• Title/Summary/Keyword: Pulsed DC

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Cytotoxicities of Tumor-specific T Lymphocytes Primed by Glioma Apoptotic Body - or Glioma Cell Lysate-pulsed Dendritic Cells

  • Kim, Jong-Tae;Chung, Dong-Sup;Kwak, Seung-Won;Han, Young-Min;Park, Young-Sup;Kim, Moon-Chan
    • Journal of Korean Neurosurgical Society
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    • v.38 no.2
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    • pp.126-131
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    • 2005
  • Objective : The choice of tumor antigen for dendritic cell[DC]-loading has still been an unresolved problem in the DC-based vaccine strategies against malignant gliomas that has not been found well-characterized tumor specific antigens. In this study, we compare tumor-specific T cell response induced by glioma apoptotic body[GAB]-pulsed DCs to response induced by glioma cell lysate-pulsed ones quantitatively. Methods : DCs generated in the presence of granulocyte macrophage-colony stimulating factor and interleukin[IL]-4 from peripheral blood mononuclear cells[PBMCs] of HLA-A2 positive healthy donors were cultured. Each GABs and glioma cell lysate generated from HLA-A2 positive T98G glioblastoma cells were co-incubated with DCs. $CD8^+$ T lymphocytes isolated from PBMCs of same donors were cultured in media containing IL-2 and either stimulated by GAB- or lysate-pulsed DCs three times at a weekly interval. The interferon[IFN]-${\gamma}$ concentrations of each cell culture supernate were measured by enzyme immunoassay technique. Cytolytic activity of the generated cytotoxic $CD8^+$ T cells either stimulated with GAB- or lysate-pulsed DCs was determined by a standard 4-h $^{51}Cr$-release assay. Results : IFN-${\gamma}$ production and cytolytic activity of effector T cells stimulated by GAB-pulsed DCs were significantly higher than those of T cells stimulated by lysate-pulsed ones. Conclusion : These results indicate the choice of antigen is a critical determinant in the induction of antitumor immunity against malignant glioma. Antigen preparations from GABs represent a promising alternative to glioma cell lysate in DC-based glioma vaccine strategies.

The design of adaptive Controller for the Voltage Bus Conditioner for the improvement of the Power Quality in the DC Power Distribution System (DC 배전시스템의 품질향상을 위한 VBC 적응제어)

  • Woo, Hyun-Min;Lee, Byung-Hun;Chang, Han-Sol;La, Jae-Du;Kim, Young-Seok
    • Proceedings of the KSR Conference
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    • 2011.10a
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    • pp.2348-2356
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    • 2011
  • In recent years, many researches for DC power distributed system (PDS) are being preformed and the importance of the DC PDS is more and more emphasized. Furthermore, in the railway system, the DC PDS is used in subway station lighting, facilities, etc. In the DC PDS, DC bus voltage instability may be occurred by the operation of multiple parallel loads such as pulsed power load, motor drive system, and constant power loads. Thus, good quality and high reliability for electric power are required and voltage bus conditioner (VBC) may be used the DC PDS. The VBC is a DC/DC converter for mitigation of the bus transients. In this paper, adaptive controller is designed. The simulation results by PSIM are presented for validating the proposed control algorithm.

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A Buck-Boost Converter-Based Bipolar Pulse Generator

  • Elserougi, Ahmed A.;Massoud, Ahmed M.;Ahmed, Shehab
    • Journal of Power Electronics
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    • v.17 no.6
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    • pp.1422-1432
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    • 2017
  • This paper presents a buck-boost converter-based bipolar pulse generator, which is able to generate bipolar exponential pulses across a resistive load. The concept of the proposed approach depends on operating the involved buck-boost converters in discontinuous current conduction mode with high-voltage gain and enhanced efficiency. A full design of the pulse generator and its passive components is presented to ensure generating the pulses with the desired specifications (rise time, pulse width, and pulse magnitude) for a given load resistance and input dc voltage. In case of moderate pulsed output voltages (i.e. few of kV), one module of the presented bipolar generator can be employed. While in case of high-voltage pulsed output, multi-module version can be employed, where each module is fed from an isolated dc source and their outputs are connected in series. Simulation models for the proposed approach are built to elucidate their performance in case of one-module as well as multi-module based generator. Finally, a scaled-down prototype for one-module of buck-boost converter-based bipolar pulse generator is implemented to validate the proposed concept.

