• 제목/요약/키워드: Planar geometry

검색결과 135건 처리시간 0.028초

방사성 폐기물 처분장내 충전물질에서의 핵종 이동 모델의 원주좌표계와 평면좌표계에서 결과 비교 (Comparison of the Cylindrical Geometry and the Planar Geometry for the Near-Field Radionuclides Transport Model)

  • Kang, Chul-Hyung;Han, Kyong-Won;Park, Hun-Hwee
    • Nuclear Engineering and Technology
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    • 제23권1호
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    • pp.41-48
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    • 1991
  • 처분장에서의 방사성 핵종 이동 연구에서 많은 학자들이 일차원 모델이나 평면좌표 모델을 가정하여 사용하고 있다. 이러한 시도들은 정당한 가정이라는 것을 보여야 할 것이다. 본 논문에서는 충전물질에서의 핵종이동에서 사용한 가정, 즉 원주좌표계를 평면좌표계로 단순화하였던 가정을 검증하고자 한다. 본 연구 결과, 충전물질층의 외경과 폐기물 고화체의 직경의 비가 1에 가까울수록 평면좌표계의 가정은 원주좌표계의 결과와 잘 일치함을 알 수 있으며 그 비가 커져도 두 좌표계의 오차는 상대적으로 적음을 알 수 있다. 또한 평면좌표계의 가정이 보수적인 결과를 준다.

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Design of an Optimal Planar Array Structure with Uniform Spacing for Side-Lobe Reduction

  • Bae, Ji-Hoon;Seong, Nak-Seon;Pyo, Cheol-Sig;Park, Jae-Ick;Chae, Jong-Suk
    • Journal of electromagnetic engineering and science
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    • 제3권1호
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    • pp.17-21
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    • 2003
  • In this paper, we design an optimal planar array geometry for maximum side-lobe reduction. The concept of thinned array is applied to obtain an optimal two dimensional(2-D) planar array structure. First, a 2-D rectangular array with uniform spacing is used as an initial planar array structure. Next, we modify the initial planar array geometry with the aid of thinned array theory in order to reduce the maximum side-lobe level. This is implemented by a genetic algorithm under some constraint, minimizing the maximum side-lobe level of the 2-D planar array. It is shown that the optimized planar array structure can achieve low side-lobe level without optimizing the excitations of the array antennas.

High Speed Displays Based on a Nonchiral Smectic C Liquid Crystal in an Antiparallel Planar Geometry

  • Jeong, Cherl-Hyun;Na, Jun-Hee;Yoon, Tae-Young;Yu, Chang-Jae;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.571-574
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    • 2005
  • We demonstrated a high speed liquid crystal (LC) display mode based on a nonchiral smectic C LC in an antiparallel planar geometry. In this antiparallel planar nonchiral smectic C (APNSC) LC mode, analog gray scales and wide viewing properties are achieved using a stepwise thermal annealing process (STAP). Because of an initially stable LC alignment in large area through the STAP, the APNSC LC mode exhibits the characteristics of fast response and high contrast ratio. This new APNSC mode is suitable for processing the dynamic image at a video rate in the next-generation LCDs.

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평판형 반응성 이온 식각기의 설계변수 분석 (Design Parameter Analysis for a Planar Type Reactive Ion Etcher)

  • 강봉구;박성호;전영진
    • 대한전자공학회논문지
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    • 제26권11호
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    • pp.1658-1665
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    • 1989
  • Reactor design considerations over several critical parameters for a planar type reactive ion etcher are given. The etch uniformity is taken as a principal design constraint. The characteristics of economicaly available vacuum pumping system are taken as practical design constraints. A set of theoretical conditions on the chamber geometry and on the gas delivery and vacuum system, that satisfy the design constraints, are derived from basic properties of RF glow discharge and gas dynamics. The theoretical results are applied to decide design parameters of a practical single-wafer-per-chamber planar type reactive ion etching machine.

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Design of Scannable Non-uniform Planar Array Structure for Maximum Side-Lobe Reduction

  • Bae, Ji-Hoon;Kim, Kyung-Tae;Pyo, Cheol-Sig;Chae, Jong-Suk
    • ETRI Journal
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    • 제26권1호
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    • pp.53-56
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    • 2004
  • In this letter, we propose a novel design scheme for an optimal non-uniform planar array geometry in view of maximum side-lobe reduction. This is implemented by a thinned array using a genetic algorithm. We show that the proposed method can maintain a low side-lobe level without pattern distortion during beam steering.

