• The Transactions of The Korean Institute of Electrical Engineers
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• v.65 no.7
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• pp.1211-1217
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• 2016

Discharge characteristics of inductively coupled plasma were investigated by using electrostatic probe and fluid simulation. The Inductively Coupled Plasma source driven by 13.56 Mhz was prepared. The signal attenuation ratios of the electrostatic probe at first and second harmonic frequency was tuned in 13.56Mhz and 27.12Mhz respectively. Electron temperature, electron density, plasma potential, electron energy distribution function and electron energy probability function were investigated by using the electrostatic probe. Experiment results were compared with the fluid simulation results. Ar plasma fluid simulations including Navier-Stokes equations were calculated under the same experiment conditions, and the dependencies of plasma parameters on process parameters were well agreed with simulation results. Because of the reason that the more collision happens in high pressure condition, plasma potential and electron temperature got lower as the pressure was higher and the input power was higher, but Electron density was higher under the same condition. Due to the same reason, the electron energy distribution was widening as the pressure was lower. And the electron density was higher, as close to the gas inlet place. It was found that gas flow field significantly affect to spatial distribution of electron density and temperature.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.922-925
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• 2007

In the usual dry etching process for the TFT-LCD fabrication, it is hard to monitor the basic plasma parameters such as density and temperature. However, the basic parameters are easily monitored during the dry etching process. We have simultaneously measured the electric characteristics and basic plasma parameters of the dry etching chamber during the process, analyzed them to interpret plasma parameters. For the Ar plasma discharge case, we could obtain the density and temperature from the electric characteristics using a simple simple sheath model.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.103-103
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• 2010

Dependence of radical and ion densities on Plasma Parameters is theoretically investigated in $Cl_2$/Ar plasma discharges. Firstly, a set of reliable rate coefficients is obtained by direct calculations with cross section data set and by comparing them with previously reported values. Then, some global discharge simulations are performed for ICP(inductively coupled plasma) discharges and the results are compared with experimental results. Finally, the validated data set is used to analyze the dependence of radical and ion densities, which are usually not easy to be measured, on electron density arid temperature.

• Fisheries and Aquatic Sciences
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• v.20 no.3
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• pp.4.1-4.6
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• 2017

Juvenile Anoplopoma fimbria (mean length $16.8{\pm}2.2cm$, and mean weight $72.8{\pm}5.4g$) were exposed for 2 months with different levels of ammonia (0, 0.25, 0.50, 0.75, 1.00, and 1.25 mg/L). Growth performances such as daily length gain, daily weight gain, condition factor, and hepatosomatic index were significantly decreased by ammonia exposure. Hematological parameters such as red blood cell (RBC) count, hematocrit, and hemoglobin were also significantly decreased. In plasma inorganic components, calcium and magnesium were significantly decreased by ammonia exposure. In plasma organic components, there was no alteration in cholesterol and total protein. In enzyme plasma components, glutamic oxalate transaminase (GOT) and glutamic pyruvate transaminase (GPT) were significantly increased. The results of this study indicated that ammonia exposure can induce significant growth reduction and blood biochemistry alterations of A. fimbria.

• Journal of the Korean Vacuum Society
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• v.7 no.s1
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• pp.171-178
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• 1998

The microstructure and properties of plasma-sprayed coatings depend on a great number of spraying parameters, random factors, which lead to vibration in these spraying parameters, may in some degree influence the microstructure and properties of the coatings. Therefore, the property values appear certain distributions, and the description and comparison of the properties of plasma-sprayed coatings should be performed employing statistical analysis. In this paper, $Cr_3C_2$-Nicr coatings of different thickness were sprayed onto stainless steel using atmosphere plasma system and adopting three kinds of gun translation speeds. Then the microhardness measurements were performed on polished surface of the coatings. Forty readings were taken and statistically analyzed by calculating the characteristic values, estimating and comparing the means, and assessing whether they belonged to the Normal or Weibull Distribution. This study has found that statistical analysis could discriminate influence of spraying parameters and coating design on microhardness of the $Cr_3C_2$-Nicr coatings from random vibration, which showed that the microharness of the $Cr_3C_2$-Nicr coatings were related to gun translation speed coating thickness.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.143.1-143.1
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• 2015

