• 제목/요약/키워드: Semiconductor laser

검색결과 524건 처리시간 0.024초

Sol-gel deposited TiInO thin-films transistor with Ti effect

  • Kim, Jung-Hye;Son, Dae-Ho;Kim, Dae-Hwan;Kang, Jin-Kyu;Ha, Ki-Ryong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.200-200
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    • 2010
  • In recent times, metal oxide semiconductors thin films transistor (TFT), such as zinc and indium based oxide TFTs, have attracted considerable attention because of their several advantageous electrical and optical properties. There are many deposition methods for fabrication of ZnO-based materials such as chemical vapor deposition, RF/DC sputtering and pulsed laser deposition. However, these vacuum process require expensive equipment and result in high manufacturing costs. Also, the methods is difficult to fabricate various multicomponent oxide semiconductor. Recently, several groups report solution processed metal oxide TFTs for low cost and non vacuum process. In this study, we have newly developed solution-processed TFTs based on Ti-related multi-component transparent oxide, i. e., InTiO as the active layer. We propose new multicomponent oxide, Titanium indium oxide(TiInO), to fabricate the high performance TFT through the sol-gel method. We investigated the influence of relative compositions of Ti on the electrical properties. Indium nitrate hydrate [$In(NO^3).xH_2O$] and Titanium isobutoxide [$C_{16}H_{36}O_4Ti$] were dissolved in acetylacetone. Then monoethanolamine (MEA) and acetic acid ($CH_3COOH$) were added to the solution. The molar concentration of indium was kept as 0.1 mol concentration and the amount of Ti was varied according to weighting percent (0, 5, 10%). The complex solutions become clear and homogeneous after stirring for 24 hours. Heavily boron (p+) doped Si wafer with 100nm thermally grown $SiO_2$ serve as the gate and gate dielectric of the TFT, respectively. TiInO thin films were deposited using the sol-gel solution by the spin-coating method. After coating, the films annealed in a tube furnace at $500^{\circ}C$ for 1hour under oxygen ambient. The 5% Ti-doped InO TFT had a field-effect mobility $1.15cm^2/V{\cdot}S$, a threshold voltage of 4.73 V, an on/off current ratio grater than $10^7$, and a subthreshold slop of 0.49 V/dec. The 10% Ti-doped InO TFT had a field-effect mobility $1.03\;cm^2/V{\cdot}S$, a threshold voltage of 1.87 V, an on/off current ration grater than $10^7$, and a subthreshold slop of 0.67 V/dec.

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(Y0.85-xYb0.15)3Ga5O12:Er3+x 형광체의 형광특성 (Luminescence Characteristics of (Y0.85-xYb0.15)3Ga5O12:Er3+x Phosphors)

  • 정종원;이성수
    • 새물리
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    • 제68권12호
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    • pp.1308-1314
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    • 2018
  • 본 연구에서는 고상반응법을 이용하여 $(Y_{0.85-x}Yb_{0.15})_3Ga_5O_{12}:Er^{3+}_x$ 형광체 분말을 합성하고 그 분말의 형광특성을 연구하였다. $Yb^{3+}$ 이온의 농도를 0.15 mol에 고정하고 $Er^{3+}$ 이온의 농도를 변화시키며 제작된 $(Y_{0.85-x}Yb_{0.15})_3Ga_5O_{12}:Er^{3+}_x$ 형광체의 결정성을 X-선 회절장치를 이용하여 형광체 분말의 결정성을 측정하였다. $(Y_{0.85-x}Yb_{0.15})_3Ga_5O_{12}:Er^{3+}_x$ 분말은 $Er^{3+}$ 이온의 함유량에 관계없이 입방정계 구조의 다결정 상으로 성장하였음을 확인할 수 있었다. 형광광도계를 이용하여 형광체의 형광특성을 관찰하였으며, 980 nm 레이저 다이오드와 분광기를 이용하여 형광체의 상방전환 형광특성을 분석하였다. 980 nm 레이저 다이오드로 여기시킨 $(Y_{0.85-x}Yb_{0.15})_3Ga_5O_{12}:Er^{3+}_x$ 형광체의 상방전환 발광스펙트럼은 553 nm 부근의 강한 녹색 형광과 660 nm에서의 약한 적색 형광을 나타내었다. 형광과 상방전환에 의한 형광의 세기는 $Er^{3+}$ 이온의 첨가량이 0.12 mol 일 때 가장 높게 나타났으며, 에너지 전달 과정을 이용해 상방전환에 의한 형광 특성을 분석하였다.

