• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.79-79
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• 2012

A high temperature and a low temperature plasma process technologies were developed and demonstrated for synthesis, hybrid formation, surface treatment and CVD engineering of nano powder. RF thermal plasma is used for synthesis of spherical nano particles in a diameter ranged from 10 nm to 100 nm. A variety of nano particules such as Si, Ni, has been synthesized. The diameter of the nano-particles can be controlled by RF plasma power, pressure, gas flow rate and raw material feed rate. A modified RF thermal plasma also produces nano hybrid materials with graphene. Hemispherical nano-materials such as Ag, Ni, Si, SiO2, Al2O3, size ranged from 30 to 100 nm, has been grown on graphene nanoplatelet surface. The coverage ranged from 0.1 to 0.7 has been achieved uniformly over the graphene surface. Low temperature AC plasma is developed for surface modification of nano-powder. In order to have a three dimensional and lengthy plasma treatment, a spiral type of reactor has been developed. A similar plasma reactor has been modfied for nano plasma CVD process. The reactor can be heated with halogen lamp.

• 한국세라믹학회지
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• 제53권1호
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• pp.93-98
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• 2016

Cold plasma and heat treatment were selected as technologies to reduce unburned carbon in fly ash to less than 1.0%. Both cold plasma and heat treatment made it possible to eliminate unburned carbon to less than 1.0%. In the case of fly ash, which almost entirely eliminated unburned carbon with an ignition loss of 0.5%, heat treatment caused adhesion among particles and the BET specific surface area rapidly decreased as the mean particle size increased. On the other hand, with cold plasma, unburned carbon elimination caused the BET specific surface area to decrease and, as no adhesion occurred among particles, the mean particle size became small. Also, cold plasma treatment allowed small spherical particles confined within the unburned carbon particles to be released with the elimination of the unburned carbon frame, so that the quantity of fine particles had a tendency to slightly increase.

• 한국섬유공학회:학술대회논문집
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• 한국섬유공학회 2003년도 봄 학술발표회 논문집
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• pp.434-435
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• 2003

Physicochemical properties of a polymer surface significantly affect adhesion, wetting, and dyeing properties. In recent years, low temperature plasma technology has been widely used for surface modification of polymers. Surface fluorination by low temperature plasma treatment has been employed to improve the water and oily repellency of textile fabrics. However, very few results have been reported on soil release properties of the oxygen plasma treated textile fabrics. (omitted)

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 춘계학술대회 논문집 방전 플라즈마 유기절연재료 초전도 자성체연구회
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• pp.11-14
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• 2004

In this paper, the effect of adhesion properties of semiconductive-insulating interface layer of silicone rubber on electrical properties was investigated. The modifications produced on the silicone surface by oxygen plasma were accessed using ATR-FTIR, contact angle and AFM. Adhesion was obtained from T-peel tests of semiconductive layer having different treatment durations. In addition, ac breakdown test was carried out for elucidating the change of electrical property with duration of plasma treatment. From the results, the treatment in the oxygen plasma produced a noticeable increase in surface energy, which can be mainly ascribed to the the creation of O-H and C=O. It is observed that adhesion performance was determined by not surface energy but roughness level of silicone surface. It is found that ac dielectric strength was increased with improving the adhesion between the semiconductive and insulating interface.

• 한국염색가공학회지
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• 제34권3호
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• pp.165-172
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• 2022

Polypropylene(PP) is a textile material with various functions such as eco-friendliness, lightness, and elasticity. Although most synthetic fibers can be dyed and finished, but original PP is difficult to dye or finish due to its extremely hydrophobic properties, so its application expansion is limited. In order to solve this problem, dyeable PP was developed, and various researches on textiles for clothing such as mass production technology, fine fiberization and performance improvement are in progress. Plasma treatment is a processing method for modifying the surface of fabrics, and has effects such as hydrophilization, deepening color, improving adhesion, and surface polymerization. In this study, plasma treatment was applied to study changes in hydrophilization properties of dyeable PP, surface changes before and after plasma treatment and performance according to hydrophilization.

• 한국전기전자재료학회논문지
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• 제11권7호
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• pp.517-521
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• 1998

After etching Al-Cu alloy films using $SiCl_4/Cl_2/He/CHF_3$ plasma, a corrosion phenomenon on the metal surface has been studied with XPS(X-ray pheotoelectron spectroscopy) and SEM (Scanning electron microscopy). In Al-Cu alloy system, the corrosion occurs rapidly on the etched surface by residual chlorine atoms. To prevent the corrosion, $CHF_3$ plasma treatment subsequent to the etch has been carried put. A passivation layer is formed by fluorine-related compounds on the etched Al-Cu surface after $CHF_3$ treatment, and the layer suppresses effectively the corrosion on the surface as the $CHF_3$treatment in the pressure of 300m Torr.

