• Title/Summary/Keyword: Si-Alloy

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Thermoelectric Properties of Rapidly Solidified and extruded N-type $Bi_2Te_{2.85}Se_{0.15}$ alloy with extrusion die angle (급속응고법에 의한 $Bi_2Te_3$계 N형반도체 열전재료의 압출 다이각 변화에 따른 열전특성)

  • 권동진;홍순직;손현택;천병선;이윤석
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2001.11a
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    • pp.29-29
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    • 2001
  • 열전재료는 열전현상을 가지고 있어 열전발전과 열선냉각이 가능하기 때분에 해저용, 우주용, 군사용의 특수 전원으로 이미 실용화되어있고, 반도체, 레이저 다이오드, 적외선 검출소자 등의 냉각기로 쓰여지고 있어 많은 연구자들이 이들 재료에 대한 연구에 관을 갖고 열전특성을 향상시키기 위하여 많은 연구를 진행하고 있다 이들 열전재료는 사용 온도구역에 따라 3종류로 구분하고 있으며, 실온부근의 저온 영역(20$0^{\circ}C$)이하에서는 $Bi_2Te_3$계 재료, 중온영역(20$0^{\circ}C$~50$0^{\circ}C$)에서sms (Pb,Ge) Te계 재료, 고온영역(50$0^{\circ}C$~lOoo$^{\circ}C$)에서는 Si-Ge계 Fe Si계 재료가 이용되고 있다. 본 연구에서는 실온에서 성능지수가 높은 Bi_2(Te,Se)_3$에 대한 연구를 진행하였다. Bi_2(Te,Se)_3$계 열전재료는 기존의 공법인 Zone melting법을 이용하는 경우 성능지수가 높으나, 단위정이 Rhombohedral 구조파 기저면(basal plane)에 벽개성이 있는 관계로 재료의 적지 않은 손실과 가공상의 어려움이 있다. 또한 사료전체에 걸쳐 화학적으로 균질한 고용체를 얻는 것도 어려운 문제점으보 부각되고 있디 따라서 이와같은 문제점을 보완하기 위하여 용질원자의 편석감소, 고용도의 증가, 균일 고용체 형성, 결정립의 미세화등의 장점이 있는 급속응고법을 본 연구에 응용하였다. 본 연구에서는 위에서와 같은 급속응고의 장점과 대량 가공이 능늪한 연간압출공정을 이용하여 제조된 분말을 성형화 하였다. 특히 열간압출 가공에 있어서 압축다이 각 변화는 재료의 소성유동에 매우 중요한 역하을 하게되며, 이와 갇은 소성유동은 본 재료의 열전특성에 중요한 영향을 미치는 C 면 배양에 중요한 역할을 한 것으 로 기대된다. 이에 본 연구에서는 압출다이 각도 변화에 따른 미세조직변화와 이들 조직이 강도와 열전특성에 미치는 영향을 석하고자 한다. 압출재의 미세조직은 XRD(X Ray Diffraction), SEM(Scanning Electron Microscopy)으로 분석하였으며, 열전특성인 Seebeck계수($\alpha$)와 전기비저항( $\rho$ )은 열전측정장치로, 기계적 강도는 MTS장비를 이용하여 이루어졌다. 또한 압축다이각도 변화에 따른 결정방위 해석은 모노크로미터가 장착된 X RD장비감 이용하여 분석되었다.

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A study on the Properties of $In_{l-x}Ga_{x}As$ Grown by the TGS Methods (TGS법으로 성장한 $In_{l-x}Ga_{x}As$의 특성에 관한 연구)

