• Bulletin of the Korean Chemical Society
• /
• 제22권8호
• /
• pp.883-888
• /
• 2001

We describe an ion-surface scattering apparatus newly developed to investigate the reactive scattering process of low-energy alkali-metal ions at surfaces. The apparatus consists of an alkali-metal ion gun that is rotatable by 360°, a quadrupole mass spectrometer (QMS) with an ion energy analyzer, a sample manipulator with a heating-and-cooling stage, and an ultrahigh vacuum (UHV) chamber that houses these components. Preliminary experimental results obtained from the apparatus are presented on angular and energy distributions of the ions scattered from clean Pt(111) and water-adsorbed Pt surfaces.

• 한국염색가공학회지
• /
• 제23권1호
• /
• pp.11-20
• /
• 2011

UV-induced surface copolymerization has been widely applied as a simple, useful and versatile approach to improve the surface properties of textiles. C.I. Reactive Black 5 and acrylic acid (AA) were continuously grafted onto cotton by UV irradiation. The photografting may occur by the copolymerization of AA with the vinylsulfone reactive dye which photochemically converted from the bissulfatoethylsulfone reactive group. The graft yield and color yield were influenced by UV energy, the dye and photoinitiator concentrations, a mole ratio of AA to dye, and pH. The coloration of cotton fabrics having a K/S of 7.0 can be obtained under a UV irradiation energy of 15$J/cm^2$ by the photografting of an aqueous alkaline formulation of 6% dye concentration containing 3% photoinitiator concentration on the weight of monomers, and a 3:1 mole ratio addition of AA to the dye. Furthermore, the photochemically dyed cotton fabrics showed comparable washing (staining) and rubbing fastness to conventional reactive dyeing method except shade change in the wash fastness and light fastness.

• Bulletin of the Korean Chemical Society
• /
• 제27권1호
• /
• pp.53-58
• /
• 2006

A powder of destructive adsorbent was prepared by impregnating Mn and Cu on the surface of amorphous aluminosilicate. It catalytically dimerized tert-butyl mercaptan into di-tert-butyl disulfide on its surface. Turnover of the dimerization was strongly dependent on the surface morphology of the adsorbent, which could be altered by modification of aluminosilicate support. During the process of impregnation, which involved heat treatment at 500 ${^{\circ}C}$, the shape of the pore was preserved, though large fraction of micropores were eliminated. The reactive sites on the surface were poisoned as dimerization products strongly adhered on them. Therefore, high surface area was not always desirable. When the surface was heavily populated with “inkbottled” pores with a narrow entrance in uniform size, heavy poisoning of the reactive sites turned the destructive adsorbents almost useless.

• 한국수소및신에너지학회논문집
• /
• 제14권4호
• /
• pp.321-326
• /
• 2003

We tried to improve the $H_2$-sorption properties of Mg by mechanical grinding under $H_2$ (reactive grinding) with CoO. The sample Mg+10wt.%CoO as prepared absorbs 1.25wt.% hydrogen and the activated sample absorbs 2.39wt.% hydrogen for 60min at 598K, $11.2barH_2$. The reactive grinding of Mg with CoO increases the $H_2$-sorption rates by facilitating nueleation(by creating defects on the surface of the Mg particles and by the additive), by making cracks on the surface of Mg particles and reducing the particle size of Mg and thus by shortening the diffusion distances of hydrogen atoms. Hydriding-dehydriding cycling increases the $H_2$-sorption rates by making cracks on the surface of Mg particles and reducing the particle size of Mg.

• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2007년도 춘계학술대회
• /
• pp.309-312
• /
• 2007

Sputter deposition followed by surface treatment was studied using reactive RF plasma as a method for preparing titanium oxide($TiO_{2}$) films on indium tin oxide(ITO) coated glass substrate for dye-sensitized solar cells(DSSCs). Anatase structure $TiO_{2}$ films deposited by reactive RF magnetron sputtering under the conditions of $Ar/O_{2}$(5%) mixtures, RF power of 600W and substrate temperature of $400^{\circ}C$ were surface-treated by inductive coupled plasma(ICP) with $Ar/O_{2}$ mixtures at substrate temperature of $400^{\circ}C$, and thus the films were applied to the DSSCs, The $TiO_{2}$ Films made on these exhibited the BET specific surface area of 95, the pore volume of $0.3cm^{2}$ and the TEM particle size of ${\sim}25$ nm. The DSSCs made of this $TiO_{2}$ material exhibited an energy conversion efficiency of about 2.25% at $100mW/cm^{2}$ light intensity.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.325-325
• /
• 2011

