• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.472-472
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• 2010

The tomography has played a key role in tokamak plasma diagnostics for image reconstruction. The Phillips-Tikhonov (P-T) regularization method was attempted in this work to reconstruct cross-sectional phantom images of the plasma by minimizing the gradient between adjacent pixel data. Recent studies about the comparison of the several tomographic reconstruction methods showed that the P-T method produced more accurate results. We have studied existing Laplacian matrix used in Phillips-Tikhonov regularization method and developed modified Laplacian matrix (Modified L). The comparison of the reconstruction result by the modified L and existing L showed that modified L produced more accurate result. The difference was significantly pronounced when a portion of plasma was reconstructed. These results can be utilized in the Edge Plasma diagnostics; especially in divertor diagnostics on tokamak a large impact is expected. In addition, accurate reconstruction results from received data in only one direction were confirmed through phantom test by using P-T method with modified L. These results can be applied to the tangentially viewing pin-hole camera diagnostics on tokamak.

• Applied Science and Convergence Technology
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• v.24 no.1
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• pp.16-21
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• 2015

The characteristics of an atmospheric pressure plasma jet (APPJ) in He discharge are measured with electrical and optical diagnostics methods. The discharge phenomenon in one cycle of the APPJ was diagnosed using intensified charge coupled device (ICCD) imaging. The gate mode images show that the propagation of plasma bullets happens only when the applied voltage on the inner conductor is positive. Moreover, the Schlieren image of the plasma jet shows that the laminar flow is changed into a turbulent flow when the plasma jet is turned on, especially when the gas flow rate increases.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.202-202
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• 2011

Diagnostics of plasma density is a key factor for monitoring plasma processing. Various probes are invented to measure plasma density and cut-off probe is a one of the most promising diagnostics tool for measuring plasma density. However, at the low density or high pressure the cut-off probe cannot clearly resolve the cut-off peak. Several reasons make this problem: Cut-off likes peaks caused by cavity resonances and weaken transmission spectrum signal at high pressure. Recently, You et al., have researched mechanism of cut-off probe and we improve the cut-off reliability and sensitivity base on that research. Modified cut-off antenna is adapted and bias cut-off probe method is tried. These experiment results have good agreement with the previous study and show good measurement characteristics.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 1999.11a
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• pp.46-52
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• 1999

Laser diagnostics have been extensively used to understand plasma behaiviour under different discharge conditions. Measurements were performance for (i) electric field, (ii) electron temperature and density, and (iii) reaction products due to chemical reactions by electron impacts. The knowledge thus gained has been extensively used to realize novel plasma performances, such as epitaxial thin film depositions using plasma sputtering, performance improvements of discharge-pumped excimer laser, and developments of environmental equipment.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.176.2-176.2
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• 2013

Property of optical diagnostics for pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is 0.5 ${\mu}F$, to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of 0.5 ${\mu}F$. High voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ~ 1 ${\mu}s$ between the two electrodes of anode-cathode whose material is made of tungsten pin, which are immersed into the liquids. We have investigated the emitted hydrogen lines for optical diagnostics of high voltage pulsed plasma. The emission line of 656.3 nm from $H-{\alpha}$ and 486.1 nm from $H-{\beta}$ have been measured by a monochromator. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium conditions, the electron temperature and density of the high voltage pulsed plasma in liquid could be obtained by the Stark broadening of optical emission spectroscopy. For the investigation of the influence of pulsed plasma on biological proteins, we have exposed it onto the proteins such as hemoglobin and myoglobin. The structural changes in these proteins and their analysis have also been obtained by circular dichroism (CD) and ultraviolet (UV) visible spectroscopy.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.1-6
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• 2002

Plasma processing of semiconductor materials plays a dominant role in microelectronic technology. During last century, plasma have gone a way from laboratory phenomena to industrial applications due to intensive progress in both scientific and industrial trends. Improvement and development of new experience together with development of plasma theory and plasma diagnostics methods. A most parameters (pressure, flow rate, power density) and various levels of plasma system (energy distribution, volume gas chemistry, transport, heterogeneous effects) to understand the whole process mechanism. It will allow us to choose a correct ways for processes optimization.

• Proceedings of the KIEE Conference
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• 1989.11a
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• pp.145-148
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• 1989

Plasma diagnostics using Langmuir Probe is of wide application because of its simplicity in measurement of electron temperatures and densities. Current methods using simple circuit and analog meters, however, have troubles when they are applied to time-varying or thermal plasmas. To overcome these problems and expand the area of applicability, we have designed fast electronic voltage sweeping circuit in which we can detect digital data. Diagnostics using our digital Langmuir Probe is performed in various kinds of plasmas and the results are shown. Our method can be applied to measuring electron temperature and density of high temperature or time-varying plasmas. And we expect further knowledge of each state of plasma.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.576-576
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• 2013

Recently, diagnostics of plasma becomes more important due to requirement of precise control of plasma processing based on measurement of plasma characteristics. The Langmuir probe has been used for the diagnostics but it has an inevitable uncertainty and error sources such as incorrect tip length and RF noise. Instead of the Langmuir probe, various diagnostic methods have been developed and researched. The cutoff probe is promising one for plasma density using microwaves and resonance phenomenon at the plasma frequency. The cutoff probe has various advantages as follows; (i) it is simple and robust, (ii) it uses few assumptions, and (iii) it is free from deposition by reactive gas. However, the cutoff probe also has uncertainty and error sources such as gap between tips, tip length, direction of tip plane, and RF noise. In this study, the uncertainty and error sources in manufacturing both probes and in diagnostics process were analyzed via comparative experiment at various discharge conditions. Furthermore, to reveal the user dependence of both probes, three well trained Ph. D students made the Langmuir probe and the cutoff probe, respectively, and it were analyzed. Thought this study, it is established that reliability and validity of the Langmuir probe and the cutoff probe related with not only the intrinsic characteristics of probes but also probe user.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.185.1-185.1
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• 2016

Cutoff probe, diagnostics instrument for plasma density, have been received an extensive attention due to simple, robust and lowest assumption. Although the cutoff probe has a long history, physical model is limited in low density plasma. For that reason, we propose a novel transmission line model of cutoff probe for precise measurement of high density plasma. In addition simplified circuit model can be obtained from transmission line model. It can explain simply physics of cutoff probe in high density plasma.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.94-94
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• 2010

As a new plasma source for the plasma enhanced chemical vapor deposition (PCVD) of ${\mu}c$-Si deposition, we have demonstrated a microwave-excited plasma source, which can produce high density (${\sim}10^{12}\;cm^{-3}$) plasma with low electron temperature (~1 eV) and low plasma potential (~10 V). In this plasma source, microwave power radiated from slot antenna is distributed along the plasma-dielectric interface in large area and this enables us to produce uniform high-density plasma in large area. To optimize deposition conditions, deep understanding of gas phase chemistry is indispensable. In this presentation, we will discuss on the gas phase diagnostics of microwave $SiH_4/H_2$ plasma such as $SiH_4$ dissociation or $SiH_3$ radical profile as well as deposited film properties.