• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.3
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• pp.292-300
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• 2006

In order to improve energy efficiency in the dilute trichloroethylene removal using the nonthermal plasma process, the barrier discharge treatment combined with manganese dioxide was experimentally studied. Reaction kinetics in this process was studied on the basis of final byproducts distribution. Decomposition efficiency was improved to about $99\;\%$ at the specific energy of 40 J/L with passing through manganese dioxide. C=C ${\pi}$ bond cleavage of TCE substances gave DCAC, which has the single bond of C-C through oxidation reaction during the barrier discharge plasma treatment. Those DCAC were broken easily in the subsequent catalytic reaction due to the weak bonding energy about $3{\sim}4\;eV$ compared with the double bonding energy in TCE molecules. Oxidation byproducts of DCAC and TCAA from TCE decomposition are generated from the barrier discharge plasma treatment and catalytic surface chemical reaction, respectively. Complete oxidation of TCE into COx is required to about 400 J/L, but $CO_2$ selectivity remains about $60\;\%$.

• Korean Journal of Materials Research
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• v.3 no.6
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• pp.565-574
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• 1993

The Ar/Ar- $H_{2}$ plasma method Lvas applied to reduce and refine high purity Nb metal. Inaddition, the reaction between molten Nb metal and hydrogen were also analyzed in the Ar-(20%)$H_{2}$plasma. The metallic Nb of 99.5wt% was obtained at the ratio of $C/Nb_{2}O_{5}$=5.00 in the Ar plasma reductionand the $O_2$ loss from the thermal decomposition of niobium oxides did not take place. In the Ar-(20%)Hi plasma the metallic Nb of 99.8wt% was produced at the ratio of $C/Nb_{2}O_{5}$=4.80. It was observedthat a major reaction of the deoxidation was the reaction with H, Hi, and a deoxidation by the evaporationof $NbO_x$ did not occur but a mass loss of Nb did by a "splash" effect. The deoxidation reaction rateobeyed the 1st order reaction kinetics and the reaction rate constant(k') of deoxidation was $7.8 \times 10_{-7}$(m/sec).The solubility of hydrogen in Nb metal was 60ppm and it was larger than the solubility of molecularstate hydrogen by 40ppm in the Ar-(20%)$H_{2}$ plasma method. A saturation was within 60sec anda hydrogen content was reduced below lOppm by a Ar plasma re-treatment.by a Ar plasma re-treatment.

• Journal of Korean Society for Atmospheric Environment
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• v.18 no.1
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• pp.51-58
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• 2002

Destruction process of toluene using a wire-cylindrical BBD (Dielectric Barrier Discharge) reactor packed with catalysts was investigated to characterize the synergetic effects of non-thermal plasma and catalyst process. The catalysts used in the present study were ${\gamma}$-Al$_2$BO$_3$ and Pt/${\gamma}$-Al$_2$O$_3$. Under the numerous test conditions, specific energy density (SED (J/L)) and the conversion of toluene, defined as (1 -[C$_{f}$]/[C$_{i}$]), were measured. The test results showed that toluene decomposition efficiency followed the pseudo-first order in the case of plasma only process. The pseudo-first order process, however, was modified to pseudo-zeroth order reaction in the case of catalyst-assisted plasma process. This modification of the reaction order was verified based on a simple kinetic model proposed in the present study. Owing to the modification of reaction order, which resulted from the catalytic process, the specific energy to achieve the high removal efficiencies, i.e. 80~90%, was reduced significantly.y.y.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.3
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• pp.669-673
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• 2011

This study explores the numerical analysis method of fluid dynamics in the reaction section to improve the gas processing efficiency in the hazardous gas removal by atmospheric thermal plasma. This study also intends to contribute in technology advance to improve the processing efficiency and make the process more stable. Numerical analysis of temperature distribution in the reaction section dependent on the change in flow velocity of Ar and plasma temperature change, which are major control variables in the cracking process of HFC-23 using arc plasma, was done. The characteristic of incoming oxygen by temperature suggested that when temperature increased to 1600K, 1700K, 1800K respectively, the range of cracking temperature 1500K increased to 75.0%, 83.3%, 90.2% respectively. The temperature change of Ar by velocity change was widest in the area higher than 1500K when the velocity was 2.5m/s; however, since there was no big difference when the velocity was 2m/s, it is believed that 2 m/s would be most proper.

• Journal of Adhesion and Interface
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• v.10 no.3
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• pp.148-153
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• 2009

An atmospheric plasma pre-treatment method was applied to PU foam, Leather (Action), Rubber to improve its adhesion using solvent and water soluble type pressure sensitive adhesion in atmospheric plate type reactor. In order to investigate the optimum reaction condition of plasma treatment, type of reaction gas (nitrogen), rate of gas flow (30~100 mL/min), and reaction time (0~30 s) were examined in a plate plasma reactor. The result of the surface modification with respect to the treatment procedure was characterized by using SEM. Due to a de-crease of the contact angle of various materials, the greatest adhesion strength was achieved at optimum condition such as flow rate of 100 mL/min, reaction time of 10 second for an atmospheric plasma treatment of the PU foam, EVA foam, Leather (Action) and Rubber also resulted in the improvement of the adhesion.

