• 제목/요약/키워드: Pt Thin Films

검색결과 829건 처리시간 0.031초

$Sr_{0.8}Bi_{2.4}Ta_2O_9/Pt/Si$ 구조의 수소열처리에 의한 강유전특성 열화에 미치는 W-N/Pt 전극효과 (Effects of W-N/Pt Bottom Electrode on the Ferroelectric Degradation of $Sr_{0.8}Bi_{2.4}Ta_2O_9/Pt/Si$ Structure due to the Hydrogen Annealing)

  • 이창우
    • 마이크로전자및패키징학회지
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    • 제11권4호
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    • pp.87-91
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    • 2004
  • [ $Sr_{0.8}Bi_{2.4}Ta_2O_9(SBT)/Pt$ ] 구조에서 $350^{\circ}C$ 온도로 수소열처리에 의한 강유전특성 열화를 방지하기 위한 W-N/Pt 하부전극의 효과를 살펴보았다. 그 결과 Pt와 SBT 박막사이에 증착된 W-N박막에 의해 수소의 확산을 차단할 수 있었다. Pt 표면에서 수소원자가 화학적인 흡착이 일어나지 않음으로써 흡착된 수소가 SBT 박막내의 산소와 결합하게 됨으로써 oxygen deficiency가 발생하는 것을 막을 수 있었다. W-N 박막이 양호한 확산방지막으로 작용하여 강유전특성의 열화현상을 방지 할 수 있었다.

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캐패시터용 강유전체 박막의 제조 및 특성 (Fabrication and Properties of Ferroelectric Thin Film for Capacitor)

  • 소병문;박춘배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 전문대학교육위원 P
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    • pp.31-34
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    • 1999
  • In the present study, we fabricated stoichiometric $(Ba_{1-x}Sr_x)TiO_3$ thin films at various substrate temperature and contents using of magnetron sputtering method on optimized Pt-based electrodes (Pt/TiN/$SiO_2$/Si). The substate temperature deposited at 200[ $^{\circ}C$], 400[$^{\circ}C$] and 600[$^{\circ}C$] and crystalline BST thin films show above 400[$^{\circ}C$]. Also, the composition of $(Ba_{1-x}Sr_x)TiO_3$ thin films deposited on Si wafer substrate at 400[$^{\circ}C$] were closed to stoichiometry($1.015{\sim}1.093$ in A/B ratio), but compositional deviation from a stoichiometry is larger as $SrCO_3$ is added. The drastic decrease of dielectric constant and increase of dielectric loss in $(Ba_{1-x}Sr_x)TiO_3$thin films is observed above 100[kHz]. V-I characteristics of $(Ba_{1-x}Sr_x)TiO_3$ thin films show the decrease of leakage current with the increase of $SrCO_3$ contents.

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Metal-Organic Decomposition법에 의한 강유전성 $YMnO_3$ 박막의 제조 및 특성 (Preparation of Ferroelectric $YMnO_3$ Thin Films by Metal-Organic Decomposition Process and their Characterization)

  • 김제헌;강승구;김응수;김유택;심광보
    • 한국세라믹학회지
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    • 제37권7호
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    • pp.665-672
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    • 2000
  • The ferroelectric YMnO3 thin films were prepared by MOD(metal-organic decomposition) method with Y- and Mn-acetylacetonate as starting materials. Thin films were grown on various substrates by spin-coating technique. The crystalline phases of the thin films were identified by X-ray diffractometer as a function of heat-treatment temperature, pH of coating solution and substrate. In addition, the effect of Mn/Y molar ratio(0.8~1.2) on the formation of hexagonal-YMnO3 phase was investigated. In forming highly c-axisoriented hexagonal-YMnO3 single phase, the Pt coated Si substrate was more effective than the bare Si substrate, and the optimum heat-treatment condition was at 82$0^{\circ}C$ for 30 min. Higher Mn/Y molar ratio within 0.8~1.2 and pH of YMnO3 precursor solution within 0.5~2.5 favored formation of ferroelectric hexagonal phase rather than orthorhombic phase. Leakage current density of the hexagonal-YMnO3 thin film formed on Pt(111)/TiO2/SiO2/Si substrate was low enough as 0.4~4.0$\times$10-8(A/$\textrm{cm}^2$) at 5 V and its remanent polarization(Pr), calculated from the P-E hysteresis loop, was 3 nC/$\textrm{cm}^2$.

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Ca 치환량에 따른 SCT 박막의 제조 및 전기적 특성 (Fabrication and Electrical Properties of SCT thin Film with Substitution Contents of Ca)

  • 김진사;이준웅
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권10호
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    • pp.559-563
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    • 2000
  • The $(Sr_{1-x}Ca_x)TiO_3(SCT)$ thin films are deposited on Pt-coated(Pt/TiN/$SiO_2$/Si) using RF sputtering method with substitutional contents of Ca. The maximum grain of thin films is obtained by substitution of Ca at 15[mol%]. Also the composition of SCT thin films were closed to stoichiometry(1.081∼1.117 in A/B/ ratio). The dielectric constant was increased with increasing the substitutional contents of Ca, while it was decreased if the substitutional contents of Ca exceeded over 15[mol%]. The dielectric constant changes almost linearly in temperature ranges of -80∼+90[^${\circ}C$]. The temperature properties of the dielectric loss have a stable value within 0.02 independent of the substitutional contents of Ca. All SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequency, and the relaxation frequency is observed above 2000[kHz]. The current-voltage characteristics of SCT15 thin films showed the increasing leakage current as the measuring temperature increase.

