• Title/Summary/Keyword: Pulsed power

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Study on Characteristics of Micro Patterned Copper Electrodeposition according to Parameters in Laser Beam Machining (레이저빔 가공 인자에 따른 구리도금 미세 패터닝 특성 연구)

  • Shin, Hong Shik
    • Journal of Institute of Convergence Technology
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    • v.5 no.2
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    • pp.21-25
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    • 2015
  • This paper proposes a fabrication process of deposited layer with micro patterns that uses a combination of a pulsed laser beam machining and an electrodeposition. This process consists of the electrodeposition and the laser beam machining. The deposited layer on metal can be selectively eliminated by laser ablation. As a result, the deposited layer with micro patterns can be fabricated without a mask. The characteristics of the deposited layer on stainless steel were investigated according to the average power and marking speed in the pulsed laser beam machining. The optimal laser beam conditions for precise micro patterning of the deposited layer were determined. Finally, the deposited copper layer with micro text was successfully fabricated by the pulsed laser beam machining.

Optical Properties of Silicon Nanoparticles and $C_{60}$ Thin Films Prepared by Pulsed Laser Ablation (Pulsed Laser Ablation으로 제작한 $C_{60}$ 및 Si 박막의 광학적 특성 분석)

  • Kim, M.S.
    • Journal of Power System Engineering
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    • v.9 no.4
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    • pp.118-123
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    • 2005
  • We have investigated the fabrication of Si nanoparticles and $C_{60}$ thin films by pulsed laser ablation. By atomic force microscopy(AFM), the laser-deposited $C_{60}$ thin film was verified to have surface far smoother than the surfaces of films produced by the conventional evaporation method. The Si deposited at a He atmosphere of 0.2 Torr was with about $60{\AA}$ height of the Si nanoparticles, suggesting that it was uniformly deposited. We observed visible green emissions spectra in the $Si/C_{60}$ multilayer films after laser annealing. It is considered that this green emissions is occurred from SiC particles, which is produced reaction of Si nanoparticles with $C_{60}$ by laser annealing.

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Ion Nitriding Using Pulsed D.C Glow Discharge Combined with Inductively Coupled Plasma (펄스직류방전과 유도결합방전의 복합에 의한 SCM440강의 이온질화)

  • Kim, Yoon-Kee
    • Journal of the Korean institute of surface engineering
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    • v.43 no.2
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    • pp.91-96
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    • 2010
  • SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.

The comparative study of pure and pulsed DC plasma sputtering for synthesis of nanocrystalline Carbon thin films

  • Piao, Jin Xiang;Kumar, Manish;Javid, Amjed;Wen, Long;Jin, Su Bong;Han, Jeon Geon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.320-320
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    • 2016
  • Nanocrystalline Carbon thin films have numerous applications in different areas such as mechanical, biotechnology and optoelectronic devices due to attractive properties like high excellent hardness, low friction coefficient, good chemical inertness, low surface roughness, non-toxic and biocompatibility. In this work, we studied the comparison of pure DC power and pulsed DC power in plasma sputtering process of carbon thin films synthesis. Using a close field unbalanced magnetron sputtering system, films were deposited on glass and Si wafer substrates by varying the power density and pulsed DC frequency variations. The plasma characteristics has been studied using the I-V discharge characteristics and optical emission spectroscopy. The films properties were studied using Raman spectroscopy, Hall effect measurement, contact angle measurement. Through the Raman results, ID/IG ratio was found to be increased by increasing either of DC power density and pulsed DC frequency. Film deposition rate, measured by Alpha step measurement, increased with increasing DC power density and decreased with pulsed DC frequency. The electrical resistivity results show that the resistivity increased with increasing DC power density and pulsed DC frequency. The film surface energy was estimated using the calculated values of contact angle of DI water and di-iodo-methane. Our results exhibit a tailoring of surface energies from 52.69 to $55.42mJ/m^2$ by controlling the plasma parameters.

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Simulation of Luminance and Uniformity of LGP According to the Laser Scattering Pattern (렌즈형 광섬유를 이용하여 펄스형 반도체 레이저 Beam Shaping 및 증폭 기술 연구)

  • Kwon, Oh-Jang;Kim, Ryun-Kyung;Shim, Young-Bo;Han, Young-Geun
    • Korean Journal of Optics and Photonics
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    • v.21 no.6
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    • pp.254-258
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    • 2010
  • We investigate an optical technique for beam shaping and optical amplification of a pulsed laser diode without variation of its original properties, such as repetition rate and pulse duration. The horizontal and longitudinal sizes of the pulsed laser diode are 300 and $2{\mu}m$, respectively, and its output power is $1.1mW/cm^2$. The multimodal and elliptical pulse shape of the laser diode is converted to the single-modal and Gaussian pulse shape by using a lensed optical fiber. Since the single-modal lensed fiber coupling from the multimodal pulsed laser diode degrades the output power severely, the output power of the pulsed laser diode is dramatically enhanced by using an optical amplification method based on master oscillated power amplification (MOPA). The pulse qualities of the laser diode are not changed after amplifying the pulse power and the output power was finally measured to be $29mW/cm^2$.

