• Title/Summary/Keyword: QMS

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Development of the Model for Evaluation of Medical device manufacturer's Quality Management System against international standards and industry environment's change (국제기준 및 산업환경 변화에 대응한 의료기기 제조기업 품질경영 평가모델 개발)

  • Yoon, Do-Sik
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.6
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    • pp.382-390
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    • 2018
  • This study developed a model to evaluate the quality management system of a medical device manufacturing company, and applied it to medical device manufacturers to understand the impact on business performance in response to international regulations and industry's change. This study prepared preliminary items, defined four (4) major factors (Plan-Do-Check-Act) that consist of the evaluation layers and items per category according to prior research review and expert interview, and calculated the weight and importance using AHP. The study results showed that responsibility & authority and quality objective in Planning Category, product-related requirement and R&D in Doing Category, Measuring and monitoring in Check Category, and review of meeting Regulatory and regulation in Action Category are relatively more important factors. The evaluation model developed based on the calculated weight and importance to business performance was applied to medical device manufacturers to investigate and analyze the implementation level of QMS and its impact on business performance according to each category. Most medical device manufacturers to be studied showed a reasonable level of QMS and effective business performance. Almost all the evaluation layers and items in the four (4) factors had a significant influence on business performance. Although the medical device quality management system is aimed mainly at license acquisition, it is important that management environment factors not related directly to licensing and authorization are important to business performance, and it is effective when these factors are integrated and operated within and outside the manufacturer.

Magnetized inductively coupled plasma etching of GaN in $Cl_2/BCl_3$ plasmas

  • Lee, Y.H.;Sung, Y.J.;Yeom, G.Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 1999.10a
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    • pp.49-49
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    • 1999
  • In this study, $Cl_2/BCI_3$ magnetized inductively coupled plasmas (MICP) were used to etch GaN and the effects of magnetic confinements of inductively coupled plasmas on the GaN etch characteristics were investigated as a function of $Cl_2/BCI_3$. Also, the effects of Kr addition to the magnetized $Cl_2/BCI_3$ plasmas on the GaN etch rates were investigated. The characteristics of the plasmas were estimated using a Langmuir probe and quadrupole ma~s spectrometry (QMS). Etched GaN profiles were observed using scanning electron microscopy (SEM). The small addition of $Cl_2/BCI_3$ (10-20%) in $Cl_2$ increased GaN etch rates for both with and without the magnetic confinements. The application of magnetic confinements to the $Cl_2/BCI_3$ inductively coupled plasmas (ICP) increased GaN etch rates and changed the $Cl_2/BCI_3$ gas composition of the peak GaN etch rate from 10% $BCI_3$ to 20% $BCI_3$. It also increased the etch selectivity over photoresist, while slightly reducing the selectivity over $Si0_2$. The application of the magnetic field significantly increased positive $BCI_2{\;}^+$ measured by QMS and total ion saturation current measured by the Langmuir probe. Other species such as CI, BCI, and CI+ were increased while species such as $BCl_2$ and $BCI_3$ were decreased with the application of the magnetic field. Therefore, it appears that the increase of GaN etch rate in our experiment is related to the increased dissociative ionization of $BCI_3$ by the application of the magnetic field. The addition of 10% Kr in an optimized $Cl_2/BCI_3$ condition (80% $Cl_2/$ 20% $BCI_3$) with the magnets increased the GaN etch rate about 60%. More anisotropic GaN etch profile was obtained with the application of the magnetic field and a vertical GaN etch profile could be obtained with the addition of 10% Kr in an optimized $Cl_2/BCI_3$ condition with the magnets.

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Development of a Noble Gas Isotope Dilution Mass Spectrometric System Combined with a Cryogenic Cold Trap (초저온 냉각 트랩을 결합한 비활성기체 동위원소 희석 질량분석 시스템의 제작)

  • HONG, BONGJAE;SHIN, DONGYOUB;PARK, KEYHONG;HAHM, DOSHIK
    • The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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    • v.27 no.3
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    • pp.144-157
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    • 2022
  • Noble gases, which are chemically inert and behave conservatively in marine environments, have been used as tracers of physical processes such as air-sea gas exchange, mixing of water masses, and distribution of glacial meltwater in the ocean. For precise measurements of Ne, Ar, and Kr, we developed a mass spectrometric system consisting of a quadrupole mass spectrometer (QMS), a high vacuum preparation line, an activated charcoal cryogenic trap (ACC), and a set of isotope standard gases. The high vacuum line consists of three sections: (1) a sample extraction section that extracts the dissolved gases in the sample and mixes them with the standard gases, (2) a gas preparation section that removes reactive gases using getters and separates the noble gases according to their evaporation points with the ACC, and (3) a gas analysis section that measures concentrations of each noble gas. The ACC attached to the gas preparation section markedly lowered the partial pressures of Ar and CO2 in the QMS, which resulted in a reduced uncertainty of Ne isotope analysis. The isotope standard gases were prepared by mixing 22Ne, 36Ar, and 86Kr. The amounts of each element in the mixed standard gases were determined by the reverse isotope dilution method with repeated measurements of the atmosphere. The analytical system achieved precisions for Ne, Ar, and Kr concentrations of 0.7%, 0.7%, and 0.4%, respectively. The accuracies confirmed by the analyses of air-equilibrated water were 0.5%, 1.0%, and 1.7% for Ne, Ar, and Kr, respectively.

