• Title/Summary/Keyword: Plasma electron beam

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Influences of degradation in MgO protective layer and phosphors on ion-induced secondary electron emission coefficient and static margins in alternating current plasma display panels

  • Jeong, H.S.;Lim, J.E.;Park, W.B.;Jung, K.B.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.518-521
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    • 2004
  • The degradation characteristics of MgO protective layer and phosphors have been investigated in terms of the ion-induced secondary electron emission coefficient ${\gamma}$ and static margin of discharge voltages, respectively, in this experiment. The ion-induced secondary electron emission coefficients ${\gamma}$ for the degraded MgO protective layer and phosphors have been studied by ${\gamma}$ -focused ion beam system. The energy of Ne+ ions used is from 80 eV to 200 eV in this experiment. The degraded MgO and phosphor layers are found to have higher ${\gamma}$ than that of normal ones without degradations or aged one. Also, the static margin of discharge voltages for test panels with degraded MgO protective layer and phosphors been found to be seriously decreased in comparison with those of normal ones without degradations.

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Measurement of Defect Energy Level in MgO Layer

  • Son, Chang-Gil;Song, K.B.;Jeoung, S.J.;Park, E.Y.;Kim, J.S.;Choi, E.H.;J, S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1380-1383
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    • 2007
  • The secondary electron emission coefficient (${\gamma}$) of the cathode is an important factor for improving the discharge characteristics of AC-PDP, because of its close relationship to discharge voltage. In this experiment, we have investigated the electronic structure of the energy band in the MgO layer responsible for the high ${\gamma}$. We used three kinds of MgO pellet that have another component, and each MgO layers have been deposited by electron beam evaporation method. The work-functions of MgO layer have been investigated from their ion-induced secondary electron emission coefficient (${\gamma}$), respectively, using various ions with different ionization energies in a ${\gamma}-FIB$ (Focused Ion Beam) system. We have compared work-function with ${\gamma}-FIB$ system current signal for measurement defect energy level in MgO layer. MgO-A in the three types has lowest work-function value (4.12eV) and there are two defect energy levels.

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Measurement of Energy bands of the MgO Layer in AC-PDPs

  • Jeoung, S.J.;Lee, H.J.;Son, C.G.;Kim, J.H.;Park, E.Y.;Hong, Y.J.;You, N.L.;Lee, S.B.;Han, Y.G.;Jeoung, S.H.;Song, K.B.;Moon, M.W.;Oh, P.Y.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.906-909
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    • 2006
  • The secondary electron emission coefficient $({\gamma})$ of the cathode is an important factor for improving the discharge characteristics of AC-PDPs because of its close relationship to discharge voltage. In AC-PDPs, MgO is most widely used as a surface protective layer. In this experimental, we have investigated the electronic structure of the energy band structure of the MgO layer responsible for the high ${\gamma}$. The MgO layers have been deposited by electron beam evaporation method, where the $O_2$ partial pressures have been varied as 0, $5.2{\times}10^{-5}$ torr, $1.0{\times}10^{-4}$ torr, and $4.1{\times}10^{-4}$ torr, in this experiment. It is noted that work function that is energy gap between surface and first defect level of MgO layer has the lowest value for the highest O2 partial pressure of $4.1^{\ast}10^{-4}$ Torr.

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Measurement of EUV (Extreme Ultraviolet) and electron temperature in a hypocycloidal pinch device for EUV lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.108-108
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    • 2010
  • We have generated Ne-Xe plasma in dense plasma focus device with hypocycloidal pinch for extreme ultraviolet (EUV) lithography and investigated an electron temperature. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ne-Xe(30%) gas in accordance with pressure. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature of the hypocycloidal pinch plasma focus could be obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by Boltzmann plot. The light intensity is proportion to the Bolzman factor. We have been measured the electron temperature by observation of relative Ne-Xe intensity. The EUV emission signal whose wavelength is about 6~16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD) and the line intensity has been detected by using a HR4000CG Composite-grating Spectrometer.

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Measurement of Plasma Parameters (Te and Ne) and Reactive Oxygen Species in Nonthermal Bioplasma Operating at Atmospheric Pressure