  • Lee, W.S.;Moon, D.C.;Kim, S.T.;Suh, Y.S.
    • Proceedings of the KIEE Conference
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    • 1988.11a
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    • pp.372-375
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    • 1988
  • The III-V ternary alloy semiconductor $In_{l-x}Ga_{x}As$ were grown by the temperature Gradient of $0.60{\leq}x{\leq}0.98$. The electrical properties were investigated by the Hall effect measurement with the Van der Pauw method in the temperature range of $90{\sim}300K$. $In_{l-x}Ga_{x}As$ were revealed n-type and the carrier concentration at 300K were in the range of $9.69{\times}10^{16}cm^{-3}{\sim}7.49{\times}10^{17}cm^{-3}$. The resistivity was increased and the carrier mobility was decreased with increasing the composition ratio. The optical energy gap determined by optical transmission were $20{\sim}30meV$ lower than theoretical valves on the basis of absorption in the conduction band tail and it was decreased with increasing the temperature by the Varshni rule. In the photoluminescence of undoped $In_{l-x}Ga_{x}As$ at 20K, the main emission was revealed by the radiative recombination of shallow donor(Si) to acceptor(Zn) and the peak energy was increased with increasing the composition, X. The diffusion depth of Zn increases proportionally with the square root of diffusion time, and the activation energy for the Zn diffusion into $In_{0.10}Ga_{0.90}As$ was 2.174eV and temperatures dependence of diffusion coefficient was D = 87.29 exp(-2.174/$K_{B}T$). The Zn diffusion p-n $In_{x}Ga_{x}As$ diode revealed the good rectfying characteristics and the diode factor $\beta{\approx}2$. The electroluminescence spectrum for the Zn-diffusion p-n $In_{0.10}Ga_{0.90}As$ diode was due to radiative recombation between the selectron trap level(${\sim}140meV$) and Zn acceptor level(${\sim}30meV$). The peak energy and FWHM of electroluminescence spectrum at 77K were 1.262eV and 81.0meV, respectively.

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High Efficiency Solar Cell(I)-Fabrication and Characteristics of $N^+PP^+$ Cells (고효율 태양전지(I)-$N^+PP^+$ 전지의 제조 및 특성)

  • 강진영;안병태
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.18 no.3
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    • pp.42-51
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    • 1981
  • Boron was predeposited into p (100) Si wafer at 94$0^{\circ}C$ for 60minutes to make the back surface field. High tempreature diffusion process at 1145$^{\circ}C$ for 3 hours was immediately followed without removing boron glass to obtain high surface concentration Back boron was annealed at 110$0^{\circ}C$ for 40minutes after boron glass was removed. N+ layer was formed by predepositing with POCI3 source at 90$0^{\circ}C$ for 7~15 minutes and annealed at 80$0^{\circ}C$ for 60min1es under dry Of ambient. The triple metal layers were made by evaporating Ti, Pd, Ag in that order onto front and back of diffused wafer to form the front grid and back electrode respectively. Silver was electroplated on front and back to increase the metal thickness form 1~2$\mu$m to 3~4$\mu$m and the metal electrodes are alloyed in N2 /H2 ambient at 55$0^{\circ}C$ and followed by silicon nitride antireflection film deposition process. Under artificial illumination of 100mW/$\textrm{cm}^2$ fabricated N+PP+ cells showed typically the open circuit voltage of 0.59V and short circuit current of 103 mA with fill factor of 0.80 from the whole cell area of 3.36$\textrm{cm}^2$. These numbers can be used to get the actual total area(active area) conversion efficiency of 14.4%(16.2%) which has been improved from the provious N+P cell with 11% total area efficiency by adding P+ back.

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Magnetoresistive Effect in Ferromagnetic Thin Films( I ) (강자성체 박막(Fe-Ni, Co-Ni)의 자기-저항 효과에 관한 연구( I ))

  • Chang, C.G.;Yoo, J.Y.;Song, J.Y.;Yun, M.Y.;Park, J.H.;Son, D.R.
    • Journal of Sensor Science and Technology
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    • v.1 no.1
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    • pp.23-34
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    • 1992
  • In order to fabricate magnetoresistive sensor, Fe-Ni and Co-Ni alleys were evaporated on the slide glass and the silicon wafers. Saturation magnetic induction($B_{s}$), coercive field strength($H_{c}$) and magnetoresistance were measured for fabricated samples. The evaporated Fe-Ni thin films show that the saturation magnetic induction was 0.65 T, and coercive field strength was 0.379 A/cm, and this value was changed to 0.370 A/cm(//), 0.390 A/cm(${\bot}$), respectively after magnetic annealing. For the measurement of coercive field strength, magnetizing frequency of 1 kHz was used. For the fabricated sensor element, the change of magnetoresistance (${\Delta}R/R$) was excessively unstable due to oxidation in the process of fabrication. The evaporated Co-Ni alloy thin films show that saturation magnetic induction was 0.66 T, and coercive field strengthes were 5.895 A/cm(//), 5.898 A/cm(${\bot}$), respectively, after magnetic annelaing. The change of magnetoresistance(${\Delta}R/R$) was $3.6{\sim}3.7%$ of which value was excessively stable to room temperature. Fe-Ni thin film could have many problems due to large affinity in the process of fabrication of magnetoresistance sensor, but Co-Ni thin film could be a suitable material for fabrication of magnetoresistance sensor, because of its small affinity and definite magnetoresistance effects.

