• 제목/요약/키워드: SiC nanotube

검색결과 51건 처리시간 0.025초

촉매금속(Ni-Cu)의 적층 증착법에 의한 탄소나노튜브의 성장 (Growth of Carbon Nanotubes on Different Catalytic Substrates)

  • 배성규;이세종;조성진;이득용
    • 한국세라믹학회지
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    • 제41권3호
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    • pp.247-252
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    • 2004
  • 노튜브의 길이는 급격히 증가하였지만 촉매금속의 적층방법에 따른 탄소나노튜브의 성장 형태는 큰 차이가 없었다. 특히, ICBD 방법에 의해 Ni 촉매금속을 증착한 경우 다른 방법에 비하여 직선적인 탄소나노튜브가 관찰되었다. ^x Carbon nanotubes were grown on SiO$_2$/Si substrates by applying $C_2$H$_2$ gas through chemical vapor deposition process. It was found that carbon nanotubes were grown successfully on the substrates with catalytic films under 20 $\AA$ total thickness. The increase in reaction temperature from 50$0^{\circ}C$ to 80$0^{\circ}C$ resulted in longer carbon nanotube, but there was no clear tendencies with different types of catalytic layers. It was evident that carbon nanotubes became more straight on the substrate with Ni catalytic film produced by ICBD method.

Carbon Nanotube Synthesis using Magnetic Null Discharge Plasma Production Technology

  • Sung, Youl-Moon
    • Journal of Electrical Engineering and Technology
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    • 제2권4호
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    • pp.532-536
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    • 2007
  • Carbon nanotube (CNT) properties, produced using a magnetic null discharge (MND) plasma production technology, were investigated. We firstly deposited the Fe layer 200 nm in thickness on Si substrate by the magnetic null discharge sputter method at the substrate temperature of $300도C$, and then prepared CNTs on the catalyst layer by using the magnetic null discharge (MND) based CVD method. CNTs were deposited in a gas mixture of CH4 and N2 at a total pressure of 1 Torr by the MND-CVD method. The substrate temperature and the RF power were $650^{\circ}C$ and 600W, respectively. The characterization data indicated that the proposed source could synthesize CNTs even under relatively severe conditions for the magnetic null discharge formation.

High aspect ratio 팁의 비접촉모드에서의 측정 (Non-contact mode measurement of high aspect ratio tip)

  • 신영현;한창수
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.463-464
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    • 2006
  • This paper present experimental results by non-contact mode Atomic Force Microscopy using high aspect ratio tips (HAR-T). We fabricated the carbon nanotube tip based on dielectrophoresis and the carbon nano probe by focused ion beam after dielectrophoretic assembling. In this paper, we measure AAO sample and trench structure to estimate HAR-T's performance and compared with conventional Si tip. We confirmed that results of HAR-T's performance in non contact mode was very superior than conventional tip.

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The Electronic Structure of Carbon Nanotubes with Finite Length : Tight Binding Theory

  • Moon, Won-Ha;Kim, Won-Woo;Hwang, Ho-Jung
    • Transactions on Electrical and Electronic Materials
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    • 제3권1호
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    • pp.23-29
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    • 2002
  • The electronic properties of Carbon Nanotube(CNT) are currently the focus of considerable interest. In this paper, the electronic properties of finite length effect in CNT for the carbon nano-scale device is presented. To Calculate the electronic properties of CNT, Empirical potential method (the extended Brenner potential for C-Si-H) for carbon and Tight Binding molecular dynamic (TBMD) simulation are used. As a result of study, we have known that the value of the band gap decreases with increasing the length of the tube. The energy band gap of (6,6) armchair CNT have the ranges between 0.3 eV and 2.5 eV. Also, our results are in agreements with the result of the other computational techniques.

Comparison of carbon nanotube growth mode on various substrate

  • I.K. Song;Y.S. Cho;Park, K.S.;Kim, D.J.
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.44-44
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    • 2003
  • Growth mechanism of carbon nanotubes(CNTs) synthesized by chemical vapor deposition is abided by two growth modes. These growth modes are classified by the position of activated catalytic metal particle in the CNTs. Growth mode can be also affected by interaction between substrate and catalytic metal and induced energy such as thermal and plasma. We studied the reaction of catalytic metal to the substrate and growth mode of CNTs. Various substrates such as Si(100), graphite plate, coming glass, sapphire and AAO membrane are used to study the relation between catalytic metal and substrate in the synthesis of CNTs. For catalytic metal, thin film was deposited on various substrate via sputtering technique with a thickness of ∼20nm and magnetic fluids with none-sized particles were dispersed on AAO membrane. After laying process on AAO membrane, it was dried at 80$^{\circ}C$ for 8 hour. Synthesizing of CNTs was carried out at 900$^{\circ}C$ in NH3/C2H2 mixture gases flow for 10minutes.

