• Journal of the Korean Society for Heat Treatment
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• v.14 no.1
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• pp.8-16
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• 2001

The effects of gas composition, pressure, temperature and time on the case thickness, hardness and nitride formation in the surface of tool steels(STD11 and STD61) have been studied by micro-pulse plasma nitriding. External compound layer and internal diffusion layer and the diffusion layer were observed in the nitrided case of tool steels. The relative amounts and kind of phases formed in the nitrided case changed with the change of nitriding conditions. Generally, only nitride phases such as ${\gamma}(Fe_4N)$, ${\varepsilon}(Fe_{2-3}N)$, or $Cr_{1.75}V_{0.25}N_2$ phases were detected in the compound layer, while nitride and carbide phases such as ${\varepsilon}-nitride(Fe_{2-3}N)$, $(Cr,Fe)_{\gamma}C_3$ or $Fe_3C$ were detected in the diffusion layer by XRD analysis. The thickness of compound layer increased with the increase of nitrogen content in the gas composition. Maximum case depth was obtained at gas pressure of 200Pa.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05c
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• pp.201-203
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• 2001

This paper describes the information for quantitative simulation of weakly ionized plasma. We must grasp the meaning of the plasma state condition to utilize engineering application and to understand materials of plasma state. In this paper, the drift velocity of electron in Xenon gas calculated for range of E/N values from 0.01~500[Td] at the temperature is $300[^{\circ}K]$ and pressure is 1[Torr], using a set of electron collision cross sections determined by the authors and the values of drift velocity of electrons are obtained for TOF, PT, SST sampling method of Backward Prolongation by two term approximation Boltzmann equation method. it has also been used to predict swarm parameter using the values of cross section as input. The result of Boltzmann equation, the drift velocity of electrons, has been compared with experimental data by L. S. Frost and A. V. Phelps for a range of E/N. The swarm parameter from the study are expected to server as a critical test of current theories of low energy scattering by atoms and molecules.

• Membrane Journal
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• v.9 no.2
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• pp.107-113
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• 1999

Alcohol concentration via pervaporation process was performed by using commercial PDMS(polydimethylsiloxane) composite membrane and plasma treated PP(polypropylene) membranes. Effects of operating parameters of pcrvaporation process were examined. With the increase of butanol concentration in the feed, flux and selectivity increased due to the greater affinity of butanol with PDMS than that of water. As the operating temperature increased, free volume as well as the solubilities and diffusivities of alcohol and water increased to result in the greater flux and less selectivity of the membrane. As solubility parameter difference between alcohol and PDMS membrane decreased, high flux and good selectivity were obtained. When PP membrane was plasma treated with methanol, it has 6 times greater flux than PDMS membrane with equivalent separation factor. With the increase of plasma treatment time, flux and selectivity were enhanced. However, excess treatment time caused pore blocking to result in the flux decrease.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.195.1-195.1
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• 2016

Currently, as Plasma application is expanded to the industrial and medical industrial, low temperature plasma applications became important. Especially in medical and biology, many researchers have studied about generated radical species in atmospheric pressure low temperature plasma directly adapted to human body. Therefore, so measurement their plasma parameter is very important work and is widely studied all around world. One of the plasma parameters is electron density and it is closely relative to radical production through the plasma source. some kinds of method to measuring the electron density are Thomson scattering spectroscopy and Millimeter-wave transmission measurement. But most methods have very expensive cost and complex configuration to composed of experiment system. We selected Michelson interferometer system which is very cheap and simple to setting up, so we tried to measuring electron density by laser interferometer with laser beam chopping module for measurement of temporal phase difference in plasma jet. To measuring electron density at atmospheric pressure Ar plasma jet, we obtained the temporal phase shift signal of interferometer. Phase difference of interferometer can occur because of change by refractive index of electron density in plasma jet. The electron density was able to estimate with this phase difference values by using physical formula about refractive index change of external electromagnetic wave in plasma. Our guiding laser used Helium-Neon laser of the centered wavelength of 632 nm. We installed chopper module which can make a 4kHz pulse laser signal at the laser front side. In this experiment, we obtained more exact synchronized phase difference between with and without plasma jet than reported data at last year. Especially, we found the phase difference between time range of discharge current. Electron density is changed from Townsend discharge's electron bombardment, so we observed the phase difference phenomenon and calculated the temporal electron density by using phase shift. In our result, we suggest that the electron density have approximately range between 1014~ 1015 cm-3 in atmospheric pressure Ar plasma jet.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.136.2-136.2
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• 2015

