• Proceedings of the Korean Vacuum Society Conference
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• 2003.02a
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• pp.118-118
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• 2003

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.240-240
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• 2015

본 논문에서는 플라즈마 모델링과 식각 표면 분석을 통해 가스 비율 변화에 따른 $CF_4/C_4F_8/Ar$ 유도결합 플라즈마의 특성과 Si 및 $SiO_2$의 식각 메커니즘에 대해 연구하였다.

• Proceedings of the KIEE Conference
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• 1997.07e
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• pp.1663-1665
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• 1997

Direct measurements of electric fields in a glow discharge are difficult because the measurement method should be sensitive to the electric field and non-intrusive. Laser spectroscopy is very suitable in that it is non-intrusive and allow in-situ measurements to be made. In this report, the measurement techniques of electric fields in glow discharge using laser spectroscopy were described.

• Proceedings of the Optical Society of Korea Conference
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• 2001.02a
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• pp.112-114
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• 2001

고온 고밀도 플라즈마는 그 자체가 가지는 다양한 응용성 때문에 분광학적 특성에 대한 보다 나은 이해가 필요하다. 그 중에서도 이온화 균형은 플라즈마에서의 빛의 방출과 흡수를 결정하는데 중요한 역할을 하는 것으로 일반적으로는 기저 준위의 점유밀도가 들뜬 준위에 비해 월등히 많기 때문에 각 이온화 상태의 기저 준위들 간의 이온화 과정들만이 고려된다. 하지만 플라즈마의 밀도가 높아지면 들뜬 준위가 이온화에 기여하는 정도가 커지기 때문에 더 이상 기저 준위들만을 고려하는 것은 맞지 않게 된다. (중략)

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.933-936
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• 2007

An inductively coupled plasma source with internaltype linear inductive antennas named as "multiple Utype antenna" was developed for the substrate size of $2,300mm\;{\times}\;2,000mm$. High density plasmas on the order of $1.18\;{\times}\;10^{11}\;cm^{-3}$ could be obtained and the RF power of 8kW with good plasma stability.

• Proceedings of the Membrane Society of Korea Conference
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• 2003.07a
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• pp.41-46
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• 2003

Plasma processes developed in our laboratory, of interest for biomaterials, barrier coatings for food packaging and corrosion protection, are briefly reviewed in this contribution. Particular attention is devoted to diagnostics aimed to rationalize plasma-surface interactions and to identify parameters and correlations to be utilized for process control.

• ETRI Journal
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• v.30 no.3
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• pp.383-393
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• 2008

The etching mechanism of $ZrO_2$ thin films and etch selectivity over some materials in both $BCl_3$/Ar and $BCl_3/CHF_3$/Ar plasmas are investigated using a combination of experimental and modeling methods. To obtain the data on plasma composition and fluxes of active species, global (0-dimensional) plasma models are developed with Langmuir probe diagnostics data. In $BCl_3$/Ar plasma, changes in gas mixing ratio result in non-linear changes of both densities and fluxes for Cl, $BCl_2$, and ${BCl_2}^+$. In this work, it is shown that the non-monotonic behavior of the $ZrO_2$ etch rate as a function of the $BCl_3$/Ar mixing ratio could be related to the ion-assisted etch mechanism and the ion-flux-limited etch regime. The addition of up to 33% $CHF_3$ to the $BCl_3$-rich $BCl_3$Ar plasma does not influence the $ZrO_2$ etch rate, but it non-monotonically changes the etch rates of both Si and $SiO_2$. The last effect can probably be associated with the corresponding behavior of the F atom density.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.19 no.4
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• pp.1-8
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• 2005

Plasma researches using parallel-plate electrodes are widely used in semiconductor application such as etching and thin film deposition. Therefore, a quantitative understanding and control of plasma behavior are becoming increasingly necessary because their important applications and simulation techniques have been actively carried out in order to solve such problems above. In this paper, we developed a two-dimensional(2D) self-consistent fluid model, because 2D models can deal with real reactor geometries. The fluid model is based on particle continuity equations for taking account of an electrode system in a cylindrical geometry. An pure Ar gas was used at 500[mTorr] and radio-frequency (13.56(MHz)). Four models were simulated under the different electrode geometries which have chamber widths of 5.25, 6.0, 8.0, and 10.0[cm] and we compared their results with each other. Plasma uniformity and a do self-bias voltage were also discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.498-498
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• 2013

Atmospheric Pressure Plasmas have pioneered a new field of plasma for biomedical application bridging plasma physics and biology. Biological and medical applications of plasmas have attracted considerable attention due to promising applications in medicine such as electro-surgery, dentistry, skin care and sterilization of heat-sensitive medical instruments [1]. Traditional approaches using electronic devices have limits in heating, high voltage shock, and high current shock for patients. It is a great demand for plasma medical industrial acceptance that the plasma generation device should be compact, inexpensive, and safe for patients. Microwave-excited micro-plasma has the highest feasibility compared with other types of plasma sources since it has the advantages of low power, low voltage, safety from high-voltage shock, electromagnetic compatibility, and long lifetime due to the low energy of striking ions [2]. Recent experiment [2] shows three-log reduction within 180-s treatment of S. mutans with a low-power palm-size microwave power module for biomedical application. Experiments using microwave plasma are discussed. This low-power palm-size microwave power module board includes a power amplifier (PA) chip, a phase locked loop (PLL) chip, and an impedance matching network. As it has been a success, more compact-size module is needed for the portability of microwave devices and for the various medical applications of microwave plasma source. For the plasma generator, a 1.35-GHz coaxial transmission line resonator (CTLR) [3] is used. The way of reducing the size and enhancing the performances of the module is examined.

• Journal of Astronomy and Space Sciences
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• v.15 no.2
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• pp.359-371
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• 1998

We present the design specifications and the performance estimation of the FUVS (Far Ultraviolet Spectrograph) proposed for the observations of aurora, day/night airglow and astronomical objects on small satelltes in the spectral range of $900~1750AA$. The design of FUVS is carried out with the full consideration of optical characteristics of the grating and the aspheric substrate. Two independent methods, ray-tracing and the wave front aberration theory, are employed to estimate the performance of the optical design and it is verified that both procedures yield the resolution of $2~5AA$ in the entire spectral range. MDF (Minimum Detectable Flux) is also estimated using the known characteristics of the reflecting material and MCP, to study the feasibility of detection for faint emission lines from the hot interstellar plasmas. The results give that the observations from 1 day to 1 week, depending on the line intensity, can detect such faint emission lines from diffuse interstellar plasmas.