• Polymer(Korea)
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• v.34 no.6
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• pp.565-573
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• 2010

Copoly(2-(dimethylamino)ethyl methacrylate)(DAEMA)/butyl acrylate (BA) and copoly(methyl methacrylate)(MMA)/BA/2-(cinnamoyloxy)ethyl methacryate (CEMA), which were cross-linked with dibromoalkane and UV irradiation, respectively, were prepared for the precursors of interpenetrating polymer network (IPN) humidity-sensitive films. 3-(Triethoxysilyl)propyl cinnamate (TESPC) was used as a surface-pretreating agent for the attachment of IPN-polyelectrolyte to the electrode surface by UV irradiation. Humidity sensitive polymeric thin films with an IPN structure were prepared by crosslinking reactions of copoly(DAEMA/BA) with 1,4-dibromobutane (DBB) and copoly(MMA/BA/CEMA) by UV-irradiation. The anchoring of an IPN-polyelectrolyte into the substrate was carried out via the photochemical $[2{\pi}+2{\pi}]$ cycloaddition. The resulting humidity sensors showed a high sensitivity in the range of 20~95%RH and a small hysteresis (<1.5%RH). The response time for adsorption and desorption process at 33~94%RH was 48 and 65 s, respectively, indicating a fast response. The effects of the concentration of copolymers, molar ratio of crosslinking agents and time of the precursor solution for dip-coating on their humidity sensitive properties including water durability were investigated.

• Journal of the Korean Applied Science and Technology
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• v.15 no.1
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• pp.9-15
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• 1998

Poly(p-anol-formaldehyde) cinnamates(AGEFCs) were synthesized to prepare a photo-sensitive polymer which enabled to be photodimerized via 6-center reaction. The photocharacteristics of the mixture of the AGEFCs and a sensitizer after exposure to light was tested. The yield of the residual film, which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. AGEFC-3 revealed a good photosensitive effect such as about 73% yield of residual film at 128 min. of exposed time.

• Polymer(Korea)
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• v.36 no.3
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• pp.315-320
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• 2012

Ultra violet (UV) curable pressure sensitive adhesives (PSA) were prepared by controlling both the structure of acryl copolymer and the functionality and content of multi-functional monomers. Acryl copolymer worked as the base polymer for giving the tackiness. Multi-functional monomers were used to vary the crosslinked structure and the degree of crosslink. Acryl copolymer showed the reduced peel strength after UV curing by decreasing the content of 2-ethylhexyl acrylate in the monomer composition. Both the peel strength of PSA and the content of residue found on silicon wafer decreased after UV curing by increasing the functionality of multi-functional monomers. UV curable PSA containing 20 phr six-functional monomer showed the higher peel strength before UV curing and the lower peel strength and the least residue on silicon wafer after UV curing.

• Transactions on Electrical and Electronic Materials
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• v.7 no.4
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• pp.204-209
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• 2006

Photo Resist (PR) ashing process was carried out with the atmospheric pressure- dielectric barrier discharge (ADBD) using $SF_6/N_2/O_2$. Ashing rate (AR) was sensitive to the mixing ratio of the oxygen and nitrogen of the blower type of ADBD asher. The maximum AR of 5000 A/min was achieved at 2% of oxygen in the $N_2$ plasma. With increasing the oxygen concentration to more than 2% in the $N_2$ plasma, the discharge becomes weak due to the high electron affinity of oxygen, resulting in the decrease of AR. When adding 0.5% of SF6 to $O_2/N_2$ mixed plasma, the PR AR increased drastically to 9000 A/min and the ashed surface of PR was smoother compared to the processed surface without $SF_6$. Carbon Fluorinated polymer may passivate the PR surface. It was also observed that the glass surface was not damaged by the fluorine.