• 제목/요약/키워드: Shadow length

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Control of a Novel PV Tracking System Considering the Shadow Influence

  • Ko, Jae-Sub;Chung, Dong-Hwa
    • Journal of Electrical Engineering and Technology
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    • 제7권4호
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    • pp.524-529
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    • 2012
  • This paper proposes a novel control strategy of a PV tracking system considering the shadow influence. If distance of between PV arrays is not enough, shadow can be occurred to PV module. In PV system, if shadow is occurred to PV modules then PV modules operates reverses bias, and will eventually cause hot-spot and loss. To reduce loss by shadow influence, this paper proposes shadow compensation algorithm using distance between arrays and shadow length of array. The distance between arrays is calculated by using azimuth of solar, and length of array shadow is calculated using by altitude of solar. The shadow compensation algorithm proposed in this paper compares distance between arrays and length of array shadow. When the shadow length is longer than the distance between arrays, the algorithm adjusts altitude of array to avoid the shadow effects. The control algorithm proposed in this paper proves validity through compared with conventional algorithm and proposes experiment result.

그림자 영향을 고려한 새로운 태양광 추적시스템 제어 (Control of a Novel PV Tracking System Considering the Shadow Influence)

  • 박기태;최정식;정동화
    • 전기학회논문지
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    • 제57권6호
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    • pp.994-1002
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    • 2008
  • In this paper a novel tracking system is described, regarding the influence of shadow between array, aimed at improving the efficiency of PV tracking system. Comparing with a building site versus capacity power, domestic solar powers have a limited siting. Therefore, each array interferes with the shadow of other arrays. The loss by influence of those shadow can be compensated for by means of control algorithm of the tracking device. The paper suggests a method controlling an altitude for length which is received the shadow influence of PV array. By using an azimuth of current solar position and the length between arrays, the controller of tracking device is able to calculate the length between actual arrays and make a comparison of the shadow length at a specific time with the length between arrays. When the shadow length is longer than the length between arrays, the controller of tracking device can adjust a position by compensating error altitude of the length between arrays at an altitude of current solar position. In the paper, we develop the control algorithm able to minimize the loss caused by the influence of shadow on the PV tracking system, and compared this with conventional output system. The controller has been tested in the laboratory with proposed algorithm and shows excellent performance.

음영에 의한 손실을 고려한 태양광 발전 추적 시스템 (Photovoltaic tracking system considered loss by shadow)

  • 최정식;고재섭;정철호;김도연;정병진;정동화
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2008년도 춘계학술발표대회 논문집
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    • pp.135-141
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    • 2008
  • In this paper a novel tracking system is described, regarding the influence of shadow between array, aimed at improving the efficiency of PV tracking system. Comparing with a building site versus capacity power, domestic solar powers have a limited siting. Therefore, each array interferes with the shadow of other arrays. The loss by influence of those shadow can be compensated for by means of control algorithm of the tracking device. The paper suggests a method controlling an altitude for length which is received the shadow influence of PV array. By using an azimuth of current solar position and the length between arrays, the controller of tracking device is able to calculate the length between actual arrays and make a comparison of the shadow length at a specific time with the length between arrays. When the shadow length is longer than the length between arrays, the controller of tracking device can adjust a position by compensating error altitude of the length between arrays at an altitude of current solar position. In the paper, we develop the control algorithm able to minimize the loss caused by the influence of shadow on the PV tracking system, and compared this with conventional output system. The controller has been tested in the laboratory with proposed algorithm and shows excellent performance

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태양광 발전 추적 시스템의 효율 향상을 위한 그림자 보상알고리즘 개발 (Development of shadow compensation algorithm for efficiency improvement of photovoltaic tracking system)

  • 고재섭;최정식;정철호;김도연;정병진;전영선;정동화
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 2008년도 춘계학술대회 논문집
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    • pp.411-414
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    • 2008
  • In this paper a novel tracking system is described, regarding the influence of shadow between array, aimed at improving the efficiency of PV tracking system. The loss by influence of those shadow can be compensated for by means of control algorithm of the tracking device. The paper suggests a method controlling an altitude for length which is received the shadow influence of PV array. By using an azimuth of current solar position and the length between arrays, the controller of tracking device is able to calculate the length between actual arrays and make a comparison of the shadow length at a specific time with the length between arrays. In the paper, we develop the control algorithm able to minimize the loss caused by the influence of shadow on the PV tracking system, and compared this with conventional output system. The controller has been tested in the laboratory with proposed algorithm and shows excellent performance