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집합과 평면기하를 활용한 공간기하의 3대 문제 증명 (Proof of the three major problems of spatial geometry using sets and plane geometry)

  • 도강수;류현기;김광수
    • East Asian mathematical journal
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    • 제39권4호
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    • pp.479-492
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    • 2023
  • Although Euclidean plane geometry is implemented in the middle school course, there are three major problems in high school space geometry that can be intuitively taken for granted or misinterpreted as circular arguments. In order to solve this problem, this study proved three major problems using sets, Euclidean plane geometry, and parallel line postulates. This corresponds to a logical sequence and has mathematical and mathematical educational values. Furthermore, it will be possible to configure spatial geometry using sets, and by giving legitimacy to non-Euclidean spatial geometry, it will open the possibility of future research.

건축물 평면 형상 역설계 자동화를 위한 Scan-to-Geometry 맵핑 규칙 정의 (Scan-to-Geometry Mapping Rule Definition for Building Plane Reverse engineering Automation)

  • 강태욱
    • 한국BIM학회 논문집
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    • 제9권2호
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    • pp.21-28
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    • 2019
  • Recently, many scan projects are gradually increasing for maintenance, construction. The scan data contains useful data, which can be generated in the target application from the facility, space. However, modeling the scan data required for the application requires a lot of cost. In example, the converting 3D point cloud obtained from scan data into 3D object is a time-consuming task, and the modeling task is still very manual. This research proposes Scan-to-Geometry Mapping Rule Definition (S2G-MD) which maps point cloud data to geometry for irregular building plane objects. The S2G-MD considers user use case variability. The method to define rules for mapping scan to geometry is proposed. This research supports the reverse engineering semi-automatic process for the building planar geometry from the user perspective.

미세입자 분사가공을 위한 3 차원 임의형상 모재용 마스크 모델링 (Mask Modeling of a 3D Non-planar Parent Material for Micro-abrasive Jet Machining)

  • 김호찬;이인환;고태조
    • 한국정밀공학회지
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    • 제27권8호
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    • pp.91-97
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    • 2010
  • Micro-abrasive Jet Machining is one of the new technology which enables micro-scale machining on the surface of high brittle materials. In this technology it is very important to fabricate a mask that prevents excessive abrasives not to machine un-intend surface. Our previous work introduced the micro-stereolithography technology for the mask fabrication. And is good to not only planar material but also for non-planar materials. But the technology requires a 3 dimensional mask CAD model which is perfectly matched with the surface topology of parent material as an input. Therefore there is strong need to develop an automated modeling technology which produce adequate 3D mask CAD model in fast and simple way. This paper introduces a fast and simple mask modeling algorithm which represents geometry of models in voxel. Input of the modeling system is 2D pattern image, 3D CAD model of parent material and machining parameters for Micro-abrasive Jet Machining. And the output is CAD model of 3D mask which reflects machining parameters and geometry of the parent material. Finally the suggested algorithm is implemented as software and verified by some test cases.

Structural and Conformational Studies of ortho-, meta-, and para-Methyl Red upon Proton Gain and Loss

  • Park, Sun-Kyung;Lee, Choong-Keun;Min, Kyung-Chul;Lee, Nam-Soo
    • Bulletin of the Korean Chemical Society
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    • 제26권8호
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    • pp.1170-1176
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    • 2005
  • The structures and conformations of ortho-, meta-, and para-methyl red (MR) upon proton gain and loss were studied by density functional calculations, and compared to methyl yellow for the effects of a carboxyl substitution. Internal hydrogen bonding causes the geometry of neutral o-MR planar, otherwise twist. Monoprotonated species of MR are planar where the proton is attached to $\beta$-azo nitrogen. This loses its azo character a bit, and shows strong delocalization characterized as a quinonoid canonical structure. Di-protonated species of MR is proved to hold two protons at the amino and $\alpha$-azo nitrogen atoms, and planar. It regains somewhat of its azo character, but still shows fairly delocalized property in terms of carbocationic canonical structures. The carboxyl substitution on 4-dimethylamino-trans-azobenzene structure has some delocalization effects on the geometry or conformation of MR derivatives whether neutral, mono-, di- or de-protonated.