Effect of Reaction Gas on the Structural and Optical Features of nc-Si:H thin Films Prepared by PECVD Techniques (PECVD 기법에의해 제조된 나노 결정 Si 박막의 구조 및 광학적 특성)
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- Proceedings of the Korean Ceranic Society Conference
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- 2003.04a
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- pp.231.2-231
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- 2003