• 폴리머
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• 제38권2호
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• pp.205-212
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• 2014

본 연구에서는 폴리에테르설폰(polyethersulfone, PES)을 연소배가스에 포함된 수증기를 분리 및 회수하기 위한 고분자 분리막 소재로 사용하기 위해 다양한 물리 화학적 표면개질 방법을 사용하여 PES 평막 표면의 친수성을 향상시키고자 하였다. 균일한 PES 평막을 제조한 후 친수성 향상을 위한 개질 방법으로 산처리, 블렌딩 및 플라즈마 처리를 통해 표면개질을 하였고, 표면 특성을 비교하였다. PES 평막 표면의 특성 변화는 ATR-FTIR, XPS, SEM 및 접촉각 측정을 통해 관찰하였다. 황산을 이용한 산처리 방법과 양친매성 고분자를 이용한 블렌딩 방법에 의해 개질된 PES 평막에서는 접촉각의 변화가 크지 않았다. Ar 플라즈마 처리를 한 경우, 플라스마 처리 시간이 증가함에 따라 PES 표면의 친수성이 크게 증가하는 것을 확인할 수 있었다. 본 결과를 통해 다양한 표면개질 방법 중 플라즈마 방법을 적용하여 PES 표면을 처리하는 것이 PES 막 표면의 친수성 향상에 가장 효과적임을 확인하였다.

• 한국의상디자인학회지
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• 제11권1호
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• pp.43-51
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• 2009

The cotton, wool, cotton/wool blended(80:20) and tencel fabrics were treated with low temperature oxygen or argon plasma, enzymes(cellulase or protease), or oxygen plasma-enzyme and examined for their weight loss and conditions for treatment for the environment friendly finishing. In the plasma treatment argon gas had better effect on the weight loss than oxygen gas did and the weight loss of all the fabrics was increased as increasing discharge power and discharge time. The weight loss of cotton, wool, cotton/wool blended(80:20) fabrics decreased in a large measure after 1 hr but that of tencel didn't decrease after 1 hr. In case of cellulose fibers oxygen gas plasma induced chemical functional groups on the surface of substrate more than argon gas plasma did so the weight loss of wool was larger than that of cotton, tencel fabrics in oxygen plasma-enzyme treatment. The weight loss of cotton and tencel fabrics decreased the initial stage because oxygen plasma pre-treatment caused cross linking as well as etching effect but argon plasma pre-treatment didn't. The plasma pre-treatment cleared the way for enzyme treatment on the whole but oxygen plasma pre-treatment bear in hand the increase of weight loss more or less because of the cross linking on the surface of cellulose fibers. The appropriate conditions for plasma treatment was 10-1Torr, 40W for 30minutes and for cellulase treatment were enzyme concentration of $3g/{\ell}$, pH 5, $60^{\circ}C$ for 1hr and for protease treatment were enzyme concentration of $4g/{\ell}$ pH 8, $60^{\circ}C$ for 1hr.

• 한국전기전자재료학회논문지
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• 제17권12호
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• pp.1332-1336
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• 2004

Amorphous carbon (a-C) films have been deposited on Si(100) substrate using RF magnetron system in order to investigate the electron field emission properties. The a-C films were treated by $N_2$ gas plasma at room temperature. Surface morphologices and structural properties of the a-C films before and after $N_2$ plasma treatment were observed by scanning electron microscopy and Raman spectroscope, respectively. Structural properties and surface morphology of the a-C films were changed by $N_2$ plasma treatment. The emission properties can be improved by the plasma treatment according to the contents of nitrogen on the a-C films which is varied by plasma treatment time. Before the plasma treatment, the a-C films are found to have a threshold field of 14 V/$\mu$m, but the a-C film treated by $N_2$ plasma for 30 min exhibit threshold field as low as 6.5 V/$\mu$m.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권7호
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• pp.424-432
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• 2000

The plasma surface treatment, using hydrogen gas, of the silicon wafer was investigated as a pretreatment for the application to silicon-on-insulator (SOI) wafers using the silicon direct bonding technique. The chemical reactions of hydrogen plasma with surfaces were used for both the surface activation and the removal of surface contaminants. As a result of exposure of silicon wafer to the plasma, an active oxide layer was formed on the surface, which was rendered hydrophilic. The surface roughness and morphology were estimated as functions of plasma exposing time as well as of power. The surface became smoother with decreased incident hydrogen ion flux by reducing plasma exposing time and power. This process was very effective to reduce the carbon contaminants on the silicon surface, which was responsible for a high initial surface energy. The initial surface energy measured by the crack propagation method was 506 mJ/m2, which was up to about three times higher than that of a conventional RCA cleaning method.