• Title/Summary/Keyword: RF 소자

Search Result 704, Processing Time 0.027 seconds

InGaN/GaN Blue LED device 제조시 ALD (Atomic Layer Deposition) 방법으로 증착된 Al2O3 Film의 Passivation 효과

  • Lee, Seong-Gil;Bang, Jin-Bae;Yang, Chung-Mo;Kim, Dong-Seok;Lee, Jeong-Hui
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.08a
    • /
    • pp.211-212
    • /
    • 2010
  • GaN 기반의 상부발광형 LED는 동작되는 동안 생기는 전기적 단락, 그리고 칩 위의 p-형 전극과 n-형 전극 사이에 생기는 누설전류 및 신뢰성 확보를 위하여 칩 표면에 passivation 층을 형성하게 된다. SiO2, Si3N4와 같은 passivation layers는 일반적으로 PECVD (Plasma Enhanced Chemical Vapor Deposition)공정을 이용한다, 하지만 이는 공정 특성상 plasma로 인한 damage가 유발되기 때문에 표면 누설 전류가 증가 한다. 이로 인해 forward voltage와 reverse leakage current의 특성이 저하된다. 본 실험에서는 원자층 단위의 박막 증착으로 인해 PECVD보다 단차 피복성이 매우 우수한 PEALD(Plasma Enhanced Atomic Layer Deposition)공정을 이용하여 Al2O3 passivation layer를 증착한 후, 표면 누설전류와 빛의 출력 특성에 대해서 조사해 보았다. PSS (patterned sapphire substrate) 위에 성장된 LED 에피구조를 사용하였고, TCP(Trancformer Copled Plasma)장비를 사용하여 에칭 공정을 진행하였다. 이때 투명전극을 증착하기 위해 e-beam evaporator를 사용하여 Ni/Au를 각각 $50\;{\AA}$씩 증착한 후 오믹 특성을 향상시키기 위하여 $500^{\circ}C$에서 열처리를 해주었다. 그리고 Ti/Au($300/4000{\AA}$) 메탈을 사용하여 p-전극과 n-전극을 형성하였다. Passivation을 하지 않은 경우에는 reverse leakage current가 -5V 에서 $-1.9{\times}10-8$ A 로 측정되었고, SiO2와 Si3N4을 passivation으로 이용한 경우에는 각각 $8.7{\times}10-9$$-2.2{\times}10-9$로 측정되었다. Fig. 1 에서 보면 알 수 있듯이 5 nm의 Al2O3 film을 passivation layer로 이용할 경우 passivation을 하지 않은 경우를 제외한 다른 passivation 경우보다 reverse leakage current가 약 2 order ($-3.46{\times}10-11$ A) 정도 낮게 측정되었다. 그 이유는 CVD 공정보다 짧은 ALD의 공정시간과 더 낮은 RF Power로 인해 plasma damage를 덜 입게 되어 나타난 것으로 생각된다. Fig. 2 에서는 Al2O3로 passivation을 한 소자의 forward voltage가 SiO2와 Si3N4로 passivation을 한 소자보다 각각 0.07 V와 0.25 V씩 낮아지는 것을 확인할 수 있었다. 또한 Fig. 3 에서는 Al2O3로 passivation을 한 소자의 output power가 SiO2와 Si3N4로 passivation을 한 소자보다 각각 2.7%와 24.6%씩 증가한 것을 볼 수 있다. Output power가 증가된 원인으로는 향상된 forward voltage 및 reverse에서의 leakage 특성과 공기보다 높은 Al2O3의 굴절률이 광출력 효율을 증가시켰기 때문인 것으로 판단된다.

