• 제목/요약/키워드: Polishing Parameter

검색결과 37건 처리시간 0.025초

금형면 자동 다듬질 장치의 D/B 구축을 위한 실험적 연구 (Experimental Study of Developing D/B for Polishing Automation of Die and Mold)

  • 안유민
    • 한국생산제조학회지
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    • 제9권2호
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    • pp.80-86
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    • 2000
  • Although polishing process take 30-50% of whole process of manufacturing die and mold it has not been fully automat-ed yet. Considering current trend of manufacturing it is necessary to study on polishing automation. To accomplish automation reliable database must be developed. For developing it polishing mechanism should be defined and a general empirical formula that can be applied widely should be created. In this paper it is found that polishing process must be separated into 2 process such as removing cusp and getting fine surface process and the polishing parameter which is com-posed of major machining parameters and normalization of data can be applied efficiently in making reliable database.

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금형면 자동 다듬질 전문가 시스템 개발에 관한 연구-II-통합 연마 파라미터를 사용한 최적 가공 구현 및 전문가 시스템 구축- (Development of an Expert System for Optimizing Die and Mold Polishing-II)

  • 민헌식;이성환;안유민;조남규;한창수
    • 한국공작기계학회논문집
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    • 제11권1호
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    • pp.45-51
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    • 2002
  • To reduce the cost and increase reliability of die and mold products, automation of the finishing (polishing) process is essential. A major element of automation is a reliable database and a knowledge base for polishing status. This paper presents a polishing expert system which can determine optimal polishing sequences and conditions by using an empirical formula and an experimental database. The simplex method was used for the curve fittings of the experimental results. Also a graphical user interface, which visualizes the optimized results, was developed.

폴리싱 고속화를 위한 연마헤드의 회전 안정성과 윤활 상태 평가 (Rotational Stability and Lubrication State Evaluation of the Polishing Head for High Speed Polishing)

  • 이호철;최민석
    • 한국생산제조학회지
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    • 제25권4호
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    • pp.301-306
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    • 2016
  • High speed polishing can kinematically increase the polishing removal rate by using the conventional Preston equation, especially for hard substrates such as sapphire or diamond. However, high speed effects should be clarified beforehand considering the lubrication state and process parameter variations. In this paper, we developed a polishing experimental method and apparatus to determine the lubrication state by measuring the real time friction coefficient using two load cells. Through experiments, we obtained a boundary lubrication state above 0.35 of the friction coefficient by using low table speed and high polishing load, indicating a synchronized stable behavior in polishing head rotation. However, larger Stribeck indexes by a high speed above 200 rpm can generate a hydrodynamic lubrication state below 0.25 of the low friction coefficient. This causes the polishing head rotation to stop. A forced and synchronized head rotation is required for high speed polishing.

평면과 경사면의 자기연마가공에서 공정변수가 표면거칠기에 미치는 영향 (Performance Evaluation of Magnetic Abrasive Polishing by Design of Experiments)

  • 김상오;유만희;곽재섭
    • 한국공작기계학회논문집
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    • 제17권4호
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    • pp.35-41
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    • 2008
  • R/In order to satisfy the customer's variant needs for a product quality in recent years, a demand for developing higher precision machining technologies in a lot of application areas such as automobile, cellular phone and semiconductor has been increased more and more. Magnetic abrasive polishing(MAP) process is one of these precision technologies. In this study, to verify the parameters' effect of the MAP process on the surface roughness improvement of the plane and the inclined workpiece, well planned experiments which was called the design of experiments were carried out. Considered polishing factors were spindle speed, supplied current, abrasive type and working gap between the workpiece and the solid tool. As a result, it was seen that the supplied current and the working gap greatly affected the surface roughness improvement.

전해-자기 복합 가공을 이용한 마이크로 채널 디버링공정 최적화 (A Study on the Optimization of Deburring Process for the Micro Channel using EP-MAP Hybrid Process)

  • 이성호;곽재섭
    • 한국생산제조학회지
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    • 제22권2호
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    • pp.298-303
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    • 2013
  • Magnetic abrasive polishing is one of the most promising finishing methods applicable to complex surfaces. Nevertheless this process has a low efficiency when applied to very hardened materials. For this reason, EP-MAP hybrid process was developed. EP-MAP process is expected to machine complex and hardened materials. In this research, deburring process using EP-MAP hybrid process was proposed. EP-MAP deburring process is applied to micro channel, thereby it can obtain both deburring process and polishing process. EP-MAP deburring process on the micro channel was performed. Through design of experiment method, error of height in this process according to process parameter is analyzed. When the level 1 parameter A(magnetic flux density) and level 2 parameter B(electric potential), C(working gap) and level 3 parameter D(feed rate) are applied in the deburring process using EP-MAP hybrid process, it provides optimum result of EP-MAP hybrid deburring process.

