• 제목/요약/키워드: Plasma surface

검색결과 3,409건 처리시간 0.034초

산소 플라즈마 처리에 의한 반도전성 실리콘 고무 표면의 특성변화 (A Study of the Changes of Surface Properties on Semiconductive-Insulating of Silicone Rubber by Oxygen Plasma Treatment)

  • 이기택;황선묵;홍주일;허창수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집
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    • pp.25-28
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    • 2005
  • This paper was investigated the changes of surface properties of high-temperature-vulcanized(HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone surface by oxygen plasma were accessed using x-ray photoelectron spectroscopy(XPS), contact angle and Scanning Electron Microscope(SEM). The results of the chemical analysis showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx. x=3~4) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized(HTV) semiconductive silicone rubber. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.

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Effects of Hydrogen Plasma Treatment of the Underlying TaSiN Film Surface on the Copper Nucleation in Copper MOCVD

  • Park, Hyun-Ah;Lim, Jong-Min;Lee, Chong-Mu
    • 한국세라믹학회지
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    • 제41권6호
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    • pp.435-438
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    • 2004
  • MOCVD is one of the major deposition techniques for Cu thin films and Ta-Si-N is one of promising barrier metal candidates for Cu with high thermal stability. Effects of hydrogen plasma pretreatment of the underlying Ta-Si-N film surface on the Cu nucleation in Cu MOCVD were investigated using scanning electron microscopy, X-ray photoelectron spectroscopy and Auger electron emission spectrometry analyses. Cu nucleation in MOCVD is enhanced as the rf-power and the plasma exposure time are increased in the hydrogen plasma pretreatment. The optimal plasma treatment process condition is the rf-power of 40 Wand the plasma exposure time of 2 min. The hydrogen gas flow rate in the hydrogen plasma pretreatment process does not affect Cu nucleation much. The mechanism through which Cu nucleation is enhanced by the hydrogen plasma pretreatment of the Ta-Si-N film surface is that the nitrogen and oxygen atoms at the Ta-Si-N film surface are effectively removed by the plasma treatment. Consequently the chemical composition was changed from Ta-Si-N(O) into Ta-Si at the Ta-Si-N film surface, which is favorable for Cu nucleation.

Surface Characterization of the Activated Carbon Fibers After Plasma Polymerization of Allylamine

  • Lu, Na;Tang, Shen;Ryu, Seung-Kon;Choi, Ho-Suk
    • Carbon letters
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    • 제6권4호
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    • pp.243-247
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    • 2005
  • Plasma polymerization of allylamine subsequently after plasma pre-treatment was conducted on the activated carbon fibers (ACFs) for the immobilization of amine groups in the surface of ACFs. The change of structural properties of ACFs with respect to different polymerization conditions was investigated through BET method. The change of surface morphologies of ACFs with respect to different plasma polymerization power was also studied through AFM. It was found that the structural properties such as specific surface area and micropore volume could be optimized under certain plasma deposition conditions. It was reckoned that treatment and deposition showed adverse effect on plasma polymerization, in which the former developed the micro-structures of the ACFs and the latter tended to block the micro pores. The Fourier transform infrared spectroscopy (FTIR) revealed that the poly(allylamine) was successfully immobilized on the surface of ACFs and the amount of the deposited polymer layer was related to the plasma polymerization power. SEM results showed that the plasma deposited polymer layer were small and homogenously distributed. The size and the distribution of particles deposited were closely related to the plasma polymerization power, too.

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Surface Modification Studies by Atomic Force Microscopy for Ar-Plasma Treated Polyethylene

  • Seo, Eun-Deock
    • Macromolecular Research
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    • 제10권5호
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    • pp.291-295
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    • 2002
  • Atomic force microscopy(AFM) was used to study the polyethylene(PE) surfaces grafted and immobilized with acrylic acid by Ar plasma treatment. The topographical images and parameters including RMS roughness and Rp-v value provided an appropriate means to characterize the surfaces. The plasma grafting and immobilization method were a useful tool for the preparation of surfaces with carboxyl group. However, the plasma immobilization method turned out to have a limitation to use as a means of preparation of PE surface with specific functionalities, due to ablation effect during the Ar plasma treatment process.

