• 제목/요약/키워드: Probe Characteristics

검색결과 895건 처리시간 0.025초

탐침형 정보저장 기술을 위한 실리콘 탐침의 나노 마멸 특성에 관한 연구 (Nano-wear Characteristics of Silicon Probe Tip for Probe Based Data Storage Technology)

  • 이용하;정구현;김대은;유진규;홍승범
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.552-555
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    • 2004
  • The reliability issue of the probe tip/recording media interface is one of the most crucial concerns in the Atomic Force Microscope (AFM)-based recording technology. In this work, the tribological characteristics of the probe/media interface were investigated by performing wear tests using an AFM. The ranges of applied normal load and sliding velocity for the wear test were 10 to 50nN and 2 to 20$\mu$m/s respectively. The damage of the probe tip was quantitatively as well as qualitatively characterized by Field Emission Scanning Probe Microscope (FESEM) analysis and calculated based on Archard s wear equation. It was shown that the wear coefficient of the probe tip was in the order of 10$^{-4}$ ~ 10$^{-3}$ , and significant contamination at the end of the probe tip was observed. Thus in order to implement the AFM-based recording technology, tribological optimization of the probe/media interface must be achieved.

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근접장 광학계의 광학적 및 기계적 특성 분석과 근접장 간격제어 (Optical and Mechanical Characteristics of NF System and NF Gap Control)

  • 오형렬;이준희;권대갑;김수경
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2000년도 춘계학술대회논문집
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    • pp.1528-1532
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    • 2000
  • The conventional optics and near field optics are compared numerically in the view points of the spot size and propagation characteristics. The decaying characteristics of near field light require the optics to access the object within several tens of nanometers. Therefore the gap control is one of the main issues in the near field optics area. In this paper the gap control is done by using the shear force of the NF(Near Field) probe and the characteristics are examined. The probe is modeled as a 2'nd order mass-spring-damper system driven by a harmonic force. The primary cause of the decrease in vibration amplitude is due to the damping force - shear force - between the surface and the probe. Using the model, damping constant and resonance frequency of the probe is calculated as a function of probe-sample distance. Detecting the amplitude and phase shift of the NF probe attached to the high Q-factor piezoelectric tuning fork, we can control the position of the NF probe about 0 to 50nm above the sample. The feedback signal to regulate the probe-sample distance can be used independently for surface topography imaging. 3-D view of the shear force image of a testing sample with the period of $1{\mu}m$ will be shown.

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플라즈마 파라메타 측정용 고속 langmuir프로브 구동회로 실현 및 적용 (A study on fast langmuir probe driving circuit for measurement of plasma parameter and its application)

  • 신중흥;고태언;김두환;박정후
    • E2M - 전기 전자와 첨단 소재
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    • 제9권5호
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    • pp.506-511
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    • 1996
  • This paper deals with an inexpensive, simple and fast Langmuir probe sweeping circuit and its application. This sweeper completes a probe trace in a 1 ms order. Futhermore, the circuit drives a maximum probe voltage of $\pm$30V and has a maximum probe current capability of a few amperes. The plasma parameters are successfully determined using the fast Langmuir probe method.

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테스트 프로브 접점 위치와 구조의 신호 전달 특성 영향 (Effect of Contact Position and Structure of Test Probe on Its Signal Transmission Characteristics)

  • 이병성;김문정
    • 한국산학기술학회논문지
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    • 제19권10호
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    • pp.324-329
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    • 2018
  • 본 논문은 테스트 프로브의 플런저 접점 위치와 구조에 따른 신호 전달 특성 변화를 분석하였다. 플런저 접점 위치는 실제 동작 상황을 고려하였으며, 플런저 내부 접점과 바렐 입구 접점으로 나누어 테스트 프로브의 고주파 성능 변화를 조사하였다. 또한 테스트 프로브는 더블, 싱글, 아웃스프링의 3 가지 구조로 나누고 구조 차이에 따른 신호 전달 특성 변화를 분석하였다. 고주파 전자기 해석 툴 HFSS를 사용하여 삽입손실과 반사손실을 계산하고, Q3D 시뮬레이션을 이용하여 테스트 프로브의 임피던스를 분석한다. 접점 위치에 따른 계산 결과, 바렐 입구 접점의 삽입손실이 플런저 내부 접점보다 감소하였다. 이를 통해 테스트 프로브의 접점 위치에 따라 테스트 프로브의 고주파 성능이 달라질 수 있음을 확인하였다. 구조에 따른 신호 전달 특성의 비교 분석에서는 아웃스프링 프로브가 보다 우수한 삽입손실과 반사손실 주파수 특성을 보여주었다. 테스트 프로브 구조별로 특성 임피던스를 계산하였으며 더블 프로브와 싱글 프로브는 $30.8{\Omega}$으로 동일한 결과를 보여주었다. 반면에 아웃스프링 프로브는 $47.1{\Omega}$의 결과가 나타났다. 아웃스프링 프로브의 특성 임피던스가 $50{\Omega}$에 보다 근접하여 높은 신호 전달 특성을 보인 것으로 분석된다. 아웃스프링 프로브가 높은 삽입손실과 반사손실 특성을 보여 고속 동작 제품의 성능 검사에 적합한 것으로 예상한다.

Cutoff Probe를 이용한 자화유도결합 플라즈마의 특성 연구 (A Study on Magnetized Inductively Coupled Plasma Using Cutoff Probe)

  • 손의정;김동현;이호준
    • 전기학회논문지
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    • 제65권10호
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    • pp.1706-1711
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    • 2016
  • Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56MHz driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.