  • PDF

Effects of hydrogen addition during sputtering on the electrical properties of AIN insulating films for MIS device application (스퍼터링시 수소첨가가 MIS소자용 AIN절연박막의 전기적특성에 미치는 영향)

  • Kwon, Jung-Youl;Lee, Hwan-Chul;Lee, Heon-Yong
    • Transactions of the Korean hydrogen and new energy society
    • /
    • v.10 no.1
    • /
    • pp.59-69
    • /
    • 1999
  • AlN thin films were fabricated by reactive sputtering for the application of MIS devices with Al/AlN/Si structure. It has investigated the surface morphology change, I-V characteristics, C-V characteristics, and chemical composition of AlN films with the intriducing time of hydrogen on the fixed deposition condition(RF power: 150W, sputtering pressure: 5mTorr, flow rate ratio of $Ar/N_2=1$, hydrogen concentration: 5%). By addition of the hydrogen the deposition rate decreased drastically whereas the surface morphology changed little. It has been found from the analysis of I-V and C-V characteristics curves that the films deposited with hydrogen addition in initial stage had lower leakage current density, lower flat band voltage and hystersis profile when compared with those with hydrogen addition in last stage. The oxygen concentration in AlN films decreased with addition of hydrogen gas, which suggesting a profitable role in the insulation and C-V characteristics of AlN films.

  • PDF

Nano-size Study of Surface-modified Ag Anode for OLEDs (표면처리에 의한 유기발광소자(OLED)용 Ag 전극의 Nano-size 효과 연구)

  • Kim, Joo-Young;Kim, Soo-In;Lee, Kyu-Young;Kim, Hyeong-Keun;Jun, Jae-Hyeok;Jeong, Yun-Jong;Kim, Mu-Chan;Lee, Jong-Rim;Lee, Chang-Woo
    • Journal of the Korean Vacuum Society
    • /
    • v.21 no.1
    • /
    • pp.12-16
    • /
    • 2012
  • Although silver is used for T-OLED (Top emitting organic Light-Emitting Diode) as reflective anode, it is not an ideal material due to its low work function. Thus, we study the effect of annealing and atmospheric pressure plasma treatment on Ag film that increases its work function by forming the thin silver oxide layer on its surface. In this study, we deposited silver on glass substrate using RF sputtering. Then we treated the Ag samples annealing at $300^{\circ}C$ for 30 minutes in atmosphere or treating the atmospheric plasma treatment for 30, 60, 90, 120s, respectively. We measured the change of the mechanical properties and the potential value of surface with each one at a different treatment type and time. We used nano-indenter system and KPFM (Kelvin Probe Force Microscopy). KPFM method can be measured the change of surface potential. The nanoindenter results showed that the plasma treatment samples for 30s, 120s had very low elastic modulus, hardness and Weibull modulus. However, annealed sample and plasma treated samples for 60s and 90s had better mechanical properties. Therefore, plasma treatment increases the uniformity thin film and the surface potential that is very effective for the performace of T-OLED.

Fabrication and characterization of the 0.25 ${\mu}m$ T-shaped gate P-HEMT and its application for MMIC low noise amplifier (0.25 ${\mu}m$ T형 게이트 P-HEMT 제작 및 특성 평가와 MMIC 저잡음 증폭기에 응용)

  • Kim, Byung-Gyu;Kim, Young-Jin;Jeong, Yoon-Ha
    • Journal of the Korean Institute of Telematics and Electronics D
    • /
    • v.36D no.1
    • /
    • pp.38-46
    • /
    • 1999
  • o.25${\mu}m$ T-shaped gate P-HEMT is fabricated and used for design of X0band three stage monolithic microwave integrated circuit(MMIC) low noise amplifier(LNA). The fabricated P-HEMT exhibits an extrinsis transconductance of 400mS/mm and a drain current of 400mA/mm. The RF and noise characteristics show that the current gain cut off frequency is 65GHz and minimum noise figure(NFmin) of 0.7dB with an associated gain of 14.8dB at 9GHz. In the design of the three stage LNA, we have used the inductive series feedback circuit topology with the short stub. The effects of series feedback to the noise figure, the gain, and the stability have been investigated to find the optimal short stub length. The designed three staage LNA showed a gain of above 33dB, a noise figure of under 1.2dB, and ainput/output return loss of under 15dB and 14dB, respectively. The results show that the fabricated P-HEMT is very suitable for a X-band LNA with high gain.

