• Title/Summary/Keyword: Reactive nitrogen

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Rear Surface Passivation of Silicon Solar Cell with AlON Layer by Reactive Magnetron Sputtering

  • Moon, Sun-Woo;Kim, Eun-Kyeom;Park, Won-Woong;Kim, Kyung-Hoon;Kim, Sung-Min;Kim, Dong-Hwan;Han, Seung-Hee
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.430-430
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    • 2012
  • The surface recombination velocity of the silicon solar cell could be reduced by passivation with insulating layers such as $SiO_2$, SiNx, $Al_2O_3$, a-Si. Especially, the aluminium oxide has advantages over other materials at rear surface, because negative fixed charge via Al vacancy has an additional back surface field effect (BSF). It can increase the lifetime of the hole carrier in p-type silicon. The aluminium oxide thin film layer is usually deposited by atomic layer deposition (ALD) technique, which is expensive and has low deposition rate. In this study, ICP-assisted reactive magnetron sputtering technique was adopted to overcome drawbacks of ALD technique. In addition, it has been known that by annealing aluminium oxide layer in nitrogen atmosphere, the negative fixed charge effect could be further improved. By using ICP-assisted reactive magnetron sputtering technique, oxygen to nitrogen ratio could be precisely controlled. Fabricated aluminium oxy-nitride (AlON) layer on silicon wafers were analyzed by x-ray photoelectron spectroscopy (XPS) to investigate the atomic concentration ratio and chemical states. The electrical properties of Al/($Al_2O_3$ or $SiO_2/Al_2O_3$)/Si (MIS) devices were characterized by the C-V measurement technique using HP 4284A. The detailed characteristics of the AlON passivation layer will be shown and discussed.

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Effects of Ichungwhan on the Aging Process (이정환(二精丸)이 노화과정에 미치는 영향)

  • Jeong, Ji-Cheon;Hyun, Min-Kyung
    • The Journal of Internal Korean Medicine
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    • v.26 no.2
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    • pp.379-389
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    • 2005
  • Objectives: It is well known that aging and aging-related diseases are linked to the increased level of oxidative stress caused by reactive oxygen species(ROS) and reactive nitrogen species(RNS). Nonprotein-SH decreases during aging, while substances such as ROS, nitric oxide(NO), peroxynitrite($ONOO^-$), myeloperoxidase(MPO), and dityrosine show a significant increase. This study investigated the effect of Ichungwhan on the aging process by examining its effect on the generation of the above-mentioned substances. Methods: Four comparison groups of SD rats were used. They were 6 month-old rats, 24 month-old rats, and 24 month-old rats fed with food containing 0.1% and 0.3% of Ichungwhan extract. The amount of NO, $ONOO^-$, and ROS in the rats' kidneys were examined using a fluorescence microplate reader. The reagents used for this purpose include: dihydrorhodamine 123 (DHR 123), 2',7' -dichlorodihydrofluorescein, diacetate(DCFDA), and 4,5-diaminofluorescein(DAF-2). A spectrophotometer was used to investigate the reactivity of nonprotein-SH and myeioperoxidase(MPO), using reagents such as trichloroacetic acid(TCA) and tetramethylbenzidine(TMB). The amounts of MPO protein and dityrosine were measued by western blot. Results: The observed effects of Ichungwhan on rats were as follows: increase of nonprotein-SH; effective decrease of RNS level by suppression of the generation system of $ONOO^-$ and NO; decrease of ROS level; decrease of the MPO reactivity and the subsequent reduction of amount of MPO protein; retardation of dityrosine formation. It can be hypothesized, therefore, that Ichungwhan affects both the earlier and later phases of the molecular inflammatory process, and retards the aging process. Conclusions: Empirical evidence in this study supports a role for Ichungwhan in generation mechanisms of aging process-linked substances ROS, NO, $ONOO^-$, nonprotein-SH, MPO and dityrosine. Affects contrary to the aging process observed in rats beg further empiricism to investigate potential application of Ichungwhan as a medication for age-related diseases in humans.

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Growth behavior of Ti-Al-V-N Films Prepared by Dc Reactive Magnetron Sputtering (DC Reactive Magnetron Sputtering법에 의한 Ti-Al-V-N 박막의 성장거동)

  • Sohn, Yong-Un;Chung, In-Wha;Lee, Young-Ki
    • Korean Journal of Materials Research
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    • v.9 no.7
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    • pp.688-694
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    • 1999
  • Ti-6Al-4V-N films have been grown onto glass substrates by dc reactive magnetron sputtering from a Ti-6Al-4V-N alloy target at different nitrogen partial pressure, input powers and sputtering times. The influence of various sputtering conditions on structural properties of Ti-6Al-4V-N films was investigated by measuring their X-ray diffraction. The quaternary Ti-6Al-4V-N film is crystallizing in a face centered cubic TiN structure, the lattice parameter is smaller than the TiN parameter as titanium atoms of the TiN lattice are replaced by aluminum and vanadium atoms. The films show the (111) preferred orientation and the (111) peak intensity decreases as the nitrogen partial pressure is increased, but the intensity increases as the sputtering time is increased. The deposition rate and the grain size are alto related with the variation of various sputtering conditions.

