• Title/Summary/Keyword: Room temperature process

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Room-temperature Magnetotransport in Degenerately Doped GaAs:(Mn,Be) by Virtue of the Embedded Ferromagnetic Clusters

  • Yu, Fu-Cheng;Kim, Do-Jin;Kim, Hyo-Jin;Ihm, Young-Eon
    • Journal of Magnetics
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    • v.10 no.3
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    • pp.103-107
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    • 2005
  • Magnetotransport is a prerequisite to realization of electronic operation of spintronic devices and it would be more useful if realized at room temperature. The effects of Be codoping on GaMnAs on magnetotransport were investigated. Mn flux was varied for growth of precipitated GaMnAs layers under a Be flux for degenerate doping via low-temperature molecular beam epitaxy. Magnetotransport as well as ferromagnetism at room temperature were realized in the precipitated GaAs:(Mn,Be) layers. Codoping of Be was shown to promote formation of MnGa clusters, and annealing process further stabilized the cluster phases. The room-temperature magnetic properties of the layers originate from the ferromagnetic clusters of MnGa and MnAs embedded in GaAs. The degenerately doped metallic GaAs matrix allowed the visualization of the magnetotransport through anomalous Hall effect.

Mechanical Properties of Ultrafine Grained 5052 Al Alloy Produced by Cryogenic Rolling Process (극저온 압연으로 제조된 5052 Al 합금의 기계적 성질)

  • Nam W. J
    • Transactions of Materials Processing
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    • v.13 no.8
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    • pp.704-709
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    • 2004
  • The effect of annealing temperature on microstructures and mechanical properties of the 5052 Al sheets rolled 88% reduction at cryogenic temperature was investigated for the annealing temperature of 150 ~ $300^{\circ}C$, in comparison with those rolled at room temperature. The presence of equiaxed grains, whose size is about 200nm in a diameter, was observed in the alloy deformed 88% and annealed $200^{\circ}C$ for an hour. When compared with the deformation at room temperature, the deformation at cryogenic temperature showed the higher strengths and equivalent elongation after annealing at the annealing temperature below $200^{\circ}C$. However, for annealing above $250^{\circ}C$ materials deformed at cryogenic temperature showed the lower strength than those deformed at room temperature. This behavior might be attributed to the higher rate of recrystallization and growth in materials deformed at cryogenic temperature during annealing, due to the lager density of dislocations accumulated during the deformation.

Deep drawing of AZ31 alloy sheet in the warm forming temperature (AZ31 합금의 온간 디프 드로잉에 관한 연구)

  • KIM M. C.;LEE Y. S.;KWON Y. N.;LEE J. H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2004.10a
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    • pp.175-179
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    • 2004
  • Since the formability of AZ31 magnesium alloy is not good in room temperature, it is known that high temperature forming is advantageous. However, many studies are necessary to find the proper forming temperature for Mg alloy. In this study, experimental and FEM analysis are performed to investigate the forming temperature for AZ31 sheet. The deep drawing process of square cup is used in forming experiment and FEA. The investigations are performed in three forming temperature, room temperature, $250^{\circ}C\;and\;400^{\circ}C$. The square cup is well formed in $250^{\circ}C$ forming temperature, on the other hand, the crack and failure is presented in corner section in room and $250^{\circ}C$ forming temperature. The main cause is investigated as the effect of hardening range by the experimental and FEM results.

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Room Temperature Annealing Process of Recoil Fragments in Neutron Irradiated Ammonium Chromate

  • Suh, In-Suck;Kim, Nak-Bae
    • Nuclear Engineering and Technology
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    • v.4 no.4
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    • pp.322-326
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    • 1972
  • The retention of $^{51}$ Cr was studied as chromate after dissolution of irradiated ammonium chromate with reactor exposure time and various storage time at room temperature. The annealing process of ammonium chromate depending on various storage time at room temperature follows first-order kinetics from zero time value to the pseudo-equilibrium value. The retention is increased with reactor irradiation time, also following first-order kinetics.

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Comparative Study of Polymerization Environment for Hydrogel Ophthalmic Lens

  • Kim, Duck-Hyun;Sung, A-Young
    • Korean Journal of Materials Research
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    • v.28 no.12
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    • pp.696-701
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    • 2018
  • This study is carried out to evaluate the commercial feasibility of the room temperature and thermal polymerization method as a lens manufacturing method. All samples are found to be transparent after polymerization, thereby indicating that their physical and surface properties are suitable for hydrogel ophthalmic lenses. The optical and physical properties of the lenses are compared. The water content of the samples that are prepared via a room temperature polymerization process decreases with the addition of MMA as compared to the water content of the samples that are prepared via thermal polymerization. When MMA and DMA are used as an additive for improving functionality, the wettability of the lenses increases. By measuring the AFM, the surface roughness is shown to improve more than MMA and DMA. Therefore, it is judged to be an appropriate process for manufacturing hydrogel lenses with high functionality.

