• Title/Summary/Keyword: SF6

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A Study of Etching Characteristics of the ZnO Thin Film Using a SF6/Ar Inductively Coupled Plasma (SF6/Ar 유도결합플라즈마를 이용한 ZnO 박막의 식각 특성에 관한 연구)

  • Kang, Sung-Chil;Lee, Yoon-Chan;Lee, Jin-Su;Kwon, Kwang-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.12
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    • pp.935-938
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    • 2011
  • The etching characteristics of ZnO and etch selectivities of ZnO to $SiO_2$ in $SF_6$/Ar plasma were investigated using Inductively-coupled-plasma (ICP). The maximum etch rates of ZnO were 6.5 nm/min at $SF_6$(50%)/Ar(50%), Source power (700 W), Bias power (250 W), Working pressure(8 mTorr). The etch rate of ZnO showed a non-monotonic behavior with increasing from 0% to 50% Ar fraction in $SF_6$/ Ar plasma. The plasma diagnostic were characterized using Optical Emission Spectroscopy (OES) analysis measurements.

A Study on Particulate Matter Formed from Plasma Decomposition of SF6 (SF6의 플라즈마 분해로부터 생성된 입자상 물질에 관한 연구)

  • Kim, Seon-Woo;Kim, Jong-Bum;Kim, Jae-Hwan;Kim, Rae-Hyeong;Ryu, Jae-Yong
    • Journal of Korean Society for Atmospheric Environment
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    • v.33 no.4
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    • pp.326-332
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    • 2017
  • $SF_6$ (sulfur hexafluoride) gas has an extremely high global warming potential (GWP). Therefore, there has been an effort to reduce of $SF_6$ its emission into atmosphere. In this study, $SF_6$ was injected into the plasma reactor directly, decomposed particulate matter of $SF_6$ was analyzed. Destruction and removal efficiency (DRE) of $SF_6$ were tested with varying degrees of plasma power and initial concentrations of $SF_6$ (1,000 ppm). This study is conducted with plasma power which are 4.4 kW, 5.5 kW, 6.0 kW, 6.6 kW, 7.6 kW, 8.1 kW and 9.1 kW. It was confirmed through experiment that the decomposition efficiency of $SF_6$ is 100% at 7.6 kW of the plasma power. In addition, the particulate matter is formed as minute particles of which size is $1{\mu}m$ and the main component of particulate matter is identified as $AlF_3$.

The Dependence on the Gas Pressure in SF6 Molecular Gas (SF6분자가스의 압력 의존도)

  • Jeon, Byung-Hoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.9
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    • pp.816-820
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    • 2007
  • We measured the electron drift velocity, W, in 0.5% $SF_6-Ar$ mixture over the E/N range from 30 Td to 300 Td and gas pressure range from 0.1 to 0.5 Torr by the double shutter drift tube with a variable drift distance, and calculated over the same E/N and gas pressure range by using the two-term approximation of the Boltzmann equation. The measured and calculated values at different gas pressure at each E/N was appreciable dependence in the results on the gas pressure.

Diffusion Coefficients for Electrons in SF6-Ar Gas Mixtures by MCS-BEq (MCSBEq에 의한 SF6-Ar혼합기체의 확산계수)

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.64 no.3
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    • pp.125-129
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    • 2015
  • Energy distribution function for electrons in SF6-Ar mixtures gas used by MCS-BEq algorithm has been analysed over the E/N range 30~300[Td] by a two term Boltzmann equation and a Monte Carlo Simulation using a set of electron cross sections determined by other authors experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6-Ar$ mixtures were measured by time-of-flight(TOF) method, The results show that the deduced longitudinal diffusion coefficients and transverse diffusion coefficients agree reasonably well with theoretical for a rang of E/N values. The results obtained from Boltzmann equation method and Monte Carlo simulation have been compared with present and previously obtained data and respective set of electron collision cross sections of the molecules.

Distribution Function and Drift Velocities in Mixtures of SF6 and Ar (SF6-Ar 혼합기체의 전자분포함수와 이동속도)

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.59 no.2
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    • pp.146-150
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    • 2010
  • Distribution Function and Drift velocities for electrons in $SF_6$-Ar mixtures gases used by MCS-BEq algorithm has been analysed over the E/N range 30~300[Td] by a two term Boltzmann equation and by a Monte Carlo simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6$-Ar mixtures were measured by time-of-flight method. The results obtained in this work will provide valuable information on the fundamental behaviors of electrons in weakly ionized gases and the role of electron attachment in the choice of better gases and unitary gas dielectrics or electro negative components in dielectric gas mixtures. The results show that the deduced electron drift velocities agree reasonably well with theoretical for a rang of E/N values.