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RF 스퍼터링법에 의한 SCT 박막의 기판온도 영향 (Influence of Substrate Temperature of SCT Thin Film by RF Sputtering Method)

  • 오용철;김진사;조춘남;신철기;송민종;소병문;최운식;김충혁;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.718-721
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    • 2004
  • The $(Sr_{0.9}Ca_{0.1})TiO_3$(SCT) thin films are deposited on Pt-coated electrode$(Pt/TiN/SiO_2/Si)$ using RF sputtering method at various substrate temperature. The optimum conditions of RF power and $Ar/O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about $18.75[{\AA}/min]$. The crystallinity of SCT thin films were increased with increase of substrate temperature in the temperature range of $100\sim500[^{\circ}C]$. The dielectric constant of SCT thin films were increased with the increase of substrate temperature, and changed almost linearly in temperature ranges of $-80\sim+190[^{\circ}C]$. The current-voltage characteristics of SCT thin films showed the increasing leakage current as the substrate temperature increases.

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졸-겔법으로 Pt/Ti/SiO2/Si 기판위에 제작된 (Bi,La)Ti3O12 강유전체 박막의 특성 연구 (Charaterization of (Bi,La)Ti3O12 Ferroelectric Thin Films on Pt/Ti/SiO2/Si Substrates by sol-gel Method)

  • 황선환;장호정
    • 한국재료학회지
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    • 제12권11호
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    • pp.835-839
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    • 2002
  • Metal-Ferroelectric-Metal(MFM) capacitors were prepared using $Bi_{3.3}$ $La_{0.7}$ $Ti_3$$O_{12}$ (BLT) ferroelectric thin films which were spin coated on $Pt/Ti/SiO_2$/Si substrates by the Sol-Gel method. BLT thin films annealed at above $650^{\circ}C$ showed polycrystalline structures with typical c-axis preferred orientation. The grain size and surface roughness were increased as the annealing temperature increased from $650^{\circ}C$ to $700^{\circ}C$. In addition, the full width at half maximum (FWHM) values were decreased with increasing annealing temperatures, indicating the improvement of crystallinity. The remanent polarization (2Pr= $Pr^{+}$ $+Pr^{-) }$ and leakage current of the BLT film annealed at $650^{\circ}C$ were about 29.3 $\mu$C/cm$^2$ and $2.3$\times$10^{-8}$$ A/cm^2$ at 3V. There were no distinct changes in the retention charges after $10^{10}$ polarization switching cycles, showing good fatigue property of the annealed BLT films.

Pt 코팅된 Si 기판에 제조한 KLN 박막의 구조적 특성 (Structural Properties of KLN Thin Film Deposited on Pt Coated Si Substrate)

  • 박성근;이기직;백민수;전병억;김진수;남기홍
    • 한국전기전자재료학회논문지
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    • 제14권5호
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    • pp.410-416
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    • 2001
  • KLN thin films were fabricated on Pt coated Si(100) wafer using an rf-magnetron sputtering method. The grown KLN thin film consists of 4-fold grains. In this experiment, the structure of 4-fold grained thin film was investigated using XRD and SEM measurements. Pt layer was also deposited using the rf-magnetron sputtering method,. XRD measurement showed that he Pt thin film has Gaussian distribution form with strong (111) direction orientation. The KLN thin film has preferred-orientation of (001) direction, and the peak consists of 2 separate peaks; one with broad FWHM and the other with narrow FWHM. The sharp peak is due to single crystal, and combining with Em results, the 4-fold grain consists of singel crystals with c-axis normal to substrate.

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RF 스퍼터링법에 의한 SBT박막의 분극특성 (Polarization Properties of SBT Thin Film by RF Sputtering)

  • 김태원;조춘남;김진사;유영각;김충혁;박용필;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.893-896
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    • 2000
  • The SrBi$_2$Ta$_2$O$\sub$9/(SBT) thin films are deposited on Pt-coated electrode(Pt/TiO$_2$/SiO$_2$/Si) using RF sputtering method. The SBT thin films deposited on substrate at 400-500[$^{\circ}C$]. SBT thin film deposited on Pt-coated electrodes have the cubic perovskite structure and polycrystalline state. With increasing annealing temperature from 600[$^{\circ}C$] to 850[$^{\circ}C$], flourite Phase was crystalized to 650[$^{\circ}C$] and Bi-layered perovskite phase was crystalized above 700[$^{\circ}C$]. The maximum remanent polarization is 11.73 ${\mu}$C/cm$^2$at 500[$^{\circ}C$] of substrate temperature and 750[$^{\circ}C$] annealing temperature for 30min.

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