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PECVD 증착조건 변화에 따른 a-C;H 박막의 구조 변화

  • 조영옥;노옥환;윤원주;이정근;최영철;이영희;최용각;유수창
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.93-93
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    • 2000
  • 수소화된 비정질 탄소(a-C:H)는 그 증착 조건에 따라서 여러 가지 다른 구조와 특성을 갖게 되며, 특히 DLC(diamond-like carbon) 및 CNT(Carbon nanotube)는 FED (field emission display) 개발 면에서 중요하게 연구되고 있다. 우리는 a-C:H 박막을 PECVD (plasma-enhanced chemical vapor deposition) 방법으로 증착하고 CH4 가스를 사용하였고 기판 온도는 상온-32$0^{\circ}C$ 사이에서 변화되었다. 기판은 Corning 1737 glass, quartz, Si, Ni 등을 사용하였다. 증착 압력과 R.F. power는 각각 0.1-1 Torr 와 12-60w 사이에서 변화되었다. ESR 측정은 X-band(주파수 약 9 GHz)에서 그리고 상온에서 행해졌다. 상온에서의 스핀밀도는 약한-표준피치(weak-pitch standard) 스펙트럼과 비교하여 얻을 수 있었다. 그리고 a-C:H 박막의 구조는 He-Ne laser(파장 632.8 nm)를 이용하는 micro-Raman spectroscopy로 분석하였다. 증착조건에 따른 스핀밀도의 변화 및 Raman 스펙트럼에서의 D-peak, G-peak의 위치 및 반치록, I(D)/I(G) 등을 조사하였다. 증착된 a-C:H 박막은 R.F.power가 증가할수록 대체로 스핀밀도가 증가하였으며, Raman 스펙트럼에서의 I(D)/I(G) 비율은 대체로 감소하였다. 증착된 박막들은 polymer-like Carbon으로 추정되었으며, 스핀밀도가 증가할수록 대체적으로 흑연 구조 영역이 증가됨을 알 수 있었다. 또한 glass나 Si 기판에 비해 Ni 기판위에서 polymer-like Carbon 구조는 향상되는 경향을 보였다.

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Ti-6Al-4V 합금 표면에 생성된 $TiO_2$ 나노튜브의 전석회화 처리 (Precalcification Treatment of $TiO_2$ Nanotube on Ti-6Al-4V Alloy)

  • 김시정;박지만;배태성;박은진
    • 대한치과보철학회지
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    • 제47권1호
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    • pp.39-45
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    • 2009
  • 연구목적: 최근 치과용 임플란트의 임상 경향이 전체 치료기간을 줄일 수 있는 방법에 관심이 집중됨에 따라 불활성의 티타늄 임플란트 표면에 활성을 부여하기 위한 다양한 표면처리 방법이 검토되고 있다. 본 연구에서는 높은 강도가 요구되는 부위의 임플란트 재료로서 사용되고 있지만 표면 특성이 순 티타늄에 비해 떨어지는 Ti-6Al-4V 합금의 골전도성을 개선할 목적으로 시행되었다. 연구 재료 및 방법: $20{\times}10{\times}2\;mm$의 Ti-6Al-4V 합금판을 준비한 다음 $TiO_2$ 나노튜브를 형성하기 위해 DC 정전원 장치의 양극과 음극에 각각 시편과 백금판을 결선하고 0.5 M $Na_2SO_4$와 1.0 wt% NaF를 함유하는 전해액을 사용하여 전압 20 V와 전류밀도 $30\;㎃/cm^2$ 조건에서 2시간 동안 양극산화 처리하였다. $TiO_2$ 나노튜브 형성 후 산화 피막층의 결정화를 유도하기 위해 $600^{\circ}C$에서 2시간 동안 열처리하였고, 표면활성도를 개선하기 위해 0.5 M $Na_2HPO_4$ 수용액 24시간 침적과 $Ca(OH)_2$ 포화 수용액에 5시간 침적을 시행하였다. 준비한 시편의 표면 반응성을 조사하기 위해 pH와 무기이온의 농도를 사람의 혈장과 유사하게 조절한 Hanks 용액 (H2387, Sigma Chemical Co., USA)에 2주간 침적하였다. 결과: 20 V에서의 양극산화처리로 직경 48.0 - 65.0 ㎚ 범위의 무정형의 $TiO_2$ 나노튜브가 전체 표면에 걸쳐서 균일하게 생성되는 양상을 보였다. $TiO_2$ 나노튜브는 $600^{\circ}C$에서 2시간 열처리 후 상대적으로 강한 anatase 피크와 함께 rutile 피크가 관찰되었다. $TiO_2$ 나노튜브의 표면활성도는 0.5 M $Na_2HPO_4$ 수용액 24시간 침적과 $Ca(OH)_2$ 포화수용액에 5시간 침적으로 개선되었다. 열처리와 전석회화 처리 후 SBF에 침적한 결과, $TiO_2$ rutile 피크의 상대적 강도는 크게 증가되었지만 HA의 석출은 저하되는 경향을 보였다. 결론: 이상의 결과로 미루어 볼 때, 양극산화 처리한 $TiO_2$ 나노튜브는 $600^{\circ}C$에서의 열처리에 의해 피막층이 안정화되고, 0.5 M $Na_2HPO_4$ 수용액 24시간 침적과 $Ca(OH)_2$ 포화수용액에 5시간 침적으로 표면에 인산칼슘층을 형성하는 것이 표면활성도를 개선하는데 유효함을 알 수 있었다.

