• Title/Summary/Keyword: Pattern Alignment

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A Study of Liquid Crystal Alignment Layer Using Brewster Angle Microscope (Brewster Angle Microscope를 이용한 액정 배향막 연구)

  • 정치섭
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.12 no.1
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    • pp.81-87
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    • 1999
  • The surface morphology of liquid crystal alignment layer has been investigated by using Brewster angle microscope(BAM) for the first time. The samples used in this work for liquid crystal alignment layer were mechanically rubbed polyimide films. The rubbing pattern on this layer has been analyzed with the terms of microgroove and rubbing induced optical birefringence. For the mechanically rubbed surface, the geometrical factors of microgroove play the major role for the formation of rubbing pattern. We propose that the BAM can be used as a powerful tool not only for observing the rubbing pattern, but also for inspecting the surface defects.

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A Pattern Summary System Using BLAST for Sequence Analysis

  • Choi, Han-Suk;Kim, Dong-Wook;Ryu, Tae-W.
    • Genomics & Informatics
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    • v.4 no.4
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    • pp.173-181
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    • 2006
  • Pattern finding is one of the important tasks in a protein or DNA sequence analysis. Alignment is the widely used technique for finding patterns in sequence analysis. BLAST (Basic Local Alignment Search Tool) is one of the most popularly used tools in bio-informatics to explore available DNA or protein sequence databases. BLAST may generate a huge output for a large sequence data that contains various sequence patterns. However, BLAST does not provide a tool to summarize and analyze the patterns or matched alignments in the BLAST output file. BLAST lacks of general and robust parsing tools to extract the essential information out from its output. This paper presents a pattern summary system which is a powerful and comprehensive tool for discovering pattern structures in huge amount of sequence data in the BLAST. The pattern summary system can identify clusters of patterns, extract the cluster pattern sequences from the subject database of BLAST, and display the clusters graphically to show the distribution of clusters in the subject database.

Calibration Method for the Panel-type Multi-view Display

  • Kim, Jonghyun;Lee, Chang-Kun;Hong, Jong-Young;Jang, Changwon;Jeong, Youngmo;Yeom, Jiwoon;Lee, Byoungho
    • Journal of the Optical Society of Korea
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    • v.19 no.5
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    • pp.477-486
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    • 2015
  • We propose a novel calibration method which can be applied to all kinds of panel-type multi-view displays. We analyze how the angular, the axial, and the lateral misalignment affects the 3D image quality in a panel-type multi-view display. We demonstrate the ray optics simulation with a 3-view slanted parallax barrier system using pentile display for the quantitative calculation. Based on the analysis, we propose a new alignment pattern for all kinds of panel-type multi-view displays. The proposed pattern is sensitive to all of the angular, the axial, and the lateral misalignments. The high spatial frequency images and on and off alignment in the proposed pattern help observers to calibrate the system easily. We theoretically show the generality of the proposed alignment pattern and verify the pattern with image simulations and experiments.

Parallel pattern fabrication on metal oxide film using transferring process for liquid crystal alignment (전사 공정을 이용한 산화막 정렬 패턴 제작과 액정 배향 특성 연구)

  • Oh, Byeong-Yun
    • Journal of IKEEE
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    • v.23 no.2
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    • pp.594-598
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    • 2019
  • We demonstrate an alternative alignment process using transferring process on solution driven HfZnO film. Parallel pattern is firstly fabricated on a silicon wafer by laser interference lithography. Prepared HfZnO solution fabricated by sol-gel process is spin-coated on a glass substrate. The silicon wafer with parallel pattern is placed on the HfZnO film and annealed at $100^{\circ}C$ for 30 min. After transferring process, parallel grooves on the HfZnO film is obtained which is confirmed by atomic force microscopy and scanning electron microscopy. Uniform liquid crystal alignment is achieved which is attributed to an anisotropic characteristic of HfZnO film by parallel grooves. The liquid crystal cell exhibited a pretilt angle of $0.25^{\circ}$ which showed a homogeneous alignment property.

Patterning of BiLaO film using imprinting process for liquid crystal display (임프린팅을 이용한 BiLaO 패터닝과 액정 디스플레이 소자의 응용)

  • Lee, Ju Hwan
    • Journal of IKEEE
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    • v.25 no.1
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    • pp.64-68
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    • 2021
  • We demonstrate an effect of annealing temperature on imprinting process of BiLaO thin film for liquid crystal alignment. BiLaO prepared sol-gel process was deposited by spin coating on a glass substrate, and then transferred to a pre-fabricated aligned pattern which is fabricated on a silicon wafer by laser interference lithography. Thin film was annealed at different temperature of 100, 150, 200, and 250 ℃. From the polarized optical microscopy analysis, the liquid crystal orientation was not uniform at the annealing temperature of 200 ℃ or lower and the uniform liquid crystal alignment characteristics were confirmed at the annealing temperature of 250 ℃. From atomic force microscopy, the pattern was not transferred at a temperature of 200 ℃ or lower. In contrast, the pattern was transferred at 250 ℃. Anisotropy of the thin film was obtained by the alignment pattern transferred at a temperature of 250 ℃, and the liquid crystal molecules could be evenly oriented on the thin film. Therefore, it was confirmed that the liquid crystal alignment process by the imprinting process of the BiLaO oxide film was affected by the annealing temperature.