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Preventive Effects of GLEDITSIAE SPINA Ethanol Extracts and its Fraction on Oxidative Stress and Human LDL Oxidation (GLEDITSIAE SPINA 에탄올 추출물 및 분획물이 산화적 스트레스와 human LDL 산화억제에 미치는 영향)

  • Kim, Hyuck;Lee, Min-Ja;Lee, Hye-Sook;Jung, Hyun-Jung;Choi, Sung-Kyu;Lee, Chang-Sub;Park, Won-Hwan
    • Journal of Physiology & Pathology in Korean Medicine
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    • v.23 no.3
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    • pp.631-638
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    • 2009
  • GLEDITSIAE SPINA (GS) has been used as folk remedies traditionally for treatment of antiphlogistic and antifebrile agents. An ethanol extract and its fraction of GS were assessed to determine the mechanism of its antioxidant activity. Also, inhibitory effect of extract from GS and its fraction measuring the inhibitory effect on $Cu^{2+}$-induced human low-density lipoprotein (LDL) oxidation. GS ethanol extract and its fraction exhibited a concentration-dependent reactive oxygen species (ROS) and reactive nitrogen species (RNS) scavenging activities, including trolox equivalent antioxidant capacity (TEAC), OPPH radical, superoxide anion, hydroxyl radicals, peroxynitrite and nitric oxide, using different assay systems. Furthermore, the GS ethanol extract and its fraction showed dose-dependent protection of LDL oxidation induced by $CuSO_4$. In addition, the GS ethanol extract and its fraction were characterized as containing a high amount of total phenolics. These results suggest that GS ethanol extract and its fraction might be helpful for preventing oxidative stress and protecting LDL oxidation.

Model Development for the Nitrification-Denitrification Coupled Process

  • Lee, Mee-Sun;Lee, Kang-Kun
    • Proceedings of the Korean Society of Soil and Groundwater Environment Conference
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    • 2002.04a
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    • pp.195-198
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    • 2002
  • Nitrogen pollution in urban and rural groundwater is a common problem and poses a major threat to drinking water supplies based on groundwater. In this work, the kinetics of nitrification-denitrification coupled reactions are modeled and new reaction modules for the RT3D code (Clement, 1997) describing the fate and transport nitrogen species, dissolved oxygen, dissolved organic carbon, and biomass are developed. The proposed nitrogen transformations and transport model showed very good match with results of a conceptual model. However, the model simulation results for the major reactive species should be tested for validation using experimental and field data.

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The Sheet Resistance Properties of Tungsten Nitride Thin films for Intergrated Circuit (IC소자용 질화 텅스텐 박막의 면저항 특성)

  • 이우선;정용호;김남오;정종상;유병수
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.94-97
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    • 1997
  • We investigated the sheet resistance properties of tungsten nitride thin films deposited by RF and DC sputtering system. It deposited at various conditions that determine the sheet resistance. The properties of the sheet resistance of these films were measured under various conditions. Sheet resistance analysed under the flow rate of the argon gas and contents of nitrogen from nitrogen-argon gas mixtures. We found that these sheet resistance were largely depend on the temperature of substrate, gas flow rate and RF power. Very high and low sheet resistance of tungsten films obtained by DC sputtering. As the increase of contents of nitrogen gas obtained from nitrogen-argon gas mixture, tungsten nitride thin films deposited by the reactive DC sputtering and the sheet resistance of these films were increased.