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ON THE EXTREMAL TYPE I BINARY SELF-DUAL CODES WITH NEAR-MINIMAL SHADOW

  • HAN, SUNGHYU
    • Journal of applied mathematics & informatics
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    • 제37권1_2호
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    • pp.85-95
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    • 2019
  • In this paper, we define near-minimal shadow and study the existence problem of extremal Type I binary self-dual codes with near-minimal shadow. We prove that there is no such codes of length n = 24m + 2($m{\geq}0$), n = 24m + 4($m{\geq}9$), n = 24m + 6($m{\geq}21$), and n = 24m + 10($m{\geq}87$).

국부증착용 마이크로 샤도우 마스크 제작 (Fabrication of Miniaturized Shadow-mask for Local Deposition)

  • 김규만;유르겐부르거
    • 한국정밀공학회지
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    • 제21권8호
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    • pp.152-156
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    • 2004
  • A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

광선추적 수행중 혼합 음영검사에 관한 연구 (A Hybrid Shadow Testing Scheme During Ray Tracing)

  • 어길수;경종민
    • 대한전자공학회논문지
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    • 제26권3호
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    • pp.95-104
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    • 1989
  • 본 논문은 3차원적 분할공간 환경에서 종래의 음영검사법과 Crow의 음영입체법을 상황에 따라 우리하도록 선택하는 혼합음영검사법을 소개하고 파라메타화를 통하여 그 선택의 최적화를 꾀하였다. 추가적인 선행계산시간이 소요됨에도 불구하고 제안된 혼합음영검사법은 여러가지 예제화면들에 재하여 종래의 방법에 비하여 음영계산시간에 있어서는 50%, 전체묘화시간에 있어서는 30%정도씩의 CPU시간단축효과를 보였다. 그 원인은 음영검사의 선택적 사용을 통하여 그림자영역의 일관성(coherency)을 이용한데에 있다. 연속되는 두 반사점사이에 존재하는 음영다각형의 갯수를 나타내는 $N_{th}$라는 파라메타가 음영검사의 효과적 선택을 위한 지표가 되며, 묘화환경의 통계적 수치로부터 이 값을 알아내는 방법이 제안되고 실험적 결과와 비교된다.

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그림자식 모아레를 이용한 형상측정법의 정확도 개선에 관한 연구 (A Study on the Improvement of Accuracy of Shape Measurement in the Shadow Moire Method)

  • 박경근;박윤창;정경민
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 1999년도 춘계학술대회 논문집
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    • pp.175-180
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    • 1999
  • Generally, When we measure of object 3D surfaces with phase shifting shadow moire method, it is use of optical system consist of light source, grating, and ccd camera. At this time, it is important parameter that vertical distance of grating and camera, grating and light source, and horizontal distance of camera and light source. When use camera consist of complex lens vertical distance of grating and camera is unknown parameter. From this cause equivalent wave length of moire fringe is uncertain. In this study, We exactly obtain a vertical distance of grating and camera so improve on measurement accuracy.

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Pentacene Thin Film Transistors Fabricated by High-aspect Ratio Metal Shadow Mask

  • Jin, Sung-Hun;Jung, Keum-Dong;Shin, Hyung-Chul;Park, Byung-Gook;Lee, Jong-Duk;Yi, Sang-Min;Chu, Chong-Nam
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.881-884
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    • 2004
  • The robust and large-area applicable metal shadow masks with a high aspect ratio more than 20 are fabricated by a combination of micro-electro-discharge machining (${\mu}$-EDM) and electro chemical etching (ECE). After defining S/D contacts using a 100 ${\mu}m$ thick stainless steel shadow mask, the top-contact pentacene TFTs with channel length of 5 ${\mu}m$ showed routinely the results of mobility of 0.498 ${\pm}$ 0.05 $cm^2$/Vsec, current on/off ratio of 1.6 ${times}$ $10^5$, and threshold voltage of 0 V. The straightly defined atomic force microscopy (AFM) images of channel area demonstrated that shadow effects caused by the S/D electrode deposition were negligible. The fabricated pentacene TFTs have an average channel length of 5 ${\pm}$ 0.25 ${\mu}m$.

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