Effect of Process Parameters on Plasma Nitriding Properties of $FeAl/SiC_p$ Composites ($FeAl/SiC_p$ 복합재료의 공정변수에 따른 플라즈마 질화 특성)

  • 박지환;김수방;박윤우
    • Journal of Powder Materials
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    • v.6 no.4
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    • pp.286-293
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    • 1999
  • This study was to analyse the relationship between process parameters of the sintered composite and plasma nitriding properties with pulsed DC plasma. Fe-40at%$SiC_p$ composites of full density were fabricated by hot pressing at 1100~$1150^{\circ}C$. Sintered Fe-40at%Al and Fe-40at%$Al/SiC_p$ alloys were nitrided under pulsed DC plasma. Excellent surface hardness in the FeAl alloys could be obtained by plasma nitriding. ($H_v$ :100gf, diffusion layer : 1100~$1450kg/mm^2$, matrix : 330~$360kg/mm^2$) The wear resistance of $FeAl/SiC_p$ composites were improved about by 4~6times than FeAl and nitrided $FeAl/SiC_p$ were improved about 2 times than $FeAl/SiC_p$ matrix.

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Growing Behavior of AlN Thin Film Deposited by Asymmetric Bipolar Pulsed DC Reactive Sputtering (비대칭 펄스 직류 반응성 스퍼터링으로 증착된 AlN 박막의 성장 거동)

  • 김주형;이전국;안진호
    • Journal of the Korean Ceramic Society
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    • v.38 no.1
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    • pp.61-67
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    • 2001
  • 비대칭 펄스 직류 반응성 스퍼터링을 이용하여 상온에서 Si(100) 기판 위에 AlN 박막을 증착하였다. 100 kHz에서 200 kHz까지 펄스 주파수의 변화 및 70%에서 90%까지 duty cycle의 변화에 따른 아크 발생과 AlN 박막의 결정성 그리고 미세 조직을 관찰하였다. Duty cycle에서 양의 펄스 유지 시간이 증가함에 따라 증착 중에 아크 발생 빈도가 현저히 감소하였고 AlN 박막의 입자 크기와 결정상의 c축 배향성이 증가하였다. 반면에 펄스 주파수 변화에 따른 아크 발생은 일정한 경향을 나타내지 않았지만 전반적으로 많은 아크가 발생했다. 아크 발생 빈도가 늘어남에 따라 c축 배향성이 감소하였다. 양의 펄스 유지 시간과 펄스 주파수가 감소함에 따라 박막의 증착 속도는 증가하였으며 440$\AA$/min의 높은 증착 속도를 나타냈다.

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Development of A Micro Pulse Concept Power Supply for E.P (전기집진기용 마이크로 펄스 전원장치 개발)

  • Nam, Jung-Han;Kim, Jong-Wha;Cho, Chang-Ho
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.1022-1024
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    • 1999
  • With the increasing demands for clean environment, development of air cleaning systems has been received increasing attention. One of the key technologies in the electrostatic precipitator (EP) is high voltage pulsed power supply, which affects the performance of the overall system. In this study, a high voltage microsecond pulse power supply for the EP is developed for 500MW coal power plants. The power supply has a DC source and a pulsed one. The ratings of the DC and the pulse source are 60kV, 800mA and 70kV, 400mA, respectively.

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I-V Characteristics of Negatively DC Pulsed Target in ECR Plasma for Landmine Detection (지뢰탐지를 위한 ECR 플라즈마에서 타깃에 고전압 DC 펄스 인가시 전압-전류 특성 분석)

  • Kim, Seong Bong;Lee, Hui Jea;Park, Seungil;Yoo, Suk Jae;Cho, Moohyun;Han, Seung-Hoon;Lim, Byeongok
    • Journal of the Korean institute of surface engineering
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    • v.47 no.1
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    • pp.53-56
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    • 2014
  • I-V characteristics of a cylindrical target in an ECR plasma were studied for sheath spatial evolutions when the target was pulsed biased to a high negative potential. The magnetic field effects on sheath thickness and sheath boundary speed were investigated by comparison between the experimental results and the theoretical results using the Child-Langmuir sheath model. The results showed that the magnetic field suppressed electron motion away from the target so that sheath thickness and sheath boundary speed decreased.

Plasma Characteristics and Substrate Temperature Change in Al:ZnO Pulse Sputter Deposition: Effects of Frequency (Al:ZnO의 펄스 스퍼터 증착에서 주파수에 따른 플라즈마의 특성과 기판 온도 변화)

  • Yang, Won-Kyun;Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.40 no.5
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    • pp.209-213
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    • 2007
  • Change of the plasma volume by pulse frequency in a bipolar pulsed DC unbalanced magnetron sputtering was investigated. As increasing the frequency at off duty 10% and at a constant power, the plasma volume was lengthened in vertical direction from the AZO target. When there is an electrically floated substrate, the vertical length of the plasma area was not affected by the pulse frequency. Instead, the diameter of the plasma volume was increased. We found that the temperature rise of a substrate was affected by the pulse frequency, too. As increasing it, the maximum temperature rise of a glass substrate was decreased from $132^{\circ}C\;to\;108^{\circ}C$.