ITO 플라즈마 표면처리와 ppMMA 버퍼층으로 제작한 OLED의 발광특성 (Enhanced Performance of the OLED with Plasma Treated ITO and Plasma Polymerized Methyl Methacrylate Buffer Layer)

  • 임재성;신백균
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권1호
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    • pp.30-33
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    • 2006
  • Transparent indium tin oxide (ITO) anode surface was modified using $O_3$ Plasma and organic ultrathin buffer layers were deposited on the ITO surface using 13.56 MHz RF plasma polymerization technique. The EL efficiency, operating voltage and lifetime of the organic light-emitting device (OLED) were investigated in order to study the effect of the plasma surface treatment and role of plasma polymerized organic ultrathin buffer layer. Poly methylmethacrylate (PMMA) layers were plasma polymerized on the ITO anode as buffer layer between anode and hole transport layer (HTL). The plasma polymerization of the organic ultrathin layer were carried out at a homemade capacitive-coupled RF plasma equipment. N,N'-diphenyl-N,N'(3- methylphenyl)-1,1'-diphenyl-4,4'-diamine (TPD) as HTL, Tris(8-hydroxyquinolinato) Aluminum $(Alq_3)$ as both emitting layer (EML)/electron transport layer (ETL), and aluminum layer as cathode were deposited using thermal evaporation technique. Effects of the plasma surface treatment of ITO and plasma polymerized buffer layers on the OLED performance were discussed.

알루미늄의 발수 표면처리 기술 개발 (Development of Surface Treatment for Hydrophobic Property on Aluminum Surface)

  • 변은연;이승훈;김종국;김양도;김도근
    • 한국표면공학회지
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    • 제45권4호
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    • pp.151-154
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    • 2012
  • A hydrophobic surface has been fabricated on aluminum by two-step surface treatment processes consisting of structure modification and surface coating. Nature inspired micro nano scale structures were artificially created on the aluminum surface by a blasting and Ar ion beam etching. And a hydrophobic thin film was coated by a trimethylsilane ($(CH_3)_3SiH$) plasma deposition to minimize the surface energy of the micro nano structure surface. The contact angle of micro nano structured aluminum surface with the trimethylsilane coating was $123^{\circ}$ (surface energy: 9.05 $mJ/m^2$), but the contact angle of only trimethylsilane coated sample without the micro nano surface structure was $92^{\circ}$ (surface energy: 99.15 $mJ/m^2$). In the hydrophobic treatment of aluminum surface, a trimethylsilane coated sample having the micro nano structure was more effective than only trimethylsilane coated sample without the micro nano structure.

감압 상태 순환유동층 반응기에서 플라즈마 그래프팅에 의한 미세입자 표면 개질 (Surface Modification of Fine Particle by Plasma Grafting in a Circulating Fluidized Bed Reactor under Reduced Pressure)

  • 박성희
    • Korean Chemical Engineering Research
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    • 제53권5호
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    • pp.614-619
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    • 2015
  • 미세입자의 플라즈마 표면 개질을 감압상태하의 순환유동층 반응기에서 수행하였다. 플라즈마에 의해 처리된 폴리스타이렌 입자는 폴리에틸렌글리콜로 표면에 그래프팅하였다. 표면 개질 전 입자와 플라즈마 처리된 입자 그리고 그래프팅된 입자의 특성은 각각 DPPH 방법, FTIR, SEM 그리고 접촉각 측정으로 분석하였다. 플라즈마 처리된 폴리스타이렌 입자의 표면에 과산화물이 잘 형성되었다. 또한, 폴리에틸렌글리콜의 그래프팅 중합에 의해 플라즈마 처리된 입자 표면에 그래프팅이 잘 분산되었다. 따라서 감압상태의 순환 유동층 반응기에서 플라즈마 처리에 의한 PEG-g-PS 입자를 성공적으로 형성할 수 있었다.