• 제목/요약/키워드: PZT

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유리 기판 위에서의 PZT 캐패시터에 관한 연구 (A study on PZT capacitor on the glass substrate)

  • 주필연;박영;정규원;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 춘계학술대회 논문집 전자세라믹스 센서 및 박막재료 반도체재료 일렉트렛트 및 응용기술
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    • pp.80-83
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    • 2000
  • The post-annealing treatments on rf magnetron sputtered PZT($Pb_{1.05}(Zr_{0.52},\;Ti_{0.48})O_3$) thin films($4000{\AA}$) have been investigated for a structure of PZT/Pt/Ti/Coming glass(1737). Crystallization properties of PZT films were strongly dependent on RTA(Rapid Thermal Annealing) annealing temperature and time. We were able to obtain a perovskite structure of PZT at $650^{\circ}C$ and 10min. P-E curves of Pd/PZT/Pt capacitor demonstrate typical hysteresis loops. The measured values of $P_r$, $E_c$ were $8.1[{\mu}C/cm^2]$, 95[kV/cm] respectively. Polarization value decrease about 25% after $10^9$ cycles.

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Polymer/PZT 복합재료를 이용한 초음파 트랜스듀서의 음향특성 (Acoustic Properties of Ultrasonic Transducers using Polymer/PZT piezomposites)

  • 홍정표;류정탁;김연보
    • 한국음향학회:학술대회논문집
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    • 한국음향학회 2004년도 추계학술발표대회논문집 제23권 2호
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    • pp.353-356
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    • 2004
  • 단일 PZT보다 전기적 및 음향 특성비 우수한 Polymer/PZT 압전복합재료를 설계하고, 이것으로 초음과 트랜스듀서를 제작하여 음향특성을 고찰하였다. 폴리머의 체적 수축율 조정을 위한 충진제를 선정하고, PZT의 부피분율출 $30\~80\%$ 변화시켜 이것에 따른 전기적 특성 및 음향 특성을 비교, 검토하였다. PZT/Polymer 압전복합재료의 전기기계결합계수$(=k_{t})$는 단일 PZT 보다 우수하게 나타났으며, 음향 임피던스는 $3\~7[Mrayl]$ 정도로 낮게 조정할 수 있었다. 또한 Pulse-echo법으로 음향 송수신특성을 측정한 길과, 단일의 PZT를 사용한 경우보다 높은 진폭과 넓은 대역폭이 측정되어 음향 특성이 우수한 것을 확인 할 수 있었다.

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화학적 기계적 연마 공정으로 제조한 PZT 캐패시터의 전기적 특성 (Electrical Properties of Fabrication PZT Capacitors by Chemical Mechanical Polishing Process)

  • 고필주;김남훈;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.370-371
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    • 2006
  • 본 연구에서는 PZT박막의 강 유전 캐패시터 제작을 위한 연구로, 4-inch크기의 $SiO_2$/Pt/Ti/Si가 증착된 웨이퍼를 습식 식각하여 $SiO_2$ 패턴(0.8um)을 형성하였고, PZT박막의 캐패시터 제작을 위해 패턴 웨이퍼에 $Pb_{1.1}$($Zr_{0.52}Ti_{0.48}$)$O_3$조성을 갖는 PZT를 증착하였다. $600^{\circ}C$에서 열처리 후 페로브스카이트 구조를 가지는 PZT 박막의 CMP(chemical mechanical polishing) 공정에 따른 전기적 특성을 연구하였다. 강유전체 소자 적용을 위한 CMP 공정으로 제조된 PZT 박막 캐패시터의 P-E특성, I-V특성, 피로특성 등의 전기적 특성을 측정하였다.

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PZT 분말 제조를 위한 수열합성 조건에 관한 연구 (Studies on hydrothermal synthetic conditions for preparation of PZT powders)

  • 정성택;이기정;서경원
    • 한국결정성장학회지
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    • 제6권2호
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    • pp.254-262
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    • 1996
  • 수열합성법을 이용하여 $1~3\;\mu\textrm{m}$의 입자 크기를 갖는 균일한 $Pb(Zr_{0.52}Ti_{0.48})O_{3}$ (PZT)분말을 제조하였다. 출발물질의 종류에 따라 반응조건이 다소 차이를 보였지만, 일반적으로 10 M의 KOH를 광화제로 사용하여, $180^{\circ}C$ 이상에서 2시간 동안 반응시켜 PZT 분말을 합성 할 수 있었다. 또한, 광화제의 농도, 수열반응 온도, 그리고 반응시간이 증가할수록 균일상의 분말이 형성됨을 보였다.

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PZT를 이용한 광 정보저장기기용 엑츄에이터의 추적제어 (Track following control of optical pick-up actuator using PZT)

  • 이우철;양현석;박노철;박영필
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.664-669
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    • 2003
  • This paper proposes a swing-arm type dual-stage actuator, which consists of a PZT actuator for fine motion and a VCM(Voice Coil Motor) for coarse motion, for SFF ODD(Small Form Factor Optical Disk Drive), in order to achieve fast access speed and precise track following control. We focus our attention on the design and control of the PZT actuator, because there have been a lot of previous researches related to the VCM and dual-stage actuators. Due to the dual cantilever structure, the PZT actuator can generate precise translational tracking motion at its tip where optical pickup is attached at, and the effect of hysteric behavior of the PZT element is reduced. The dynamic model of the PZT actuator is derived by using the Hamilton's principle, and verified by comparing with the experimental frequency response. The sliding mode control is designed in order to be robust against modeling uncertainties. Simulations and experimental results confirm the effectiveness of the suggested control scheme.

