• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.258-259
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• 2005

[ $CuInSe_2$ ] thin films were fabricated at various fabrication conditions (substrate temperature, sputtering pressure, BC/RF power, vapor deposition, heat treatment). And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInSe_2$ thin films with stoichiometric composition. $CuInSe_2$ thin film was well made at the heat treatment of 500[$^{\circ}C$] of SLG/Cu/In/Se stacked elemental layer which was prepared by sputter and thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1 : 1 : 2. At the same time, carrier concentration, hall mobility and resistivity of the thin films was $1.27\sim9.88\times10^{17}[cm^{-3}]$, $49.95\sim185[cm^2/V{\cdot}s]$ and $10^{-1}\sim10^{-2}[\Omega{\cdot}cm]$, respectively

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.395-395
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• 2012

We fabricate organic-inorganic hybrid thin film for the purpose of encapsulation by molecular layer deposition (MLD) using Trimethylaluminium (TMA) and Adipoyl Chloride (AC). Ellipsometry was employed to verify self limiting reaction of ALD. Linear relationship between number of cycle and thickness was obtained. We found that desirable organic thin film fabrication is possible by MLD surface reaction in nanoscale. Purging was carried out after dosing of each precursor to form monolayer in each sequence. We also confirmed roughness of the organic thin film by atomic force microscopy. We deposit TMA and AC at $70^{\circ}C$ and that 1.78A root mean square was obtained which indicates that uniform organic thin film was formed. We confirmed precursor's functional group by IR spectrum. We calculated WVTR of organic-inorganic hybrid super-lattice epitaxial layer using Ca test. WVTR indicates superlattice film can be possibly use as encapsulation in flexible devices.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.106-106
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• 2014

Atomic layer deposition 방법으로 증착시킨 ZnO 박막은 다양한 종류의 태양전지에서 TCO, Buffer Layer 등 다양한 층에 활용될 수 있어 최근 많은 주목을 받고 있다. 각 적용분야에 필요한 요구조건에 따라 ZnO의 다양한 물리/화학적 특성은 이에 맞도록 조절될 필요가 있으며, 이는 ALD 공정을 통해 ZnO를 증착할 때도 마찬가지이다. 본 발표에서는 ALD를 이용한 ZnO 공정에서 이러한 물리/화학적 특성을 조절하기 위하여 시도되고 있는 precursor/reactant의 선정, 공정조건의 조절, 새로운 precursor의 적용 예를 들고, 특히 전기적 특성에 초점을 맞추어 이들이 증착된 ZnO 박막 특성에 미치는 영향을 조사하였다.

• Journal of the Korean institute of surface engineering
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• v.41 no.1
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• pp.28-32
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• 2008

In this paper CdS thin films, which were widely used window layer of the CdS/CdTe and the CdS/$CuInSe_2$ heterojunction solar cell, were grown by chemical bath deposition, which is a very attractive method for low-cost and large-area solar cells, and the structural, optical and electrical properties of the films was studied. As the thiourea/$CdAc_2$ mole ratio was increased, the deposition rate of CdS films prepared by CBD was increased due to increasing reaction velocity in solution and the optical bandgap was increased at higher thiourea/$CdAc_2$ mole ratio due to larger grain size and continuous microstructure. The minimum resistivity of the films was at thiourea/$CdAc_2$ mole ratio of 3.

• Journal of the Semiconductor & Display Technology
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• v.10 no.2
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• pp.83-89
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• 2011

In this study, we investigated the effects of shutter control by Reactive Magnetron Sputtering using Inductively-Coupled Plasma(ICP) for obtaining ZnO thin films with high purity. The surface morphologies and structure of deposited ZnO thin films were characterized using Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and X-ray Diffractometer (XRD). Also, optical and chemical properties of ZnO thin films were analyzed by Spectroscopic Ellipsometer (SE) and X-ray Photoelectron spectroscopy (XPS). As a result, it observed that ZnO thin films grown at reactive sputtering using shutter control and ICP were higher density, lower surface roughness, better crystallinity than other conventional sputtering deposition methods. For obtaining better quality deposition ZnO thin films, we will investigate the effects of substrate temperature and RF power on shutter control by a reactive magnetron sputtering using inductively-coupled plasma.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.103-104
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• 2015

정확한 두께와 조성 제어, 훌륭한 재현성의 박막을 형성할 수 있는 Atomic layer deposition 방법으로 증착시킨 ZnO 박막은 여러 분야에 적용될 수 있기 때문에 최근 많은 주목을 받고 있다. ALD-ZnO 박막을 형성하기 위하여 가장 흔히 사용되는 전구체 (precursor)와 반응체 (reactant)는 DEZ(DiethylZinc)와 $H_2O$이다. 그러나 DEZ 전구체를 사용한 ALD-ZnO 박막은 낮은 열적 안정성이 문제로 지적되어져 왔으며, 또한 여러 분야의 적용 및 산업화를 위해서는 높은 증착률, 큰 범위의 전기적 저항, 높은 투과도가 필요로 한다. 본 연구에서는 atomic layer deposition 기법을 통해 열적 안정성을 가진 새로운 전구체인 DEZDMEA ($Et_2Zn:NEtMe_2$)을 사용하여 ZnO 박막을 증착하였다. DEZDMEA ($Et_2Zn:NEtMe_2$) 및 $H_2O$ 주입 시간에 따른 증착률와 전기적 성질, 투과도를 조사하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.82-82
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• 2015