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A study on Improving the Dyeability of BTCA treated Cotton Fabrics Containing Nitrogenous Cationic Additives (BTCA처리 면직물의 질소계양이온화제 첨가에 의한 염색성 향상에 관한 연구)

  • 박은경;유효선
    • Journal of the Korean Society of Clothing and Textiles
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    • v.24 no.6
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    • pp.819-827
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    • 2000
  • The purpose of this study is to produce cotton fabric having improved dyeability and colorfastness as well as retaining the desirable durable press property. When cotton fabric was treated with additives, nitrogen content was increased as the additive concentration was increased. DP ratings and wrinkle recovery properties of BTCA treated cotton fabrics were greatly increased. But DP rating was lowered slightly by adding additives and wrinkle recovery property was decreased with the increase of additive concentration. Tensile strength was decreased by BTCA treatment but increased as additive concentration was increased. Various BTCA/additive treatments produced great affinity for reactive and acid dyes when dyebaths were adjusted at pH 3. It was showed that dyeability was increased as additive concentration was increased. The most effective additive for improving the dyeing properties of the crosslinked cotton was TEAㆍHCl. In case of reactive dye, there was almost no improvement on the dyeability of finished cotton by adding salt. Color fastness to washing and light of finished and dyed cotton were low except for the washfastness of reactive dye. Dyeing the BTCA/additive treated cotton fabrics with reactive dye had no effect on the physical properties.

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Enhancement of Nitric Oxide with nonthermal plasma jet and its effect on Escherichia coli inactivation

  • Shaw, Priyanka;Kumar, Naresh;Attri, Pankaj;Kwak, Hyong Sin;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.159-159
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    • 2015
  • A new approach for antimicrobial is based on the overproduction of reactive nitrogen species (RNS), especially; nitric oxide (NO) and peroxinitrite (ONOO-) are important factors to deactivate the bacteria. Recently, non-thermal atmospheric pressure plasma jet (APPJ) has been frequently used in the field of microbial sterilization through the generation of different kinds of RNS/ROS species. However, in previous study we showed APPJ has combine effects ROS/RNS on bacterial sterilization. It is not still clear whether this bacterial killing effect has been done through ROS or RNS. We need to further investigate separate effect of ROS and RNS on bacterial sterilization. Hence, in this work, we have enhanced NO production, especially; by applying a 1% of HNO3 vapour to the N2 based APPJ. In comparison with nitrogen plasma with inclusion of water vapour plasma, it has been shown that nitrogen plasma with inclusion of 1% of HNO3 vapour has higher efficiency in killing the E. coli through the high production of NO. We also investigate the enhancement of NO species both in atmosphere by emission spectrum and inside the solution by ultraviolet absorption spectroscopy. Moreover, qPCR analysis of oxidative stress mRNA shows higher gene expression. It is noted that 1% of HNO3 vapour plasma generates high amount of NO for killing bacteria.

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Comparative assessment on the influences of effluents from conventional activated sludge and biological nutrient removal processes on algal bloom in receiving waters

  • Park, Chul;Sheppard, Diane;Yu, Dongke;Dolan, Sona;Eom, Heonseop;Brooks, Jane;Borgatti, Douglas
    • Environmental Engineering Research
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    • v.21 no.3
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    • pp.276-283
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    • 2016
  • The goal of this study was to evaluate the effect of effluents from conventional activated sludge (CAS) and biological nutrient removal (BNR) processes on algal bloom in receiving waters. We made multiple effluent sampling from one CAS and two BNR facilities, characterized their effluents, and conducted bioassay using river and ocean water. The bioassay results showed that CAS effluents brought similar productivity in both river and ocean water, while BNR effluents were more reactive and productive in ocean water. Unexpectedly, nitrogen-based biomass yields in ocean water were up to six times larger for BNR effluents than CAS effluent. These results indicated that nitrogen in BNR effluents, although its total concentration is lower than that of CAS effluent, is more reactive and productive in ocean water. The ocean water bioassay further revealed that effluents of BNR and CAS led to considerably different phytoplankton community, indicating that different characteristics of effluents could also result in different types of algal bloom in receiving waters. The present study suggests that effects of upgrading CAS to BNR processes on algal bloom in receiving waters, especially in estuary and ocean, should be further examined.

Preparation of AlN thin films on silicon by reactive RF magnetron sputtering (RF 마그네트론 스퍼터링을 이용한 Si 기판상의 AlN 박막의 제조)

  • 조찬섭;김형표
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.2
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    • pp.17-21
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    • 2004
  • Aluminum nitride(AlN) thin films were deposited on silicon substrate by reactive RF magnetron sputtering without substrate heating. We investigated the dependence of some properties for AlN thin film on sputtering conditions such as working pressure, $N_2$ concentration and RF power. XRD, Ellipsometer and AES has been measured to find out structural properties and preferred orientation of AlN thin films. Deposition rate of AlN thin film was increased with an increase of RF power and decreased with an increase of $N_2$ concentration. AES in-depth measurements showed that stoichiometry of Aluminium and Nitrogen elements were not affected by $N_2$ concentration. It has shown that low working pressure, low $N_2$ concentration and high RF power should be maintained to deposit AlN thin film with a high degree of (0002) preferred orientation.

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