• 제목/요약/키워드: Pulse UV

검색결과 119건 처리시간 0.025초

자외선과 가시광선 극초단 펄스 실험의 군속도 차이에 의한 시간 분해능 및 공간 겹침의 제한 (Limitations of time resolution and spatial overlap caused by group velocity mismatch in experiments using ultrashort UV and visible optical pulses.)

  • 김성규
    • 한국광학회지
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    • 제5권2호
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    • pp.252-259
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    • 1994
  • 초고속 띄움-들띄움 광학 실험에서 자외선과 가시광선을 쓸 때, 이들의 군속도 차이에 의한 두 펄스 겹침의 불일치를 계산하는 방법을 제시하여 이 효과에 의한 시간 분해능 및 실험 신호 세기의 제한을 논하였다. 이 결과에 의하면 단일 집속 렌즈를 사용하는 실험에서는 나쁜 시간 분해능과 약한 실험 신호를 야기시킨다. 색수차 보정 렌즈 쌍을 이용하는 실험의 해답은 비현실적이다. 그렇지만 각 펼스에 개별 렌즈를 사용하는 실험이나 잘려진 보조 렌즈를 주 렌즈와 함께 사용하는 실험에서는 단일 렌즈를 사용하는 실험에 비해 시간 분해능 및 실험 신호 세기의 현저한 개선을 기대할 수 있다.

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Current-Source Pulse Density Modulated Parallel Resonant Inverter with A Single Resonant Snubber and Its Unique Application

  • Wang Y.X.;Koudriavtsev O.;Konishi Y.;Okuno A.;Nakaoka M.;Lee H.W.
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2001년도 Proceedings ICPE 01 2001 International Conference on Power Electronics
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    • pp.261-265
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    • 2001
  • In this paper, a current-source type parallel indudor compensated load resonant high-frequency soft switching inverter using IGBTs for driving the newly-produced silent discharge type ozone generating tube and excimer lamp for UV generation which incorporate a single switched capacitor resonant snubber between the port in DC busline side is presented, together with its pulse modulated unique output power regulation characteristics.

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Voltage Source Resonant Inverter for Excimer Gas Discharge Load

  • Koudriavtsev Oleg;Nakaoka Mutsuo
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2001년도 Proceedings ICPE 01 2001 International Conference on Power Electronics
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    • pp.89-92
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    • 2001
  • Silent gas discharge method has been widely applied for ozone production, ultraviolet light and UV laser generation. Since ozone and ultraviolet applications have tendency to spread widely in industry, the development of efficient and low-cost power supply for such systems is a task of great impotency. This paper introduces high-frequency inverter type mode power supply designed for ozone generation tube and ultraviolet generation excimer lamp and considerations on this inverter and pulse density modulation control strategy applied in it.

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레이저를 이용한 숨쉬는 필름 가공 기술 연구 (Fabrication of Breathable Film using Laser Pulses)

  • 최훈국;손익부;노영철;최영진;장인구
    • 한국정밀공학회지
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    • 제30권4호
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    • pp.409-413
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    • 2013
  • A polypropylene film was ablated using a $CO_2$ laser, Ti-sapphire femtosecond laser, and UV nanosecond laser. For modified atmosphere packaging, polypropylene films were ablated by laser pulse with different pulse energies and measured on an optical microscope. Also, we observed the shelf life of a banana contained within packaging of a breathable zipper bag. As a result, we have demonstrated that the breathable film can efficiently extend the shelf life of respiring foods, particularly fresh fruits and vegetables. The development of breathable film laser microfabrication system will more useful for industrial applications.

LCD 세정용 상압 플라즈마 전원장치 (Power Supply for LCO Cleaning Plasma)

  • 조형기;김규식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 심포지엄 논문집 정보 및 제어부문
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    • pp.282-284
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    • 2006
  • UV lamp systems have been used for cleaning of display pannels of TFT LCD or Plasma Display Pannel (PDP). However, the needs for high efficient cleaning and low cost made high voltage plasma cleaning techniques be developed and improved. In this paper, 3kW high voltage plasma power supply system was developed for LCD cleaning. The 3-phase input voltage is rectified and then inverter system is used to make a high frequency pulse train, which is rectified after passing through a high-power transformer. Finally, bi-directional high voltage pulse switching circuits are used to generate the high voltage plasma.

