• Journal of Electrical Engineering and Technology
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• 제11권3호
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• pp.609-617
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• 2016

Belt-driven Starter Generator (BSG) differs from other mild hybrid systems as the crankshaft of vehicle are not run off. Motor permits a low-cost method of adding mild hybrid capabilities such as start-stop, power assist, and mild levels of regenerative braking. Wound rotor synchronous motor (WRSM) could be adopted in BSG system for HEV e-Assisted application instead of the interior permanent magnet synchronous motor (IPMSM). In practice, adequate torque is indispensable for starter assist system, and energy conversion should be taken into account for the HEV or EV as well. Particularly, flux weakening control is possible to realize by adjusting both direct axis components of current and field current in WRSM. Accordingly, this paper present an off-line current acquisition algorithm that can reasonably combine the stator and field current to acquire the maximum torque, meanwhile the energy conversion is taken into consideration by losses. Besides, on account of inductance influence by non-uniform air gap around rotor, nonlinear inductances and armature flux linkage against current variation are proposed to guarantee the results closer to reality. A computer-aided method for proposed algorithm are present and results are given in form of the Look-up table (LUT). The experiment shows the validity of algorithm.

• Advances in materials Research
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• 제2권3호
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• pp.133-140
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• 2013

This paper aims to focus on the microwave processing of thick films which is a fast, cheap technique and could be the alternative to the currently used conventional high temperature processing technique. Microwave processing has gained worldwide acceptance as a novel method for heating and sintering a variety of materials, as it offers specific advantages in terms of speed, energy efficiency, process simplicity, finer microstructures and lower environmental hazards. Silver conducting thick films were prepared and processed in the household microwave oven. The films sintered at different time period by keeping the other parameter such as microwave power, film thickness etc constant. The microstructure analysis revealed that the surface morphology of the microwave processed films become compact with respect to the processing time. The sheet resistance for microwave sintered silver films is in the range of 0.003 to $1.207{\Omega}/{\Box}$ where as the films fired at 750 and $850^{\circ}C$ showed the resistance of 0.009 and $0.003{\Omega}/{\Box}$ which can be comparable. The results revealed that the microstructure of the microwave sintered films has more uniform and compact surface than that of the conventionally fired films. The paper reports upon the preparation of silver thick film by screen printing technique and processing the same by microwave which also compared with the conventionally processed thick films.

• 정보처리학회논문지A
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• 제13A권5호
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• pp.435-444
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• 2006

위치기반서비스(LBS: Location-Based Services)의 이용자가 급증함으로써 최근 위치 트리거(Location Trigger) 서비스에 대한 다양한 응용분야가 등장하고 있다. 위치 트리거는 사용자의 이동 위치를 감지하여 특정한 지역에 진입, 존재, 이탈할 경우 사용자에게 단문문자서비스(SMS), 전자메일 등을 통하여 알리거나 또는 사용자에 의해 미리 정의된 특정한 서비스를 제공하는 기술이다 기존에 이러한 위치 트리거 기술은 위치 제공 서버에 주기적으로 위치정보를 요청하여 처리해 왔으나 LBS 서비스 가입자가 증가할수록 서버 및 통신 부하로 인하여 시스템의 성능 저하를 초래하게 된다. 이에 본 논문에서는 위치 트리거를 처리함에 있어서 이동통신망의 위치서버의 부하를 줄이고 모바일 단말기에 임베디드 된 GPS 디바이스의 전력 소모량을 최소화하는 멀티레벨 위치 트리거 방법에 대하여 연구하였다. 실제 본 논문에서 제시하는 방법을 설계하고 테스트베드를 구축하여 성능을 평가함으로써 위치 트리거 기술의 성능 향상에 기여하였다.

• 한국전기전자재료학회논문지
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• 제16권6호
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• pp.449-453
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• 2003

Ferroelectric YMnO$_3$ thin films were etched with Ar/Cl$_2$ and CF$_4$/Cl$_2$ inductively coupled plasma (ICP). The maximum etch rate of YMnO$_3$ thin film was 300 $\AA$/min at a Ar/Cl$_2$ gas mixing ratio of 2/8, a RF power of 800 W, a DE bias of 200 V, a chamber pressure of 15 mTorr, and a substrate temperature of 30 $^{\circ}C$. From the X-ray photoelectron spectroscopy (XPS) analysis, yttrium etched by chemical reactions with Cl radicals assisted by Ar ion bombardments in Ar/Cl$_2$ plasma. In CF$_4$/Cl$_2$ plasma, yttrium are remained on the etched surface of YMnO$_3$ and formed of nonvolatile YF$_{x}$ compounds manganese etched effectively by chemical reactions with Cl and F radicals. From the X-ray diffraction (XRD) analysis, the (0004) diffraction peak intensity of the YMnO$_3$ thin film etched in Ar/Cl$_2$ plasma shows lower value than that in CF$_4$/Cl$_2$ plasma. It indicates that the crystallinty of YMnO$_3$ thin film is more easily damaged by the Ar ion bombardment than the changes of stoichiometry due to nonvolatile etch by-products.s.