  • PDF

Characteristics of a-Si:H Multilayer for Contact-type Linear Image Sensor (밀착형 1차원 영상감지소자를 위한 a-Si:H 다층막의 특성)

  • Oh, Sang-Kwang;Kim, Ki-Wan;Choi, Kyu-Man
    • Journal of Sensor Science and Technology
    • /
    • v.1 no.1
    • /
    • pp.5-12
    • /
    • 1992
  • We have fabricated a-Si:H multilayer for contact-type linear image sensor by means of RF glow discharge decomposition method. The ITO/i-a-Si:H/Al structure has relatively high dark current due to indium diffusion and carrier injection from both electrodes, resulting in low photocurrent to dark current. To suppress the dark current and to enhance interface electric field between ITO and i-a-Si:H film we have fabricated ITO/insulator/i-a-S:H/p-a-S:H/Al multilayer film with blocking structure. The photocurrent of ITO/$SiO_{2}(300{\AA})$/i-a-Si:H/p-a-Si:H($1500{\AA}$)/Al multilayer sensor with 5V bias voltage became saturated at about 20nA under $20{\mu}W/cm^{2}$ light intensity, while the dark current was less than 0.1nA. To increase the light generation efficiency we have adopted ITO/$SiO_{x}N_{y}(300{\AA})$/i-a-Si:H/p-a-Si:H($1500{\AA}$)/Al structure, showing photocurrent of 30nA and dark current of 0.08nA with 5V bias voltage. Also the spectral photosensitivity of the multilayer was enhanced for short wavelength visible region of 560nm, compared with that of the a-Si:H monolayer of 630nm. And its photoresponse time was about 0.3msec with the film homogeneity of 5% deviation.

  • PDF

Voltage-Controlled Artificial Transmission Line Employing Periodically Loaded Diodes for Application to On-Chip Matching Components on MMIC (MMIC용 온칩 정합 소자에의 응용을 위한 주기적 배열 다이오드 구조를 이용한 전압 제어형 전송 선로)

  • Yun, Young
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.19 no.1
    • /
    • pp.7-14
    • /
    • 2008
  • In this paper, we propose VATL(Voltage-controlled Artificial Transmission Line) employing periodically loaded diodes for application to on-chip matching components on MMIC. Compared with conventional microstrip line, the VATL showed a much shorter wave length due to periodic capacitance of diodes, and the characteristic impedance of the VATL was easily controlled bγ changing supplied voltage. Concretely, the characteristic impedance of the VATL was changed from $80{\sim}20{\Omega}$ in a range of $0{\sim}1.05V$ and the VATL showed a wavelength of 1.5mm at 20GHz, while conventional microstrip line showed a wavelength of 5.3mm at the same frequency. Using the VATL, a ${\lambda}/4$ impedance transformer was fabricated on GaAs MMIC for application to on-chip matching components on MMIC. Using the ${\lambda}/4$ impedance transformer made it possible to perform impedance matching between RF components with various characteristic impedance of $30{\sim}100{\Omega}$ by adjusting applied Voltage.

Development of Planar Active Electronically Scanned Array(AESA) Radar Prototype for Airborne Fighter (항공기용 평면형 능동 전자주사식 위상 배열(AESA) 레이더 프로토 타입 개발)

  • Chong, Min-Kil;Kim, Dong-Yoon;Kim, Sang-Keun;Chon, Sang-Mi;Na, Hyung-Gi
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.21 no.12
    • /
    • pp.1380-1393
    • /
    • 2010
  • This paper presents a design, fabrication and the test results of planar active electronically scanned array(AESA) radar prototype for airborne fighter applications using transmit/receive(T/R) module hybrid technology. LIG Nex1 developed a AESA radar prototype to obtain key technologies for airborne fighter's radar. The AESA radar prototype consists of a radiating array, T/R modules, a RF manifold, distributed power supplies, beam controllers, compact receivers with ADC(Analog-to-Digital Converter), a liquid-cooling unit, and an appropriate structure. The AESA antenna has a 590 mm-diameter, active-element area capable of containing 536 T/R modules. Each module is located to provide a triangle grid with $14.7\;mm{\times}19.5\;mm$ spacing among T/R modules. The array dissipates 1,554 watts, with a DC input of 2,310 watts when operated at the maximum transmit duty factor. The AESA radar prototype was tested on near-field chamber and the results become equal in expected beam pattern, providing the accurate and flexible control of antenna beam steering and beam shaping.