Biological Removal Phosphorus Containing Swine Wastewater (생물학적 처리에 의한 돈사폐수의 인제거)

  • 신남철;박정호
    • Journal of Environmental Health Sciences
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    • v.26 no.4
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    • pp.15-20
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    • 2000
  • The studies of swine wastewater treatment aim to development of process using soil microorganism. Removal rate of swine wastewater containing organic matter was 99 percent in case of high loading rate. Microorganism was devoted to improve the treatment efficiency of the process. According to the result obtained from biological treatment of high loading rate swine wastewater. Hydraulic retention time was 2.3 days in unit process of biological phosphorus removal. BO $D_{rm}$ / $P_{rm}$ ratio was 1122 in room temperature anaerobic process and 355.6 in mesophilic anaerobic process. And then phosphorus removal rate mesophilic anaerobic process was 3 time as much as than room temperature acaerobic process.

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A Study on the Improvement of Drawing Limit in Stainless Butt Products using Warm Deep Drawing Process (온간 성형법을 이용한 스테인리스 버트 제품의 성형한계 향상에 관한 연구)

  • 김승수;나경환;김종호;한창수
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 1995.03a
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    • pp.203-210
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    • 1995
  • The rapid progress of automobile industry has led to a demand for sheet metal products and the new forming technology for complex product is required. In Deep Drawing process of steel sheet, especially stainless steel sheet at room temperture, some intermediate annealing need to be added to lessen strain hardening effect. The present study is concerned with the wram deep drawing of stainless steel sheet. In order to reduce the number of working process. the limit drawing ration is considered as main parameter. In this study, the effect of process variables such a sblank holder force, working temperature and lubricant on limit drawing ration is investigated . Experiments are carried out for the hemisherical and sqare shape at room and warm temperature respectively. The drawing loads and thickness deviation accoring to process variables measured . As the result of apploying those experimental data to the commerical butt product, the number of process can be reduced and good quality of products can be obtained.

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The Simulations on the Formability of AZ31 Magnesium Alloy Sheet in Warm Deep Drawing (AZ31 마그네슘합금판의 온간 디프드로잉 성형성해석)

  • Kang, Dae-Min;Hwang, Jong-Kwan
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.3 no.1
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    • pp.52-58
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    • 2004
  • The material used is a commercial magnesium based alloy AZ31(Mg-3Al-1Zn)sheet with a thickness of 1.0mm. Uniaxial tension tests at warm temperature were carried out to investigate the material characteristics of K, m, and n. A warm drawing process with a local heating and cooling technique was developed to improve formability in this study with results of uniaxial tension tests because it is very difficult for Mg alloy to deform at room temperature by the conventional method. The die and blank holder were heated up, while the punch was water-cooled during deformation. FE simulations considering heat transfer were executed with Mg alloy to investigate the Improvement of deep drawability. For the assessment of improvement those were compare with the results of no considering heat transfer and room temperature.

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A new fabrication process of vanadium oxides($VO_{x}$) thin films showing high TCR and low resistance for uncooled IR detectors

  • Han, Yong-Hee;Kang, Ho-Kwan;Moon, Sung-Uk;Oh, Myung-Hwan;Choi, In-Hoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.558-561
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    • 2001
  • Vanadium oxide ($VO_x$) thin films are very good candidate material for uncooled infrared (IR) detectors due to their high temperature coefficient of resistance (TCR) at room temperature. But, the deposition of $VO_x$ thin films showing good electrical properties is very difficult in micro bolometer fabrication process using sacrificial layer removal because of its low process temperature and thickness of thin films less than $1000{\AA}$. This paper presents a new fabrication process of $VO_x$ thin films having high TCR and low resistance. Through sandwich structure of $VO_{x}(100{\AA})/V(80{\AA})/VO_{x}(500{\AA})$ by sputter method and post-annealing at oxygen ambient, we have achieved high TCR more than $-2%/^{\circ}C$ and low resistance less than $10K\Omega$ at room temperature.

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A new fabrication process of vanadium oxides($VO_{x}$) thin films showing high TCR and low resistance for uncooled IR detectors

  • Han, Yong-Hee;Kang, Ho-Kwan;Moon, Sung-Uk;Oh, Myung-Hwan;Park, In-Hoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.558-561
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    • 2001
  • Vanadium oxide ($VO_{x}$) thin films are very good candidate material for uncooked infrared (IR) detectors due to their high temperature coefficient of resistance (TCR) at room temperature. But, the deposition of $VO_{x}$ thin films showing good electrical properties is very difficult in micro bolometer fabrication process using sacrificial layer removal because of its low process temperature and thickness of thin films less than 1000${\AA}$. This paper presents a new fabrication process of $VO_{x}$ thin films having high TCR and low resistance. Through sandwich structure of $VO_{x}$(100${\AA}$)/V(80${\AA}$)/$VO_{x}$(500${\AA}$) by sputter method and post-annealing at oxygen ambient, we have achieved high TCR more than -2%/$^{\circ}C$ and low resistance less than $10K\Omega$ at room temperature.

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