Development of high repetition rate and high power pulsed Nd:YAG laser power supply using ZCS resonant converter (ZCS공진형 컨버터를 적용한 고반복 대출력 펄스형 Nd:YAG 레이저 전원장치 개발)

  • Joe, K.Y.;Kim, E.S.;Byun, Y.B.;Kim, H.J.;Park, J.M.;Lee, H.W.
    • Proceedings of the KIEE Conference
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    • 1996.07a
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    • pp.514-517
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    • 1996
  • Zero current switching(ZCS) series resonant converter is used to control laser power density in a pulsed Nd:YAG laser power supply. The high power and high repetition rate paused Nd:YAG laser is designed and fabricated to control current pulse width and pulse repetition rate in the double elliptical laser oscillator. In order to find out operational characteristics of pulsed Nd:YAG laser, the electrical properties of driving power supply and laser output power are investigated and experimented by changing of the current pulse width from 200uS to 350uS(step 50uS) and pulse repetition rate range of 500pps(pulse per second) to 1150pps. From that result, we obtaind maximum efficiency of 1.83% and maximum laser output or 220W at the condition of 350 uS and 1150pps with one Nd:YAG rod), and obtained that of more than 400W with two laser head connecting series.

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Development of High Voltage and High Energy Density Capacitor for Pulsed Power Application (펄스파워용 고전압 고에너지밀도 커패시터 개발)

  • 이병윤;정진교;이우영;박경엽;이수휘;김영광
    • The Transactions of the Korean Institute of Electrical Engineers B
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    • v.52 no.5
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    • pp.203-210
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    • 2003
  • This paper describes high voltage and high energy density capacitor developed for pulsed power applications. The rated voltage of the developed capacitor is DC 22 [kV], the capacitance is 206 [$\mu$F] and the energy density is about 0.7 [kJ/kg]. Polypropylene film and kraft paper were used as the dielectrics. The ratio of the thickness of each dielectric material which consists of the composite dielectric structure, stacking factor and the termination method were determined by the charging and discharging tests on model capacitors. In terms of energy density, the developed capacitor has higher energy density compared with the products of foreign leading companies. In addition, it has been proved that the life expectancy can be more over 2000 shots through the charging and discharging test. The voltage reversal factor was 20%. This capacitor can be used as numerous discharge applications such as military, medical, industrial fields.

Development of 100MW's 150kJ Compact Pulsed Power Supply (수백MW급 150kJ 집적화 펄스전원 개발)

  • Kim, Jin-Sung;Lee, Byung-Ha;Kim, Sung-Ho;Yang, Kyung-Seoung;Kim, Young-Bae;Kim, Jong-Soo;Jin, Yun-Sik;Ryoo, Hong-Jae
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1383_1384
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    • 2009
  • In this study, CPPS(Compact Pulsed Power Suppy) has been developed. The goals of CPPS are charging energy 150kJ, trapezoidal pulsed power shaping of 150~250MW with about 1msec pulse width, consecutive charging rate of several times/min, and total system volume below $0.5m^3$. The CPPS is composed of 4 modules of 37.5kJ which can be operated independently. This paper describes the design, setup and performance of CPPS in experiment and simulation.

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Development of Pulsed Power Supply using INPIStron (INPIStron을 이용한 Pulsed Power전원장치의 개발)

  • Seo, Kil-Soo;Kim, Young-Bae;Cho, Kuk-Hee;Lee, Hyeong-Ho
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.1069-1071
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    • 1999
  • Closing switch는 여러 가지가 있으나, 방전시 발생하는 Z-pinch로 인한 전극의 손상으로 수명이 짧고, 소음, 열 발생 등으로 소형화가 문제점으로 되어왔다. Inverse pinch현상을 이용하여 기존의 closing switch보다 전류밀도가 1/62, 주울열의 발생, 인덕턴스가 작다. INPIStron의 수명에 영향을 미치는 절연물질은 세라믹을, 도전체로서는 경제성을 감안하여 쉽게 구할 수 있는 구리를 이용하여 제작하였고, 트리거는 gas-puffing방식을 사용하였다. 또한 이렇게 제작된 INPIStron을 이용하여 2MJ-500kA급 pulsed power 전원 장치를 개발하였다.

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Characteristics of high-efficiency rust removal by adjusting variable frequency and voltage charging using the Pulsed Power system (펄스파워를 이용한 펄스반복율에 변화에 의한 고효율 RUST(녹) 제거 특성에 관한 연구)

  • Song, Woo-Jung;Kim, Su-Weon;Jeon, Jin-An;Joung, Jong-Han;Kim, Hwi-Young;Kim, Hee-Je
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.1800-1803
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    • 2002
  • The pulsed power system was widely making use good of many industrial and environments. The pulse generator generally required for short pulse duration and high peak value was forced to consider its volume and economy. In this paper, this system is designed and fabricated which has a compact size of pulse generator with switched MOSFET. We have studied the removal of rust material using Arc discharging in pulsed power system. It have tested their characteristics by adjusting variable voltage charging and pulse repetition rate. As a result, We can eliminate rust materials with this device.

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