Chemical Vapor Deposition Using Ethylene Gas toward Low Temperature Growth of Single-Walled Carbon Nanotubes

  • Jo, Sung-Il;Jeong, Goo-Hwan
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.262-267
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    • 2015
  • We demonstrate the growth of single-walled carbon nanotubes (SWNTs) using ethylene-based chemical vapor deposition (CVD) and ferritin-induced catalytic particles toward growth temperature reduction. We first optimized the gas composition of $H_2$ and $C_2H_4$ at 500 and 30 sccm, respectively. On a planar $SiO_2$ substrate, high density SWNTs were grown at a minimum temperature of $760^{\circ}C$. In the case of growth using nanoporous templates, many suspended SWNTs were also observed from the samples grown at $760^{\circ}C$; low values of $I_D/I_G$ in the Raman spectra were also obtained. This means that the temperature of $760^{\circ}C$ is sufficient for SWNT growth in ethylene-based CVD and that ethylene is more effective that methane for low temperature growth. Our results provide a recipe for low temperature growth of SWNT; such growth is crucial for SWNT-based applications.

Growth of vertically aligned carbon nanotubes on a large area Si substrates by thermal chemical vapor deposition

  • Lee, Cheol-Jin;Park, Jung-Hoon;Son, Kwon-Hee;Kim, Dae-Woon;Lyu, Seung-Chul;Park, Sung-Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.212-212
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    • 2000
  • Since the first obserbvation of carbon nanotubes, extensive researches have been done for the synthesis using arc discharge, laser vaporization, and plasma-enhanced chemical vapor deposition. Carbon nanotubes have unique physical and chemical properties and can allow nanoscale devices. Vertically aligned carbon nanotubes with high quality on a large area is particularly important to enable both fundamental studies and applications, such as flat panel displays and vacuum microelectronics. we have grown vertically aligned carbon nanotubes on a large area of Si substrates by thermal chemical vapor deposition using C2H2 gas at 750-950$^{\circ}C$. we deposited catalytic metal on Si susbstrate using thermal evaporation. The nanotubes reveal highly purified surface. The carbon nanotubes have multi-wall structure with a hollow inside and it reveals bamboo structure agreed with base growth model. Figure 1 shows SEM micrograph showing vertically aligned carbon nanotubes whih were grown at 950$^{\circ}C$ on a large area (20mm${\times}$30mm) of Si substrates. Figure 2 shows TEM analysis was performed on the carbon nanotubes grown at 950$^{\circ}C$ for 10 min. The carbon nanotubes are multi-wall structure with bamboo shape and the lack of fringes inside the nanotube indicates that the core of the structure is hollow. In our experiment, carbon nanotubes grown by the thermal CVD indicate base growth model.

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Co-Ni 합금위에서 수직방향으로 정렬된 탄소나노튜브의 성장 (Growth of Vertically Aligned Carbon Nanotubes on Co-Ni Alloy Metal)

  • 류재은;이철진;이태재;손경희;신동혁
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권8호
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    • pp.451-454
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    • 2000
  • We have grown vertically aligned carbon nanotubes in a large area of Co-Ni codeposited Si substrates by the thermal CVD usign $C_2H_2$ gas. Since the discovery of carbon nanotubes, growth of carbon nanotubes has been achieved by several methods such as laser vaporization, arc discharge, and pyrolysis. In particular, growth of vertically aligned nanotubes is important to flat panel display applications. Recently, vertically aligned carbon nanotubes have been grown on glass by PECVD. Aligned carbon nanotubes can be also grown on mesoporous silica and Fe patterned porous silicon using CVD. In this paper, we demonstrate that carbon nanotubes can be vertically aligned on catalyzed Si substrate when the domain density of catalytic particles reaches a certain value. We suggest that steric hindrance between nanotubes at an initial stage of the growth forces nanotubes to align vertically and each nonotubes are grown in bundle.

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