이중 로듐 층을 갖는 멤스 프로브 팁의 특성 (Characteristics of MEMS Probe Tip with Multi-Rhodium Layer)

  • 박동건;박용준;임슬기;김일;신상훈;조현철;박승필;김동원
    • 한국표면공학회지
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    • 제45권2호
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    • pp.81-88
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    • 2012
  • Probe tip, which should have not only superior electrical characteristics but also good abrasion resistance for numerous contacts with semiconductor pads to confirm their availability, is essential for MEMS probe card. To obtain good durability of probe tip, it needs thick and crack-free rhodium layer on the tip. However, when the rhodium thickness deposited by electroplating increased, unwanted cracks by high internal stress led to serious problem of MEMS probe tip. This article reported the method of thick Rh deposition with Au buffer layer on the probe tip to overcome the problem of high internal stress and studied mechanical and electrical properties of that. MEMS probe tip with double-Rh layer had good contact resistance and durability during long term touch downs.

Study on Validity and Reliablity of the Cutoff Probe and Langmuir Probe via Comparative Experiment in the Processing Plasma

  • Kim, D.W.;You, S.J.;You, K.H.;Lee, J.W.;Kim, J.H.;Chang, H.Y.;Oh, W.Y.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.576-576
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    • 2013
  • Recently, diagnostics of plasma becomes more important due to requirement of precise control of plasma processing based on measurement of plasma characteristics. The Langmuir probe has been used for the diagnostics but it has an inevitable uncertainty and error sources such as incorrect tip length and RF noise. Instead of the Langmuir probe, various diagnostic methods have been developed and researched. The cutoff probe is promising one for plasma density using microwaves and resonance phenomenon at the plasma frequency. The cutoff probe has various advantages as follows; (i) it is simple and robust, (ii) it uses few assumptions, and (iii) it is free from deposition by reactive gas. However, the cutoff probe also has uncertainty and error sources such as gap between tips, tip length, direction of tip plane, and RF noise. In this study, the uncertainty and error sources in manufacturing both probes and in diagnostics process were analyzed via comparative experiment at various discharge conditions. Furthermore, to reveal the user dependence of both probes, three well trained Ph. D students made the Langmuir probe and the cutoff probe, respectively, and it were analyzed. Thought this study, it is established that reliability and validity of the Langmuir probe and the cutoff probe related with not only the intrinsic characteristics of probes but also probe user.

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보조전극의 배치 및 주파수에 따른 매설지선의 접지임피던스 특성 (Characteristics for Ground Impedance of Counterpoise according to Position of Auxiliary Probe and Frequency)

  • 길형준;김동우
    • 한국안전학회지
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    • 제27권4호
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    • pp.33-37
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    • 2012
  • This paper describes the characteristics for ground impedance of counterpoise according to position of auxiliary probe and frequency using the fall-of-potential method and the testing techniques to minimize the measuring errors are proposed. The fall-of-potential method is theoretically based on the potential and current measuring principle and the measuring error is primarily caused by the position of auxiliary probes. In order to analyze the effects of ground impedance due to the distance of the current probe and frequency, ground impedances were measured in case that the distance of current probe was located from 10[m] to 100[m] and the measuring frequency was ranged in 55 [Hz], 128[Hz], 342[Hz], and 513[Hz]. The results could be help to determine the position of auxiliary probe when the ground impedance was measured at grounding system.

Eddy Current Signal Analysis for Transmit-Receive Pancake Coil on ECT Array Probe

  • Lee, Hyang-Beom
    • 비파괴검사학회지
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    • 제26권1호
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    • pp.25-29
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    • 2006
  • In this paper, the eddy current signals come from a pair oi transmit-receive (T/R) pancake coil on ECT array Probe are analyzed with the variations of the lift-of and of the distance between transmit and receive coils. To obtain the electromagnetic characteristics of the probes, the governing equation describing the eddy current problems is derived from Maxwell's equation and is solved using three-dimensional finite element method. Eddy current signals from T/R coils on ECT array probe have quite different characteristics compared with ones from impedance coil on rotating pancake coil probe. The results in this paper ran be helpful when the field eddy current signals from ECT array probe are evaluated.

Comparative Study on Microwave Probes for Plasma Density Measurement by FDTD Simulations

  • Kim, D.W.;You, S.J.;Na, B.K.;Kim, J.H.;Chang, H.Y.;Oh, W.Y.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.218.1-218.1
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    • 2014
  • In order to measure the absolute plasma density, various probes are proposed and investigated and microwave probes are widely used for its advantages (Insensitivity to thin non-conducting material deposited by processing plasmas, High reliability, Simple process for determination of plasma density, no complicate assumptions and so forth). There are representative microwave probes such as the cutoff probe, the hairpin probe, the impedance probe, the absorption probe and the plasma transmission probe. These probes utilize the microwave interactions with the plasma-sheath and inserted structure (probe), but frequency range used by each probe and specific mechanisms for determining the plasma density for each probe are different. In the recent studies, behaviors of each microwave probe with respect to the plasma parameters of the plasma density, the pressure (the collision frequency), and the sheath width is abundant and reasonably investigated, whereas relative diagnostic characteristics of the probes by a comparative study is insufficient in spite of importance for comprehensive applications of the probes. However, experimental comparative study suffers from spatially different plasma characteristics in the same discharge chamber, a low-reproducibility of ignited plasma for an uncertainty in external discharge parameters (the power, the pressure, the flow rate and so forth), impossibility of independently control of the density, the pressure, and the sheath width as well as expensive and complicate experimental setup. In this paper, various microwave probes are simulated by finite-different time-domain simulation and the error between the input plasma density in FDTD simulations and the measured that by the unique microwave spectrums of each probe is obtained under possible conditions of plasma density, pressure, and sheath width for general low-temperature plasmas. This result shows that the each probe has an optimum applicable plasma condition and reliability of plasma density measurement using the microwave probes can be improved by the complementary use of each probe.

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