An inductively coupled plasma source driven by 13.56MHz was prepared for the deposition of a-C:H thin film. Properties of the plasma source are investigated by fluid simulation including Navier-Stokes equations and home-made tuned single Langmuir probe. Signal attenuation ratios of the Langmuir probe at first and second harmonic frequency were 13.56Mhz and 27.12Mhz respectively. Dependencies of plasma parameters on process parameters were agreed with simulation results. Ar/CH4 plasma simulation results shown that hydrocarbon radical densities have their lowest value at the vicinity of gas feeding line due to high flow velocity. For input power density of 0.07W/cm3, CH radical density qualitatively follows electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density. The result suggest that optimization of discharge power is important for controlling deposition film quality in high density plasma sources.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.126-126
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• 2009

Noninvasive plasma diagnostic technique is introduced to analyze and characterize HICP (Helmholtz Inductively Coupled Plasma) source during the plasma etching process. The HICP reactor generates plasma mainly through RF source power at 13.56MHz RF power and RF bias power of 12.56MHz is applied to the cathode to independently control ion density and ion energy. For noninvasive sensors, the RF sensor and the OES (Optical emission spectroscopy) were employed since it is possible to obtain both physical and chemical properties of the reactor with plasma etching. The plasma impedance and optical spectra were observed while altering process parameters such as pressure, gas flow, source and bias power during the poly silicon etching process. In this experiment, we have found that data measured from these noninvasive sensors can be correlated to etch results. In this paper, we discuss the relationship between process parameters and the measurement data from RF sensor and OES such as plasma impedance and optical spectra and using these relationships to analyze and characterize H-ICP source.

• Journal of Environmental Science International
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• v.26 no.1
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• pp.109-118
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• 2017

This study was conducted to investigate the effects of intermittent plasma and electrolysis treatments on lettuce (Lactuca sativa var. oak-leaf.), nutrient solution components ($NO_3{^-}-N$, $NH_4{^+}-N$, $PO{_4}^{3-}-P$, $K^+$, $Ca^{2+}$ and $Mg^{2+}$) and environmental parameters (electrical conductivity, total dissolved solids and pH). The recirculating hydroponic cultivation system consisted of planting port, LED lamp, water reservoir and circulating pump. Nutrient solution was circulated in the following order: reservoir ${\rightarrow}$ filtration-plasma or filtration-electrolysis ${\rightarrow}$ planting port ${\rightarrow}$ reservoir. The results showed that nutrient solution components and environmental parameters were changed by plasma or electrolysis treatment. Lettuce growth was not affected by the intermittent plasma or electrolysis treatment with 30 minutes or 90 minutes, respectively. The roots of the lettuce was damaged by excessive plasma and electrolysis treatment. Electrolysis treatment had greater effect on than plasma treatment because of the accumulation of high levels of TRO (Total Residual Oxidants).

• Journal of Powder Materials
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• v.6 no.4
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• pp.286-293
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• 1999

This study was to analyse the relationship between process parameters of the sintered composite and plasma nitriding properties with pulsed DC plasma. Fe-40at%$SiC_p$ composites of full density were fabricated by hot pressing at 1100~$1150^{\circ}C$. Sintered Fe-40at%Al and Fe-40at%$Al/SiC_p$ alloys were nitrided under pulsed DC plasma. Excellent surface hardness in the FeAl alloys could be obtained by plasma nitriding. ($H_v$ :100gf, diffusion layer : 1100~$1450kg/mm^2$, matrix : 330~$360kg/mm^2$) The wear resistance of $FeAl/SiC_p$ composites were improved about by 4~6times than FeAl and nitrided $FeAl/SiC_p$ were improved about 2 times than $FeAl/SiC_p$ matrix.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.22 no.2
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• pp.298-305
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• 1997

In this paper, the radiation characteristics of a slot annenna in conduction cylinder covered with a moving isotropic plasma layer are analyzed. Integral representations of the eletromagnetic fields in the spectral domain radiated through the plasma layer are derived and converted into the fields in the spacial domain by saddle-point ingegration. Radiation null which brings about distorion in the radiation parrern is explained by the zero of integrand in an asymptotic integral as a function of plasma and velocity parameters. Numerical results for a radiation null calculated from various plasma and velocity parameters correspond to the results of planner structure.