• 제목/요약/키워드: R-mark

검색결과 157건 처리시간 0.035초

Q-mark 모델의 R&D 품질 영향 분석 (R&D Quality Impact Analysis of Q-mark Model)

  • 박정현
    • 전자통신동향분석
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    • 제30권1호
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    • pp.154-161
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    • 2015
  • 본고에서는 Q-mark 모델의 R&D(Research & Development) 품질 영향 분석을 기술한다. 이를 위해 Q-mark 모델 특징과 종류 그리고 절차를 간략히 기술하고, R&D 품질에 대한 Q-mark 인증 모델 영향에 대해 연구현장 설문조사 내용을 바탕으로 연구결과 완성도 측면, 대외 신뢰도 개선을 통한 과제 수주 측면, 기술 이전과 사업화 측면, 그리고 과제관리 효율화 측면 등에서 분석하여 제시한다. 또 앞으로 Q-mark 모델이 보다 객관적이고 효과적인 R&D 품질관리를 위한 인증 모델로 개선되고 지속적으로 운영되기 위해 보완되어야 할 사항에 대해 설문조사 결과를 바탕으로 인증 측면, 프로세스 범주 측면, 제공 템플릿 측면, 그리고 품질 지원 서비스 및 전문성 측면에서 기술한다.

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유도무기체계 모드 5 피아식별 체계통합 및 인증시험 (Mark XIIA(Mode 5) IFF System Integration and Certification Test for Surface to Air Missile System)

  • 김우현;정세영;이연수;장세명
    • 한국군사과학기술학회지
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    • 제25권2호
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    • pp.160-168
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    • 2022
  • The new IFF mode, Mode-5 replacing Mode-4, has already been established by the US DoD for its allies and NATO forces. A IFF retrofit program for replacing the Mark XII Mode-4 with Mark XIIA Mode-5 is in progress in order to overcome the security limitations of the former in R.O.K. IFF certification test for the new mode, Mode-5, has been performed on medium range surface to air missile platform of the Korean armed forces for the first time in R.O.K and this is regarded as a monumental event in Korean defense industry. The present paper is a discussion on the procedures applied to the IFF system retrofit and integration, lessons learned from AIMS test with the US AIMS PO as observer. The minimum modification from the existing Mark XII Mode-4 to Mark XIIA Mode-5 and evolutional adaption from previous design including interoperability are required for the system retrofit. Letter of Certification was received from the US AIMS PO after the tests. The authors propose that the lessons learned and know-how acquired during the tests are managed by the R.O.K Government as the standard structure of a database. It is expected that the use of the database will reduce the developmental difficulties and risk, also increase efficiency in future developments and other projects.

추기형 광디스크에서 최적 기록마크 생성을 위한 열전달 해석 (Heat transfer analysis for optimization of recording mark on Compact Disk-Recordable)

  • 홍성국;이정두;신정묵;고성로;이경호;조형희
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2001년도 춘계학술대회논문집D
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    • pp.589-595
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    • 2001
  • The present study conducted heat transfer analysis in multi-layer of CD-R. It is necessary to analyze heat transfer during the recording process to find optimum power and write strategy in CD-R. This study investigated effects of several parameters such as recording speed, laser power, layer thickness and thermal property. The calculated results presented temperature distribution in the multi-layer and detailed information of recording characteristics. Optimum laser power was estimated, comparing an optimum mark length with the calculated mark lengths. The results showed that the optimum laser power was influenced significantly by the layer thickness and the thermal properties of the dye.

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ShadeEye$^{(R)}$ NCC system을 이용한 Vita CAD/CAM Ceramic Block의 크기에 따른 색조 일치성 비교연구 (Comparative Study of Color Correspondence According to Size of Vita CAD/CAM Ceramic Block Using ShadeEye-Ncc$^{(R)}$ System)

  • 김재홍;김혜영;김웅철;김지환
    • 대한치과기공학회지
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    • 제33권3호
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    • pp.203-210
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    • 2011
  • Purpose: The purpose of this study was to compare color correspondence of different sizes of Vita Mark II$^{(R)}$ and TriLuxe$^{(R)}$ Feldspar blocks. Methods: The three commercially available shades(1M2, 2M2, 3M2) of Mark II & TriLuxe blocks for the CEREC$^{(R)}$ CAD/CAM system were examined. For each of three colors, three different sizes were tested, 5 blocks each. The measurements were made using a spectrophotometer equipped with an integrating sphere using the CIE $L^*$, $a^*$, $b^*$ colorimetric system. Results: The $L^*$, $a^*$, $b^*$ value of Vita Mark II$^{(R)}$ ceramic block showed significantly higher than TriLuxe$^{(R)}$ ceramic block(p<0.05). In comparing the Vita Mark II$^{(R)}$ specimen of the three different shade, color differences between materials(${\Delta}E^*$) showed the lowest value of 2.09, and the highest was 2.24. ${\Delta}E^*$ values of the materials of Vita Mark II$^{(R)}$ were higher than 2. As the size of ceramic block differed, the color correspondence of Vita Mark II$^{(R)}$ showed statistically significant difference but, this result is clinically acceptable. Conclusion: All the different sizes of the different shades of Vita TriLuxe$^{(R)}$ blocks for the CEREC$^{(R)}$ system showed the high degree of color correspondence necessary in industrially prefabricated CAD/CAM blocks. The results of the present study suggested that it would be necessary to establish the reproducible and constant color specification system for an esthetic restoration.