• Journal of Adhesion and Interface
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• v.8 no.4
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• pp.23-31
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• 2007

An atmospheric plasma pre-treatment method was applied to EVA foam, Leather (Action), Rubber and Unwoven to improve its contact angle and adhesion using atmospheric plate type reactor. In order to investigate the optimum reaction condition of plasma treatment, type of reaction gas (nitrogen), rate of gas flow (30~100 mL/min), and reaction time (0~30 sec) were examined in a plate plasma reactor. The result of the surface modification with respect to the treatment procedure was characterized by using SEM. Due to a decrease of the contact angle of various materials, the greatest adhesion strength was achieved at optimum condition such as flow rate of 100 mL/min, reaction time of 10 second for an atmosphere nitrogen gas. Consequently, the atmospheric plasma treatment reduced the contact angle of the EVA foam, Leather (Action) and Rubber also resulted in the improvement of the adhesion.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.74-74
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• 2010

The aqua-plasma is the non-thermal plasma in electrical conductive electrolyte by generates the vapor film layer on the immersed metal electrode surface. This plasma can generate the hydroxyl radical by dissociate the water molecule with the plasma electron. To develop the plasma discharge device for high efficiency in the hydroxyl radical generation, proper model for estimation of plasma power is necessary. In this work, the 1-D spherical model was developed, considering temperature dependence material constants. The relation between the plasma power and hydroxyl generation was also studied by the comparison between the optical emission intensity from the hydroxyl radical using monochromator and estimated plasma power. First, the thickness of vapor layer thickness was estimated using the Navier-Stokes fluid equation in order to calculate the discharge E-field inside vapor layer. Using the E-field magnitude and power balance on the plasma generation, it was possible to estimate the plasma power. The plasma power was assumed to uniformly fill the vapor layer and the temperature of vapor layer was fixed in the boiling temperature of electrolyte, 375K. In the experiment, the aqua-plasma was discharged in the saline by applied the voltage on the bipolar electrode. The range of applied voltage was 234 to 280V-rms in the frequency of 380 kHz. Two type electrodes were produced with two ${\Phi}0.2$ tungsten. The plasma power was estimated from the V-I signal from the two high voltage probes and current probe. The estimated plasma power agreed with the profile of emission intensity when the plasma discharged between the metal electrode and vapor layer surface. However, when the plasma discharged between the metal electrodes, the increasing rate of emission intensity was lower than the increase of plasma power. It implies that the surface reaction is more sufficient rather than the volume reaction in the radical generation, due to the high density of water molecule in the liquid.

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2005.11b
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• pp.300-315
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• 2005

Recently plasma surface-cleaning or surface-etching techniques have been focused in the respect of decontamination of spent or used nuclear parts and equipment. In this study decontamination rate of metallic cobalt surface was experimentally investigated via its surface etching rate with a $CF_4-O_2$ mixed gas plasma and metallic surface wastes of cobalt oxides were simulated and decontaminated with $NF_3$ - Ar mixed gas plasma. Experimental results revealed that a mixed etchant gas with about $80{\%}\;CF_4-20{\%}\;O_2$ gives the highest reaction rate of cobalt disk and the rate reaches with a negative 300 DC bias voltage up to $0.43\;{\mu}m$/min at $380^{\circ}C$ and $20{\%}\;NF_3-80\%$ Ar mixed gas gives $0.2\;{\mu}m$/min of reaction rate of cobalt oxide film.

• Journal of the Korean institute of surface engineering
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• v.32 no.3
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• pp.297-302
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• 1999

In situ measurement of infrared absorption spectra has been performed during low-temperature plasma-enhanced chemical vapor depositiion of silicon-oxide films using tetramethoxysilane as a silicon source. Several absorption bands due to the reactant molecules are clearly observed before deposition. In the plasma, these bands completely disappear at any oxygen mixing ratio. This result shows that most of the tetramethoxysilane molecules are dissociated in the rf plasma, even C-H bonds. Existence of Si-H bonds in vapor phase and/or on the film surface during deposition has been found by infrared diagnostics. We observed both a decrease in Si-OH absorption and an increase in Si-O-Si after plasma off, which means the dehydration condensation reaction continues after deposition. The rate of this reaction is much slower than the deposition ratio of the films.

• Journal of the Korean Society of Industry Convergence
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• v.6 no.4
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• pp.269-275
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• 2003

A non-thermal plasma process combined with $Cr_2O_3/TiO_2$ catalyst was applied to the decomposition of trichloroethylene (TCE). A dielectric barrier discharge reactor operated with AC high voltage was used as the non-thermal plasma reactor. The effects of reaction temperature and input power on the decomposition of TCE and the formation of byproducts including HCl, $Cl_2$, CO, NO, $NO_2$ and $O_3$ were examined. At an identical input power, the increase in the reaction temperature from 373 K to 473 K decreased the decomposition of TCE in the plasma reactor. The presence of the catalyst downstream the plasma reactor not only enhanced the decomposition of TCE but also affected the distribution of byproducts, significantly. However, synergistic effect as a result of the combination of non-thermal plasma with catalyst was not observed, i.e., the TCE decomposition efficiency in this plasma-catalyst combination system was almost similar to the sum of those obtained with each process.