• 한국표면공학회지
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• 제46권4호
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• pp.168-174
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• 2013

In this study, low-cost, high-speed deposition, excellent processability, high mechanical strength and electrical conductivity, chemical stability and corrosion resistance of stainless steel to meet the obsessive-compulsive (0.1 mm or less) were selected CrN thin film. new price reduction to sputter deposition causes - the possibility of sublimation source for inductively coupled plasma Cr rods were attempts by DC bias. 0.6 Pa Ar inductively coupled plasmas of 2.4 MHz, 500 W, keeping Cr Rod DC bias power 30 W (900 V, 0.02 A) is applied, $N_2$ flow rate of 0.5, 1.0, 1.5 sccm by varying the characteristics of were analyzed. $N_2$ flow rate increases, decreases and $Cr_2N$, CrN was found to increase. In addition to corrosion resistance and contact resistance, corrosion resistance, electrical conductivity was evaluated. corrosion current density than $N_2$ 0 sccm was sure to rise in all, $N_2$ 1 sccm at $4.390{\times}10^{-7}$ (at 0.6 V) $A{\cdot}cm^{-2}$, respectively. electrical conductivity process results when $N_2$ 1 sccm 28.8 $m{\Omega}/cm^2$ with the lowest value of the contact resistance was confirmed that came out. The OES (SQ-2000) and QMS (CPM-300) using a reactive deposition process to add $N_2$ to maintain a uniform deposition rate was confirmed that.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.117-117
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• 2000

높은 광학적 투과성과 전기전도성을 갖는 ITO film은 solar cell같은 optoelectronic device나 휴대용 소형 TV, flat panel display 등의 투명전극으로 그 응용 분야가 광범위하여 많은 연구가 수행되어져 왔다. 기판으로서 유리를 사용할 때 생기는 활용범위 제한을 극복하고자 최근 유기물 위에 증착이 가능한 저온 증착방법에 대한 연구가 활발히 이루어지고 있다. 그 가운데 이온빔과 같은 energetic한 beam을 이용한 박막의 제조는 기판을 플라즈마 발생지역으로부터 분리시켜 이온빔의 flux 및 에너지, 입사각 등의 자유로운 조절을 통해 상온에서도 우수한 성질의 박막형성 가능성이 제시되어 지고 있다. ITO박막을 형성하는 방법 중 스프레이법이나 CVD법과 같은 화학적 증착방법은 증착시 350-50$0^{\circ}C$의 고온이 필요하고 현재 가장 많이 응용되어 지고 있는 sputter법은 15$0^{\circ}C$정도의 가열이 필요하므로 앞으로 응용가능성이 매우 커서 많은 연구가 진행중인 플라스틱과 아크릴 같은 flexible 한 기판위 증착에 적용이 불가능하다. 본 실험에서는 IBAD(Ion Beam Assisted Deposition)법을 이용하여 저온 ITO film을 유리와 유기막위에 증착하는 연구를 수행하였다. 유기막위에 증착된 ITO는 보다 가볍고 충격에 강하고 유리에 못지 않은 투과성을 가지고 있으나 현재 film의 quality 향상에 대한 요구가 증대되어 지고 있는 실정이다. 따라서, 본 실험에서는 dual oxygen ion gun의 조건변화에 따른 ITO film의 특성변화를 관찰하였다. 고정된 증？율에 한 개 ion gun에 ion flux를 고정시킨 후 또 다른 ion gun에서 발생하는 oxygen radical의 영향을 조사하였으며 oxygen radical의 rf power에 따른 변화는 OES(Optical emission spectroscopy)를 사용하였다. 너무 적은 oxygen ion beam flux나 oxygen radical은 film의 전도도 및 투과도를 저하시켰고 반면 너무 과도한 flux의 증가 시는 전도도는 감소하였고 투과도는 증가하는 경향을 보였다. 기판에 도달하는 oxygen ion flux는 faraday cup을 이용하여 측정하였으며 증착된 ITO film은 XPS, UV-spectrometer, 4-point probe를 이용하여 분석하였다.