A Study on the Design and Fabrication of GHz Magnetic Thin Film Inductor Utilizing Co90Fe10/SiO2 Multilayer (Co90Fe10/SiO2 Multilayer를 이용한 GHz 자성박막 인덕터 설계 및 제작에 관한 연구)

  • 공기준;윤의중;진현준;박노경;문대철
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.25 no.5B
    • /
    • pp.985-991
    • /
    • 2000
  • In this paper, the optimum structure of 2GHz magnetic thin film planar inductor were designed and fabricated to reduce the inductor area and to maximize the inductance L and quality factor Q of the inductor. The optimum design was performed utilizing Co90Fe10 layer multilayered with SiO2 layers to avoid the eddy-current skin effect and considering new lumped element model. New magnetic thin film inductors operating at 2GHz were fabricated on a Si substrate utilizing photo-lithography and lift-off techniques. The frequency characteristics of L, Q, and impedance in more than fifty identical inductors were measured using an RF Impedance Analyzer(HP4291B with HP16193A test fixture). The self-resonant frequencies(SRF) of the inductors were measured by a Vector Network Analyzer(HP8510). The developed inductors have SRF of 1.8 to 2.3GHz, L of 47 to 68nH, and Q of 70 to 80 near 1GHz. Finally, high frequency, high performance, planar micro-inductor(area=30.8 x 30.8il$^2$) with maximized L and Q were fabricated succefully.

  • PDF

Tunable Dielectric Properties and Curie Temperature with BST Thick Films (BST 후막의 가변 유전특성과 큐리온도에 관한 연구)

  • Kim In-Sung;Song Jae-Sung;Min Bok-Ki;Jeon So-Hyun
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.55 no.8
    • /
    • pp.392-398
    • /
    • 2006
  • The properties of tunable dielectric materials on RF frequency band are important high tunability and low loss for RF variable devices, variable capacitor, phased array antenna and other components application. Various composite of BST(barium strontium titanate) ratio combined with other non-electrical active oxide ceramics have been formulated for such uses. We present the tunable properties and Curie temperature on BST thick films. The grain growth of the weight ratio of $BaTiO_3$ increased. This can be explained by the substitute $Sr^{2+}$ ion for $Ba^{2+}$ ion in the $BaTiO_3$ system. The Curie temperature was shifted to lower temperature with increasing $SrTiO_3$in the $BaTiO_3-SrTiO_3$ system, because of decreasing the lattice constant. Also, the dielectric constant, tunability and K-factor of $(Ba_xSr_{1-x})TiO_3$ at over the Curie temperature decreased, at over the $60^{\circ}C$ fixation, maximum dielectric constant at Curie temperature and hence sharper phase transformation occurred at Curie temperature. The result were interpreted as a process of internal stress relaxation resulting form the increase of $90^{\circ}$ domains induced the BST. As a result, It is concluded that over the Curie temperature, frequency response and DC field effect for the tunable properties of BST thick film are suppressed by the transition broadening. For the application of tunable devices, that the curie temperature was investigated to be increased.

Performance Analysis of RF Transformation in DS/CDMA Receiver (DS/CDMA수신기에서 RF변환부의 성능분석)

  • Pyeon, Suk-Bum;Ju, Jae-Han
    • Journal of the Korean Institute of Telematics and Electronics T
    • /
    • v.35T no.2
    • /
    • pp.86-92
    • /
    • 1998
  • In this paper, it is derived the system design parameters for the J-STD-018 of the PCS mobile station(MS) minimum performance using DS/CDMA analyzed the system performance due to the receiver components. The simulation shows the selectivity is -70.96dB at 1.25MHz frequency offset from the carrier frequency while the MS noise figure to satisfy J-STD-018 is 10dB and the input 3rd harmonics intercept point of the MS class I and MS class II-V is -9.5dBm and -14dBm respectively. When the interference power level at the receiver is small, the receiver has better performance as we increase the gain of LNA. However, when the interference level at the receiver is large, the receiver performance is decreased by the effect of the spurious. Thus, the effectiveness of LNA On/Off switching technique is proved as to reduce the effect of the spurious.

  • PDF