• Title/Summary/Keyword: Plasma Technology

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An Experimental Study on Multiple ICP & Helicon Source for Oxidation in Semiconductor Process

  • Lee, Jin-Won;Na, Byoung-Keun;An, Sang-Hyuk;Chang, Hong-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.271-271
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    • 2012
  • Many studies have been investigated on high density plasma source (Electron Cyclotron Resonance, Inductively Coupled Plasma, Helicon plasma) for large area source after It is announced that productivity of plasma process depends on plasma density. In this presentation, we will propose the new concept of the multiple source, which consists of a parallel connection of ICP sources and helicon plasma sources. For plasma uniformity, equivalent power (especially, equivalent current in ICP & Helicon) should distribute on each source. We design power feeding line as coaxial transmission line with same length of ground line in each source for equivalent power distribution. And we confirm the equivalent power distribution with simulation and experimental result. Based on basic study, we develop the plasma source for oxidation in semiconductor process. we will discuss the relationship between the processing parameters (With or WithOut magnet, operating pressure, input power ). In ICP, plasma density uniformity is uniform. In ICP with magnet (or Helicon) plasma density is not uniform. As a result, new design (magnet arrangement and gas distributor and etc..) are needed for uniform plasma density in ICP with magnet and Helicon.

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Enviromental Application of Plasma Technology

  • Lee, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.119.1-119.1
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    • 2014
  • Toxic waste disposal: Many people think that when toxic waste is dumped into the ocean or into the air, it disappears. This belief is incorrect. Rather than disappearing, it accumulates over time and slowly destroys the environment. Ultimately, it leads to the destruction of human race. Plasma is environmentally friendly: Plasma is environmentally friendly because it is created and disappears. When plasma is formed on the earth, you need certain conditions such as accelerating electrons by an electrical discharge or a particle accelerator. When this is gone, plasma completely disappears, leaving no impact on the environment. Plasmas produce radicals: Even if plasma density is low at atmospheric pressure, many radicals (excited states of molecules) are created. These radicals are chemically very aggressive. So instead of using harmful chemicals, plasma can be utilized for less of an impact on the environment. Plasma can reach very high temperatures: Plasma is also useful because when you control the density, you can easily reach high temperatures up to $5000{\sim}6000^{\circ}C$ at atmosphere pressure. Because of this heat and the chemical aggressiveness of the plasma, there are many green applications for plasma technology. Pulsed power technology: Pulsed electric field for extraction, drying and killing bacteria. Treatment of biological tissue by pulsed electric fields: Extraction of substances from cells: Sterilisation, Medical applications, Growth stimulation, Food preparation. Each application has its specialities, especially with respect to pulse shape and electric field strength.

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Reduction Kinetics of Gold Nanoparticles Synthesis via Plasma Discharge in Water

  • Sung-Min Kim;Woon-Young Lee;Jiyong Park;Sang-Yul Lee
    • Journal of the Korean institute of surface engineering
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    • v.56 no.6
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    • pp.386-392
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    • 2023
  • In this work, we describe the reduction kinetics of gold nanoparticles synthesized by plasma discharge in aqueous solutions with varied voltages and precursor (HAuCl4) concentrations. The reduction rate of [AuCl4]- was determined by introducing NaBr to the gold colloidal solution synthesized by plasma discharge, serving as a catalyst in the reduction process. We observed that [AuCl4]- was completely reduced when its characteristic absorption peak at 380 nm disappeared, indicating the absence of [AuCl4]- for ligand exchange with NaBr. The reduction rate notably increased with the rise in discharge voltage, attributable to the intensified plasma generated by ionization and excitation, which in turn accelerated the reduction kinetics. Regarding precursor concentration, a lower concentration was found to retard the reduction reaction, significantly influencing the reduction kinetics due to the presence of active H+ and H radicals. Therefore, the production of strong plasma with high plasma density was observed to enhance the reduction kinetics, as evidenced by optical emission spectroscopy.