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Quantitative Analysis and Archaeometric Interpretation for Molten Glass and Bronze Materials within Baekje Crucibles from the Ssangbukri Site in Buyeo, Korea (부여 쌍북리유적 출토 백제 도가니 내부 유리 및 청동 용융물질의 정량분석과 고고과학적 해석)

  • Lee, Chan-Hee;Park, Jin-Young;Kim, Ji-Young
    • Journal of Conservation Science
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    • v.26 no.2
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    • pp.157-169
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    • 2010
  • This study focused on the material characteristics and archaeometric relationship between the molten glass and bronze materials within the crucibles and gilt-bronze Bodhisattva statue excavated from the Ssangbukri site in Buyeo, Korea. Yellowish green to red brown vitreous material in the crucibles was identified as lead glass which contained scarce amount of BaO, and low $Al_2O_3$ and CaO. Metallic molten material was identified as bronze of copper-tin-lead alloy with low amount of impurities that indicated well-refined materials. Also, cassiterite was used for raw metal ore of tin. The Bodhisattva statue consisted of major copper with trace impurities in the core metal, and gold amalgam in the gilded layer. Though lead isotopic analysis showed contradictory results in each lead glass, bronze and Bodhisattva statue that required further examination, it could be stated that the statue was made in the Ssangbukri site based on the high-level technical skills of bronze production.

A topological metal at the surface of an ultrathin BiSb alloy film

  • Hirahara, T.;Sakamoto, Y.;Saisyu, Y.;Miyazaki, H.;Kimura, S.;Okuda, T.;Matsuda, I.;Murakami, S.;Hasegawa, S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.14-15
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    • 2010
  • Recently there has been growing interest in topological insulators or the quantum spin Hall (QSH) phase, which are insulating materials with bulk band gaps but have metallic edge states that are formed topologically and robust against any non-magnetic impurity [1]. In a three-dimensional material, the two-dimensional surface states correspond to the edge states (topological metal) and their intriguing nature in terms of electronic and spin structures have been experimentally observed in bulk Bi1-xSbx single crystals [2,3,4]. However, if we want to know the transport properties of these topological metals, high purity samples as well as very low temperature will be needed because of the contribution from bulk states or impurity effects. In a recent report, it was also shown that an intriguing coupling between the surface and bulk states will occur [5]. A simple solution to this bothersome problem is to prepare a topological metal on an ultrathin film, in which the surface-to-bulk ratio is drastically increased. Therefore in the present study, we have investigated if there is a method to make an ultrathin Bi1-xSbx film on a semiconductor substrate. From reflection high-energy electron diffraction observation, it was found that single crystal Bi1-xSbx films (0${\sim}30\;{\AA}A$ can be prepared on Si(111)-$7{\times}7$. The transport properties of such films were characterized by in situ monolithic micro four-point probes [6]. The temperature dependence of the resistivity for the x=0.1 samples was insulating when the film thickness was $240\;{\AA}A$. However, it became metallic as the thickness was reduced down to $30\;{\AA}A$, indicating surface-state dominant electrical conduction. Figure 1 shows the Fermi surface of $40\;{\AA}A$ thick Bi0.92Sb0.08 (a) and Bi0.84Sb0.16 (b) films mapped by angle-resolved photoemission spectroscopy. The basic features of the electronic structure of these surface states were shown to be the same as those found on bulk surfaces, meaning that topological metals can be prepared at the surface of an ultrathin film. The details will be given in the presentation.