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유리기판 위에 증착한 PZT 박막의 전기적 특성에 관한 연구 (A Study on Electrical Properties of PZT Thin Films Deposited on the Glass Substrates)

  • 정규원;주필연;박영;이준신;송준태
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제50권1호
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    • pp.24-29
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    • 2001
  • PZT thin films(4000A) have prepared onto 1737 corning glass and ITO coated glass substrates with a RF magnetron sputtering system using Pb_{1.05}(Zr_{0.52},Ti_{0.48})O_3$ceramic target, Electrical properties of PZT thin film deposited after ITO coated glass were P${\gamma}$ was decreased by 25% after 109cycles, respectively. With the RTA treatment duration and temperature increased, the crystallization of PZT thin films were enhanced, however, the leakage current density became higher. The leakage current mechanism was found to be space charge conduction by the defects and oxygen vacancies existing in PZT and PZT/bottom electrode interfaces.

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O-3형 PZT/PVDF 복합재료의 압전특성에 관한 연구 (A study on the piezoelectric properties with PZT/PVDF composites of O-3 connectivity)

  • 최용;김용혁;김호기;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 정기총회 및 창립40주년기념 학술대회 학회본부
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    • pp.254-256
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    • 1987
  • In this study, piezoelectric composite materials of O-3 connectivity were made by, mixing FZT ceramics with polymers, the dependence of volume % PZT and poling condition for dielectric and piezoelectric properties were investigated. The measured value of dielectric constant was dependent on the volume % PZT, which was exponentially increased with volume %PZT. Piezoelectric coefficient ($\bar{d}_{33}$) was exponentially increased with volume % PZT. Voltage coefficient ($\bar{g}_{33}$) was decreased with volume % PZT, but it was larger than that of single phase PZT ($\bar{g}_{33}$) because the dielectric constant ($\bar{\varepsilon}_{33}$) of composite materials was decreased.

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PZT와 LiNbO$_3$기판에서의 SAW필터의 제작 (Fabrication of SAW filter on PZT and LINbO$_3$substrates)

  • 정연호;여동훈;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1996년도 추계학술대회 논문집
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    • pp.40-43
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    • 1996
  • Substrates of SAW filter are mainly single crystal such as LiNbO$_3$, LiTaO$_3$. However, fabrication of crystal is difficult and cost is very high. In this study, crystal was substituted for piezoelectric ceramics which has simple fabrication process. The same SAW filter mask was photolithographed on crystal(LiNbO$_3$) substrate and ceramic(PZT4, PZT5A and PZT8) substrate in order to compare experimental value with theoretical value. The difference of center frequency was only 3.7%. PZT8 showed good bandwidth properties. It is considered that PZT8 has higher mechanical quality factor and propagation velocity than PZT4, PTT5A.

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PZT-CMP 공정시 후처리 공정에 따른 표면 특성 (Surface Characteristics of PZT-CMP by Post-CMP Process)

  • 전영길;이우선
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.103-104
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    • 2006
  • $Pb(Zr,Ti)O_3(PZT)$ is very attractive ferroelectric materials for ferroelectric random access memory (FeRAM) applications because of its high polarization ability and low process temperature. However, Chemical Mechanical Polishing (CMP) pressure and velocity must be carefully adjusted because FeRAM shrinks to high density devices. The contaminations such as slurry residues due to the absence of the exclusive cleaning chemicals are enough to influence on the degradation of PZT thin film capacitors. The surface characteristics of PZT thin film were investigated by the change of process parameters and the cleaning process. Both the low CMP pressure and the cleaning process must be employed, even if the removal rate and the yield were decreased, to reduce the fatigue of PZT thin film capacitors fabricated by damascene process. Like this, fatigue characteristics were partially controlled by the regulation of the CMP process parameters in PZT damascene process. And the exclusive cleaning chemicals for PZT thin films were developed in this work.

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PZT(53/47) 박막의 식각 및 전기적 특성에 관한 연구 (A study on the Etching and electrical Properties of PZT Thin Films)

  • 김경태;이성갑;이영희;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.39-42
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    • 2000
  • The effect of excess Pb contents on the etching of PZT thin films and their electrical properties has been investigated. Ferroelectric PZT(53/47) thin films were prepared by the metal alkoxide-based Sol-Gel method, in which they were spin-coating on P7Ti/Si02/Si substrate using the PZT(53/47) stock solutions with various excess Pb contents. Etching of PZT film was performed using planar inductively coupled Ar/Cl$_2$/BCl$_3$ plasma. The etch rate of PZT film was 2450 $\AA$/min at Ar(20)/BCl$_3$(80) gas mixing ratio and substrate temperature of 8$0^{\circ}C$.

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