Surface Modification with Atmospheric Microwave Agron Plasma Jet Assisted with Admixture of H2O2 and Analysis of Plasma Characteristics

  • Won, I.H.;Shin, H.K.;Kwon, H.C.;Kim, H.Y.;Kang, S.K.;Lee, J.K.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.544-545
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    • 2013
  • Recently, low-temperature atmospheric-pressure plasmas have been investigated [1,2] for biomedical applications and surface treatments. Experiments for improving hydrophilicity of stainless steel (SUS 304) plate with atmospheric microwave argon and H2O2 mixture plasma jet [3] were carried out and experimental measurements and plasma simulations were conducted for investigating the characteristics of plasma for the process. After 30 s of low power (under 10 W) and low temperature (under $50^{\circ}C$) plasma treatment, the water contact angle decreased rapidly to around $10^{\circ}$ from $75^{\circ}$ and was maintained under $30^{\circ}$ for a day (24 hours). The surface free energy, calculated from the contact angles, increased. The chemical properties of the surface were examined by X-ray Photoelectron Spectroscopy (XPS) and the surface morphology and roughness were examined by Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) respectively. The characteristics of plasma sources with several frequencies were investigated by Optical Emission Spectroscopy (OES) measurement and one-dimensional Particle-in-Cell (PIC) simulation and zero-dimensional global simulation [4]. The relation between plasma components and the efficacy of the surface modification were discussed.

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Glucose Content and pH of Broiler and Porcine Blood Plasma by Glucose Oxidase or Baker's Yeast Addition (Glucose Oxidase 및 제빵용 효모 첨가에 따른 육계와 돼지의 혈장 포도당과 pH 변화)

  • Lee, Jae-Jun;Yi, Young-Hyoun
    • Korean Journal of Food Science and Technology
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    • v.31 no.2
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    • pp.416-420
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    • 1999
  • The effects of GOD and yeast on glucose content and pH of broiler and porcine blood plasma were investigated. The initial glucose concentration of broiler and porcine blood plasma were $150mg/100cm^{3}\;and\;143mg/100cm^{3}$, respectively. Addition of GOD and yeast decreased glucose contents in broiler and porcine plasma. As expected, plasma glucose content decreased as incubation time increased. While 1080 and 1110 min were required to remove glucose from both broiler and porcine plasma at GOD 5 units/g and 480 and 1020 min were required at GOD 10 units/g, respectively; both required 240 min at 0.3% yeast (w/w). The Maillard reaction can be prevented by desugarization. During the removal of glucose, pH of the plasma decreased. As glucose content in plasma leveled off, the pH value of plasma increased. Therefore, pH may be used as an index of desugarization.

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The effect of $Ar\;+\;H_2$ Plasma on the Low Temperature ITO Film Synthesized on Polymer (폴리머 기판상에 합성된 저온 ITO 박막에 미치는 $Ar\;+\;H_2$ 플라즈마의 영향)

  • Moon, Chang-S.;Chung, Yun-M.;Lee, Ho-Y.;Kim, Yong-M.;Kim, Kab-S.;Gaillard, M.;Han, Jeon-G.
    • Journal of the Korean institute of surface engineering
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    • v.39 no.5
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    • pp.206-209
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    • 2006
  • Indium tin oxide (ITO) films were synthesized on polymer (PES, polyethersulfone) at room temperature by pulsed DC magnetron sputtering. By the control of introducing hydrogen to argon atmosphere, the resistivity of ITO films was obtained at $5.27\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$ without substrate heating in comparison with $2.65\;{\times}\;10{-3}\;{\Omega}{\cdot}cm$ under hydrogen free condition. ITO film synthesized at Ar condition was changed from amorphous to crystalline. These result from the enhancement of electron temperature in $Ar\;+\;H_2$ plasma, which induces the increase of ionization of target materials and argon. The dominant increase of ions such as In II and O II and neutral Sn I was monitored by optical emission spectroscopy (OES). Thermal energy required for the crystalline film formation is compensated by kinetic energy transfer through ion bombardments to substrate.

Increase in Color Depth and Analysis of the Interfacial Electrokinetic Potential of Poly(Ethylene Terephthalate) Fabric by Plasma Treatment (폴리에스테르 직물의 저온플라즈마 처리에 따른 계면동전위와 심색성 향상에 관한 연구)

  • Jeon, Sang-Min;Lee, Ki-Poong;Gu, Kang
    • Textile Coloration and Finishing
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    • v.15 no.4
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    • pp.1-7
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    • 2003
  • We investigated the effect of color depth on polyester fabrics by plasma treatment. In this study, although it have many paper about effects of plasma treatment, we observed interfacial electrokinetic potential of polyester fabrics by plasma treatment and also we investigated relationship between deep coloring agent and plasma treatment to get the effect of color depth on polyester fabrics. The results obtained are as follows, 1. Plasma treatment did not enhanced the effect of color depth of polyester fabrics by plasma treatment independently. 2. In the case of using the deep coloring agent with plasma treatment on polyester fabrics, lightness was more decreased than using the deep coloring agent itself. 3. Plasma treatment could not affect surface shape and tensile strength of treated polyester fabrics.