• 한국건축시공학회지
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• 제15권2호
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• pp.153-160
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• 2015

본 연구는 대리석가공과정에 발생하는 부산물인 폐 대리석 분말을 고유동 콘크리트의 유동성, 충전성 및 강도특성에 어떠한 영향을 주는지를 분석하였다. 실험결과, 폐 대리석 분말을 혼입한 굳지 않은 고유동 콘크리트 특성을 살펴보면 유동성이 증가하였고, 재료분리 저항성, 충전성이 우수하였다. 또한 경화한 고유동 콘크리트에서 압축강도는 폐 대리석 분말의 치환율 15%까지 모든 재령에서 압축강도가 증가하여 폐 대리석 분말의 최적 치환율은 15% 이내가 적정할 것으로 판단된다. 이상의 실험결과를 바탕으로 폐 대리석 분말을 고유동 콘크리트의 충전재로 활용하면 산업부산을 활용할 수 있어 환경오염방지와 콘크리트 제조시 원가절감의 이점을 동시에 달성할 수 있을 것으로 판단된다.

• 대한심미치과학회지
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• 제23권1호
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• pp.16-26
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• 2014

CAD/CAM에서 사용할 수 있는 소재는 composite, ceramic, hybrid 그리고 metal이 있다. 그중에 진료실 CAD/CAM에서는 주로 monolithic ceramic 테크닉을 사용하는 데, monolithic ceramic 테크닉이란 한 가지 소재로만 제작하는 방법을 말한다. 블럭상태의 소재를 최종치아형태로 깎아 폴리싱해서 사용하거나, 열을 가해서 사용하는 방법으로, 기존의 도재 축조 작업이 필요 없다. 심미성에서는 다소 부족하지만, 1시간 안에 제작이 가능하므로 1회, 1일 방문으로 치료를 완료할 수 있고, 소재의 안정성이 높으며(녹이거나 상변화를 시키지 않음에 따라 왜곡이 생기거나 강도가 약해질 가능성이 적음), 컴퓨터 조작(CAD 작업)으로 치아를 디자인하여 제작하므로 진료실에서 쉽게 작업할 수 있다는 장점이 있다. 이 테크닉에 사용할 수 있는 소재를 임상적 관점에서 세대별로 따라 분류해 보았다.

• The Journal of Advanced Prosthodontics
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• 제7권2호
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• pp.151-159
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• 2015

PURPOSE. To describe and characterize the surface topography and cleanliness of CAD/CAM manufactured zirconia abutments after steaming and ultrasonic cleaning. MATERIALS AND METHODS. A total of 12 ceramic CAD/CAM implant abutments of various manufacturers were produced and randomly divided into two groups of six samples each (control and test group). Four two-piece hybrid abutments and two one-piece abutments made of zirconium-dioxide were assessed per each group. In the control group, cleaning by steam was performed. The test group underwent an ultrasonic cleaning procedure with acetone, ethyl alcohol and antibacterial solution. Groups were subjected to scanning electron microscope (SEM) analysis and Energy-dispersive X-ray spectroscopy (EDX) to verify and characterize contaminant chemical characterization non- quantitatively. RESULTS. All zirconia CAD/CAM abutments in the present study displayed production-induced wear particles, debris as well as organic and inorganic contaminants. The abutments of the test group showed reduction of surface contamination after undergoing an ultrasonic cleaning procedure. However, an absolute removal of pollutants could not be achieved. CONCLUSION. The presence of debris on the transmucosal surface of CAD/CAM zirconia abutments of various manufacturers was confirmed. Within the limits of the study design, the results suggest that a defined ultrasonic cleaning process can be advantageously employed to reduce such debris, thus, supposedly enhancing soft tissue healing. Although the adverse long-term influence of abutment contamination on the biological stability of peri-implant tissues has been evidenced, a standardized and validated polishing and cleaning protocol still has to be implemented.

• 한국정밀공학회지
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• 제29권3호
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• pp.289-294
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• 2012

There are several indicators to represent characteristics of chemical mechanical planarization (CMP) such as material removal rate (MRR), surface quality and removal uniformity on a wafer surface. Especially, the removal uniformity on the wafer edge is one of the most important issues since it gives a significant impact on the yield of chip production on a wafer. Non-uniform removal rate at the wafer edge (edge effect) is mainly induced by a non-uniform pressure from nonuniform pad curvature during CMP process, resulting in edge exclusion which means the region that cannot be made to a chip. For this reason, authors tried to minimize the edge exclusion by using an edge profile control (EPC) ring. The EPC ring is equipped on the polishing head with the wafer to protect a wafer from the edge effect. Experimental results showed that the EPC ring could dramatically minimize the edge exclusion of the wafer. This study shows a possibility to improve the yield of chip production without special design changes of the CMP equipment.

• Journal of Electrical Engineering and information Science
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• 제2권5호
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• pp.65-71
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• 1997

We present heterojunction solar cells with a structure of metal/a-Si:H(n-i-p)/poly-Si(n-p)/metal for the terrestrial applications. This cell consists fo two component cells: a top n-i-p junction a-Si:Hi cell with wide-bandgap 1.8eV and a bottom n-p junction poly-Si cell with narrow-bandgap 1.1eV. The efficiency influencing factors of the solar cell were investigated in terms of simulation an experiment. Three main topics of the investigated study were the bottom cell with n-p junction poly-Si, the top a-Si:H cell with n-i-p junction, and the interface layer effects of heterojunction cell. The efficiency of bottom cell was improved with a pretreatment temperature of 900$^{\circ}C$, surface polishing, emitter thickness of 0.43$\mu\textrm{m}$, top Yb metal, and grid finger shading of 7% coverage. The process optimized cell showed a conversion efficiency about 16%. Top cell was grown by suing a photo-CVD system which gave an ion damage free and good p/i-a-Si:H layer interface. The heterojunction interface effect was examined with three different surface states; a chemical passivation, thermal oxide passivation, and Yb metal. the oxide passivated cell exhibited the higher photocurrent generation and better spectral response.

