• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.111-114
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• 2003

In order to improve the surface uniformity and the conduction properties of the fabricated YBCO thick films, a system that applies alternating field vertically to the EPD field has been developed for the first time and applied to the electrophoretic deposition process. The applied alternating electric field caused a force to be exerted on each YBCO particle and resulted in a shaking of the particle in the direction of applied electric field, accomplishing a uniform particle orientation. The usual commercial electrical power was used for the vertically applied alternating voltage and the induced electric field was 25-120 V/cm at 60Hz. The thick film fabricated by the method developed in this paper showed better surface uniformity without crack and porosity and improved film characteristics such as critical temperature ($T_{c,zero}$ : 90 K) and critical current density ($2354\;A/cm^2$). Therefore, it is expected that the shaky-aligned electrophoretic deposition method can be used to fabricate superconductor films through a simpler process and at less expense.

• Journal of Electrical Engineering and Technology
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• v.1 no.4
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• pp.520-527
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• 2006

The electrical discharge and operational characteristics of needle and wire-cylinder corona charger based on current measurements for positive and negative coronas were evaluated and compared. A semi-empirical method was used to determine the ion concentrations in the charging zone and at the outlet of both chargers. Results from experimental investigation revealed that magnitudes of the charging current from the wire-cylinder charger were approximately 3.5 and 2 times smaller than those from the needle charger for the positive and negative coronas, respectively. The ion number concentrations at the outlet for positive corona of both chargers were higher than fur negative corona at the same voltage. Flow and electric fields in the charging zone of both chargers were also analyzed via numerical computation. Strong electric field strength zone was identified and led to high charging and particle deposition. Effect of particle deposition on the evolution of discharge current was presented. It was shown that ions loss inside the wire-cylinder charger was higher than the needle charger The particle deposited on the corona electrodes and on the grounded cylinder caused a great reduction in charging efficiency of both chargers.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.11
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• pp.1041-1046
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• 2003

In order to improve the surface uniformity and the conduction properties of the fabricated YBCO thick films, a system that applies alternating field vertically to the EPD field has been developed for the first time and applied to the electrophoretic deposition process. The applied alternating electric field, so called Shaky Alternating Assisted Field, caused a force to be exerted on each YBCO particle and resulted in a shaking of the particle in the direction of applied electric field, accomplishing a uniform particle orientation. The usual commercial electrical power was used for the vertically applied alternating voltage and the induced electric field was 25-120 V/cm at 60Hz. The thick film fabricated by the method developed in this paper showed better surface uniformity without crack and porosity and improved film characteristics such as critical temperature (Tc,zero = 90 K) and critical current density (2354 A/$\textrm{cm}^2$), Therefore, it is expected that the shaky-aligned electrophoretic deposition method can be used to fabricate superconductor films through a simpler process and at less expense.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.23 no.2
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• pp.262-271
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• 1999

A study of aerosol dynamics has been done to obtain axially and radially varying size distributions of particles generated in the Modified Chemical Vapor Deposition process. Heat and mass transfer have also been studied since particle generation and deposition strongly depend on the temperature field in a tube. Bimodal size distributions of particles have been obtained both in the particulate flow and in the deposited particle layer for the first time using the sectional method to solve aerosol dynamics. Variations of geometric mean diameter, geometric standard deviation have been studied for various parameters; flow rates and maximum wall temperature. The comparison between one-dimensional and two-dimensional approaches has also been made.

• Journal of Electrical Engineering and Technology
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• v.1 no.1
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• pp.98-100
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• 2006

ZnO thin films were deposited at different repetition rates of 5 Hz and 10 Hz by pulsed laser deposition. X-ray diffraction (XRD) full widths at half maximum (FWHMs) of (002) ZnO peak in ZnO thin film deposited at 5 Hz and 10 Hz was 0.22 and $0.26^{\circ}$, respectively. The grain size of ZnO thin film deposited at 5 Hz was larger than that of 10 Hz. The variation of repetition rates did not have an effect on the optical property of ZnO thin films. The degradation of the crystalline quality and surface morphology in ZnO thin film deposited at 10 Hz resulted from supersaturation effect by decrease of time interval between a ZnO particle arriving on a substrate by laser shot and a ZnO particle arriving on a substrate by next laser shot.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.126-129
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• 2007

The particle formation using pyrolysis has many advantages over other particle manufacturing techniques. The particles by pyrolysis have relatively uniform size and chemical composition. Also, we can easily produce high purity particles. Thus, we studied the formation of silicon particles by pyrolysis of 50% $SiH_4$ gas diluted in Ar gas. A pyrolysis furnace was used for the thermal decomposition of $SiH_4$ gas at $800^{\circ}C$ and atmospheric pressure. The aerosol flow from furnace is separated into two ways. The one is to the Scanning Mobility Particle Sizer (SMPS) for particle size distribution measurement and the other is to the particle deposition system. The produced silicon particles are deposited on the wafer in the deposition chamber. SEM measurement was used to compare the particle size distribution results from the SMPS. Depending on the experimental conditions, particles of high concentration in the $30\sim80$ nm size range were generated.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.789-790
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.575-576
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.585-586
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.1543-1544
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• 2013