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Life Prediction of Low Cycle Fatigue for Ni-base Superalloy GTD111 DS at Elevated Temperature (Ni기 초내열합금 GTD111 DS의 고온 저주기 피로수명 예측)

  • Kim, Jin Yeol;Yoon, Dong Hyun;Kim, Jae Hoon;Bae, Si Yeon;Chang, Sung Yong;Chang, Sung Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.41 no.8
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    • pp.765-770
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    • 2017
  • GTD111 DS of nickel base superalloy has been used for gas turbine blades. In this study, low cycle fatigue test was conducted on the GTD111 DS alloy by setting conditions similar to the real operating environment. The low cycle fatigue tests were conducted at room temperature, $760^{\circ}C$, $870^{\circ}C$, and various strain amplitudes. Test results showed that fatigue life decreased with increasing total strain amplitude. Cyclic hardening response was observed at room temperature and $760^{\circ}C$; however, tests conducted at $870^{\circ}C$ showed cyclic softening response. Stress relaxation was observed at $870^{\circ}C$ because creep effects occurred from holding time. A relationship between fatigue life and total strain range was obtained from the Coffin-Manson method. The fratography using a SEM was carried out at the crack initiation and propagation regions.

A Study on the Carbothermic Reduction and Refining of V, Ta and B Oxides by Ar/Ar-H2 Plasma (Ar/Ar-H2 플라즈마에 의한 V, Ta, B 산화물의 탄소용융환원 및 정련)

  • Chung, Yong-Sug;Park, Byung-Sam;Hong, Jin-Seok;Bae, Jung-Chan;Kim, Moon-Chul;Baik, Hong-Koo
    • Transactions of the Korean hydrogen and new energy society
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    • v.7 no.1
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    • pp.81-92
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    • 1996
  • The Ar/Ar-$H_2$ plasma method was applied to reduce oxides and refine metals of V, Ta and B. In addition, the high temperature chemical reaction in Ar plasma and of the refining reaction in the Ar-(20%)$H_2$ plasma were analyzed. The crude V of 96wt% purity was obtained at the ratio of $C/V_{2}O_{5}=4.50$ by the Ar plasma reduction grade and the maximum reduction was obtained at $C/V_{2}O_{5}=4.50$ due to the $O_{2}$ loss from the thermal decomposition of vanadium oxide. In the Ar-(20%)$H_2$ plasma refining, the metallic V of 99.2wt% was produced at the ratio of $C/V_{2}O_{5}=4.40$. It was considered that a main refining reaction resulted from the chemical reaction between the residual carbon and residual oxygen. The metallic Ta of 99.8wt% was obtained at the ratio of $C/Ta_{2}O_{5}=5.10$ in a Ar plasma reduction and the Oz loss from the thermal decomposition of tantalum pentoxide did not take place. The deoxidation reaction was more significant than the decarburization reaction in the Ar-(20%)$H_2$ plasma refining and the metallic Ta of 99.9wt% was produced within the range of $C/Ta_{2}O_{5}$ ratio of 4.50 to 5.10. The Vickers hardness of Ta in the above mentioned range was about 220Hv due to the decrease in a residual oxygen by the deoxidation reaction. On the other hand, C is no suitable agent for the reduction of $B_{2}O_{3}$ by the Ar and Ar-$H_2$ plasma. But Fe-B-Si alloy was produced with the reduction of $B_{2}O_{3}$ in the melt when Fe, C, $B_{2}O_{3}$, and ferroboron mixtures were melted by the high frequency induction melting.

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Conservation Treatment and Study on Manufacturing Techniques of Jija Chongtong Gun in the Middle of Joseon Dynasty (조선 중기 제작된 지자총통의 보존처리와 제작기법 연구 -동아대학교 석당박물관 소장 보물 지자총통을 중심으로-)