반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2002.05a
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• pp.10-11
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• 2002

• Transactions of the Korean Society of Mechanical Engineers A
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• v.32 no.4
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• pp.354-361
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• 2008

Cold rolled steel sheet for automotive was treated by Ar/$O_2$ atmospheric pressure plasma to improve the adhesive bonding strength. Through the contact angle test and calculation of surface free energy for cold rolled steel sheet, the changes of surface properties were investigated before and after plasma treatment. The contact angle was decreased and surface free energy was increased after plasma treatment. And the change of surface roughness and morphology were observed by AFM(Atomic Force Microscope). The surface roughness of steel sheet was slightly changed. Based on Taguchi method, single lap shear test was performed to investigate the effect of experimental parameter such as plasma power, treatment time and flow rate of $O_2$ gas. Results shows that the bonding strength of steel sheet treated in Ar/$O_2$ atmospheric pressure plasma was improved about 20% compared with untreated sheet.

• Proceedings of the Korean Society of Applied Pharmacology
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• 1994.04a
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• pp.343-343
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• 1994

1. 목 적 : 혈액 중에 존재하는 약물은 대부분 혈장 단백질과 결합하며, 비단백 결합성 약물만이 생체막을 통과하여 여러 조직에 분포되고, target eel1에서 약리학적 작용을 나타내며, 대사, 배설 될 수 있다. 단백결합율이 높은 약물일수록 비결합성 약물의 양은 적어지며, 따라서 비결합성 약물의 증가는 약효의 상승을 의미하게 된다. 최근 만성 질환에 한약의 병용투여가 증가하고 있다. 본 실험에서는 단백결합율이 높은 감초의 주성분인 Glycyrrhizic acid(GA)와 고혈압 치료제로 많이 사용되는 칼슘 길항제를 병용 투여할 경우, 칼슘 길항제의 혈장 단백결합에 미치는 영향을 살펴 보았다. 2. 방 법 : Diltiazem hydrochloride, Verapamil hydrochloride, Nifedipine 와 GA를 model 약물로 하여 평형 투석법과 한외 여과법을 이용하여 fatty acid free human serum albumin(HSA), Low density lipoprotein( LDL ), of-Acid glycoprotein(AAG), plasma 각각에 대한 결합율을 HPLC로 분석하였으며 또한 Scatchard plot를 이용하여 binding parameter를 구하였다. 3. 결과 및 고찰 : GA는 Diltiazem의 HSA와 plasma의 결합율에 영향을 미쳤으며, Verapamil의 HSA, LDL, AAG, Plasma 결합율에, 그리고 Nifedipine의 HSA, LDL, Plasma의 단백 결합율에 영향을 주었으며, 각각 n과 Ka값에 변화를 주었다.

• Journal of computational fluids engineering
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• v.17 no.2
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• pp.71-77
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• 2012

Numerical simulations are carried out for flow over a circular cylinder controlled by the momentum forcing which is generated by a pair of plasma actuators symmetrically mounted on the cylinder surface. A popular and empirical plasma model is used for the spatial distribution of momentum forcing. In this study, we consider two different types of actuation, i.e., steady and unsteady (or pulsed) actuation. In the unsteady actuation, the actuation is turned on and off periodically, its frequency being a control parameter. The objective of this study is to investigate the effects of actuator location and actuation frequency on the flow structures and the forces on the cylinder. Results show that the cylinder wake can be effectively controlled by proper actuator location. For example, when the actuators are located at $120^{\circ}$ from the stagnation point, vortex shedding is completely suppressed with the boundary layer almost fully attached to the surface, resulting in drag reduction and lift elimination.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.5
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• pp.54-62
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• 1998

In a plasma etching system, ions become an important parameter in determining the wafer topography which depends on both the physical sputtering mechanism and the chemically enhanced reaction. this paper reports the energy and angular distributions of ions across the plasma sheath using a monte carlo method. The ion distribution is mainly affected by the magnitude of the sheath voltage and by the collision in the sheath. Furthemore, the local potential distribution in a plamsa sheath has been determined by solving the poisson's equation. In th is work, ionic collisions were cosidered in terms of both charge exchange and momentum transfer. The three-dimensional distributions of ions were calculated with varying the input process conditions in the plasma reactor.