Fourier transform infrared spectroscopy과 Quadrupole mass spectrometer을 이용한 Cyclopentadienyl Tris (dimethylamino) Zirconium의 열분해 특성 연구

  • O, Nam-Geun;An, Jong-Gi;Gang, Go-Ru;Kim, So-Yeon;Kim, Jin-Tae;Yun, Ju-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.99.1-99.1
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    • 2015
  • ALD와 CVD 공정을 진행 하는데 있어서 전구체의 평가 및 실시간 분해과정을 확인 하는 것은 매우 중요하다. 본 실험에서는 고유전 산화막에 쓰이는 Cyclopentadienyl Tris (dimethylamino) Zirconium, CpZr(NMe2)3 전구체의 증기압 특성과 FTIR, QMS를 활용하여 $250^{\circ}C$ 온도구간 에서의 분해과정을 실시간으로 측정 하였다. CpZr(NMe2)3의 Atomic mass 는 288 amu이며 증기압은 $60^{\circ}C$에서 0.075 Torr로 측정되었다. 온도가 증가 함에 따라 FTIR 에서 CH3 symmetric stretch (2776 cm-1), CH3 symmetric stretch (2865 cm-1) intensity가 줄어 들게 되었으며 QMS에서도 15 amu (Methyl)의 신호가 온도가 증가함에 따라 감소함을 확인 할수 있었다. QMS에서 Cp의 이온전류가 사라진 이유는 Cp가 모체인 CpZr에서 모두 다 분리되었고 신호가 없어 졌기 때문이다. 본 연구를 통해서 FTIR 단독으로는 얻을수 없는 온도에 따른 세부적인 분해과정을 QMS로 실시간 측정 함으로서 FTIR의 분석 결과와 산호보완 할수 있게 되었다.

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Layer-by-layer Control of MoS2 Thickness by ALET

  • Kim, Gi-Hyeon;Kim, Gi-Seok;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.234.1-234.1
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    • 2015
  • Molybdenum disulfide (MoS2)는 van der Waals 결합을 통한 층상구조의 물질로써 뛰어난 물리화학적, 기계적 특성으로 Field Effect Transistors (FETs), Photoluminescence, Photo Detectors, Light Emitters 등의 많은 분야에서 연구가 보고 되어지고 있는 차세대 2D-materials이다. 이처럼 MoS2 가 다양한 범위에 응용될 수 있는 이유는 layer 수가 증가함에 따라 1.8 eV의 direct band gap 에서 1.2 eV 의 indirect band-gap으로 특성이 변화할 뿐만 아니라 다양한 고유의 전기적 특성을 지니고 있기 때문이다. 그러나 MoS2 는 원자층 단위의 layer control 이 어렵다는 이유로 다양한 전자소자 응용에 많은 제약이 보고 되어졌다. 본 연구에서는 MoS2 의 layer를 control 하기 위해 ICP system 에서 mesh grid 를 삽입하여 Cl2 radical을 효과적으로 adsorption 시킨 뒤, Ion beam system 에서 Ar+ Ion beam 을 통해 한 층씩 제거하는 방식의 atomic layer etching (ALE) 공정을 진행하였다. ALE 공정시 ion bombardment 에 의한 damage 를 최소화하기 위해 Quadruple Mass Spectrometer (QMS) 를 통한 에너지 분석으로 beam energy 를 20 eV에서 최적화 할 수 있었고, Raman Spectroscopy, X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy(AFM) 분석을 통해 ALE 공정에 따른 MoS2 layer control 가능 여부를 증명할 수 있었다.

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A Study of Construction Quality Management System using QR code (QR코드를 활용한 품질경영시스템에 관한 연구)

  • Park, Sang-Min;Lim, Tae-Kyung;Lee, Dong-Eun
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2012.11a
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    • pp.137-139
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    • 2012
  • This paper presents a system architecture and database of construction quality management system which encourages real time information tracking and monitoring. It improves the real time quality record tracking by using QR code technology in the project delivery. The advantages and issues relative to QR code and the database structures of the tracking system are presented. Conventional project scheduling system, operation modeling and analysis system, and quality management system are hybridized using QR code technology. The system improves project quality management by tracking the atomic tasks which consists of a construction process at the lowest level of construction hierarchy. It analyzes the quality records to determine the causes of abnormality and/or nonconformity. Using QR code technology, the construction quality management system may be more effective than the conventional one. It was confirmed that the quality management processes in construction project delivery can be more visible and controllable by integrating QR code technology, project scheduling system, and quality management system.