  • Choi, Eun Ha;Kim, Yong Hee;Kwon, Gi Chung;Choi, Jin Joo;Cho, Guang Sup;Uhm, Han Sup;Kim, Doyoung;Han, Yong Gyu;Suanpoot, Pradoong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.141-141
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    • 2013
  • We have generated the needle-typed nonthermal plasma jet by using an Ar gas flow at atmospheric pressure. Diagnostics of electron temperature anddensity is critical factors in optimization of the atmospheric plasma jet source in accordance with the gas flow rate. We have investigated the electron temperature and density of plasma jet by selecting the four metastable Ar emission lines based on the atmospheric collisional radiative model and radial profile characteristics of current density, respectively. The averaged electron temperature and electron density for this plasma jet are found to be ~1.6 eV and ~$3.2{\times}10^{12}cm^{-3}$, respectively, in this experiment. The densities of OH radical species inside the various bio-solutions are found to be higher by about 4~9 times than those on the surface when the argon bioplasma jet has been bombarded onto the bio-solution surface. The densities of the OH radicalspecies inside the DI water, DMEM, and PBS are measured to be about $4.3{\times}10^{16}cm^{-3}$, $2.2{\times}10^{16}cm^{-3}$, and $2.1{\times}10^{16}cm^{-3}$, respectively, at 2 mm downstream from the surface under optimized Ar gas flow 250 sccm.

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A study on the E-beam resist characteristics of plasma polymerized styrene (플라즈마중합 스티렌 박막의 e-beam 레지스트 특성에 관한 연구)

  • 이덕출;박종관
    • Electrical & Electronic Materials
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    • v.7 no.5
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    • pp.425-429
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    • 1994
  • In this paper, we study on the plasma polymerized styrene as a negative electron-beam resist. Plasma polymerized thin film was prepared using an interelectrode inductively coupled gas-flow type reactor. We show that polymerization parameters of thin film affect sensitivity and etching resistance of the resist. Molecular weight distribution of plasma polymerized styrene is 1.41-3.93, and deposition rates of that are 32-383[.angs./min] with discharge power. Swelling and etching resistance becomes . more improved with increasing discharge power during plasma polymerization. Etch rate by RIE is higher than that by plasma etching.

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Preliminary Study on Improvement of Surface Characteristics of Stellite21 Deposited Layer by Powder Feeding Type of Direct Energy Deposition Process Using Plasma Electron Beam (플라즈마 전자빔을 이용한 분말공급형 직접식 에너지 적층 공정으로 제작된 Stellite21 적층층의 표면 특성 개선에 관한 기초 연구)

  • Kim, Dong-In;Lee, Ho-Jin;Ahn, Dong-Gyu;Kim, Jin-Seok;Kang, Eun Goo
    • Journal of the Korean Society for Precision Engineering
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    • v.33 no.11
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    • pp.951-959
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    • 2016
  • The aim of this paper is to investigate the improvement of surface characteristics of Stellite21 deposited layer by powder feeding type of direct energy deposition (DED) process using a plasma electron beam. Re-melting experiments of the deposited specimen is performed using a three-dimensional finishing system with a plasma electron beam. The acceleration voltage and the travel speed of the electron beam are chosen as process parameters. The effects of the process parameters on the surface roughness and the hardness of the re-melted region are examined. The formation of the re-melted region is observed using an optical microscope. Results of these experiments revealed that the re-melting process using a plasma electron beam can greatly improve the surface qualities of the Stellite21 deposited layer by the DED process.

Characteristics of Electron Beam Extraction in Large Area Electron Beam Generator

  • Woo, Sung-Hun;Lee, Hong-Sik
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.1
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    • pp.10-14
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    • 2004
  • A large area electron beam generator has been developed for industrial applications, for example, waste water cleaning, flue gas treatment, and food pasteurization. The operational principle is based on the emission of secondary electrons from the cathode when ions in the plasma contact the cathode, which are accelerated toward the exit window by the gradient of the electric potential. Conventional electron beam generators require an electron beam scanning mechanism because a small area thermal electron emitter is used. The electron beam of the large area electron beam generator does not need to be scanned over target material because the beam area is considerable. We have fabricated a large area electron beam generator with peak energy of 200keV, and a beam diameter of 200mm. The electron beam current has been investigated as a function of accelerating voltage and distance from the extracting window while its radial distribution in front of the extracting window has been also measured.

Electron Beam Propagation in a Plasma

  • Min, Kyoung-W.;Koh, Woo-Hee
    • Journal of Astronomy and Space Sciences
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    • v.5 no.1
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    • pp.1-8
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    • 1988
  • Electron beam propagation in a fully ionized plasma has been studied using a one-dimensional particle simulation model. We compare the results of electrostatic simulations to those of electromagnetic simulations. The electrostatic results show the essential features of beam-plasma interactions. It is found that the return currents are enhanced by the beam-plasma instability which accelerates ambinet plasmas. The results also show the heating of ambient plasmas and the trapping of plasmas due to the locally generated electric field. The electromagnetic simulations show much the same results as the electrostatic simulations do. The level of the radiation generated by the same non-relativistic beam is slightly higher than the noise level. We discuss the results in context in context of the heating of coronal plasma during solar flares.

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