Very initial stage of oxidation process of Si (001) surface at room temperature (300 K) and high temperature (1200 K) was investigated using large scale molecular dynamics simulation. Reactive force field potential [1] was used for the simulation owing to its ability to handle charge variation as well as breaking and forming of bonds associated with the oxidation reaction. The results show that oxygen molecules adsorb dissociatively or otherwise leave the silicon surface. Initial position and orientation of oxygen molecule above the surface play important role in determining final state and time needed to dissociate. At 300 K, continuous transformation of ion $Si^+$ (or suboxide Si2O) to $Si2^+$ (SiO), $Si3^+$ (Si2O3) and finally to $Si4^+$ (SiO2) clearly observed. High temperature silicon surface provide heat energy that enable oxygen atom to penetrate into deeper silicon surface. The heat energy also retards adsorption process. As a result, transformation of ion $Si^+$ is impeded at 1200 K.

• Bulletin of the Korean Chemical Society
• /
• 제32권2호
• /
• pp.389-398
• /
• 2011

Although the currently available surface spectroscopic techniques provide powerful means of studying atoms and simple molecules on surfaces, the identification of complex molecules and functional groups is a major concern in surface analysis. This article describes a recently developed method of surface molecular analysis based on reactive ion scattering (RIS) of low energy (< 100 eV) $Cs^+$ beams. The RIS method can detect surface molecules via a mechanism in which a $Cs^+$ projectile picks up an adsorbate from the surface during the scattering process. The basic principles of the method are reviewed and its applications are discussed by showing several examples from studies of molecules and their reactions on surfaces.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
• /
• pp.155-155
• /
• 2000

Adsorption of alkali metals on a silicon surface has attracted much attention due to its importance in metal-semiconductor interface technology, In particular, the bonding nature of alkali metal to silicon substrate has been a focus of fundamental research efforts. We examined the adsorbed layer of Cs on a Si(111)-(7$\times$) surface by reactive ion scattering (RIS) of hyperthermal Cs+ beams. RIS from a Cs-adsorbed surface gives rise to Cs, representing pickup of surface Cs by Cs projectile. The Cs intensity is proportional to surface coverage of Cs at a high substrate temperature (473 K), while it varies anomalously with Cs coverage at low temperatures (130-170 K). This observation indicates that RIS selectively detects metallic Cs on surface, but discriminates ionic Cs. Transition from ionic to metallic Cs adlayer is driven by thermal diffusion of Cs and their clustering process.

• Bulletin of the Korean Chemical Society
• /
• 제21권11호
• /
• pp.1095-1100
• /
• 2000

we have proposed a three-dimensional GLE approach to gas-surface reactive scattering, model H + H $${\rightarrow}$H_2/Si(100)-(2$ ${\times}$1) system, and the implementation of 3D GLE method on the hydrogen on silicon surface has been presented. The formalism and algori thm of the 3D GLE are worked properly in the reactive scattering system. The calculated normal mode frequencies of surface vibrations were almost identical to previous harmonic slab calculations. The reaction probabilities were calculated for two energies. The calculations show that a very large amount of energy is transferred in surface in low energy scattering. Three different types of reaction mechanisms has been observed, which can not be shown in flat and rigid surface models. Further work on the reaction mechanisms and calculations of the vibrational and rotation distributions of products is in progress. The results will be reported elsewhere soon.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.211-211
• /
• 2012

The electrical loss of the photo-generated carriers is dominated by the recombination at the metal- semiconductor interface. In order to enhance the performance of the solar cells, many studies have been performed on the surface treatment with passivation layer like SiN, SiO2, Al2O3, and a-Si:H. In this work, Al2O3 thin films were investigated to reduce recombination at surface. The Al2O3 thin films have two advantages, such as good passivation properties and back surface field (BSF) effect at rear surface. It is usually deposited by atomic layer deposition (ALD) technique. However, ALD process is a very expensive process and it has rather low deposition rate. In this study, the ICP-assisted reactive magnetron sputtering method was used to deposit Al2O3 thin films. For optimization of the properties of the Al2O3 thin film, various fabrication conditions were controlled, such as ICP RF power, substrate bias voltage and deposition temperature, and argon to oxygen ratio. Chemical states and atomic concentration ratio were analyzed by x-ray photoelectron spectroscopy (XPS). In order to investigate the electrical properties, Al/(Al2O3 or SiO2,/Al2O3)/Si (MIS) devices were fabricated and characterized using the C-V measurement technique (HP 4284A). The detailed characteristics of the Al2O3 passivation thin films manufactured by ICP-assisted reactive magnetron sputtering technique will be shown and discussed.