기판온도가 GZO 투명전도막의 재료평가지수에 미치는 영향 (Effects of Substrate Temperature on Figure of Merit of Transparent Conducting GZO Thin Films)

  • 신현호;정양희;강성준
    • 한국전자통신학회논문지
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    • 제18권5호
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    • pp.797-802
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    • 2023
  • 본 연구에서는 펄스 레이저 증착법으로 기판 온도에 따른 GZO(Ga2O3 : 5 wt %, ZnO : 95 wt %) 박막을 유리 기판에 증착하여 전기적 및 광학적 특성을 조사하였다. XRD측정을 통해 기판 온도에 무관하게 모든 GZO 박막이 c 축으로 우선 성장함을 확인할 수 있었고, 300℃ 에서 증착한 GZO 박막이 반가폭 0.38° 로 가장 우수한 결정성을 나타내었다. 기판 온도가 150에서 300℃ 로 증가함에 따라 GZO 박막의 비저항은 감소하는 경향을 보인 반면에 가시광 영역에서의 평균 투과도는 크게 영향을 받지 않는 것으로 조사되었다. 300℃ 에서 증착한 GZO 박막의 재료 평가 지수가 2.05×104-1·cm-1 로 가장 우수한 값을 나타내었고, 이때 비저항과 가시광 영역에서의 평균 투과도는 각각 3.72 × 10-4 Ω·cm 과 87.71 % 이었다. 본 연구를 통해 GZO 박막이 매우 유망한 투명 전도막 재료라는 것을 알 수 있었다.

Efficient Red-Color Emission of InGaN/GaN Double Hetero-Structure Formed on Nano-Pyramid Structure

  • 고영호;김제형;공수현;김주성;김택;조용훈
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.174-175
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    • 2012
  • (In, Ga) N-based III-nitride semiconductor materials have been viewed as the most promising materials for the applications of blue and green light emitting devices such as light-emitting diodes (LEDs) and laser diodes. Although the InGaN alloy can have wide range of visible wavelength by changing the In composition, it is very hard to grow high quality epilayers of In-rich InGaN because of the thermal instability as well as the large lattice and thermal mismatches. In order to avoid phase separation of InGaN, various kinds of structures of InGaN have been studied. If high-quality In-rich InGaN/GaN multiple quantum well (MQW) structures are available, it is expected to achieve highly efficient phosphor-free white LEDs. In this study, we proposed a novel InGaN double hetero-structure grown on GaN nano-pyramids to generate broad-band red-color emission with high quantum efficiency. In this work, we systematically studied the optical properties of the InGaN pyramid structures. The nano-sized hexagonal pyramid structures were grown on the n-type GaN template by metalorganic chemical vapor deposition. SiNx mask was formed on the n-type GaN template with uniformly patterned circle pattern by laser holography. GaN pyramid structures were selectively grown on the opening area of mask by lateral over-growth followed by growth of InGaN/GaN double hetero-structure. The bird's eye-view scanning electron microscope (SEM) image shows that uniform hexagonal pyramid structures are well arranged. We showed that the pyramid structures have high crystal quality and the thickness of InGaN is varied along the height of pyramids via transmission electron microscope. Because the InGaN/GaN double hetero-structure was grown on the nano-pyramid GaN and on the planar GaN, simultaneously, we investigated the comparative study of the optical properties. Photoluminescence (PL) spectra of nano-pyramid sample and planar sample measured at 10 K. Although the growth condition were exactly the same for two samples, the nano-pyramid sample have much lower energy emission centered at 615 nm, compared to 438 nm for planar sample. Moreover, nano-pyramid sample shows broad-band spectrum, which is originate from structural properties of nano-pyramid structure. To study thermal activation energy and potential fluctuation, we measured PL with changing temperature from 10 K to 300 K. We also measured PL with changing the excitation power from 48 ${\mu}W$ to 48 mW. We can discriminate the origin of the broad-band spectra from the defect-related yellow luminescence of GaN by carrying out PL excitation experiments. The nano-pyramid structure provided highly efficient broad-band red-color emission for the future applications of phosphor-free white LEDs.

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