diluted silica slurry (DSS) were evaluated to achieve the improvement of removal rates and non-uniformity. Second, the control of pH level due to the dilution of slurry was examined. And then, we have discussed the CMP characteristics as a function of abrasive dispersion time.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.09a
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• pp.103-111
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• 1998

Au fine particle dispersed TiO2 film was prepared on silica glass substrate by sol-gel dip and firing process. The films were fabricated from the system of titanium tetraisoproxie-EtOh-HCl_H2O-hydrogen tetrachloroaurate(III) tetrahydrate. The conditions for the formation of the clear solution and dissolving high concentration of Au compound were examined. And a photoreduction process was adopted to control the size of gold metal particles. Phase evolution of matrix TiO2 and variation of Au particle with UV irradiation were investigated by XRDA, SEM, TEM and UV-visible spectrophotometer. And the effect of CPCl(Cetylpyridinium chloride monohydrate) as a dispersion agent was evaluated.

• Korean Journal of Optics and Photonics
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• v.11 no.1
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• pp.43-46
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• 2000

We generated 9-fs pulses from a Kerr-lens mode-locked Ti:sapphire laser only using commercial optical components. Two sets of prisms pair made of fused silica were used to compensate group delay dispersion inside and outside the laser oscillator respectively, and broadband mirrors were used to obtain a broad spectrum. By comparison between reflectance curves of the broadband mirrors and those of previous ones, broadband mirrors which have high reflectance bandwidth of over 180 nm were found to be essential to produce sub-IO-fs pulses. ulses.