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Etching Characteristics of ZnO Thin Films Using Inductively Coupled Plasma of HBr/Ar/CHF3 Gas Mixtures (HBr/Ar/CHF3 혼합가스를 이용한 ZnO 박막의 유도결합 플라즈마 식각)

  • Kim, Moon-Keun;Ham, Young-Hyun;Kwon, Kwang-Ho;Lee, Hyun-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.12
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    • pp.915-918
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    • 2010
  • In this work, the etching characteristics of ZnO thin films were investigated using an inductively coupled plasma(ICP) of HBr/Ar/$CHF_3$ gas mixtures. The plasma characteristics were analyzed by a quadrupole mass spectrometer (QMS) and double langmuir probe (DLP). The surface reaction of the ZnO thin films was investigated using X-ray photoelectron spectroscopy (XPS). The etch rate of ZnO was measured as a function of the $CHF_3$ mixing ratio in the range of 0-15% in an HBr:Ar=5:2 plasma at a fixed gas pressure (6mTorr), input power (700 W), bias power (200 W) and total gas flow rate(50sccm). The etch rate of the ZnO films decreased with increasing $CHF_3$ fraction due to the etch-blocking polymer layer formation.

Building of PSMS in corporate of ISO 9000 certification (PL 대응체계 구축 방안)

  • Park, Jae-Heung;Hwang, Hee;Moon, Jae-Seung
    • Journal of Korean Society for Quality Management
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    • v.31 no.3
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    • pp.19-36
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    • 2003
  • The manager of manufacturing industry just not to have known what to do related to the law of product liability(PL) that was put into operation in July 1, 2002. The law of PL is a public law about defective product, which was established in order to compensate consumer's damages of property and body caused by product, to make sound society by the safety products and to take international competitiveness. But the existing civil law has been having clause that compensation to be taken is limited. The law of PL is resolving this limitations and is characterized by the easy relief from damages of defective product. The decision in the case of Green-man has been a precedent since the court sentenced the manufacturer to liability. The law of PL has been in force in 27 countries, including all of the EU countries, Japan, Philippines and China. It has been shown that the corporations which meet the Global Standard, could survive in global competition. The economic effects by the law of PL are the increase of consumers relief production cost by the lawsuits. This paper will recommend more biref method that is able to cover PSMS by use of QMS. It will make domestic corporation improve in the plan, manufacture and sale of products to meet the Global Standard.

Implication of Industrial Security Capacity Based on Level Evaluation (산업보안 역량 수준평가 및 개선방안)

  • Kim, Moon Sun;Jeoune, Dae-Seong;Nam, Kyung H.;Kim, Gyu-Ro;Han, Chan-Myeong
    • Journal of Korean Society for Quality Management
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    • v.41 no.4
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    • pp.649-657
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    • 2013
  • Purpose: In this study, the actual situation of domestic firms vulnerable to industrial security competence will be discussed. And accordingly be discussed for effective response measures. Methods: Using a structured questionnaire by mail, fax, e-mail and fill method was used respondents. By the end of '10 R&D Center, which holds 15,247 companies(population) among the 95% level of confidence, tolerance ${\pm}3%$ p-level corporate type, sector, region extraction method stratified multi-level companies were investigated through the final 1529. Results: The average level of industrial security capabilities 43.8%(out of 100) is very weak, so urgent and positive response measures also need to be investigated sought. Conclusion: we propose the effective management framework and improvement plans to prevent illegal industrial leakage are to be made.

A Delphi Approach to the Development of an Integrated Performance Measurement and Management Model for a Car Assembler

  • Shawyun, Teay
    • Industrial Engineering and Management Systems
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    • v.7 no.3
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    • pp.214-227
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    • 2008
  • Today's dynamic competitiveness requires an organization to improve its performance measurement and management. Quality Management Systems (QMS) abound, the main ones being: ISO series, Malcolm Baldridge National Quality Award (MBNQA), European Forum for Quality Management (EFQM), Six Sigma Business Scorecard and the Balanced Scorecard. Based on the literature, the IPMMM (Integrated Performance Measurement and Management Model) identified 7 key synthesized factors: leadership, strategy management and policy, customer and market, learning and growth, partnership and resources, internal processes and business results that are employed to investigate the key performance indicators of a car assembler using the Delphi methodology. In the 2 rounds of Delphi panels consisting of 20 senior management personnel, the $1^{st}$ round of 198 indicators in the IPMMM yielded 90 indicators. The $2^{nd}$ round yielded 43 performance indicators with 18 rated as critical based on the % assigned in the $1^{st}$ and $2^{nd}$ priority rating of "very important factor" and "key performance indicator" that must be ranked high on both of the priorities. The very critical indicators appeared to be: defect percentage and first time capability (tie in $1^{st}$ place) and revenue, goal setting, customer satisfaction index, on-time delivery, brand image, return on investment, Claim Occurrence Ratio, and debt being ranked from $3^{rd}$ to $10^{th}$. It can be surmised that an organization can identify and develop an appropriate set of performance indicators through the Delphi methodology and implement and manage them based on the Balanced Scorecard.