AE 센서와 신경회로망을 이용한 NAK80 금형강의 자기연마 가공특성 모니터링 (Surface Condition Monitoring in Magnetic Abrasive Polishing of NAK80 Using AE Sensor and Neural Network)

  • 김광희;신창민;김태완;곽재섭
    • 한국생산제조학회지
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    • 제21권4호
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    • pp.601-607
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    • 2012
  • The magnetic abrasive polishing (MAP), for online monitoring with AE sensor attachment, was performed in this study. To predict the surface roughness after the magnetic abrasive polishing of NAK80, the signal data acquired from the AE sensor were analyzed. A dimensionless coefficient, which consisted of average of AErms and standard deviation of AE signal, was defined as a characteristic of the MAP and a prediction model was obtained using least square method. A neural network, which had multiple input parameters from AE signals and polishing conditions, was applied for predicting the surface roughness. As a result of this study, it was seen that there was very close correlation between the AE signal and the surface roughness in the MAP. And then on-line prediction of the surface roughness after the MAP of the NAK80 was possible by the developed prediction model.

패드 그루브의 밀도변화가 연마특성에 미치는 영향 (The Effect of Pad Groove Density on CMP Characteristics)

  • 박기현;정재우;이현섭;서헌덕;정석훈;이상직;정해도
    • 한국정밀공학회지
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    • 제22권8호
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    • pp.27-33
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    • 2005
  • Polishing pads play an important role in chemical mechanical polishing(CMP) which has recently been recognized at the most effective method to achieve global planarization. In this paper, we have investigated CMP characteristics as a change of groove density of polishing pads. The parameter $(K_n)$ is proposed to estimate groove density of pad. The $K_n$ is defined as groove area divided by pitch area. As the groove density value increased, removal rate increased to some point and then gradually saturated in case of increasing the groove density excessively. In addition Within wafer non-uniformity(WIWNU) worse as groove density increased excessively, although WIWNU improved as groove density increased. Also the uniformity of temperature of pad surface decreased as the groove density increased. It was because that the cooling effect increased as groove density increased. In other words, increasing the groove density which means the apparent contact area of pad has influence on amount of discharge of slurry during polishing process.

SiC 증착층 계면의 표면조도에 미치는 흑연 기판의 표면조도 영향 (Effects of the Surface Roughness of a Graphite Substrate on the Interlayer Surface Roughness of Deposited SiC Layer)

  • 박지연;정명훈;김대종;김원주
    • 한국세라믹학회지
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    • 제50권2호
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    • pp.122-126
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    • 2013
  • The surface roughness of the inner and outer surfaces of a tube is an important requirement for nuclear fuel cladding. When an inner SiC clad tube, which is considered as an advanced Pressurized Water Cooled Reactor (PWR) clad with a three-layered structure, is fabricated by Chemical Vapor Deposition (CVD), the surface roughness of the substrate, graphite, is an important process parameter. The surface character of the graphite substrate could directly affect the roughness of the inner surface of SiC deposits, which is in contact with a substrate. To evaluate the effects of the surface roughness changes of a substrate, SiC deposits were fabricated using different types of graphite substrates prepared by the following four polishing paths and heat-treatment for purification: (1) polishing with #220 abrasive paper (PP) without heat treatment (HT), (2) polishing with #220 PP with HT, (3) #2400 PP without HT, (4) polishing with #2400 PP with HT. The average surface roughnesses (Ra) of each deposited SiC layer are 4.273, 6.599, 3.069, and $6.401{\mu}m$, respectively. In the low pressure SiC CVD process with a graphite substrate, the removal of graphite particles on the graphite surface during the purification and the temperature increasing process for CVD seemed to affect the surface roughness of SiC deposits. For the lower surface roughness of the as-deposited interlayer of SiC on the graphite substrate, the fine controlled processing with the completed removal of rough scratches and cleaning at each polishing and heat treating step was important.

마그네슘 합금강의 제2세대 자기연마에서 표면거칠기 예측모델 개발 (Development of Prediction Model and Parameter Optimization for Second-Generation Magnetic Abrasive Polishing of Magnesium Alloy)

  • 김상오;이성호;곽재섭
    • 대한기계학회논문집A
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    • 제35권4호
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    • pp.401-407
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    • 2011
  • 본 연구에서는 AZ31B 마그네슘 합금 평판 연마에 제 2세대 자기연마공정을 적용하고 실험계획법을 통해 공정인자들의 특성을 평가하였으며, 2차 반응표면모델을 이용한 표면거칠기 예측모델을 개발하였다. 비자성체 재료의 기존 자기연마 공정에서는 재료의 표면에서 자기력이 낮아 표면거칠기의 향상에 효율이 낮은 단점을 가진다. 이를 보완하기 위하여 전자석 배열을 이용한 자기력 테이블을 자기연마 공정에 적용하여 비자성체 표면의 자기력을 향상시킬 수 있었다. 이러한 시스템을 제 2세대 자기연마라 일컫고, 실험계획법에 따른 공정 인자 평가 결과, 자기력 테이블의 전자석 세기가 AZ31B 평판의 표면 거칠기 향상에 가장 큰 영향을 가지고 있음을 확인했다. 또한 자기력 테이블과 공구의 회전속도에 따른 반응표면모델을 개발함으로써 마그네슘 자기연마 공정의 효율성을 높일 수 있었다.