Electron Energy Distribution Function in SF6-He Gas by Simulation (시뮬레이션에 의한 SF6-He 혼합기체에서 전자에너지 분포함수)

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.63 no.1
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    • pp.19-23
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    • 2014
  • This paper describes the electron transport characteristics in $SF_6$-He gas calculated E/N values 0.1~700[Td] by the Monte Carlo simulation and Boltzmann equation method using a set of electron collision cross sections determined by the authors and the values of electron swarm parameters obtained by TOF method. This study gained the values of the electron swarm parameters such as the electron drift velocity, the electron ionization or attachment coefficients, longitudinal and transverse diffusion coefficients for $SF_6$-He gas at a range of E/N. A set of electron collision cross section has been assembled and used in Monte Carlo simulation to predict values of swarm parameters. The result of Boltzmann equation and Monte Carlo Simulation has been compared with experimental data by Ohmori, Lucas and Carter. The swarm parameter from the swarm study are expected to sever as a critical test of current theories of low energy scattering by atoms and molecules.

Energy Distribution Function for Electrons in SF6+Ar Mixtures Gas used by MCS-BEQ Algorithm (SF6+Ar혼합기체의 MCS-BEq에 의한 전자분포함수)

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.51 no.1
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    • pp.28-32
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    • 2002
  • Energy distribution function for electrons in $SF_6+Ar$ mixtures gas used by MCS-BEq algorithm bas been analysed over the E/N range 30-300[Td] by a two term Boltzmann equation and by a Monte Carlo Simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6+Ar$ mixtures were measured by time-of-flight(TOF) method. The results show that the deduced electron drift velocities, the electron ionization or attachment coefficients, longitudinal and transverse diffusion coefficients and mean energy agree reasonably well with theoretical for a rang of E/N values.

Effects of Surfactant on SF6 Gas Hydrate Formation Rate (가스 하이드레이트 형성 원리를 이용한 SF6 처리 기술에 관한 연구)

  • Lee, Bo-Ram;Lee, Hyun-Ju;Kim, Shin-Ho;Lee, Ju-Dong;Kim, Yang-Do
    • Korean Journal of Materials Research
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    • v.18 no.2
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    • pp.73-76
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    • 2008
  • [ $SF_6$ ] gas has been widely used as an insulating, cleaning and covering gas due to its outstanding insulating feature and because of its inert properties. However, the global warming potential of $SF_6$ gas is extremely high relative to typical global warming gases such as $CO_2$, CFCs, and $CH_4$. For these reasons, it is necessary to separate and collect waste $SF_6$ gas. In this study, the effects of a surfactant (Tween) on the formation rate of $SF_6$ gas hydrates were investigated. The $SF_6$ gas hydrate formation rate increased with the addition of Tween and showed a nearly 6.5 times faster hydrate formation rate with an addition of 0.2 wt.% Tween compared to an addition of pure water. This is believed to be due to the increased solubility of $SF_6$ gas with the addition of the surfactant. It was also found that $SF_6$ gas hydrate in the surfactant solution showed two-stage hydrate formation rates with a formation rate that increased rapidly in the 2nd stage.

Impulse breakdown Characteristics in SF6/N2, Gas Mixtures with a Temperature Variation (온도변화에 따른 SF6/N2 혼합가스의 임펄스 절연파괴특성)

  • Li, Feng;Lee, Bok-Hee
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.22 no.12
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    • pp.79-86
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    • 2008
  • This paper presents the experimental results of impulse breakdown characteristics in $SF_6/N_2$ gas mixtures under a highly non-uniform electric field with a change in temperature. The test temperature ranges from -25[$^{\circ}C$] to 25[$^{\circ}C$]. The processes of impulse preliminary breakdown developments were analyzed by the measurements of current pulse and luminous signals. As a result, the temperature dependance of breakdown voltage for the negative polarity was much stronger than that for the positive polarity. When increasing the temperature, The leader stepping time for the negative polarity was shown to be longer than that for the positive polarity. The results presented in this paper can be used as a useful information in designing the gas insulation lines with prominent ability for lightning surge.

SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge

  • Jeong, Soo-Yeon;Kim, Ji-Hun;Hwang, Yong-Seuk;Kim, Gon-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.4
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    • pp.204-209
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    • 2006
  • Photo Resist (PR) ashing process was carried out with the atmospheric pressure- dielectric barrier discharge (ADBD) using $SF_6/N_2/O_2$. Ashing rate (AR) was sensitive to the mixing ratio of the oxygen and nitrogen of the blower type of ADBD asher. The maximum AR of 5000 A/min was achieved at 2% of oxygen in the $N_2$ plasma. With increasing the oxygen concentration to more than 2% in the $N_2$ plasma, the discharge becomes weak due to the high electron affinity of oxygen, resulting in the decrease of AR. When adding 0.5% of SF6 to $O_2/N_2$ mixed plasma, the PR AR increased drastically to 9000 A/min and the ashed surface of PR was smoother compared to the processed surface without $SF_6$. Carbon Fluorinated polymer may passivate the PR surface. It was also observed that the glass surface was not damaged by the fluorine.