On the Development of a Spatial Hybrid Visual Alignment System (3차원 하이브리드 비전 정렬 시스템에 관한 연구)

  • Hwang, Jae-Woong;Kwon, Sang-Joo
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.4
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    • pp.79-87
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    • 2011
  • In this paper, suggested is a hybrid-type visual alignment system to align mask and panel in 3-D space, where mask and panel are to be controlled independently by two individual positioning mechanisms in order to compensate for spatial misalignments. In the hybrid visual alignment system, the below 4-PPR parallel mechanism provides in-plain motions to pattern mask like the other conventional alignment systems while the above 4-RPS parallel mechanism is to move glass panel to achieve a complete spatial alignment. For the control of the hybrid alignment system, first, inverse kinematic solutions for the parallel mechanisms are given to determine the driving distance of each active joint, and also an efficient way to determine the spatial alignment error is developed by exploiting three in-plane cameras.

Sharp Edge Tool Alignment for Micro Pattern Machining (마이크로 패터닝 가공을 위한 공구 정렬에 관한 연구)

  • Park, Soon-Sub;Won, Jong-Ho
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.8 no.3
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    • pp.1-6
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    • 2009
  • This paper presents a geometrical error compensation of tool alignment for sharp edge bite on B axis controlled machine. In precision micro patterning, bite alignment is crucial parameter for machined surface. To decrease bite alignment error, plus tilted bite from B axis center is touched to reference work piece(pin gauge) and checked the deviation from original position. Same process is repeated for maximum touch deviation value. From this touched position value, wheel alignment error in X axis and Z axis can be calculated on B axis center. Experimental results show that this compensation method is efficient to correct sharp edge bite alignment.

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Pattern Check According To The Rubbing Direction Of The LC VA Cell (VA 액정 셀의 러빙방향에 따른 패턴 확인)

  • Kim, Jeong-ha;Kim, Hak-rae;Song, Jang-kun
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2015.10a
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    • pp.481-483
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    • 2015
  • In order to understand the characteristics of the LCD, we make Vertical Alignment Liquid Crystal Cell and check the pattern that appears in Cell flowing a current. After giving different rubbing directions on made cell, check and compare various patterns appeared on the cell, research the cause of the patterns. When we apply a current to the cell, lines appear on the cell. We find that higher voltage and frequency make many lines on the cell.

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Kinematics and Control of a Visual Alignment System for Flat Panel Displays (평판 디스플레이 비전 정렬 시스템의 기구학 및 제어)

  • Kwon, Sang-Joo;Park, Chan-Sik;Lee, Sang-Moo
    • Journal of Institute of Control, Robotics and Systems
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    • v.14 no.4
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    • pp.369-375
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    • 2008
  • The kinematics and control problem of a visual alignment system is investigated, which plays a crucial role in the fabrication process of flat panel displays. The first solution is the inverse kinematics of a 4PPR parallel alignment mechanism. It determines the driving distance of each joint to compensate the misalignment between mask and panel. Second, an efficient vision algorithm for fast alignment mark recognition is suggested, where by extracting essential feature points to represent the geometry of a mark, the geometric template matching enables much faster object recognition comparing with the general template matching. Finally, the overall visual alignment process including the kinematic solution, vision algorithm, and joint control is implemented and experimental results are given.

Measurement and Correction of PCB Alignment Error Using Two Cameras (2대의 카메라를 이용한 PCB의 위치 오차 측정 및 보정)

  • 김천환;신동원
    • 제어로봇시스템학회:학술대회논문집
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    • 2000.10a
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    • pp.302-302
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    • 2000
  • This paper presents the measurement and correction of PCB alignment errors for PCB-manufacturing machines. The conventional PCB-manufacturing machine doesn't have enough accuracy to accommodate the demand for high-resolution circuit pattern and high-density mounting capacity of electronic chips. It is because of alignment errors of PCB loaded to the PCB-manufacturing machine. Therefore, this study focuses on the development of the system which is able to measure and correct alignment errors whit high-accuracy. An automatic optical inspection part measures the PCB alignment error using two cameras, and the high-accuracy 3-axis stage makes correct of these error. The operating system is run in the environment of Window 98 (or NT). Finally we implemented this system to PCB screen printer and PCB exposure system.

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