• 한국진공학회지
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• 제8권1호
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• pp.75-82
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• 1999

내부 삽입형 유도결합 플라즈마를 이온화원으로 하는 I-PVD장치를 이용하여 박막을 형성하는데 중요한 요소의 하나가 이온의 입사에너지이며, 이는 플라즈마 전위와 기판 전위의 차이에 의해서 결정된다. 이를 감소시킬 목적으로 안테나 여기 주파수를 4MHz의 중간주파수에서, 안테나의 정합 회로를 변형형, 부동형의 2가지로 변화시키고, 부동형에서는 바이어스 저항의 값을 가변시켰다. 그 결과 Ar 플라즈마에서 4MHz RF 전력 600 W에서 5 mTorr에서 30 mTorr의 넓은 압력 범위에서 5V 미만의 낮은 평균 플라즈마 전위와 60V의 안테나 전압을 얻었다. 또한 출력측에 설치한 RLC회로의 조절을 통해서 RF전력 500 W에서 RF 입력 및 출력단의 Rf 안테나 유기 전압을 50V의 아주 낮은 값으로 유지시킬 수 있었다. 이때의 안테나 및 플라즈마의 총 임피던스는 약 10$\Omega$이었으며, 리액턴스를 0.05$\Omega$수준으로 유지하였을 때 가장 낮은 전압을 얻었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.68-69
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• 2011

The process of charge transfer at the interface between two semiconductors or between a metal and a semiconductor plays an important role in many areas of technology. The optimization of such devices requires a good theoretical description of the interfaces involved. This, in turn, has motivated detailed mechanistic studies of interfacial charge-transfer reactions at metal/organic, organic/organic, and organic/inorganic semiconductor heterojunctions. Charge recombination of photo-induced electron with redox species such as oxidized dyes or triiodide or cationic HTM (hole transporting materials) at the heterogeneous interface of $TiO_2$ is one of main loss factors in liquid junction DSSCs or solid-state DSSCs, respectively. Among the attempts to prevent recombination reactions such as insulating thin layer and lithium ions-doped hole transport materials and introduction of co-adsorbents, although co-adsorbents retard the recombination reactions as hydrophobic energy barriers, little attention has been focused on the anchoring processes. Molecular engineering of heterogeneous interfaces by employing several co-adsorbents with different properties altered the surface properties of $TiO_2$ electrodes, resulting to the improved power conversion efficiency and long-term stability of the DSSCs. In this talk, advantages of the coadsorbent-assisted sensitization of N719 in preparation of DSSCs will be discussed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.159-162
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• 2002

Ferroelectric $YMnO_{3}$ thin films were etched with $Ar/Cl_{2}$ and $CF_{4}/Cl_{2}$ inductivly coupled plasma (ICP). The maximum etch rate of $YMnO_{3}$ thin film was $300{\AA}/min$ at a $Ar/Cl_{2}$ gas mixing ratio of 2/8, a RF power of 800 W, a dc bias of 200 V, a chamber pressure of 15 mTorr, and a substrate temperature of ${30^{\circ}C}$. From the X-ray photoelectron spectroscopy (XPS) analysis ， yttrium not only etched by chemical reactions with Cl radicals, but also assisted by Ar ion bombardments in $Ar/Cl_{2}$ plasma. In $CF_{4}/Cl_{2}$ plasma, yttrium are remained on the etched surface of $YMnO_{3}$ and formed of nonvolatile YFx compounds Manganese etched effectively by chemical reactions with Cl and F radicals. From the X-ray diffraction (XRD) analysis, the (0004) diffraction peak intensity of the $YMnO_{3}$ thin film etched in $Ar/Cl_{2}$ plasma shows lower value than that in $CF_{4}/Cl_{2}$ plasma. It is indicates that the crystallinty of $YMnO_{3}$ thin film is more easily damaged by the Ar ion bombardment than the changes of stoichiometry due to nonvolatile etch by-products.

• 한국세라믹학회지
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• 제56권5호
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• pp.497-505
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• 2019

Lanthanum-based transition metal cations containing perovskites have emerged as potential catalysts for the intermediate-temperature (600-800℃) oxygen reduction reaction (ORR). Here, we report a facile acetylacetone-assisted combustion route for the synthesis of nanostructured La_0.6Sr_0.4Co_0.2Fe_0.8O_3-δ (LSCF6428) cathodes for intermediate-temperature solid-oxide fuel cells (IT-SOFCs). The as-prepared powder was analyzed by thermogravimetry analysis-differential scanning calorimetry. The powder calcined at 800℃ was characterized by X-ray diffraction, scanning electrode microscopy, energy dispersive X-ray spectroscopy, and Brunauer-Emmett-Teller surface area measurements. It was found that the porosity of the air electrode significantly increased by utilizing the nanostructured LSCF6428 instead of commercial powder. The performance of a single cell fabricated with the nanostructured LSCF6428 cathode increased by 112%, from 0.4 to 0.85 W cm^-2, at 700℃. Electrochemical impedance spectroscopy showed a considerable reduction in the area-specific resistance and activation energy from 133.5 to 61.5 kJ/mol, resulting in enhanced electrocatalytic activity toward ORR and overall cell performance.