  • Nam Dohyeon;Park Younghwan;Lee Jaesung
    • Conservation Science in Museum
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    • v.30
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    • pp.23-46
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    • 2023
  • The Jija Chongtong Gun, owned by Seokdang Museum of Dong-A University, is a tubedstyle heavy weapon of the battlefield in the mid-Joseon Dynasty and is the second largest firearm after Cheonja Chongtong. The original surface color of the Jija Chongtong Gun was obscured by foreign substances and therefore it was judged that its condition requires the conservation treatment. For stable conservation treatment, gamma ray and X-ray non-destructive transmission surveys was conducted to determine the internal structure and conservation condition. And the component analysis on the material components and surface contaminants of Jija Chongtong Gun was conducted by utilizing the p-XRF component analysis, SEM-EDS component analysis, and XRD analysis. As a result of the gamma-ray and X-ray non-destructive transmission investigation, a large amount of air bubbles was observed inside Jija Chongtong Gun, and the part that appeared to be a chaplet by visual observation was not identified. As a result of gamma-ray and p-XRF component analysis, it was confirmed that Jija Chongtong Gun was bronze made of copper (Cu), tin (Sn), and lead (Pb) alloy. As a result of surface analysis of foreign substances using SEM-EDS, it was confirmed that the main components of white foreign substances were calcium (Ca), sulfur (S), and titanium (Ti). Titanium was presumed to be titanium dioxide (TiO2), the main component of white correction fluid. The red foreign substance was confirmed to contain barium (Ba) as its main ingredient, and was presumed to be barium sulfate (BaSO4), an extender pigment in paint. White and red contaminants, mainly composed of titanium and barium, are presumed to have been deposited on the surface in recent years. The yellow foreign substances were confirmed to be aluminum (Al) and silicon (Si), and were presumed to have originated from soil components. As a result of SEM-EDS and XRD component analysis, the white foreign substance was confirmed to be gypsum (CaS). Based on the results of component analysis, surface impurities were removed, stabilization treatment, and strengthening treatment were performed. During the conservation process, unknown inscriptions Woo (右), Byeong (兵), Sang (上), and Yi (二) were discovered through a portable microscope and precise 3D scanning. In addition, the carving method, depth, and width of the inscription were measured. Woo Byeong Sang is located above Happo Fortress in Changwon, and Yi can be identified as the second hill.

Efficient Red-Color Emission of InGaN/GaN Double Hetero-Structure Formed on Nano-Pyramid Structure

  • Go, Yeong-Ho;Kim, Je-Hyeong;Gong, Su-Hyeon;Kim, Ju-Seong;Kim, Taek;Jo, Yong-Hun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.174-175
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    • 2012
  • (In, Ga) N-based III-nitride semiconductor materials have been viewed as the most promising materials for the applications of blue and green light emitting devices such as light-emitting diodes (LEDs) and laser diodes. Although the InGaN alloy can have wide range of visible wavelength by changing the In composition, it is very hard to grow high quality epilayers of In-rich InGaN because of the thermal instability as well as the large lattice and thermal mismatches. In order to avoid phase separation of InGaN, various kinds of structures of InGaN have been studied. If high-quality In-rich InGaN/GaN multiple quantum well (MQW) structures are available, it is expected to achieve highly efficient phosphor-free white LEDs. In this study, we proposed a novel InGaN double hetero-structure grown on GaN nano-pyramids to generate broad-band red-color emission with high quantum efficiency. In this work, we systematically studied the optical properties of the InGaN pyramid structures. The nano-sized hexagonal pyramid structures were grown on the n-type GaN template by metalorganic chemical vapor deposition. SiNx mask was formed on the n-type GaN template with uniformly patterned circle pattern by laser holography. GaN pyramid structures were selectively grown on the opening area of mask by lateral over-growth followed by growth of InGaN/GaN double hetero-structure. The bird's eye-view scanning electron microscope (SEM) image shows that uniform hexagonal pyramid structures are well arranged. We showed that the pyramid structures have high crystal quality and the thickness of InGaN is varied along the height of pyramids via transmission electron microscope. Because the InGaN/GaN double hetero-structure was grown on the nano-pyramid GaN and on the planar GaN, simultaneously, we investigated the comparative study of the optical properties. Photoluminescence (PL) spectra of nano-pyramid sample and planar sample measured at 10 K. Although the growth condition were exactly the same for two samples, the nano-pyramid sample have much lower energy emission centered at 615 nm, compared to 438 nm for planar sample. Moreover, nano-pyramid sample shows broad-band spectrum, which is originate from structural properties of nano-pyramid structure. To study thermal activation energy and potential fluctuation, we measured PL with changing temperature from 10 K to 300 K. We also measured PL with changing the excitation power from 48 ${\mu}W$ to 48 mW. We can discriminate the origin of the broad-band spectra from the defect-related yellow luminescence of GaN by carrying out PL excitation experiments. The nano-pyramid structure provided highly efficient broad-band red-color emission for the future applications of phosphor-free white LEDs.

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