• Title/Summary/Keyword: Pattern stamper

Search Result 36, Processing Time 0.019 seconds

Large area imprint process using isostatic pressure

  • Lee, Sang-Mun;Mun, Jin-Seok;Gwak, Jeong-Bok;Na, Seung-Hyeon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2007.11a
    • /
    • pp.209-209
    • /
    • 2007
  • Ni stamper위에 100nm의 Si 코팅후 자기조립 단분자막(SAM)을 액상 코팅방식으로 형성 하였고, 내구성 및 열적 안정성을 검증하기 위해 반복적인 이형 및 압력인가 test가 실시하였다. 20회 이상의 이형실험을 통해 열적, 기계적 안정성을 확인하고, 접촉각 측정을 통해 이형특성의 안정성도 고찰하였다. 이를 Imprint공법을 적용 fine pattern의 구조물을 얻을 수 있었다. SAM코팅은 TRICHLOROSILANE을 사용하였으며 Hexane과 1000:1의 비율로 섞어서 stirrer에서 mixing하는 방식을 사용했으며, UV-ozone처리를 통한 이형성 제거 효과도 관찰하였다.

  • PDF

Development of control technique of nano-sized pattern for electroplating (나노급 도금공정을 위한 미세패턴 제어기술의 개발)

  • Lee, Jae-Hong;Lee, Byoung-Wook;Lee, Kyung-Ho;Kim, Chang-Kyo
    • Proceedings of the KIEE Conference
    • /
    • 2004.07c
    • /
    • pp.1576-1578
    • /
    • 2004
  • The alumina membrane with nano sized pore was prepared from aluminum by anodic oxidation to apply for storage equipment, gas sensor and stamper. The pore size and cell size of the pores are controlled by anodic oxidation voltage. The alumina thickness was controlled by etching process using 0.2M $H_3PO_4$. The thickness of alumina on Si wafer was very accurately controlled by anodic oxidation time. Nickel with nano-sized grain was electroplated on the Au layer on silicon wafer. The fabricated pores on alumina membrane was the thickness of $7{\sim}10{\mu}m$ with straight nano-sized pore of 307${\sim}$120nm. The alumina by the etching process shows smooth surface. The size of Ni grain was 130nm and 250nm for 10mA/$cm^2$and 20mA/$cm^2$of electroplating currents, respectively.

  • PDF

Fabrication of Lenticular Lens by Continuous UV Roll Imprinting (UV Roll 임프린팅 공정을 이용한 렌티큘러 렌즈 제작)

  • Myung H.;Cha J.;Kim S.;Kang S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
    • /
    • 2005.10a
    • /
    • pp.91-94
    • /
    • 2005
  • With increasing demands for large-scale micro-optical components in the field of digital display, the establishment of large-scale fabrication technology fur polymeric patterns has become a priority. The starting point of any polymer replication process is the mold, and the mold often has flat surface. However, It is very hard to replicate large-scale micro patterns using the flat mold, because the cost of large-scale flat mold was very high, and some uniformity and releasing problems were often occurred in large scale flat molding process. In this study, a UV roll imprinting system to overcome the financial and fabrication issues of large-scale pattern replication process was designed and constructed. As a practical example of the system, a lenticular lens with radius of curvature of $223{\mu}m$ and pitch of $280{\mu}m$, which was used to provide wide viewing angle in projection TV, was designed and fabricated. The roll stamper was fabricated using direct machining process of aluminum roll base. Finally, the shape accuracy and uniformity of roll imprinted lenticular lens sheet were measured and analyzed.

  • PDF

Fabrication of Nano Master with Anti-reflective Surface Using Aluminum Anodizing Process (양극산화공정을 이용한 반사방지 성형용 나노 마스터 개발)

  • Shin, H.;Park, Y.;Seo, Y.;Kim, B.
    • Journal of the Korean Society of Manufacturing Technology Engineers
    • /
    • v.18 no.6
    • /
    • pp.697-701
    • /
    • 2009
  • A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

  • PDF

Study of Optical Design Method for Ultra Slim Backlight System Using LED Light Source (LED광원을 이용한 초박형 백라이트에 대한 광학설계기법의 연구)

  • Han, Jeong-Min;Han, Jin-Woo;Kim, Byoung-Young;Kim, Jong-Yeon;Kim, Young-Hwan;Kim, Jong-Hwan;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2007.11a
    • /
    • pp.432-432
    • /
    • 2007
  • We studied optical simulation method for ultra slim backlight system. We designed 0.7mm thickness light guide plate and combined 48 white color LEDs for 12 inch wide size TFT-LCD. We designed flat shape PMMA light guide plate with both side patterned. It have vertical prism shape on upper side and ellipse dot pattern on the other side. We targeted 4500 nit brightness and uniform emission characteristic without hot spot or dark area. At first, we designed uniform emission area with more high brightness in center area and then, debugged light entering hot spot zone and direction of outgoing light flux. Although it was designing step, we obtained good result with reverse prism optical sheet and it had good repeatability because it was based on the stamper method in injection process without laser engraving or micro groove engraving method.

  • PDF

An Experimental Study on the Replication Ratio of Micro Patterns of 7 inch LGP using Injection/Compression and RHCM (사출/압축 및 RHCM 기술이 7인치 도광판 마이크로 패턴 전사성에 미치는 영향에 대한 실험적 연구)

  • Cho, S.W.;Kim, J.S.;Hwang, C.J.;Yoon, K.H.;Kang, J.J.
    • Transactions of Materials Processing
    • /
    • v.20 no.1
    • /
    • pp.11-16
    • /
    • 2011
  • Recently, according to the rapid development of display, many display applications, such as, cellular phone, navigation, monitor and LCD TV have been changed from CRT type to LCD type. BLU(Back Light Unit) is one of main parts in LCD unit and generally, it consists of a light source, a reflective sheet, a LGP(Light Guide Plate), a diffuser sheet, and two prism sheets. The most important component of BLU is a light guide plate, which diffuses the input light to the TFT-LCD module uniformly. The LGP is usually made by injection molding process, and it has numerous optical micro patterns on the surface. In the present study the micro-patterned stamper which has cylindrical shape was fabricated by using the UV-LiGA process. And the replication characteristics have been compared among three different kinds of injection molding process; general injection molding, injection/compression molding and RHCM(Rapid Heating and Cooling Molding). Average replication ratios of CIM and ICM were 19.1% and 64.6%, respectively. On the other hand, the average replication ratio of RHCM process showed the higher value of 98.4% among these. It show that maintaining the mold surface above $T_g$ could increase the replication ratio of micro patterns substantially.