• 한국산학기술학회논문지
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• 제16권11호
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• pp.7773-7780
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• 2015

팝퍼 케틀의 국산화 개발을 위하여 기존 케틀을 분석하고, 열선 배치에 따른 열전달 해석을 통하여 케틀 국산화 개발을 위한 연구를 수행하였다. 케틀 재료 분석을 위한 시편을 제작하고 Polishing 및 Etching을 수행하였다. SEM을 이용하여 시편의 표면을 관찰하여 페라이트 퍼얼라이트 재질을 디프 드로잉 방식으로 제작하였음을 파악하였다. 도금층 재질 및 두께 분석을 통해 Ni(16%)도금이 $16{\sim}49{\mu}m$임을 파악하였다. 또한 열선 배치에 따른 열전달 특성을 파악하고, 최적 열선 시스템을 개발하였다. 케틀의 장시간 작업 시간 중에 발생하는 케틀 과열 시 작동을 중지하는 제어 시스템을 제작하였다. 케틀 개발 이후 성능 평가를 수행하여 부피팽창률에 대한 평가 규격 KS G3602를 만족하였다.

• 한국추진공학회지
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• 제14권4호
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• pp.39-45
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• 2010

자주포 또는 원자로와 같은 두꺼운 실린더는 압력용기 내부에 유익한 잔류 압축응력을 유도하여 작용압력과 피로수명을 증가시키도록 자긴 가공되고 있다. 자긴가공도가 증가하면 구멍에서 압축잔류응력의 크기도 증가한다. 본연구의 목적은 ASME 코드에 의해 적용된 Kendall 모델을 이용하여 고강도 SCM440 강의 정확한 잔류응력을 예측하는 것이다. SCM440 후육실린더의 내부에 유압이 적용되고 30% 변형률까지 자긴 가공하였다. 자긴가공된 시편은 전해연마하고 X-ray 회절법을 이용하여 정확한 잔류응력을 산출하도록 하였다. 그리고 주사전자현미경을 이용하여 자긴가공에 의해 소성변형된 표면층을 분석하였다. 측정한 잔류응력과 계산된 결과를 비교하여 약간의 차이는 있으나 비교적 서로 잘 일치하고 있다.

• 한국광학회지
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• 제19권4호
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• pp.249-254
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• 2008

새 구조의 액정 엑스선 감지기를 만들었다. 이것은 액정판을 만들고 유리판을 얇게 식각한 다음, 그 유리판 위에 반사막과 광전도층을 연속하여 입힌 구조이다. 새 구조의 액정엑스선 감지기는 공정의 안정성, 대면적화, 감도 등에서 이미 상품화된 엑스선 감지기와도 충분히 경쟁할 수 있으며, 따라서 성공적으로 상용화 할 수 있음을 확인했다.

• 한국산업융합학회 논문집
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• 제23권6_2호
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• pp.1051-1058
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• 2020

The chemical mechanical planarization (CMP) is a process of physically and chemically polishing the semiconductor substrate. The planarization quality of a substrate can be evaluated by the within wafer non-uniformity (WIWNU). In order to improve WIWNU, it is important to manage the pad profile. In this study, a device capable of non-contact measurement of the pad thickness profile was developed. From the measured pad profile, the profile of the pad surface and the groove was extracted using the envelope function, and the pad thickness profile was derived using the difference between each profile. Thickness profiles of various CMP pads were measured using the developed PMS and envelope function. In the case of IC series pads, regardless of the pad wear amount, the envelopes closely follow the pad surface and grooves, making it easy to calculate the pad thickness profile. In the case of the H80 series pad, the pad thickness profile was easy to derive because the pad with a small wear amount did not reveal deep pores on the pad surface. However, the pad with a large wear amount make errors in the lower envelope profile, because there are pores deeper than the grooves. By removing these deep pores through filtering, the pad flatness could be clearly confirmed. Through the developed PMS and the pad thickness profile calculation method using the envelope function, the pad life, the amount of wear and the pad flatness can be easily derived and used for various pad analysis.

• 한국작물학회:학술대회논문집
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• 한국작물학회 2022년도 추계학술대회
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• pp.299-299
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• 2022

Whole wheat is rich in dietary fiber and contains various biological activity substances such as arabinoxylan, phytic acid and phenolic compounds. However, excessive fiber contents of whole wheat has a negative effect on dough formation, making it difficult to process. In this study, we tried to improve the usability of whole wheat by suggesting an appropriate degree of purification of whole wheat from 'Saekeumkang', a domestic wheat cultivar containing protein and gluten suitable for noodle production. The contents of arabinoxylan, phytic acid, and vitamin E were measured in the polishing rate range of 5-20% of whole wheat flour. As the milling ratio increased, the flour properties improved. The arabinoxylan and phytic acid content of whole wheat were 67.95 mg/g and 0.87 mg/g, but when milled at 20%, arabinoxylan and phytic acid were 60% and 80% of whole wheat, respectively. And as the milling ratio increased, the vitamin E content tended to decrease (whole wheat: 4.063 mg/100 g, 20% milled: 2.96 mg/100 g), However, the vitamin E composition ratio did not change. On the other hand, α-tocopherol showed the greatest than other vitamin E isomers. Therefore, further studies needed to optimize milling rate to improve the final product while maintaining the approximate nutritional and functional value of the whole wheat.