Relationship between articulation paper mark size and percentage of force measured with computerized occlusal analysis

  • Qadeer, Sarah;Kerstein, Robert;Kim, Ryan Jin-Yung;Huh, Jung-Bo;Shin, Sang-Wan
    • The Journal of Advanced Prosthodontics
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    • 제4권1호
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    • pp.7-12
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    • 2012
  • PURPOSE. Articulation paper mark size is widely accepted as an indicator of forceful tooth contacts. However, mark size is indicative of contact location and surface area only, and does not quantify occlusal force. The purpose of this study is to determine if a relationship exists between the size of paper marks and the percentage of force applied to the same tooth. MATERIALS AND METHODS. Thirty dentate female subjects intercuspated into articulation paper strips to mark occlusal contacts on their maxillary posterior teeth, followed by taking photographs. Then each subject made a multi-bite digital occlusal force percentage recording. The surface area of the largest and darkest articulation paper mark (n = 240 marks) in each quadrant (n = 60 quadrants) was calculated in photographic pixels, and compared with the force percentage present on the same tooth. RESULTS. Regression analysis shows a bi-variant fit of force % on tooth (P<.05). The correlation coefficient between the mark area and the percentage of force indicated a low positive correlation. The coefficient of determination showed a low causative relationship between mark area and force ($r^2$ = 0.067). The largest paper mark in each quadrant was matched with the most forceful tooth in that same quadrant only 38.3% of time. Only 6 2/3% of mark surface area could be explained by applied occlusal force, while most of the mark area results from other factors unrelated to the applied occlusal force. CONCLUSION. The findings of this study indicate that size of articulation paper mark is an unreliable indicator of applied occlusal force, to guide treatment occlusal adjustments.

국내 제약회사 심벌마크의 시각적 특징 연구 (A Study on the Visual Characteristics of Korean Pharmaceutical Companies' CI Symbol Marks)

  • 홍일양
    • 한국콘텐츠학회논문지
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    • 제16권9호
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    • pp.443-450
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    • 2016
  • 국내 바이오의약산업은 국가의 핵심전략 사업으로써 고부가가치 산업이다. 고령화로 인한 의약품 수요증가, 신약 R&D 투자성과 가시화, 바이오의약 중심의 R&D 변화, 전략적 해외 기술수출 확대, 정부의 적극적 지원으로 인하여 해외 시장 진출이 급속도록 가속화되고 있다. 따라서 국내 제약회사도 글로벌 제약기업으로써의 경쟁력을 강화하고 소비자들에게 신뢰 받을 수 있는 기업으로써의 이미지 구축이 절실하다. 이에 본 연구는 마케팅 수단으로써의 CI의 중요성을 인식하고 국내 제약회사의 CI 심벌마크 시각적 특징 분석과 연령대별 선호도를 비교 분석하였다. 그 결과 심벌마크에 대한 선호도는 연령대가 높아질수록 제작년도가 오래된 심벌마크에 대한 선호도가 크게 높은 것으로 나타났으며 인지도와 비례하였다. 또한 픽처마크형 심벌마크가 워드마크 형태보다 절대적으로 선호되었다. 제약회사의 글로벌화를 위하여 기업 역시 대중의 인식변화에 대한 책임감이 요구되며 본 연구가 글로벌 경쟁력이 있는 국내 제약회사의 이미지 제고를 위한 아이덴티티 전략의 기초자료로써 심벌마크 개발 방향에 도움이 되기를 기대한다.

가변 Threshold를 이용한 Wafer Align Mark 중점 검출 정밀도 향상 연구 (A Study on Improving the Accuracy of Wafer Align Mark Center Detection Using Variable Thresholds)

  • 김현규;이학준;박재현
    • 반도체디스플레이기술학회지
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    • 제22권4호
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    • pp.108-112
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    • 2023
  • Precision manufacturing technology is rapidly developing due to the extreme miniaturization of semiconductor processes to comply with Moore's Law. Accurate and precise alignment, which is one of the key elements of the semiconductor pre-process and post-process, is very important in the semiconductor process. The center detection of wafer align marks plays a key role in improving yield by reducing defects and research on accurate detection methods for this is necessary. Methods for accurate alignment using traditional image sensors can cause problems due to changes in image brightness and noise. To solve this problem, engineers must go directly into the line and perform maintenance work. This paper emphasizes that the development of AI technology can provide innovative solutions in the semiconductor process as high-resolution image and image processing technology also develops. This study proposes a new wafer center detection method through variable thresholding. And this study introduces a method for detecting the center that is less sensitive to the brightness of LEDs by utilizing a high-performance object detection model such as YOLOv8 without relying on existing algorithms. Through this, we aim to enable precise wafer focus detection using artificial intelligence.

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신뢰성 경영시스템(IEC 60300) 도입 타당성에 관한 연구 (A feasibility study on the adoption of dependability management system)

  • 김종걸;고재규;김영섭
    • 대한안전경영과학회:학술대회논문집
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    • 대한안전경영과학회 2008년도 추계학술대회
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    • pp.611-622
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    • 2008
  • It is hot issue to get the competitiveness of product through reliability-growth as well as availability and safety in almost high-technology industry including military, chemistry, nuclear, telecommunication, transportation service and so on. In advanced countries, worldwide leading companies have tried to improve and develop high-reliability product as well as reliability management system(IEC60300). We investigate reliability certification systems for product and management system. Additionally, we study the feasibility on the adoption of dependability management system(IEC60300) by empirical survey on companies with product-reliability certification(R-mark) in Korea.

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