• Title/Summary/Keyword: Ramp-edge type junction

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Large Tunneling Magnetoresistance of a Ramp-type Junction with a SrTiO3 Tunneling Barrier

  • Lee, Sang-Suk;Yoon, Moon-Sung;Hwang, Do-Guwn;Rhie, Kung-Won
    • Journal of Magnetics
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    • v.8 no.2
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    • pp.89-92
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    • 2003
  • The tunneling magnetoresistance (TMR) of a ramp-edge type junction with SrTiO$_3$barrier layer has been stud-ied. The samples with a structure of glass/NiO(600${\AA}$)/Co(100${\AA}$)/SrTiO$_3$(400 ${\AA}$)/SrTiO$_3$(20-100${\AA}$)/NiFe(100${\AA}$) were prepared by the sputtering and etched by the electron cyclotron (ECR) argon ion milling. Nonlinear I-V characteristics were obtained from a ramp-type tunneling junctions, having the dominant difference between two different external magnetic fields (${\pm}$100 Oe) perpendicular to the junction edge line. In the SrTiO$_3$ barrier thickness of 40${\AA}$, the TMR was 52.7% at a bias voltage of -50 mV The bias voltage dependence of resistance and TMR in a ramp-type tunneling junction was similar with those of the layered TMR junction.

Fabrication and Characterization of High Temperature in-situ Ramp-edge Type Josephson Junction (고온초전도체 in-situ ramp-edge 형태의 조셉슨 접합 제작 및 특성)

  • Hur, Yun-Sung;Kim, Jin-Tae;Hwang, Yun-Seok;Lee, Sun-Gul;Park, Gwang-Seo;Kim, In-Seon;Park, Yong-Ki;Park, Jong-Chul
    • Korean Journal of Materials Research
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    • v.8 no.3
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    • pp.263-267
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    • 1998
  • In this study, we have fabricated in-situ multilayer $YBa_2Cu_3O_{7-\delta}$/$SrTiO_{3}$/$YBa_2Cu_3O_{7-\delta}$ ramp edge type junctions by using a metal mask and pulsed laser deposition method and studied the junction properties. The junctions showed RSJ-like I-V characteristics. The normal state junction resistance R, of $18 \omega$ was nearly constant with temperature. The dc-SQUID sensors fabricated with the junctions show a sensitivity that transfer function dV/$d\Phi$)~$22\mu$V/$\Phi_{0}$, indicating that the in-situ ramp edge type junction is potentially useful for sensor application.

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Tunneling Magnetoresistance of a Ramp-edge Type Junction With Si3N4 Barrier (Si3N4장벽층을 이용한 경사형 모서리 접합의 터널링 자기저항 특성)

  • Kim, Young-Ii;Hwang, Do-Guwn;Lee, Sang-Suk
    • Journal of the Korean Magnetics Society
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    • v.12 no.6
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    • pp.201-205
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    • 2002
  • The tunneling magnetoresistance (TMR) of a ramp-edge type junction has been studied. The samples with a structure of NiO(60)/Co(10)/NiO(60)/Si$_3$N$_4$(2-6)/NiFe(10) (nm) were prepared by the sputtering and etched by the electron cyclotron (ECR) argon ion milling. Nonlinear I-V characteristics was obtained from a ramp-type tunneling junctions having the dominant difference between zero and +90 Oe perpendicular to the junction edge line. The voltage dependence of TMR was stable up to a bias volt of $\pm$10 V with a TMR ratio of about -10%, which may be very peculiar magnetic tunneling properties with asymmetric tunneling process between wedge Co pinned layer and NiFe free layer.

Demonstration of rapid single-flux-quantum RS flip-flop using YBCO/Co-YBCO/YBCO ramp-edge Josephson junction with and without ground plane (YBCO/Co-YBCO/YBCO ramp-edge 접합을 이용한 RS flip-flop 회로 제작과 동작)

  • Kim, Jun-Ho;Sung, Geon-Yong;Park, Jong-Hyeok;Kim, Chang-Hun;Jung, Gu-Rak;Hahn, Taek-Sang;Kang, Jun-Hui
    • 한국초전도학회:학술대회논문집
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    • v.10
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    • pp.189-192
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    • 2000
  • We fabricated rapid single-flux-quantum RS flip-flop circuits with and without Y$_1$Ba$_2$Cu$_3$O$_{7-{\delta}}$(YBCO) ground plane. The circuit consists of SNS-type ramp-edge Josephson junctions that have cobalt-doped YBCO and Sr$_2$AITaO$_6$(SAT) for barrier layer and insulator layer, respectively. The fabricated Josephson junction showed a typical RSJ-like current-voltage(I-V) characteristics above 50K. We sucessfuly demonstrated RS flip-flop at temperatures around 50K. The RS flip-flop fabricated on ground plane showed more definite set and reset state in voltage-flux(V-${\phi}$) modulation curve for read SQUID, which may be attributed to a shielding effect of the YBCO ground plane.

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HTS Josephson Junctions with Deionized Water Treated Interface (증류수 계면처리를 이용한 고온초전도체 죠셉슨 접합 제작)

  • Moon, S.H.;Park, W.K.;Kye, J.I.;Park, J.D.;Oh, B.
    • Progress in Superconductivity
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    • v.2 no.2
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    • pp.76-80
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    • 2001
  • We have fabricated YBa$_2$Cu$_3$$O_{7-x}$ (YBCO) ramp-edge Josephson junctions by modifying ramp edges of the base electrodes without depositing any artificial barrier layer. YBa$_2$Cu$_3$O/7-x//SrTiO$_3$ (YBCO/STO) films were deposited on SrTiO$_3$(100) by on-axis KrF laser deposition. After patterning the bottom YBCO/STO layer, the ramp edge was cleaned by ion-beam and then reacted with deionized water under various conditions prior to the deposition of counter-electrode layers. The top YBCO/STO layer was deposited and patterned by photolithography and ion milling. We measured current-voltage (I-V) characteristics, magnetic field modulation of the critical current at 77 K. Some showed resistively shunted junction (RSJ)-type I-V characteristics, while others exhibited flux-flow behaviors, depending on the dipping time of the ramp edge in deionized water. Junctions fabricated using optimized conditions showed fairly uniform distribution of junction parameters such as I$_{c}$R$_{n}$ values, which were about 0.16 mV at 77 K with 1$\sigma$~ 24%. We made a dc SQUID with the same deionized water treated junctions, and it showed the sinusoidal modulation under applied magnetic field at 77 K. 77 K.

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Tunneling Magnetoresistance of a Ramp Edge Junction with $SrTiO_3$ Barrier Layer ($SrTiO_3$ 장벽층을 이용한 경사형 모서리 접합의 터널링 자기저항 특성연구)

  • Lee, Sang-Suk;Kim, Young-Il;Hwang, Do-Guwn;Kim, Sun-Wook;Kungwon Rhie;Rhee, Jang-Roh
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.174-175
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    • 2002
  • A ramp-type tunneling magnetoresistance (TMR) junction having structure NiO(60 nm)/pinned Co(10 nm)MiO(60 nm)/barrier SrTiO$_3$(2-10 nm)/free NiFe(10 nm) with the 15 degree slope was investigated. We obtained nonlinear I(V) characteristics for ramp-type tunneling junctions that have distinctive difference with and without applied magnetic field. In the barrier SrTiO$_3$ thickness of 4 nm, the TMR was about 52% at a bias voltage of 50 mV. (omitted)

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