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Voltage Source Resonant Inverter for Excimer Gas Discharge Load

  • Koudriavtsev, Oleg;Nakaoka, Mutsuo
    • Journal of Power Electronics
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    • 제2권3호
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    • pp.206-211
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    • 2002
  • Silent gas discharge method has been widely applied fur ozone production, ultraviolet light and UV laser generation. Since ozone and ultraviolet applications have tendency to spread widely in industry, the development of efficient and low - cost power supply for such systems is an important task at present. This paper introduces high-frequency inverter type mode power supply designed fur ozone generation tube and ultraviolet generation excimer lamp and considerations on the design of the inverter and pulse density modulation control strategy applied in it.

Plasmon Assisted Deep-ultraviolet Pulse Generation from Amorphous Silicon Dioxide in Nano-aperture

  • Lee, Hyunsu;Ahn, Heesang;Kim, Kyujung;Kim, Seungchul
    • Current Optics and Photonics
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    • 제2권4호
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    • pp.361-367
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    • 2018
  • Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous $SiO_2$ dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules

펨토초레이저와 자기조립박막을 이용한 나노스케일 패터닝 (Nanoscale Patterning Using Femtosecond Laser and Self-assembled Monolayers (SAMs))

  • 장원석;최무진;김재구;조성학;황경현
    • 대한기계학회논문집A
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    • 제28권9호
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    • pp.1270-1275
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    • 2004
  • Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

다층 PCB 기판의 미세 가공을 위한 UV레이저 어블레이션에 관한 연구 (A Study on UV Laser Ablation for Micromachining of PCB Type Substrate)

  • 장원석;김재구;윤경구;신보성;최두선
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1997년도 추계학술대회 논문집
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    • pp.887-890
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    • 1997
  • Recently micromachining using DPSSL(Diode Pumped Solid State Laser) with 3rd harmonic wavelength is actively studied in laser machining area. Micromachining using DPSSL have outstanding advantages as UV source comparing with excimer laser in various aspect such a maintenance cost, maskless machining, high repetition rate and so on. In this study micro-drilling of PCB type substrate which consists of Cu-PI-Cu layer was performed using DPSS Nd:YAG laser(355nm, wavelength) in vector scanning method. Experimental and numerical method(Matlab simulation, FEM) are used to optimize process parameter and control machining depth. The man mechanism of this process is laser ablation. It is known that there is large gap between energy threshold of copper and that of PI. Matlab simulation considering energy threshold of material is performed to effect of duplication of pulse and FEM thermal analysis is used to predict the ablation depth of copper. This study could be widely used in various laser micromachining including via hole microdrilling of PCB, and micromachining of semiconductor components, medical parts and printer nozzle and so on.

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Advanced surface processing of NLO borate crystals for UV generation

  • Mori, Yusuke;Kamimur, Tomosumi;Yoshimura, Masashi;Sasaki, Takatomo
    • 한국결정성장학회지
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    • 제9권5호
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    • pp.459-462
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    • 1999
  • Recent advances in NLO Borate Crystals for UV Generation are reviewed with the particular emphasis on the technique to improve the life time of UV optics. The laser-damage resistance of CLBO and fused silica surfaces was successfully improved after removing polishing compound by ion beam etching. The polishing compound embedded in the CLBO and fused silica surfaces were to a depth of less than 100nm. We were able to remove polishing compound without degrading the surface condition when the applied ion beam voltage was less than 200 V. The laser-induced surface damage threshold of CLBO was improved up to 15J/$\textrm{cm}^2$(wavelength: 355 nm, pulse width: 0.85 ns)as compared with that of the as-polished surface (11 J/$\textrm{cm}^2$). The laser-induced surface damage of fused silica also increased from 7.5J/$\textrm{cm}^2$ to 15J/$\textrm{cm}^2$. For the irradiation of a 266 nm high-intensity and high-repetition laser light, the surface lifetime of CLBO and fused silica could be more doubled compared with that of the as-polished surface.

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