원자층 단위의 정밀 제어가 가능한 원자층 증착법(Atomic Layer Deposition)은 반도체, 디스플레이, 에너지, MEMS 등 다양한 분야에서 점차 그 응용 범위를 확대하고 있다. 응용분야의 확대와 함께, 물질적 측면에서는 산화물 위주의 적용에서 나아가 금속층, 질화물 등 다양한 물질 개발로 이루어져 왔으며, 이는 precursor의 개발과 함께 공정적 측면에서 plasms를 이용한 plasma-enhanced atomic layer deposition (PEALD)의 개발과 함께 이루어져 왔다. 본 발표에서는 ALD 공정에서의 플라즈마의 활용에 대하여 논의하고, ALD 공정에서의 플라즈마 적용에 따른 영향을 살펴보았다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.12
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• pp.909-914
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• 2013

CIGS is one of thin film solar cell and has been studied so much, because of the possibility of low price and high efficiency. Until now, co-evaporation and sputtering were typical method to prepare CIGS absorption layer, and a few company commercialized solar cell by these method. However, non-vacuum process which has been studied for long time has not been progressed, though the merit of low price. Especially, aerosol deposition method has not been reported, because it is difficult to prepare a large quantity of various CIGS powder. In this study, CIGS powder was synthesized by mechanochemical method and CIGS absorption layer was deposited by aerosol deposition method. The thickness of the CIGS layer was controlled by the number of deposition and the surface roughness of it was affected by the amount of flow gas. And, also, I-V curve of it appeared metallic property in the case of 'as deposition'. After heat treatment in Se-rich atmosphere, the electrical property of it changed to a semiconductor. CdS and transparent conduction layer were formed by a typical method on it for solar cell. The efficiency of cell was appeared 0.19%. Though the efficiency was low because of the disharmony in the after-process, it was conformed that CIGS solar cell could be prepared by aerosol deposition.

• Journal of Korea Water Resources Association
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• v.41 no.9
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• pp.885-894
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• 2008

The deposition of solids in combined sewer systems results in a loss of flow capacity that may restrict flow and cause a local flooding and enhanced solids deposition. In order to solve these problems and proper pipe management, estimations of solid loads on land surface in a drainage basin and solid deposition in sewer system due to rainfall are needed but these tasks are very difficult and very expensive. In this study, procedures for estimating solid loads on surface in a drainage basin were applied and analyzed in Gunja drainage basin in Korea. Also, this paper presents the development and application of estimation equation for solid deposition in sewer system due to rainfall based on the solid deposition estimated using MOUSE model. As results, the comparison between estimated and measured solid deposition is difficult due to the absent of measured data, but the estimated values using developed equations show applicability compared with the results of MOUSE model and the application of the other basin. The developed estimation equations can be used usefully for the management of combined sewer system.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.159-159
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• 2011

Among the semiconductor ternary compounds in the I-III-$VI_2$ series, $CulnS_2$ ($CulnSe_2$) are one of the promising materials for photovoltaic applications because of the suitability of their electrical and optical properties. The $CuInS_2$ thin film is one of I-III-$VI_2$ type semiconductors, which crystallizes in the chalcopyrite structure. Its direct band gap of 1.5 eV, high absorption coefficient and environmental viewpoint that $CuInS_2$ does not contain any toxic constituents make it suitable for terrestrial photovoltaic applications. A variety of techniques have been applied to deposit $CuInS_2$ thin films, such as single/double source evaporation, coevaporation, rf sputtering, chemical vapor deposition and chemical spray pyrolysis. This is the first report that $CuInS_2$ thin films have been prepared by Aerosol Jet Deposition (AJD) technique which is a novel and attractive method because thin films with high deposition rate can be grown at very low cost. In this study, $CuInS_2$ thin films have been prepared by Aerosol Jet Deposition (AJD) method which employs a nozzle expansion. The mixed fluid is expanded through the nozzle into the chamber evacuated in a lower pressure to deposit $CuInS_2$ films on Mo coated glass substrate. In this AJD system, the characteristics of $CuInS_2$ films are dependent on various deposition parameters, such as compositional ratio of precursor solution, flow rate of carrier gas, stagnation pressure, substrate temperature, nozzle shape, nozzle size and chamber pressure, etc. In this report, $CuInS_2$ thin films are deposited using the deposition parameters such as the compositional ratio of the precursor solution and the substrate temperature. The deposited $CuInS_2$ thin films will be analyzed in terms of deposition rate, crystal structure, and optical properties.